JPS6063210A - Manufacture of sulfonic acid group-containing acrylamide polymer - Google Patents
Manufacture of sulfonic acid group-containing acrylamide polymerInfo
- Publication number
- JPS6063210A JPS6063210A JP17180383A JP17180383A JPS6063210A JP S6063210 A JPS6063210 A JP S6063210A JP 17180383 A JP17180383 A JP 17180383A JP 17180383 A JP17180383 A JP 17180383A JP S6063210 A JPS6063210 A JP S6063210A
- Authority
- JP
- Japan
- Prior art keywords
- monomer
- acid
- plasma
- aqueous medium
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 229920002401 polyacrylamide Polymers 0.000 title claims description 7
- 125000000542 sulfonic acid group Chemical group 0.000 title description 6
- 239000000178 monomer Substances 0.000 claims abstract description 42
- 239000012736 aqueous medium Substances 0.000 claims abstract description 15
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 12
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 11
- -1 alkalimetal salts Chemical class 0.000 claims abstract description 8
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 6
- 150000003863 ammonium salts Chemical class 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 15
- 239000002253 acid Substances 0.000 claims description 6
- 238000007872 degassing Methods 0.000 claims description 6
- 229920000536 2-Acrylamido-2-methylpropane sulfonic acid Polymers 0.000 claims description 5
- XHZPRMZZQOIPDS-UHFFFAOYSA-N 2-Methyl-2-[(1-oxo-2-propenyl)amino]-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(C)(C)NC(=O)C=C XHZPRMZZQOIPDS-UHFFFAOYSA-N 0.000 claims description 5
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 claims description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 4
- SJIXRGNQPBQWMK-UHFFFAOYSA-N 2-(diethylamino)ethyl 2-methylprop-2-enoate Chemical compound CCN(CC)CCOC(=O)C(C)=C SJIXRGNQPBQWMK-UHFFFAOYSA-N 0.000 claims description 3
- QHVBLSNVXDSMEB-UHFFFAOYSA-N 2-(diethylamino)ethyl prop-2-enoate Chemical compound CCN(CC)CCOC(=O)C=C QHVBLSNVXDSMEB-UHFFFAOYSA-N 0.000 claims description 3
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 claims description 3
- DPBJAVGHACCNRL-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)CCOC(=O)C=C DPBJAVGHACCNRL-UHFFFAOYSA-N 0.000 claims description 3
- XEEYSDHEOQHCDA-UHFFFAOYSA-N 2-methylprop-2-ene-1-sulfonic acid Chemical compound CC(=C)CS(O)(=O)=O XEEYSDHEOQHCDA-UHFFFAOYSA-N 0.000 claims description 3
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 claims description 3
- KFDVPJUYSDEJTH-UHFFFAOYSA-N 4-ethenylpyridine Chemical compound C=CC1=CC=NC=C1 KFDVPJUYSDEJTH-UHFFFAOYSA-N 0.000 claims description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 3
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 claims description 3
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 claims description 3
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 claims description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 2
- 229910017604 nitric acid Inorganic materials 0.000 claims description 2
- PRAMZQXXPOLCIY-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)ethanesulfonic acid Chemical compound CC(=C)C(=O)OCCS(O)(=O)=O PRAMZQXXPOLCIY-UHFFFAOYSA-N 0.000 claims 1
- 150000007513 acids Chemical class 0.000 claims 1
- LJSQFQKUNVCTIA-UHFFFAOYSA-N diethyl sulfide Chemical compound CCSCC LJSQFQKUNVCTIA-UHFFFAOYSA-N 0.000 claims 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 claims 1
- 150000003457 sulfones Chemical class 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 abstract description 21
- 229920000642 polymer Polymers 0.000 abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 8
- 239000012535 impurity Substances 0.000 abstract description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 abstract description 2
- 230000000694 effects Effects 0.000 abstract description 2
- BOOMOFPAGCSKKE-UHFFFAOYSA-N butane-2-sulfonic acid;prop-2-enamide Chemical compound NC(=O)C=C.CCC(C)S(O)(=O)=O BOOMOFPAGCSKKE-UHFFFAOYSA-N 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000003708 ampul Substances 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 description 2
- 229940008406 diethyl sulfate Drugs 0.000 description 2
- 239000003995 emulsifying agent Substances 0.000 description 2
- 229960003750 ethyl chloride Drugs 0.000 description 2
- 230000003311 flocculating effect Effects 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000002685 polymerization catalyst Substances 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000010802 sludge Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000375 suspending agent Substances 0.000 description 2
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- NZEDMAWEJPYWCD-UHFFFAOYSA-N 3-prop-2-enylsulfonylprop-1-ene Chemical compound C=CCS(=O)(=O)CC=C NZEDMAWEJPYWCD-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- LVVNAXBITSNKOO-UHFFFAOYSA-N [2-hydroxy-3-[2-hydroxy-3-(2-methylprop-2-enoyloxy)propyl]sulfonylpropyl] 2-methylprop-2-enoate Chemical compound OC(CS(=O)(=O)CC(COC(C(=C)C)=O)O)COC(C(=C)C)=O LVVNAXBITSNKOO-UHFFFAOYSA-N 0.000 description 1
- QMHAHUAQAJVBIW-UHFFFAOYSA-N [methyl(sulfamoyl)amino]methane Chemical compound CN(C)S(N)(=O)=O QMHAHUAQAJVBIW-UHFFFAOYSA-N 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229920006318 anionic polymer Polymers 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- BRXCDHOLJPJLLT-UHFFFAOYSA-N butane-2-sulfonic acid Chemical compound CCC(C)S(O)(=O)=O BRXCDHOLJPJLLT-UHFFFAOYSA-N 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000007717 redox polymerization reaction Methods 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 239000002455 scale inhibitor Substances 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006277 sulfonation reaction Methods 0.000 description 1
- 229920000247 superabsorbent polymer Polymers 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
Landscapes
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
【発明の詳細な説明】
本発明はスルホン酸基含有アクリルアミド系重合体の製
造法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a sulfonic acid group-containing acrylamide polymer.
アクリルアミド誘導体として、又釉々の特徴を有したモ
ノマーとして、1莱的用途は広範囲にわたっている。A
MP Sは共重合性の染色性七ツマ−として繊維、プラ
スチックに用いられている池、ホモポリマー或いはその
共重合体は優れた凝集作用を有する高分子凝集剤として
、又凧、パルプ工業等に於ける廃水処理剤として、又下
水処理などの汚泥脱水剤として、広く使用式れている。It has a wide range of uses as an acrylamide derivative and as a monomer with glaze characteristics. A
MPS is used as a copolymerizable dyeing agent for fibers and plastics, and its homopolymer or its copolymer is used as a polymer flocculant with excellent flocculating action, and is also used in kites, pulp industry, etc. It is widely used as a wastewater treatment agent and as a sludge dewatering agent in sewage treatment.
またスルフォン化度の高いアニオン性高分子1こ解質で
ある為、イオン交換樹脂、スケールインヒビター、スラ
ッジ分散剤、又は石油回収用高分子としても利用されて
いる極めて多目的なポリマーである。凝集剤として利用
されるスルホン酸基含有アクリルアミド系重合体Cま一
般的に品分予示のものが請求され、高分子化する程凝集
作用が強くなる。最近では分子量が例えば1000万以
上という超高分子急のポリマーが要求されるようになっ
てきている。Furthermore, since it is an anionic polymer with a high degree of sulfonation, it is an extremely versatile polymer that is used as an ion exchange resin, a scale inhibitor, a sludge dispersant, and a polymer for oil recovery. The sulfonic acid group-containing acrylamide polymer C used as a flocculant is generally requested as specified in the specification, and the higher the molecular weight, the stronger the flocculating effect. Recently, there has been a demand for ultra-high molecular weight polymers with a molecular weight of, for example, 10 million or more.
従来より2−アクリルアミド−2−メチルプロパンスル
ホン酸及びその塩からホモポリマー、コポリマー等をつ
くる方法は多数開ボされている。例えば重合開始剤とし
て、過酸化ベンゾイル、アゾビスイソブチロニトリル、
過硫酸アンモニウムなどのラジカル重合触謀や過硫酸カ
リウムと酸性亜jpij酸ソーダ、過61シ酸アンモニ
ウムとモノエタノールアミンなどのレドックス系重合触
奴などを用いて懸濁重合又は乳化重合、更には溶液重合
する事が出来る。かかる方法においては重合体にラジカ
ル開始剤、懸詞剤、乳化剤、溶媒などが残留しやすく、
その為に着色したp、解那合じやすいはかりか、III
(触性、耐察品性、耐候性の点でも好ましくない。又、
分子量の高いポリマーを得る為には微量の重合開始剤を
用い、かつ重合温度を低下させる方法が一般的であるが
、この方法では重合速度が緩慢である為、重合を100
チ近く行うことは極めて困難であシ実際的でない。Many methods have been developed to produce homopolymers, copolymers, etc. from 2-acrylamido-2-methylpropanesulfonic acid and its salts. For example, as a polymerization initiator, benzoyl peroxide, azobisisobutyronitrile,
Suspension polymerization or emulsion polymerization, and further solution polymerization using radical polymerization catalysts such as ammonium persulfate, redox polymerization catalysts such as potassium persulfate and acidic sodium jpijite, ammonium persulfate and monoethanolamine, etc. I can do it. In such methods, radical initiators, suspension agents, emulsifiers, solvents, etc. tend to remain in the polymer;
For that purpose, colored p, scales that are easy to understand, III
(It is also unfavorable in terms of tactility, inspection resistance, and weather resistance.Also,
In order to obtain a polymer with a high molecular weight, it is common to use a small amount of polymerization initiator and lower the polymerization temperature, but since the polymerization rate is slow in this method, the polymerization is
It is extremely difficult and impractical to do so in close proximity.
一方、本発明者等は各塩ビニル性単量体をプラズマ開始
重合法により重合することにより従来のものに比較して
分子量が格段に大きい直鎖状の水溶性重合体を得る技術
を確立した。そのmB体として2−アクリルアミド−2
−メチルプロパンスルホン酸を用いて高吸水性重合体を
得、これを特願昭57−49166号に提案している。On the other hand, the present inventors have established a technology to obtain a linear water-soluble polymer with a much larger molecular weight than conventional polymers by polymerizing each vinyl chloride monomer using a plasma-initiated polymerization method. . 2-acrylamide-2 as its mB form
-A super absorbent polymer was obtained using methylpropanesulfonic acid, and this was proposed in Japanese Patent Application No. 57-49166.
その後、本発明者らはその技術を、より工業的に曖利に
ずべく種々検討した。この中で固体上ツマ−にイオン化
ガスプラズマを照射し活性種を生成した後、水系溶媒を
力aえると瞬間的に重合する現象を見出し鋭意、研究の
結果本発明を完成したものである。Thereafter, the present inventors conducted various studies to make the technology more industrially unambiguous. Among these, the inventors discovered a phenomenon in which active species are generated by irradiating ionized gas plasma onto a solid material, and then instantaneously polymerizes when a water-based solvent is heated, and as a result of extensive research, the present invention was completed.
本発明の目的とするところは全く新しい重合方法を提供
するにあ)、又他の目的は、実質的に不純物を含有せず
、分子量が極めて大きいスルホン酸基含有アクリルアミ
ド系重合体を効率的にかつ安価に製造する方法を捉供1
゛るにある。The purpose of the present invention is to provide a completely new polymerization method), and another purpose is to efficiently produce a sulfonic acid group-containing acrylamide polymer that is substantially free of impurities and has an extremely large molecular weight. We have found a way to manufacture it at low cost.
It's in there.
即ち、本発明方法は2−アクリルアミ)’ −2−メチ
ルプロパンスルホン酸、そのアンモニウム塩及びそのア
ルカリ金属塩から塩ばれた少なくとも1種の単量体(1
)にイオン化ガスフ゛ラズマを照射した後、該プラズマ
の不存在で単量体(1)、又は単量体(1)とそれと共
重合可能なビニル性単坦体と、水性媒体とを混合し後重
合1−ることを特徴とする。That is, the method of the present invention comprises at least one monomer (1
) is irradiated with an ionized gas plasma, and then, in the absence of the plasma, monomer (1) or a vinyl monocarrier copolymerizable with monomer (1) and an aqueous medium are mixed and post-polymerized. 1- It is characterized by:
本発明で用いるプラズマはいわゆる低温プラズマを指し
、該イオン化ガスプラズマはか力するプラズマを生成す
るための公知方法C)いずれによっても生成させること
ができる。例えばJ。The plasma used in the present invention refers to a so-called low-temperature plasma, which ionized gas plasma can be generated by any of the known methods C) for generating a powerful plasma. For example, J.
R,ホラハン(Ho1lahan )とA、T、べi+
・(Be1l)版「プラズマ化学の応用技術」、ソイ1
ノー、ニューヨーク1974およびMシ:r、 y (
5hen)版「重合体のプラズマ化学」デツカ−、ニュ
ーヨーク、1976に記載されている1、即ち高周波発
生器に連結された平行板電極の間にモノマーを真空下で
入れ、真空室の外部又は内部のいずれかの平行板を用い
てプラズマを生成させることが出来る。また外部誘導コ
イルによって電場をつくらせ、イオン化ガスのプラズマ
を発生させてもよく、また反対に荷電した電極に間隔を
おいて直接真空室に入れてプラズマを生成させてもよい
。R, Ho1lahan and A, T, Bei+
・(Be1l) version "Application technology of plasma chemistry", Soi 1
No., New York 1974 and M.S.: r, y (
1, i.e., the monomer is placed under vacuum between parallel plate electrodes connected to a high frequency generator, and the monomer is placed under vacuum between parallel plate electrodes connected to a high frequency generator, and the monomer is placed under vacuum between parallel plate electrodes connected to a high frequency generator. Plasma can be generated using any of the parallel plates. Alternatively, an electric field may be created by an external induction coil to generate a plasma of ionized gas, or a plasma may be generated by placing oppositely charged electrodes spaced apart directly into a vacuum chamber.
1L 封体(IH:l:常温で固体であり、この固体を
通6
常10 〜10トール(10°〜1opa)σ)高真空
下で脱気した後、上述したイオン化ガスフ゛ラズマを照
射さぜる。After degassing the 1 L enclosure (IH: 1: solid at room temperature, and degassing the solid under a high vacuum (usually 10 to 10 Torr (10° to 1 opa) σ), it is irradiated with the above-mentioned ionized gas plasma. .
イオン化ガスプラズマは通常20〜200ワツト、好1
しくけ40〜100ワツトにてグロー放% サセ* 7
h 体(1) ヘ(i’) M、射lIi通常1〜36
00秒、好ましくは10〜60秒という短時間行なえば
十分である。Ionized gas plasma is usually 20 to 200 watts, preferably 1
Glow release% at 40 to 100 watts Sase * 7
h body (1) h (i') M, injection lIi usually 1-36
A short time of 00 seconds, preferably 10 to 60 seconds is sufficient.
プラズマ照射時車量体(1)の重合に殆んど生じていす
、生じていたとしても高々2重量俤である。Most of the polymerization of the vehicle body (1) occurs during plasma irradiation, and even if it occurs, the amount is at most 2 weight.
照射後のモノマーの重合率が大きい場合は、重合体が架
橋構造を有する為、水性媒体と混合し、後重合させる場
合、溶解性が低下したり重合が進まなかったり、小月−
に進行したり、生成物の性IJヒが十分でなかったり又
は、不均一になったりする。If the polymerization rate of the monomer after irradiation is high, the polymer has a crosslinked structure, so when mixed with an aqueous medium and subjected to post-polymerization, the solubility may decrease, the polymerization may not proceed, or Kozuki-
The product may not have sufficient IJ properties or may become non-uniform.
プラズマ照射を行なった後、プラズマの不存在下で単量
体(1)と水性媒体又は単量体(1)とそれと共重合E
J能なビニル性AH体と水とを混合し後重合させる。After plasma irradiation, monomer (1) and an aqueous medium or monomer (1) and copolymerization E are carried out in the absence of plasma.
The J-functional vinyl AH compound and water are mixed and post-polymerized.
本発明に適用される417体(1)は2−アクリルアミ
ド−2−メチルプロパンスルホン酸、又はそのアンモニ
ウム塩、又はそのアルカリ金属塩の中の1桟或いは2種
以上用いてもよいつどのものを用いるかは目的と性能に
より適宜選択する。The 417 substance (1) applied to the present invention is 2-acrylamido-2-methylpropanesulfonic acid, or its ammonium salt, or any one or more of its alkali metal salts, which may be used. The choice of whether to use it or not should be made as appropriate depending on the purpose and performance.
プラズマ照射によシ単量体(1)に生成させられた活性
点は詳細は不明であるが、固体状態の為、重合を開始す
る事がなく、しかし、その活性は保存されておυ、水性
媒体と6も合し、溶解する事によって始めて非常な速度
で重合を開始する。The details of the active sites generated in monomer (1) by plasma irradiation are unknown, but since they are in a solid state, they do not initiate polymerization, but their activity is preserved and υ, Polymerization begins at a very rapid rate only when 6 is combined with the aqueous medium and dissolved.
水性媒体とプラズマ照射した単量体(1)とを混合する
前或いt:1混合時、或いは混合後に単量体(1)と共
重合5I能なビニル系単量体を添〃口する事により共重
合体を得る享も可能である。Before mixing the aqueous medium and the plasma-irradiated monomer (1), or during or after mixing at t:1, a vinyl monomer capable of copolymerizing 5I with the monomer (1) is added. It is also possible to obtain a copolymer.
道量体(1)と?lL合する水性媒体としては水又は水
とメタノール、エタノール、ブタノールなどのアルコー
ル類、アセトンなどのケトン類などとの混合f勿がノh
げらり、るが、理由は不明であるが重合速度、分子量の
点で水爪独の方が好ましい。水性媒体中のモノマー濃度
としては通常高々90重重は乃、好ましくは5〜75重
量係重量に好゛ましくけ1υ〜60重f%である。モノ
マー濃度が大きいり混合は重合速度が大きいが、重合物
が非常な高粘度となり扱いにくく父、モノマー濃度が小
さい場合は効率的でな10媒体としてジメチルスルホア
ミドなどの有機溶媒も使用できるが、一般に重合速度が
遅くq1別に必要な場合を除いて水系媒体の方が好まし
い。水系媒体の添加はプラズマを射熱直後でもよいし又
、射熱した後そのまましばらく放置した後でもよい。With the dome body (1)? The aqueous medium for mixing is water or a mixture of water and alcohols such as methanol, ethanol, butanol, ketones such as acetone, etc.
Gerari and Ru, but for reasons unknown, Mizuzumedoku is preferable in terms of polymerization rate and molecular weight. The monomer concentration in the aqueous medium is usually at most 90% by weight, preferably from 1υ to 60% by weight, preferably from 5 to 75% by weight. Although the polymerization rate is high when the monomer concentration is high or when the mixture is mixed, the polymerized product becomes extremely viscous and difficult to handle.When the monomer concentration is low, it is not efficient.10 Organic solvents such as dimethylsulfamide can also be used as a medium, but In general, an aqueous medium is preferable unless the polymerization rate is slow and q1 is specifically required. The aqueous medium may be added immediately after the plasma is irradiated with heat, or may be added after the plasma is irradiated and left as is for a while.
本発明者らはプラズマ照射後10時間放置した漬水を添
加しても極めて良好な1合性を示す事を確vしている。The present inventors have confirmed that even if soaked water that has been left for 10 hours after plasma irradiation is added, extremely good incorporation properties are exhibited.
又、プラズマ照射後放置する場合は14空中におくのが
最もよいが窒素、アルゴン等の不活性気体中でもよいし
1、又、放置時11JJが短〃・ければ空気、中でも十
分m、合性は保存される。In addition, when leaving it after plasma irradiation, it is best to leave it in 14 air, but it may also be in an inert gas such as nitrogen or argon. is saved.
岸b1体(1)と共重合可能なビニル系B、it体とし
てはラジカル重合を行うものであれば艮く、特に限定さ
れない。一般にはアクリロニトリル、アクリル酸エステ
ル、メタクリル酸エステル、スチレン、塩化ビニル、塩
化ビニリデン、酢酸ビニル、アクリルアミド、メタクリ
ルアミry。The vinyl B, it isomer copolymerizable with Kishi b1 isomer (1) is not particularly limited as long as it undergoes radical polymerization. Generally, acrylonitrile, acrylic ester, methacrylic ester, styrene, vinyl chloride, vinylidene chloride, vinyl acetate, acrylamide, methacrylamide.
11−ビニルピロリドン等の中性モノマーやアクリル敲
、メタクリル酸、P−スチレンスルホン酸、ビニルスル
ホン酸、2−メタアクリロイルメキシエチルスルホン酸
、6−メタアクリロイルオキシ−2−ヒドロキシプロピ
ルスルホン酸、アリルスルホン酸、メタリルスルホン酸
等の酸性モノマー並びにこれらのアンモニウム塩及びア
ルカリ金属塩及び2−ジメチルアミノエチルアクリレー
ト、2−ジメチルアミノエチルメタクリレート、2−ジ
エチルアミノエチルアクリレート、2−ジエチルアミノ
エチルメタクリレート、2−ビニルピリジン及び4−ビ
ニルピリジン等の環基性モノマー、及びこれらの塩酸、
碩酸、ジメチル硫酸、ジエチル硫酸、又ilt塩化エチ
ル等4級化物などが挙げられる。Neutral monomers such as 11-vinylpyrrolidone, acrylic acid, methacrylic acid, P-styrenesulfonic acid, vinylsulfonic acid, 2-methacryloylmexyethylsulfonic acid, 6-methacryloyloxy-2-hydroxypropylsulfonic acid, allylsulfone acid, acidic monomers such as methallylsulfonic acid, ammonium salts and alkali metal salts thereof, and 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-diethylaminoethyl acrylate, 2-diethylaminoethyl methacrylate, 2-vinylpyridine and cyclic monomers such as 4-vinylpyridine, and hydrochloric acid thereof,
Examples include silicic acid, dimethyl sulfate, diethyl sulfate, and quaternized products such as ilt ethyl chloride.
ビニル性拒爪体としては、水溶性であるのが好1しく、
更に好ましくはアクリルアミド、メタクリルアミド、N
−ビニルピロリドン類、アクリル酸、メタクリル酸、P
−スチレンスルホン酸、ビニルスルホン酸、2−メタア
クリロイルメキシエチルスルホン酸、3−メタアクリロ
イルオキシ−2−ヒドロキシプロピルスルホンfJ 、
7 !J ルx ルホン酸、メタリルスルポン酸、並
びにこれらのアンモニウム塩、汲びアルカリ金属塩類、
2−ジメチルアミノエチルアクリレート、2−ジメチル
アミノエチルメタクリレート、2−ジエチルアミノエチ
ルアクリレート、及びジエチルアミノエチルメタクリレ
ート、2−ビニルビリジン及び4−ビニルピリジン及び
これらの塩配、硝酸、ジメチル硫酸、ジエチル硫酸又は
塩化エチルの4級化物等である。The vinyl nail repellent is preferably water-soluble,
More preferably acrylamide, methacrylamide, N
-Vinylpyrrolidones, acrylic acid, methacrylic acid, P
-Styrenesulfonic acid, vinylsulfonic acid, 2-methacryloylmexyethylsulfonic acid, 3-methacryloyloxy-2-hydroxypropylsulfone fJ,
7! J Lux Sulfonic acid, methallylsulfonic acid, and their ammonium salts, alkali metal salts,
2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-diethylaminoethyl acrylate, and diethylaminoethyl methacrylate, 2-vinylpyridine and 4-vinylpyridine and their salts, nitric acid, dimethyl sulfate, diethyl sulfate or ethyl chloride These are quaternary compounds of
本発明方法によるプラズーr開始重合は単量体(1)が
存在する系において良好に進むが同時に共重合可能なビ
ニル系重合体全添加する場合、その使用量は重合性及び
目的とする用途により考慮する必要がある。単量体(1
)とアクリルアミド、メタクリルアミド等の組み合せで
すよ単量体(1)が5重量%以上、アクリルアミド、メ
タクリルアミドが95重重量板下であれば良好な重合速
度と非常に大きい分子量を有する重合体が得られる。Prazu-r initiated polymerization according to the method of the present invention proceeds well in a system in which monomer (1) is present, but if all copolymerizable vinyl polymers are added at the same time, the amount used depends on the polymerizability and the intended use. need to be considered. Monomer (1
) and acrylamide, methacrylamide, etc. If monomer (1) is 5% by weight or more and acrylamide or methacrylamide is less than 95% by weight, a polymer with a good polymerization rate and a very large molecular weight can be obtained. can get.
後重合温度及び時間は使用する単量体の種類によって興
なり特に限定され々いが通常温度は高々100℃、時間
は1〜25時間で十分である。単量体の種類によっては
60℃を超えると熱重合を起こし低分子のポリマーが生
成してくることがあるので注意を要する。The postpolymerization temperature and time vary depending on the type of monomer used and are not particularly limited, but usually a temperature of at most 100°C and a time of 1 to 25 hours are sufficient. Depending on the type of monomer, if the temperature exceeds 60°C, thermal polymerization may occur and a low molecular weight polymer may be produced, so care must be taken.
本発明方法で得られたスルポン酸基を含有するアクリル
アミド系重合体中には単量体成分以外は何も含まないこ
とが、他の重合方伝と具なる大きな特徴である。A major feature different from other polymerization methods is that the acrylamide polymer containing sulfonic acid groups obtained by the method of the present invention does not contain anything other than monomer components.
他のJR合方法ではラジカル開始剤、懸濁剤。Other JR methods use radical initiators and suspending agents.
乳化剤などが残存しやすく完全に除去することはむつか
しいが、本発明方法ではそれらの添加剤を使用しないた
めにそれら不純物成分を含有しない。Although emulsifiers and the like tend to remain and are difficult to completely remove, the method of the present invention does not use these additives and therefore does not contain these impurity components.
本発明方法で得られたスルホン酸基含有アクリルアミド
系重合体は超高分子偏であシ、しかも何の不純物をも含
まないものである。又重合速度が大きくかつ使用原材料
及びエネルギーが少なくてすむという画期的な方法であ
る。The sulfonic acid group-containing acrylamide polymer obtained by the method of the present invention is ultra-high molecular weight and does not contain any impurities. It is also an innovative method that has a high polymerization rate and requires less raw materials and energy.
以下本発明を実施例にて詳細に説明する。The present invention will be explained in detail below with reference to Examples.
尚、固有粘度は重合体又はそのケ゛ルを一夜U、INの
NacQ 水溶液中に放置し、一定濃度となるように溶
解し、オストヮルド粘度計にて50℃での粘度を測定し
請求めた。The intrinsic viscosity was determined by leaving the polymer or its polymer in an aqueous U or IN NacQ solution overnight, dissolving it to a constant concentration, and measuring the viscosity at 50° C. using an Ostold viscometer.
実施例1
2−アクリルアミド−2−メチルプロパンスルホン酸1
.5 flを20 mQのアンプルに入れ10−5トー
ルで脱気後、150ワツトの出力まで出るザムコインタ
ーナシゴナルMPD−2L7)高岡t&発生器に連結し
た一対の外部平行電極間に挿入したこのアンプルを10
0ワツトの電力で発生したグロー放電プラズマを50秒
間照射した。Example 1 2-acrylamido-2-methylpropanesulfonic acid 1
.. After putting 5 fl into a 20 mQ ampoule and degassing at 10-5 Torr, the ZAMCO INTERNATIONAL MPD-2L7) outputs up to 150 watts. 10 ampoules
A glow discharge plasma generated at 0 watts of power was applied for 50 seconds.
次いで減圧下で脱気した水4.0gを加えた後封管し、
25℃の恒温槽に浸漬させ所定時間後重合を行った。重
合物はアンプルより取シ出し、この重合体の重合率、及
び粘度測定を行った。Next, 4.0 g of water degassed under reduced pressure was added, and the tube was sealed.
It was immersed in a constant temperature bath at 25° C. and polymerization was carried out after a predetermined period of time. The polymer was taken out from the ampoule, and the polymerization rate and viscosity of this polymer were measured.
また、上記の2−アクリルアミド−2−メチルプロパン
スルホン酸1.5gを水4.0 Iiに溶解後、20m
nのアンプルに入れ1O−5)−ルで脱気後、ついで液
体窒素で凍結し、3回脱気させ上記プラズマを50秒間
照射し封管後25℃で5時間後重合させた重合体の結果
を参考の為示した。In addition, after dissolving 1.5 g of the above 2-acrylamido-2-methylpropanesulfonic acid in 4.0 Ii of water, 20 m
After degassing with 1O-5)-l in an ampoule of n, the polymer was frozen with liquid nitrogen, degassed three times, irradiated with the above plasma for 50 seconds, sealed the tube, and polymerized after 5 hours at 25°C. The results are shown for reference.
第1表
A6及びム7の極限粘度はそれぞれ115.5dμ力1
15.5clJ4/9 であった。The limiting viscosity of Table 1 A6 and Mu7 is 115.5 dμ force 1, respectively.
It was 15.5clJ4/9.
実施例2Example 2
Claims (1)
酸、そのアンモニウム塩及び、そのアルカリ金属塩から
選ばれた少なくとも1種の単量体(1)にイオン化ガス
プラズマを照射した後、該プラズマの不存在下で単量体
(1)、又は単量体(1)Lそれと共重合可能なビニル
性単量体と、水性媒体とを混合し後重合することを特徴
とするスルホン酸基含有アクリルアミド系重合体の製造
法。 2)イオン化ガスプラズマが10″″1〜10トールの
真空下で脱気後、20〜200ワツトで1〜3600秒
間照射して得られるものである特許請求の範囲第1項記
載の製造法。 5)イオン化ガスプラズマが10−1〜10=)−ルの
真空下で脱気後、40〜100ワツトで10〜60秒間
照射して得られキ卒るものである特許請求の範囲第1項
記載の製造法。 4)イオン化ガスプラズマの不存在下での後重合が高々
100℃で行われる特許請求の範囲ニル性単量体が高々
95重量%である特許請求の範囲第1項記載の製造法。 6)ビニル性単量体が水溶性である特許請求の範囲第1
項又はg35項記載の製造法。 7)ビニル性単量体がアクリルアミド、メタクリルアミ
ド、N−ビニルピロリドンであル特許請求の範囲第1項
又は第5項或いは6項記載の製造法。 8)ビニル性単量体がアクリル酸、メタクリル酸、ビニ
ルスルホン酸、2−メタアクリロイルオキシエチルスル
ホン酸、アリルスルホン酸、メタリルスルホン酸並びに
これらの酸のアンモニウム塩及びアルカリ金属塩である
特許請求の範囲第1項又は第5項或いは6項記載の製造
法。 9)ビニル性単景体が2−ジメチルアミノエチルアクリ
レート、2−ジメチルアミノエチルメタクリレート、2
−ジエチルアミノエチルアクリレート、2−ジエチルア
ミノエチルメタクリレート、2−ビニルピリジン、及び
4−ビニルピリジン並びにこれらの塩基性単量体の塩酸
、硝酸、ジメチル硫酸、ジエチル硫の製造法。 11)水性媒体中のモノマー濃度が高々20重量%であ
る特許請求の範囲第1項記載の製造法。 12)水性媒体中のモノマー濃度が5〜75重量%であ
る特許請求の範囲第1項又は第11項記載の製造法。 1′5)水性媒体中のモノマー湿度が10〜600〜6
0重量%許請求の範囲第1項又は第11枳或いf−1:
第12項記載の製造法。[Claims] 1) After irradiating at least one monomer (1) selected from 2-acrylamido-2-methylpropanesulfonic acid, its ammonium salt, and its alkali metal salt with ionized gas plasma. , a sulfone characterized in that monomer (1), or a vinyl monomer copolymerizable therewith, and an aqueous medium are mixed and post-polymerized in the absence of the plasma. A method for producing an acid group-containing acrylamide polymer. 2) The manufacturing method according to claim 1, wherein the ionized gas plasma is obtained by degassing under a vacuum of 10'' to 10 Torr and then irradiating at 20 to 200 Watts for 1 to 3,600 seconds. 5) The ionized gas plasma can be obtained by degassing under a vacuum of 10-1 to 10-1, and then irradiating at 40 to 100 watts for 10 to 60 seconds. Manufacturing method described. 4) The process according to claim 1, wherein the postpolymerization in the absence of an ionized gas plasma is carried out at a temperature of at most 100°C. 6) Claim 1 in which the vinyl monomer is water-soluble
The manufacturing method described in item or g35. 7) The production method according to claim 1, 5, or 6, wherein the vinyl monomer is acrylamide, methacrylamide, or N-vinylpyrrolidone. 8) A patent claim in which the vinyl monomer is acrylic acid, methacrylic acid, vinylsulfonic acid, 2-methacryloyloxyethylsulfonic acid, allylsulfonic acid, methallylsulfonic acid, and ammonium salts and alkali metal salts of these acids. The manufacturing method according to item 1, item 5, or item 6. 9) Vinyl monomers are 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2
- A method for producing diethylaminoethyl acrylate, 2-diethylaminoethyl methacrylate, 2-vinylpyridine, and 4-vinylpyridine, and basic monomers thereof such as hydrochloric acid, nitric acid, dimethyl sulfate, and diethyl sulfur. 11) The production method according to claim 1, wherein the monomer concentration in the aqueous medium is at most 20% by weight. 12) The manufacturing method according to claim 1 or 11, wherein the monomer concentration in the aqueous medium is 5 to 75% by weight. 1'5) Monomer humidity in aqueous medium is 10-600-6
0% by weight Claim 1 or 11 f-1:
The manufacturing method according to item 12.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17180383A JPS6063210A (en) | 1983-09-16 | 1983-09-16 | Manufacture of sulfonic acid group-containing acrylamide polymer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17180383A JPS6063210A (en) | 1983-09-16 | 1983-09-16 | Manufacture of sulfonic acid group-containing acrylamide polymer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6063210A true JPS6063210A (en) | 1985-04-11 |
Family
ID=15930003
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17180383A Pending JPS6063210A (en) | 1983-09-16 | 1983-09-16 | Manufacture of sulfonic acid group-containing acrylamide polymer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6063210A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117209661A (en) * | 2023-11-09 | 2023-12-12 | 四川大学 | Ultrahigh molecular weight high-temperature-resistant high-salt anionic polymer and preparation method thereof |
-
1983
- 1983-09-16 JP JP17180383A patent/JPS6063210A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117209661A (en) * | 2023-11-09 | 2023-12-12 | 四川大学 | Ultrahigh molecular weight high-temperature-resistant high-salt anionic polymer and preparation method thereof |
| CN117209661B (en) * | 2023-11-09 | 2024-01-30 | 四川大学 | An ultra-high molecular weight high-temperature and high-salt anionic polymer and its preparation method |
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