JPS6064351A - Developing method of photosensitive lithographic printing plate - Google Patents
Developing method of photosensitive lithographic printing plateInfo
- Publication number
- JPS6064351A JPS6064351A JP17283583A JP17283583A JPS6064351A JP S6064351 A JPS6064351 A JP S6064351A JP 17283583 A JP17283583 A JP 17283583A JP 17283583 A JP17283583 A JP 17283583A JP S6064351 A JPS6064351 A JP S6064351A
- Authority
- JP
- Japan
- Prior art keywords
- lithographic printing
- photosensitive lithographic
- printing plate
- developing
- zone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 49
- 238000011161 development Methods 0.000 claims description 18
- 238000005406 washing Methods 0.000 abstract description 8
- 239000007921 spray Substances 0.000 abstract description 3
- 241000009298 Trigla lyra Species 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 18
- -1 Lewis acid salt Chemical class 0.000 description 15
- 239000002253 acid Substances 0.000 description 12
- 229920001577 copolymer Polymers 0.000 description 11
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 239000000178 monomer Substances 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 229920000620 organic polymer Polymers 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- 239000004115 Sodium Silicate Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 159000000000 sodium salts Chemical class 0.000 description 5
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 5
- 229910052911 sodium silicate Inorganic materials 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
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- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 4
- 239000004111 Potassium silicate Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 238000003780 insertion Methods 0.000 description 4
- 230000037431 insertion Effects 0.000 description 4
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 4
- 229910052913 potassium silicate Inorganic materials 0.000 description 4
- 235000019353 potassium silicate Nutrition 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
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- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
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- 150000008049 diazo compounds Chemical class 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
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- VAJVDSVGBWFCLW-UHFFFAOYSA-N 3-Phenyl-1-propanol Chemical compound OCCCC1=CC=CC=C1 VAJVDSVGBWFCLW-UHFFFAOYSA-N 0.000 description 2
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- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
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- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
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- 229910019142 PO4 Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
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- 239000010452 phosphate Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229940079877 pyrogallol Drugs 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 2
- 150000003460 sulfonic acids Chemical class 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
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- YUCTUWYCFFUCOR-UHFFFAOYSA-N 1,4-dihexoxy-1,4-dioxobutane-2-sulfonic acid;sodium Chemical compound [Na].CCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCC YUCTUWYCFFUCOR-UHFFFAOYSA-N 0.000 description 1
- CUOSYYRDANYHTL-UHFFFAOYSA-N 1,4-dioctoxy-1,4-dioxobutane-2-sulfonic acid;sodium Chemical compound [Na].CCCCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCCCC CUOSYYRDANYHTL-UHFFFAOYSA-N 0.000 description 1
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 1
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- HQRWWHIETAKIMO-UHFFFAOYSA-N 1-phenylbutan-1-ol Chemical compound CCCC(O)C1=CC=CC=C1 HQRWWHIETAKIMO-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
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- LBBOQIHGWMYDPM-UHFFFAOYSA-N 2-tert-butylphenol;formaldehyde Chemical compound O=C.CC(C)(C)C1=CC=CC=C1O LBBOQIHGWMYDPM-UHFFFAOYSA-N 0.000 description 1
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- MSHFRERJPWKJFX-UHFFFAOYSA-N 4-Methoxybenzyl alcohol Chemical compound COC1=CC=C(CO)C=C1 MSHFRERJPWKJFX-UHFFFAOYSA-N 0.000 description 1
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- MQWCXKGKQLNYQG-UHFFFAOYSA-N 4-methylcyclohexan-1-ol Chemical compound CC1CCC(O)CC1 MQWCXKGKQLNYQG-UHFFFAOYSA-N 0.000 description 1
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
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- XSWCQTPWGOZGPP-UHFFFAOYSA-L P(O)(O)(O)=O.S(=O)([O-])[O-].[Na+].[Na+] Chemical compound P(O)(O)(O)=O.S(=O)([O-])[O-].[Na+].[Na+] XSWCQTPWGOZGPP-UHFFFAOYSA-L 0.000 description 1
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- ARENMZZMCSLORU-UHFFFAOYSA-N propan-2-yl naphthalene-1-sulfonate Chemical compound C1=CC=C2C(S(=O)(=O)OC(C)C)=CC=CC2=C1 ARENMZZMCSLORU-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
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- 229910001388 sodium aluminate Inorganic materials 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- DZCAZXAJPZCSCU-UHFFFAOYSA-K sodium nitrilotriacetate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CC([O-])=O DZCAZXAJPZCSCU-UHFFFAOYSA-K 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- RPACBEVZENYWOL-XFULWGLBSA-M sodium;(2r)-2-[6-(4-chlorophenoxy)hexyl]oxirane-2-carboxylate Chemical compound [Na+].C=1C=C(Cl)C=CC=1OCCCCCC[C@]1(C(=O)[O-])CO1 RPACBEVZENYWOL-XFULWGLBSA-M 0.000 description 1
- HFQQZARZPUDIFP-UHFFFAOYSA-M sodium;2-dodecylbenzenesulfonate Chemical compound [Na+].CCCCCCCCCCCCC1=CC=CC=C1S([O-])(=O)=O HFQQZARZPUDIFP-UHFFFAOYSA-M 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- WYXIGTJNYDDFFH-UHFFFAOYSA-Q triazanium;borate Chemical compound [NH4+].[NH4+].[NH4+].[O-]B([O-])[O-] WYXIGTJNYDDFFH-UHFFFAOYSA-Q 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は感光性平版印刷版を現像する方法に関するもの
で、更に詳しくは弱アルカリ水現像可能なネガ型感光性
平版印刷版と強アルカリ水N、 (’Jl可能なポジ型
感光性平版印刷版を同時に7台の自動現像機にて現像す
ることができる共通現像方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for developing a photosensitive lithographic printing plate, and more specifically, a negative photosensitive lithographic printing plate that can be developed with weak alkaline water and a method of developing a photosensitive lithographic printing plate with strong alkaline water N, This invention relates to a common developing method that allows positive photosensitive lithographic printing plates to be simultaneously developed using seven automatic developing machines.
従来、ネガ型感光性平版印刷版とポジ型感光性゛平版印
刷版とではほとんどの場合現像液は異なりネガ型感光性
平版印刷版にはその専用の現像液で。Conventionally, negative-working photosensitive planographic printing plates and positive-working photosensitive planographic printing plates use different developers in most cases, and negative-working photosensitive planographic printing plates use a special developer.
またポジ型感光性平版印刷版にはその専用の現像液で現
像しない限り、十分な性能を有する平版印刷版が得られ
なかった。その為ネガ型感光性平版印刷版とポジ型感光
性平版印刷版の両方を使用している印刷業者は2台の自
動現像機を用いてそれぞれの版を現像していた。小ざな
印刷業者に一台の自動現像機を入れると作業場所が狭く
なり1作業がやりにくいという不満があった。そこで特
別なネガ型感光性平版印刷版と特別々ポジ型平版印刷版
を用いて両者の現像液を混合した現像液で同時に現像す
ることが試みられた。しかし専用の現像液でネガ型印刷
版やポジ型印刷版をそれぞれ別個に現像する場合に比較
して処理能力は低く十分に満足するものではなかった。In addition, unless a positive-working photosensitive lithographic printing plate is developed with a special developer, a lithographic printing plate with sufficient performance cannot be obtained. For this reason, printers who use both negative-working photosensitive lithographic printing plates and positive-working photosensitive lithographic printing plates develop each plate using two automatic developing machines. There were complaints that installing an automatic developing machine at a small printing company would make the work space smaller and make it difficult to perform one task. Therefore, an attempt was made to simultaneously develop a special negative-working photosensitive lithographic printing plate and a special positive-working lithographic printing plate with a developer mixture of the two. However, compared to the case where a negative-working printing plate and a positive-working printing plate are developed separately using a dedicated developer, the throughput is low and is not fully satisfactory.
その他の試みとして7台の自動現像機内にネガの現像液
とポジの現像液をそれぞれ貯蔵するタンクを設けて、ネ
ガ型感光性平版印刷版を現像する場合には切変え弁にて
ネガ増像液を現像ゾーンに導き現像し現像終了後ネガ貯
蔵タンクに現像液を回収させ、ポジ型平版印刷版?]l
−親像する場合には切変え弁にてポジ現浄液を現像ゾー
ンに導いて現像する方法が提案され、実際に試みられた
が現像液の切変え時間が長くかかりポジ型感光性平版印
刷版を多数枚処理中に2〜3枚のネガ型感光性平版印刷
版を処理しようと思ったときにすぐに処理することが出
来ないという欠点を有していた。As another attempt, seven automatic developing machines were equipped with tanks for storing negative and positive developing solutions, and when developing negative-type photosensitive planographic printing plates, a switching valve was used to increase the negative image. The solution is introduced into the development zone and developed, and after the development is completed, the developer is collected in a negative storage tank, and the positive planographic printing plate? ]l
- In the case of forming a parent image, a method was proposed in which a positive developing solution was introduced into the developing zone using a switching valve, and this method was actually attempted, but it took a long time to change the developing solution, and positive type photosensitive lithographic printing This method has a disadvantage in that when it is desired to process two or three negative photosensitive lithographic printing plates while processing a large number of plates, it is not possible to process them immediately.
本発明の目的は前記の欠点を改良しネガ型感光性平版印
刷版とポジ型感光性平版印刷版を同時に現像処理できる
共通現像方法を提供することKある。他の目的は7台の
自動駅像機においてネガ型平版印刷版とポジ型平版印刷
版が多数枚現像処理できる方法を提供することにあゐ。SUMMARY OF THE INVENTION An object of the present invention is to improve the above-mentioned drawbacks and to provide a common developing method that can simultaneously develop a negative-working photosensitive lithographic printing plate and a positive-working photosensitive lithographic printing plate. Another object of the present invention is to provide a method by which a large number of negative planographic printing plates and positive planographic printing plates can be developed using seven automatic station imagers.
本発明者らは鋭童研究を重ねた結果p I−1/λ未満
の弱アルカリ水によって未I光部が溶出または膨潤され
現像されるネガ型感光性平版印刷版および/またId
p H/ 2以上の強アルカリ水によって蕗光部が溶出
または膨潤され現1貧されるポジ型感光性平版印刷版を
、画1象露光にpH12未満の弱アルカリ水からなる現
像液が仕込まれている第1現像ゾーンとpH/2以上の
強アルカリ水からなる現像液が仕込まれている第2現像
ゾーンが連続して有する水平搬送型自動現像機に通して
現像することによって本発明の目的が達成されることを
見い出した。As a result of repeated research by the present inventors, a negative-working photosensitive lithographic printing plate and/or a negative-working photosensitive lithographic printing plate in which the unexposed area is eluted or swollen and developed with weak alkaline water with p I-1/λ or less, and/or Id
A positive-working photosensitive lithographic printing plate whose light areas are eluted or swollen and depleted by strong alkaline water with a pH of 2 or more is used, and a developer consisting of weakly alkaline water with a pH of less than 12 is added to expose one image. The object of the present invention is achieved by performing development through a horizontal conveyance type automatic developing machine which has a first developing zone which is in series and a second developing zone which is charged with a developing solution made of strong alkaline water having a pH of 2 or higher. was found to be achieved.
本発明に用いるp H/ j未満の弱アルカリ水によっ
て未鮎光部が溶出または膨潤されるネガ型感光性平版印
刷版としては酸価10〜200を有する有機高分子重合
体と実質的に水不溶性の感光性ジアゾ化合物(たとえば
ジフェニルアミン−+ −ジアゾニウム塩とホルムアル
デヒドの縮合物のスルホン酸塩又はルイス酸塩)からな
る感光層を親水性の支持体上に設けた、非光によって光
硬化する感光層を有する感光性平版印刷版が好ましい。The negative-working photosensitive lithographic printing plate whose non-lightened areas are eluted or swollen by weakly alkaline water having a pH of less than pH/j used in the present invention is a negative photosensitive lithographic printing plate containing an organic polymer having an acid value of 10 to 200 and substantially water. A photosensitive layer consisting of an insoluble photosensitive diazo compound (for example, a sulfonate or a Lewis acid salt of a condensate of diphenylamine-+-diazonium salt and formaldehyde) is provided on a hydrophilic support and is photocurable in the absence of light. A photosensitive lithographic printing plate having layers is preferred.
酸価10−200を有する有機高分子重合体の具体例と
しては、アクリル酸、メタクリル酸、クロトン酸または
マレイン酸を必須の1合成分として含む共重合体1例え
ば米国特許第4Z 、 /23 。Specific examples of organic polymers having an acid value of 10-200 include Copolymer 1 containing acrylic acid, methacrylic acid, crotonic acid or maleic acid as an essential component, such as US Pat. No. 4Z,/23.
λ7を号に記されている様なツーヒドロキシエテルアク
リレートまたはλ−ヒドロキシエチルメタクリレート、
アクリロニトリルまたはメタクリロニトリル、アクリル
酸またはメタクリル酸および必要に応じて更ニ他の共重
合しうるモノマーとの3元または参元共重合体、特開昭
!3−ハUり03号に記載されている様な末端がヒドロ
キシ基であり、かつジカルボン酸エステル残基を含む基
でエステル化されたアクリル酸またはタンクIJ/に酸
、アクリル酸またはメタクリル酸、および必要に応じて
更に他の共重合しうるモノマーとの共重合体、特開昭!
≠−216117号に記載されている様な芳香族性水酸
基を末端に有する単量体(例えばN−(≠−ヒドロキシ
フェニル)メタクリルアミドなど)、アクリル酸または
メタクリル酸、及び更に必要に応じて他の共重合可能な
モノマーの少なくとも7つとの共重合体S特開昭j6−
≠−!−
/4’i号に記載されている様なアルキアクリレートま
たはメタクリレート、アクリロニトリルまたはメタクリ
ロニトリル、および不飽和カルボン酸よりなる共重合体
が含まれる。また酸性ポリビニルアルコール誘導体、酸
性セルロース誘導体も有用で必る。Two hydroxy ether acrylate or λ-hydroxyethyl methacrylate as indicated in λ7,
Ternary or base copolymers of acrylonitrile or methacrylonitrile, acrylic acid or methacrylic acid and optionally further copolymerizable monomers, JP-A-Sho! Acrylic acid or tank IJ/ acid, acrylic acid or methacrylic acid, which has a hydroxyl group at the end and is esterified with a group containing a dicarboxylic acid ester residue as described in No. 3-HAURI No. 03. and, if necessary, a copolymer with other copolymerizable monomers, JP-A-Sho!
≠-216117, a monomer having an aromatic hydroxyl group at the end (for example, N-(≠-hydroxyphenyl) methacrylamide, etc.), acrylic acid or methacrylic acid, and if necessary, other monomers. Copolymer S with at least seven copolymerizable monomers of
≠−! Copolymers of alkyacrylates or methacrylates, acrylonitrile or methacrylonitrile, and unsaturated carboxylic acids as described in No. -/4'i are included. In addition, acidic polyvinyl alcohol derivatives and acidic cellulose derivatives are also useful.
一方、感光性ジアゾ化合物としては、p−ジアゾジフェ
ニルアミンとホルムアルデヒドとの縮合物で代表される
ジアゾ樹脂が有用であり、特に実質的に水不溶性で有機
溶剤可溶性のジアゾ樹脂は特に好捷しい。かかる好まし
いジアゾ樹脂は米国特許第3,300,30707号よ
び特開昭j≠−タr673号に詳しく記載されている。On the other hand, as the photosensitive diazo compound, diazo resins represented by a condensate of p-diazodiphenylamine and formaldehyde are useful, and diazo resins that are substantially water-insoluble and organic solvent-soluble are particularly preferred. Such preferred diazo resins are described in detail in U.S. Pat. No. 3,300,30707 and JP-A-673.
感光性ジアゾ化合物は光硬化性感光層中にj−tO重量
係。The photosensitive diazo compound is contained in the photocurable photosensitive layer by weight.
好ましくけr−2θ重f%の範囲で含有させられる。It is preferably contained within the range of r-2θ weight f%.
上述の如き光硬化性感光層をアルミニウム板のような金
稿支持体上に設は感光性平版印刷版とする。アルミニウ
ム板の表面は、米国特許第λ、7/≠、ott号に記載
されているようなアルカリ4−
金嘱珪酸場の水溶液による化成処理、米国特許第3.i
ri、≠t1号に記載されているような陽極酸化したの
ち、アルカリ金属珪酸塩の水溶液で処理することが好ま
しく、このように表面処理されたアルミニウム板上に前
述の如き感光層を015〜197m、好ましくはθ、r
〜3.夕?/m2の被覆量で塗布され、感光性平版印刷
版とされる。A photosensitive lithographic printing plate is prepared by disposing a photocurable photosensitive layer as described above on a metal support such as an aluminum plate. The surface of the aluminum plate may be subjected to a chemical conversion treatment using an aqueous solution of an alkali 4-gold silicate solution as described in U.S. Pat. i
After anodizing as described in No. ri,≠t1, it is preferable to treat with an aqueous solution of an alkali metal silicate, and on the thus surface-treated aluminum plate, a photosensitive layer as described above is formed with a thickness of 015 to 197 m. , preferably θ, r
~3. evening? /m2 to form a photosensitive lithographic printing plate.
本発明に用いるp H/ 2未満の弱アルカリ水から々
る現像液としては特開昭タ1−77≠oi号、同ll−
40221号、同!3−11Lt202号および同jタ
ー1203iII号中に記載されている様な、アニオン
界面活性剤、水に対する溶解度が常温においてIO重量
係以下である有機溶媒、アルカリ剤、水および必要によ
り汚れ防止剤からなる水溶液が好適である。As the developing solution containing weakly alkaline water with a pH of less than 2 for use in the present invention, JP-A No. 1-77≠oi and ll-
No. 40221, same! From an anionic surfactant, an organic solvent whose solubility in water is below the IO weight ratio at room temperature, an alkaline agent, water and, if necessary, a stain preventive agent, as described in No. 3-11Lt202 and No. 1203iII. An aqueous solution is suitable.
本発明に用いる弱アルカリ水からなる現像液中のアニオ
ン型界面活性剤としては1例えばラウリルアルコールサ
ルフェートのナトリウム塩、オクチルアルコールサルフ
ェートのナトリウム塩、ラウリルアルコールサルフェー
トのアンモニウム塩。Examples of anionic surfactants in the developing solution of weakly alkaline water used in the present invention include sodium salts of lauryl alcohol sulfate, sodium salts of octyl alcohol sulfate, and ammonium salts of lauryl alcohol sulfate.
第2ナトリウムアルキルサルフエートなどの炭素数t〜
、2.2の高級アルコール硫酸エステル塩類、例えばセ
チルアルコール燐酸エステルのナトリウム塩などのよう
な脂肪族アルコール燐酸エステル塩類、例えばドデシル
ベンゼンスルホン酸のナトリウム塩、イソプロピルナフ
タレンスルホン酸のナトリウム塩、メタニトロベンゼン
スルホン酸のナトリウム塩などのようなアルキルアリー
ルスルホン酸塩類、例えばC17I(33CON(CH
3) CH2CH2SO3Naなどのようなアルキルア
ミドのスルホン酸塩類。Carbon number t of secondary sodium alkyl sulfate etc.
, 2.2 higher alcohol sulfate ester salts, aliphatic alcohol phosphate ester salts such as sodium salt of cetyl alcohol phosphate ester, for example sodium salt of dodecylbenzenesulfonic acid, sodium salt of isopropylnaphthalenesulfonic acid, metanitrobenzenesulfone alkylaryl sulfonates such as sodium salts of acids, e.g. C17I(33CON(CH
3) Sulfonic acid salts of alkylamides such as CH2CH2SO3Na, etc.
例えばナトリウムスルホこはく酸ジオクチルエステル、
ナトリウムスルホこはく酸ジヘキシルエステルなどの二
塩基性脂肪酸エステルのスルホン酸塩類などが含まれる
。For example, sodium sulfosuccinate dioctyl ester,
These include sulfonic acid salts of dibasic fatty acid esters such as sodium sulfosuccinate dihexyl ester.
アニオン界面活性剤は、使用時の現像液中にO0/〜!
重量係の範囲で含有させておくことが適当である。o、
i重量係よりも少なくなるとその使用効果が低くなり、
!重量係よりも多くなると1例えば光硬化性感光層に含
有させた光硬化部分の色素の溶出(色抜け)が過多にな
ったり、光層した画像の耐摩耗性などの機械的、化学的
強度が劣化するなどの併置が出てくる。従って、好まし
い使用量はo、、t−/、J’重量係の範囲である。The anionic surfactant is added to the developer solution at the time of use.
It is appropriate to keep the content within the weight range. o,
If it is less than the i weight section, the effectiveness of its use will be lower,
! If it exceeds the weight factor, for example, the dye contained in the photocurable photosensitive layer may elute (color loss) excessively, or the mechanical and chemical strength such as the abrasion resistance of the photolayer image may deteriorate. A juxtaposition occurs, such as deterioration of Therefore, the preferred usage amount is in the range o, t-/, J' weight ratio.
本発明に用いる弱アルカリ水からなる現像液に用いられ
る有機溶媒は、水に対する溶解度が約10z@es以下
のものが適しており、好ましくは約λ重i1以下のもの
から選ばれる。この様な有機溶媒としては、l−フェニ
ルエタノール、λ−フェニルエタノール、3−フェニル
プロパノ−ルーフ1μmフェニルフタノール−/、μm
フェニルブタノール−λ、λ−フェニルブタノール−7
゜ツーフエノキシエタノール%λ−ペンジルオキシエタ
) −A/、 0−メトキシベンジルアルコール。The organic solvent used in the developing solution consisting of weakly alkaline water used in the present invention is suitably selected from those having a solubility in water of about 10z@es or less, preferably about λ weight i1 or less. Examples of such organic solvents include l-phenylethanol, λ-phenylethanol, 3-phenylpropanol, 1 μm phenylphthanol, μm
Phenylbutanol-λ, λ-phenylbutanol-7
゜Two phenoxyethanol% λ-penzyloxyethyl alcohol) -A/, 0-methoxybenzyl alcohol.
m−メトキシベンジルアルコール、p−メトキシベンジ
ルアルコール、ベンジルアルコール、シクロヘキサノー
ル、λ−メチルシクロヘキサノール。m-methoxybenzyl alcohol, p-methoxybenzyl alcohol, benzyl alcohol, cyclohexanol, λ-methylcyclohexanol.
μmメチルシクロヘキサノール及び3−メチルシクロヘ
キサノール等をあげることができる。Examples include μm methylcyclohexanol and 3-methylcyclohexanol.
有機溶媒の現像液中における含有量はt、r重−ター
量チが好適である。その使用量は界面活性剤の使用量と
密接な関係があり、有機溶媒の量が増すにつれ、界面活
性剤の量は増加させることが好ま1−7い。これは界面
活性剤の量が少なく、有機溶媒の量を多く用いると有機
溶媒が溶解せず、従って良好な現像性の確保が期待でき
なくなるからである。The content of the organic solvent in the developing solution is preferably t, r weight - tert. The amount used is closely related to the amount of surfactant used, and it is preferable to increase the amount of surfactant as the amount of organic solvent increases1-7. This is because if the amount of surfactant is small and the amount of organic solvent is large, the organic solvent will not dissolve, and therefore good developability cannot be expected to be ensured.
本発明に用いる弱アルカリ水からなる現像液に使用され
るアルカリ剤としては、珪酸ナトリウム。The alkaline agent used in the developing solution consisting of weakly alkaline water used in the present invention is sodium silicate.
珪酸カリウム、水酸化カリウム、水酸化ナトリウム、水
酸化リチウム、第3燐酸ナトリウム、第2燐酸ナトリウ
ム、第3燐酸アンモニウム、第2燐酸アンモニウム、メ
タ珪酸ナトリウム、重炭酸ナトリウム、硼酸ナトリウム
、硼酸アンモニウム。Potassium silicate, potassium hydroxide, sodium hydroxide, lithium hydroxide, tertiary sodium phosphate, dibasic sodium phosphate, tertiary ammonium phosphate, dibasic ammonium phosphate, sodium metasilicate, sodium bicarbonate, sodium borate, ammonium borate.
アンモニアなどのような無機アルカリ剤、およびモノメ
チルアミン、ジメチルアミン、トリメチルアミン、モノ
エテルアミン、ジエチルアミン、トリエチルアミン、モ
ノイソプロピルアミン、ジイソプロピルアミン、n−グ
チルアミン、モノエタノールアミン、ジェタノールアミ
ン、トリエタノールアミン、モノインプロ/qノールア
ミン、シイio−
ツブロバノールアミン、エチレンイミン、エチレンジア
ミン、ピリジンなどのような有機アミン化合物があり、
これらは単独もしくは組合せて使用できる。アルカリ剤
の現像液中における含有量はo、or〜3重量%が好適
であり、好ましくは0.1〜7重量%である。θ、Oj
重f係より少なくなると未硬化感光層の除去が不完全と
なる。Inorganic alkaline agents such as ammonia, and monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, n-glythylamine, monoethanolamine, jetanolamine, triethanolamine, mono There are organic amine compounds such as inpro/q-nolamine, io-tubulovanolamine, ethyleneimine, ethylenediamine, pyridine, etc.
These can be used alone or in combination. The content of the alkaline agent in the developing solution is preferably o, or to 3% by weight, preferably 0.1 to 7% by weight. θ, Oj
If the f coefficient is less than that, the removal of the uncured photosensitive layer will be incomplete.
一方、3重量係よりも多くなると感光層の光硬化部分の
機械的、化学的強度が劣化するようになり。On the other hand, if the amount exceeds 3% by weight, the mechanical and chemical strength of the photocured portion of the photosensitive layer will deteriorate.
例えば平版印刷版の場合には耐刷力の低下となって現わ
れる。For example, in the case of planographic printing plates, this appears as a decrease in printing durability.
本発明の現像液の残余の成分は水であるが、更に必要に
応じて当業界で知られた種寿の添加剤を含有させること
ができる。たとえば汚れ防止剤として亜硫酸ナトリウム
やスルホピラゾロンのナトリウム塩や硬水軟化剤として
エチレンジアミンテトラ酢酸II N a塩やN+CH
2C00Na)a を添加することが出来る。The remaining component of the developer of the present invention is water, and if necessary, various additives known in the art may be included. For example, sodium sulfite and the sodium salt of sulfopyrazolone are used as antifouling agents, and ethylenediaminetetraacetic acid II Na salt and N+CH are used as water softeners.
2C00Na)a can be added.
本発明に用いるpH/−以上の強アルカリ水によって露
光部が溶出または膨潤され現像されるポジ型感光性平版
印刷版としては0−キノンジアジド化合物とp H/
2未満の弱アルカリ水にほとんど溶解しないが強アルカ
リ水に可溶の有機高分子化合物からなる感光層を前記の
親水性の支持体上に設け1g光によって露光部がpH/
−以上の強アルカリ水によって溶解する感光層を有する
感光性平版印刷版が望ましい。0−キノンジアジド化合
物としては1例えば米国特許第3,0416,110号
、同第3,011ぶ、iii号、同第3.0≠t、12
1号、同第3,0≠t、//j号、同第、i、oat、
iir号、同第3,04t6.//り号、同第J 、a
llt 、120号、同第3.0≠t、i、2i号、同
第3,04tt、/ココ号、同第J、O弘t、/23号
、同第J 、ot/ 、≠30号、同第3.io、2.
toy号、同第3.iot。The positive-working photosensitive lithographic printing plate in which the exposed areas are eluted or swollen and developed with strong alkaline water having a pH of pH/- or higher used in the present invention is a combination of an 0-quinonediazide compound and a pH/- or higher.
A photosensitive layer made of an organic polymer compound that is hardly soluble in weak alkaline water but soluble in strong alkaline water with a pH of less than 2 is provided on the hydrophilic support, and the exposed area is adjusted to pH/2 by 1 g of light.
- A photosensitive lithographic printing plate having a photosensitive layer that is soluble in strong alkaline water is desirable. Examples of 0-quinonediazide compounds include 1, for example, U.S. Pat. No. 3,0416,110, U.S. Pat.
No. 1, No. 3, 0≠t, // No. j, No. i, oat,
IIR No. 3,04t6. //R issue, same issue J, a
llt, No. 120, No. 3.0≠t, i, 2i, No. 3,04tt, /Coco, No. J, O Hirot, /23, No. J, ot/, ≠30 , same No. 3. io, 2.
toy issue, same number 3. iot.
グt!号、同第3,63!、702号、同第31t≠7
,414tJ号の各明細書をはじめ、多数の刊行物に記
されている。これらの内でも、特に芳香族ヒドロキシ化
合物の0−ナフトキノンジアジドスルホン酸エステルま
たは0−ナフトキノンジアジドカルボン酸エステル、お
よび芳香族アミン化合物の0−ナフトキノンジアジドス
ルホン酸アミドまたは0−ナフトキノンジアジドカルボ
ン酸アミドが好ましく、等に米国特許第3.t3夕、7
02号明細瞥に記されているピロガロールとアセトンと
の縮合物に0−す7トキノンジアジドスルホン酸をエス
テル反応させたもの、米国特許第V。Gut! No. 3, 63! , No. 702, No. 31t≠7
, 414tJ, and many other publications. Among these, 0-naphthoquinonediazide sulfonic acid ester or 0-naphthoquinonediazidecarboxylic acid ester of an aromatic hydroxy compound, and 0-naphthoquinonediazide sulfonic acid amide or 0-naphthoquinonediazidecarboxylic acid amide of an aromatic amine compound are particularly preferred. , etc., U.S. Patent No. 3. t3 evening, 7
U.S. Patent No. V, which is obtained by subjecting the condensate of pyrogallol and acetone to an ester reaction with 0-su7toquinonediazide sulfonic acid as described in the specification of No. 02.
02!r、111号明細書に記されている末端にヒドロ
キシ基を有するポリエステルにO−ナフトキノンジアジ
ドスルホン酸、または0−ナフトキノンジアジドカルボ
ン酸をエステル反応させたもの。02! A product obtained by subjecting a polyester having a hydroxyl group at the end described in No. 111 to an ester reaction with O-naphthoquinonediazide sulfonic acid or O-naphthoquinonediazidecarboxylic acid.
英国特許第1,4tタグ、θ≠3号明細書に記されてい
るよりなp−ヒドロキシスチレンのホモポリマーまたは
これと他の共重合し得るモノマーとの共重合体に0−ナ
フトキノンジアジドスルホン酸または0−ナフトキノン
ジアジドカルボン酸をエステル反応させたもの、米国特
許第3.7より。A homopolymer of p-hydroxystyrene or a copolymer of this and other copolymerizable monomers with 0-naphthoquinonediazide sulfonic acid as described in British Patent No. 1,4t Tag, θ≠3 or ester reaction of 0-naphthoquinonediazidecarboxylic acid, from US Pat. No. 3.7.
7//号明細書に記されているよう々p−アミノスチレ
ンと他の共重合しうるモノマーとの共重合体に0−ナフ
トキノンジアジドスルホンflitたはl 3−
0−ナフトキノンジアジドカルボン酸をアミド反応させ
たものは非常にすぐれている。As described in the specification of No. 7//, 0-naphthoquinonediazide sulfone flit or l3- 0-naphthoquinonediazidecarboxylic acid is added to a copolymer of p-aminostyrene and other copolymerizable monomers. The reactants are very good.
これらのO−キノンジアジド化合物と混合して使用され
る強アルカリ水に可溶の有機高分子化合物としては、た
とえばノボラック型フェノール樹脂がおる。具体的には
フェノールホルムアルデヒドm1lb、0−クレゾール
ホルムアルデヒドm oh。Examples of organic polymer compounds soluble in strong alkaline water used in combination with these O-quinonediazide compounds include novolac type phenol resins. Specifically, phenol formaldehyde m1lb, 0-cresol formaldehyde moh.
m−クレゾールホルムアルデヒド樹脂などが含まれる。Includes m-cresol formaldehyde resin and the like.
更に@開昭1O−12jtrot号公報に記されている
様に上記のようなフェノール樹脂と共に、t−ブチルフ
ェノールホルムアルデヒド樹脂のような炭素数3〜rの
アルキル基で置換されたフェノールまたはクレゾールと
ホルムアルデヒドとの縮合物とを併用すると、より一層
好ましい。Furthermore, as described in @ Kaisho 1O-12jtrot publication, in addition to the above-mentioned phenol resins, phenol or cresol substituted with an alkyl group having 3 to r carbon atoms such as t-butylphenol formaldehyde resin and formaldehyde are used. It is even more preferable to use it in combination with a condensate.
強アルカリ水に可溶の有機高分子化合物は、感光層中に
約jO〜約t!重量、より好ましくは≦θ〜10重量%
、含有させられる。The organic polymer compound soluble in strong alkaline water is present in the photosensitive layer from about jO to about t! Weight, more preferably ≦θ~10% by weight
, may be included.
0−キノンジアジド化合物と強アルカリ水に可溶の有機
高分子化合物からなる感光層には、必要に応じて更に染
料、可塑剤、プリントアウト性能−ノ 弘−
を与える成分などの添加剤を加えることができる。If necessary, additives such as dyes, plasticizers, and components that provide printout performance may be added to the photosensitive layer consisting of an 0-quinonediazide compound and an organic polymer compound soluble in strong alkaline water. I can do it.
本発明に用いるpH/2以上の強アルカリ水によって非
光部が溶出または#潤するポジ型平版印刷版の現fw液
としてはアルカリ金属水酸化物、珪酸アルカリ金属塩、
りん酸アルカリ金属塩又はアルミン酸アルカリ金属塩、
水および必要に応じて界面活性剤や他の添加剤からなる
p H/ 2以上の強アルカリ水溶液が好適である。具
体的には特開昭≠f−/113j号、同タj−1233
4A号。The present fw solution for a positive planographic printing plate in which the non-light areas are eluted or moistened by strong alkaline water with a pH of 2 or more used in the present invention includes alkali metal hydroxides, alkali metal silicate salts,
Alkali metal phosphate or alkali metal aluminate,
A strongly alkaline aqueous solution having a pH of 2 or higher and consisting of water and optionally a surfactant and other additives is suitable. Specifically, Japanese Patent Application Publication No. Sho≠f-/113j, No. J-1233
No. 4A.
同ra−trxooti号、同!2−127331号、
同!3−44307号、同jθ−71→02号。Same ra-trxooti issue, same! No. 2-127331,
same! No. 3-44307, jθ-71→02.
同jj−、2.27JP号、同タ!−−rioo号。Same jj-, 2.27 JP issue, same ta! --rioo issue.
同夕よ一タ!911t号、同jr−iiroJy号、同
!J−/4’コjλt@、巨jjO−jt/Jλグ号に
記載されている珪酸ナトリウム又は珪酸カリウムからな
る現像液をあげることが出来る。Same evening, Ichita! 911t, same JR-IiroJy, same! Examples include developing solutions made of sodium silicate or potassium silicate described in J-/4'kojλt@, large jjO-jt/Jλg issues.
上記のようなネガ型感光性平版印刷版およびポジ型感光
性平版印刷版は、いずれも画像露光後に第1現像ゾーン
と第1現像ゾーンとを連続して有する水平搬送型自動現
像機に通されて、感光層の非画像部が除去される。第1
図は、このような自動現11機の略断面図であり1画像
非光さnたネガ型及び/又はポジ型の感光性平版印刷版
7は先づ第1現像ゾーンヘ一対の挿入ローラー/及び搬
送ローラーrなどによって矢印の方向へ搬送される。Both the negative-working photosensitive lithographic printing plate and the positive-working photosensitive lithographic printing plate described above are passed through a horizontal conveyance type automatic developing machine having a first development zone and a first development zone in succession after image exposure. Then, the non-image areas of the photosensitive layer are removed. 1st
The figure is a schematic cross-sectional view of 11 such automatic developing machines, in which a negative and/or positive photosensitive planographic printing plate 7 is first inserted into a first development zone by a pair of insertion rollers and It is transported in the direction of the arrow by a transport roller r or the like.
搬送路の上方には複数個のノズルパイブタが臨設されて
おり、タンフグ中に収納されたpH7λ未満の弱アルカ
リ水からなる第1現像液をポンプ乙によってノズル/ξ
イプタヘ供給し、そのノズルから感光性平版印刷版の感
光!−の表面へ第1現117!lfiを噴射させ、更に
ブラシローラー3で感光F−の表面が擦られ、最後に一
対の絞りローラーλによって第1現像液が絞り取られる
。かくして第1現像ゾーンを通過した感光性平版印刷版
は一対の挿入ローラー/′によって第2現像ゾーンへ送
られる。A plurality of nozzle pipes are installed above the conveyance path, and a first developer consisting of weakly alkaline water with a pH of less than 7λ stored in a tongue puffer is pumped through the nozzle/ξ by a pump B.
The photosensitive lithographic printing plate is exposed through the nozzle. - to the surface of the first version 117! lfi is injected, and the surface of photosensitive F- is further rubbed by a brush roller 3, and finally the first developer is squeezed out by a pair of squeezing rollers λ. The photosensitive lithographic printing plate thus passed through the first development zone is conveyed to the second development zone by a pair of insertion rollers/'.
第2現像ゾーンにおいても感光性平版印刷版の搬送路の
上方に被数1固のノズルパイブタ′が臨設されており、
タンクj中に収納されたpH/2以上の強アルカリ水か
らなる第1現像液をポンプ6′によってノズルパイプ2
′へ送り、そのノズルから感光性平版印刷版の感光層の
表面へ第λ現像液を噴射させ、更にブラシローラー3′
で感光層の表面が擦られ、最後に絞りローラーλ′によ
って第λ現像液が絞り取られる。第1現像ゾーンおよび
第2現像ゾーンを通過して現像処理された感光性平版印
刷版7は次いで水洗ゾーンにて十分水洗される。水洗ゾ
ーンは、一対の挿入ローラーl”および絞りローラーで
、スプレーパイブタ“カ設#されており、タンクに収納
された水道水がポンプt“によってノズルパイブタ“に
送られ、そのノズルから噴射された水道水によって、現
像された感光性平版印刷版に付着している第1現像液及
び/又は第λ現像液が綺麗に洗い流される。Also in the second development zone, a number of nozzle pipes' are installed above the conveyance path of the photosensitive planographic printing plate.
A first developer consisting of strong alkaline water with a pH of 2 or higher is supplied to the nozzle pipe 2 by a pump 6' and is stored in a tank j.
', the λth developer is injected from the nozzle onto the surface of the photosensitive layer of the photosensitive lithographic printing plate, and then the brush roller 3'
The surface of the photosensitive layer is rubbed, and finally the λth developer is squeezed out by a squeeze roller λ'. The photosensitive lithographic printing plate 7 that has passed through the first development zone and the second development zone and has been subjected to development processing is then sufficiently washed with water in a water washing zone. The water washing zone is equipped with a pair of insertion rollers and a squeezing roller, and is equipped with a spray pipe.The tap water stored in the tank is sent to the nozzle pipe by a pump, and is sprayed from the nozzle. The first developer and/or the λ-th developer adhering to the developed photosensitive lithographic printing plate are thoroughly washed away by the tap water.
上記の水平搬送型の自動現像機の第1の現像ゾーンと第
λの現像ゾーンには現滓液の処理による能力低下を回復
させる為にそれぞれの現像液に適する補充装置が取り付
けられていてもよい。また本発明に用いる水平搬送型の
自動現像機には必要に応じて現像ゾーンの後に連続した
水洗ゾーン。Even though the first developing zone and the λth developing zone of the above-mentioned horizontal conveyance type automatic developing machine are equipped with replenishing devices suitable for each developing solution in order to recover from the decrease in performance due to processing of developer slag. good. Further, the horizontal conveyance type automatic developing machine used in the present invention has a washing zone continuous after the developing zone, if necessary.
定着ゾーン、保護ガム塗布ゾーン又は乾燥ゾーンl 7
−
を取り付けたものを使用することが出来る。Fixing zone, protective gum application zone or drying zone 7
- Can be used with attached.
更に本発明を実施例にて詳細に脱明する。なお実施例は
具体的実施態様の一例を示すのみであり本発明を限定す
るものではない。Furthermore, the present invention will be elucidated in detail with examples. Note that the examples merely show examples of specific embodiments and do not limit the present invention.
実施例 1
♀素気流下にエチレングリコールモノメチルエーテルJ
ooz爺部を1oo0cに加熱し、この中へλ−ヒドロ
キシエチルメタクリレート/10重量部、アクロニトリ
ルタOg量部、メチルメタクリレート7り、り重量部、
メタクリル酸10゜J′重量部及び過酸化ベンゾイル1
1.2重量部の混合液を2時間かけて滴下した。Example 1 ♀ Ethylene glycol monomethyl ether J under bare air flow
Heat the old part of the ooz to 100c, add 10 parts by weight of λ-hydroxyethyl methacrylate, 7 parts by weight of acronitrile, 7 parts by weight of methyl methacrylate,
10°J' parts by weight of methacrylic acid and 1 part by weight of benzoyl peroxide
1.2 parts by weight of the mixed solution was added dropwise over 2 hours.
滴下終了75分後にエチレングリコールモノメチルエー
テル300重量部と過酸化ベンゾイル0゜3重量部を加
えて、そのままグ時間反応させた。75 minutes after the completion of the dropwise addition, 300 parts by weight of ethylene glycol monomethyl ether and 0.3 parts by weight of benzoyl peroxide were added, and the mixture was allowed to react for several hours.
反応終了後メタノールで希釈して水中に投じて共重合体
を沈澱させ、700Cで真空乾燥させた。After the reaction was completed, the copolymer was diluted with methanol and poured into water to precipitate the copolymer, followed by vacuum drying at 700C.
このλ−ヒドロキシエチルメタクリレート共重合体(I
)の酸価は21であった。This λ-hydroxyethyl methacrylate copolymer (I
) had an acid value of 21.
厚さ0 、 / IrTnTIの28アルミニウム板を
t o’cir−
立て後、Aθ0Cのアルミン酸ナトリウム3チ水=0で
デスマットした。このアルミニウム板をλθ係像酸中で
、2A/dm2 の電流密度で1分間陽極酸化し、その
後700Cの珪酸ナトリウムの2゜!チ水溶液で7分間
処理した。A 28 aluminum plate with a thickness of 0/IrTnTI was erected to a temperature of 0.000 m and then desmutted with 30% of sodium aluminate water at Aθ0C. This aluminum plate was anodized in λθ-containing acid at a current density of 2 A/dm2 for 1 minute, and then anodized at 700 C sodium silicate at 2°! The sample was treated with an aqueous solution of water for 7 minutes.
このアルミニウム板につぎの感光液を塗布し、1000
Cで2分間乾燥してネガ型感光性平版印刷版を得た。The following photosensitive liquid was applied to this aluminum plate, and 1000
After drying at C for 2 minutes, a negative photosensitive lithographic printing plate was obtained.
ツーヒドロキシエチルメタクリ
レート共重合体(1) r7重量部
p−ジアゾジフェニルアミンと
パラホルムアルデヒドの縮合
物の一一メトキシーl−ヒド
ロオキシーj−ベンゾイルベ
ンゼンスルホン酸塙 10M量m
オイルブルー#603
(オリエント化学工業株式会
?tJJ、トリフェニルメタン系
油溶性染料) 3M量部
コーメトキシエタノール 600重量部メタノール 1
00重量部
エチレンジクロライド too=i部
乾燥塗布重量はコ、夕?/m2であった。この感光性平
版印刷版に透明ネガ原画を密着させ3θアンぼアのカー
ボンアーク灯で70cfnの距離から≠O秒間画像勝光
した。Two-hydroxyethyl methacrylate copolymer (1) r7 parts by weight Condensate of p-diazodiphenylamine and paraformaldehyde One-methoxy l-hydroxy-j-benzoylbenzenesulfonic acid 10M amount m Oil Blue #603 (Orient Chemical Industry Co., Ltd. tJJ, triphenylmethane oil-soluble dye) 3M parts Comethoxyethanol 600 parts by weight Methanol 1
00 parts by weight of ethylene dichloride too=i part The dry coating weight is ko, evening? /m2. A transparent negative original image was brought into close contact with this photosensitive lithographic printing plate, and the image was illuminated for ≠0 seconds from a distance of 70 cfn using a 3θ ambore carbon arc lamp.
一部ポジ型感光性平版印刷版として米国特許第3、t3
夕、70り号明ra書の実施例1に記載されているアセ
トンとピロガロールの縮重合によって得られるポリヒド
ロキシフェニルのナフトキノン−/、j−’)アジドー
r−スルホン酸エステル7重1部とノボラック型クレゾ
ールホルムアルデヒド樹脂2重量部、オイルプルキロ0
3 0,03重量部を2ON量部の酢酸−λ−メトキシ
エチルと20重量部のメチルエチルケトンに溶解して作
製した感光液を、砂目立て後陽極酸化されたアルミニウ
ム板に塗布しtOoCで2分間乾燥させ乾燥塗布重量λ
、 ! f / m の感光性平版印刷版を得た。この
感光性平版印刷版に透明ポジ原画を密着させ30アンペ
アのカーボンアーク灯で70■の距離から40秒間画像
露光した。U.S. Patent No. 3, t3 as partially positive photosensitive lithographic printing plate
In the evening, 1 part of 7 parts of naphthoquinone-/,j-')azido r-sulfonic acid ester of polyhydroxyphenyl obtained by condensation polymerization of acetone and pyrogallol described in Example 1 of the 70th edition of the Meiji Ra book and novolak. Type cresol formaldehyde resin 2 parts by weight, oil pull kilo 0
3 A photosensitive solution prepared by dissolving 0.03 parts by weight in 2ON parts of λ-methoxyethyl acetate and 20 parts by weight of methyl ethyl ketone was applied to an anodized aluminum plate after graining and dried for 2 minutes at tOoC. Dry coating weight λ
, ! A photosensitive lithographic printing plate of f/m was obtained. A transparent positive original image was brought into close contact with this photosensitive lithographic printing plate and imagewise exposed for 40 seconds from a distance of 70 cm using a 30 ampere carbon arc lamp.
第1図に示すようなλつの埃像グーンとその後に水洗又
は定着ゾーンを有する水平搬送式の自動現酸機の第7現
像ゾーンに下記に示す弱アルカリ水現像液を10Jl仕
込み現像液温を30°CK11ll整した。As shown in Figure 1, 10 Jl of the weakly alkaline aqueous developer shown below was charged into the 7th developing zone of a horizontal conveyance type automatic acid developing machine which has λ dust image zones and a water washing or fixing zone after that, and the developer temperature was set to 30 liters. °CK11ll was adjusted.
ベンジルアルコール 300gr
トリエタノールアミン 100gr
イソプロピルナフタレンスルホ 100grン酸ナトリ
ウム
亜硫酸ナトリウム 、20gr
ニトリロトリ酢酸3ナトリウム jgrイオン交換水
タ≠rOgr
次で第1現像ゾーンに珪酸カリウム(Sing/に20
モル比/、2)jt、j張水溶液からなる強アルカリ水
現像液をion仕込み現像液温をコj0Cに調整した。Benzyl alcohol 300gr Triethanolamine 100gr Isopropylnaphthalene sulfonate 100gr Sodium phosphate sodium sulfite, 20gr Trisodium nitrilotriacetate jgr Ion exchange water
Ta≠rOgr Next, add potassium silicate (20% to Sing/) to the first development zone.
Molar ratio/2) A strong alkaline aqueous developer consisting of a diluted aqueous solution was charged with ion and the developer temperature was adjusted to 0C.
なおこの自現機の搬送スピードを第1現像ゾーン及び第
1現像ゾーンともそれ一 l −
ぞれの現像時間が2θ秒間になる様設定し、第1現像ゾ
ーンの後は水洗ゾーンになる探求を入れた。The transport speed of this automatic processor was set so that the developing time for both the first developing zone and the first developing zone was 2θ seconds, and the first developing zone was followed by a water washing zone. I put it in.
水洗水の水は極端に汚れない様に常に新しい水を一部補
給しオーバーフローにて排液として出した。To prevent the washing water from becoming extremely dirty, a portion of fresh water was always replenished and drained through the overflow.
また第2現像ゾーンの強アルカリ水現像液は処理による
劣化や空気中の炭酸ガスによる劣化を回復させる為に珪
酸カリウム(Si02/に20モル比1.コ)12%水
溶液を現像途中補充しつづけた。In addition, the strongly alkaline aqueous developer in the second development zone is continuously replenished with a 12% aqueous solution of potassium silicate (20 molar ratio 1.0% to SiO2) during development in order to recover from deterioration caused by processing and carbon dioxide gas in the air. Ta.
画像露光した前記のネガ型感光性平版印刷版と前記のポ
ジ型感光性平版印刷版を無差別に上記の自現機に通して
処理した。この様な処理方法でネガ型感光性平版印刷版
は41m271まで、ポジ型感光性平版印刷版は仕込ん
だ現像液に対してi。The imagewise exposed negative photosensitive lithographic printing plates and the positive photosensitive lithographic printing plates were indiscriminately passed through the above automatic processor for processing. With this processing method, negative-working photosensitive planographic printing plates can be processed up to 41 m271, and positive-working photosensitive planographic printing plates can be processed up to i.
m27tまで処理ができた。この様に現像処理された平
版印刷版に保護ガムを塗布し印刷したところいずれの印
刷版も非画像部に汚れのない美しい印刷物を得ることが
出来た。We were able to process up to m27t. When the lithographic printing plates developed in this manner were coated with a protective gum and printed, it was possible to obtain beautiful printed matter with no stains in the non-image areas of each printing plate.
実施例 2
実施例1と同様にして一一ヒドロキシェチルメー+2.
2−
タフリレート/アクリロニトリル/エテルメタクリレー
ト/メタクリル酸=、!0./20/λj/I/L重量
%(モノマー仕込比)の2−ヒドロキシエチルメタクリ
レート共重合体i)を得た。このλ−ヒドロキシエチル
メタクリレート共重合体(n)を用いて実施例1の珪酸
ナトリウム処理アルンニウム板につぎの感光液を塗布し
、1o00Cコ分間乾燥してネガ型感光性平版印刷版を
得た。Example 2 In the same manner as in Example 1, 11 hydroxyethyl me+2.
2- Tafrylate/Acrylonitrile/Ether methacrylate/Methacrylic acid=,! 0. A 2-hydroxyethyl methacrylate copolymer i) of /20/λj/I/L weight % (monomer charge ratio) was obtained. Using this λ-hydroxyethyl methacrylate copolymer (n), the following photosensitive solution was coated on the sodium silicate treated aluminium plate of Example 1, and dried for 1000 C to obtain a negative photosensitive lithographic printing plate.
実施例1のp−ジアゾジフェ
ニルアミンからなるジアゾ
樹脂 o、ri重量部
コツードロキシエチルメタク
リレート共重合体(II) !、00 ttビクトリア
ピュアーブルー
BDH(保土谷化学■製) 0,10 1t−7’チル
ナフタレンスルホ
ン酸ナトリウム θ、03 N
トリクレジジルフォスフニー
ト0護oN
りん酸 0,10 #
フッ素系界面活性剤
(FC−≠JO) 0.03重量部
エチレングリコールモノメチ
ルエーテル タO〃
メタノール /A tt
メチルエチルケトン 3+2 〃
水 /s
乾燥塗布重量は2.527m2であった。このネガ感光
性平版印刷版を実施例1のネガ型感光性平版印刷版の代
りに用いたところ実施例1とほぼ同様な結果が得られた
。Diazo resin consisting of p-diazodiphenylamine of Example 1 o, ri parts by weight Cotardoxyethyl methacrylate copolymer (II)! , 00 tt Victoria Pure Blue BDH (manufactured by Hodogaya Chemical ■) 0,10 1t-7' Sodium tilnaphthalene sulfonate θ, 03 N Tricredidyl phosphonate 0 protection oN Phosphoric acid 0,10 # Fluorine surfactant (FC-≠JO) 0.03 parts by weight ethylene glycol monomethyl ether methanol/Att methyl ethyl ketone 3+2 water/s The dry coating weight was 2.527 m2. When this negative photosensitive lithographic printing plate was used in place of the negative photosensitive lithographic printing plate of Example 1, almost the same results as in Example 1 were obtained.
第1図は1本発明の現像方法を実施するに適した自動現
像機の略断面図である。
/、/’、/”・・・・・・挿入ローラーλ、2’、2
“・・・・・・絞りローラー3.3′・・・・・・ブラ
シローラー
グ、!・・・・・・現像タンク 4.4’、4”・・・
・・・ポンプ 7・・・・・・感光性平版印刷版 it
、r’・・・・・・搬送ローラー タ、P′、り“・・
・・・・スプレーパイプIO・・・・・・オーバーフロ
ー排出口//・・・・・・水道水導入口
特許出願人 富士写真フィルム株式会社−コ j −FIG. 1 is a schematic sectional view of an automatic developing machine suitable for carrying out the developing method of the present invention. /, /', /”... Insertion roller λ, 2', 2
“...Aperture roller 3.3'...Brush roller lag!...Development tank 4.4', 4”...
... Pump 7 ... Photosensitive planographic printing plate it
, r'... Conveyance roller ta, P', r'...
... Spray pipe IO ... Overflow outlet / / ... Tap water inlet Patent applicant Fuji Photo Film Co., Ltd. -
Claims (1)
または膨潤をれ現像されるネガ型感光性平版印刷版およ
び/またはI) H/ j以上の強アルカリ水によって
露光部が溶出または膨潤され塑像されるポジ型感光性平
版印刷版を、画像非光後に第1現像ゾーンと第2」像ゾ
ーンとを連続して有する水平搬送型自動珊像機に通して
非画r象部を除去して幌律することからなる現(象方法
であって、第1覗1象ゾーンの現像液はp )I /
2未満の弱アルカリ水からなり、第1現像ゾーンの現像
液はp )I /λ以上の強アルカリ水からなることを
特徴とするネガ型およびポジ型感光性平版印刷版の共通
現像方法。Negative photosensitive lithographic printing plates that are developed with unexposed areas eluted or swollen by weak alkaline water with pH less than H/λ and/or I) Exposed areas are eluted or swelled with strong alkaline water of H/j or higher. After the image is removed, the positive-working photosensitive lithographic printing plate to be imaged is passed through a horizontal conveyance type automatic imager having a first development zone and a second image zone in succession to remove the non-image area. This is an image method that consists of applying the same amount of water to the surface, and the developer in the first zone is p)I/
A common developing method for negative-working and positive-working photosensitive lithographic printing plates, characterized in that the developer in the first development zone is made of strong alkaline water with a p )I /λ or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17283583A JPS6064351A (en) | 1983-09-19 | 1983-09-19 | Developing method of photosensitive lithographic printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17283583A JPS6064351A (en) | 1983-09-19 | 1983-09-19 | Developing method of photosensitive lithographic printing plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6064351A true JPS6064351A (en) | 1985-04-12 |
| JPH0428295B2 JPH0428295B2 (en) | 1992-05-14 |
Family
ID=15949220
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17283583A Granted JPS6064351A (en) | 1983-09-19 | 1983-09-19 | Developing method of photosensitive lithographic printing plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6064351A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS628153A (en) * | 1985-07-05 | 1987-01-16 | Konishiroku Photo Ind Co Ltd | Processing device for photosensitive material |
| JPS6287965A (en) * | 1985-10-14 | 1987-04-22 | Fuji Photo Film Co Ltd | Developing device for photosensitive material |
| JPS63186247A (en) * | 1987-01-28 | 1988-08-01 | Konica Corp | Processing method for photosensitive material |
| JPH039362A (en) * | 1989-06-07 | 1991-01-17 | Sanyo Kokusaku Pulp Co Ltd | Photosensitive film developing machine |
| JP2011023671A (en) * | 2009-07-17 | 2011-02-03 | Tokyo Electron Ltd | Developing device, resist pattern forming method and storage medium |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55140843A (en) * | 1979-04-19 | 1980-11-04 | Fuji Photo Film Co Ltd | Method and apparatus for developing ps plate |
-
1983
- 1983-09-19 JP JP17283583A patent/JPS6064351A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55140843A (en) * | 1979-04-19 | 1980-11-04 | Fuji Photo Film Co Ltd | Method and apparatus for developing ps plate |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS628153A (en) * | 1985-07-05 | 1987-01-16 | Konishiroku Photo Ind Co Ltd | Processing device for photosensitive material |
| JPS6287965A (en) * | 1985-10-14 | 1987-04-22 | Fuji Photo Film Co Ltd | Developing device for photosensitive material |
| JPS63186247A (en) * | 1987-01-28 | 1988-08-01 | Konica Corp | Processing method for photosensitive material |
| JPH039362A (en) * | 1989-06-07 | 1991-01-17 | Sanyo Kokusaku Pulp Co Ltd | Photosensitive film developing machine |
| JP2011023671A (en) * | 2009-07-17 | 2011-02-03 | Tokyo Electron Ltd | Developing device, resist pattern forming method and storage medium |
| US8474396B2 (en) | 2009-07-17 | 2013-07-02 | Tokyo Electron Limited | Developing apparatus, resist pattern forming method and storage medium |
| TWI427438B (en) * | 2009-07-17 | 2014-02-21 | 東京威力科創股份有限公司 | Developing device, method for forming photoresist pattern, and memory medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0428295B2 (en) | 1992-05-14 |
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