JPS606A - Lead wire for electronic part and method of producing same - Google Patents

Lead wire for electronic part and method of producing same

Info

Publication number
JPS606A
JPS606A JP10848383A JP10848383A JPS606A JP S606 A JPS606 A JP S606A JP 10848383 A JP10848383 A JP 10848383A JP 10848383 A JP10848383 A JP 10848383A JP S606 A JPS606 A JP S606A
Authority
JP
Japan
Prior art keywords
tin
layer
wire
copper
lead
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10848383A
Other languages
Japanese (ja)
Inventor
守安 禎四郎
悟 高野
石黒 信吾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP10848383A priority Critical patent/JPS606A/en
Publication of JPS606A publication Critical patent/JPS606A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は、電子部品用リード線およびその製造方法に関
し、更に詳しくは、二層の錫または錫−鉛合金めっきの
間に銅または銅合金めっき層を有する電子部品用リード
線およびその製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a lead wire for electronic components and a method for manufacturing the same, and more particularly to a lead wire for electronic components having a copper or copper alloy plating layer between two layers of tin or tin-lead alloy plating. This invention relates to a lead wire and a method for manufacturing the same.

従来、電子部分用リード線は、電気めっきにより一層ま
たは二層の錫または錫−鉛合金めっきを施すか、あるい
は溶融めっきにより一層の錫または錫−鉛合金めっきを
施して製造されているが、それぞれ次の様な欠点があっ
た。
Conventionally, lead wires for electronic parts have been manufactured by applying one or two layers of tin or tin-lead alloy plating by electroplating, or by applying one layer of tin or tin-lead alloy plating by hot-dip plating. Each had the following drawbacks.

すなわち、電気めつきては、光沢電気めっきは脆いので
自己径巻付等に際してクラックが発生して採用できない
為、外観の粗いめっきしか得られない。従って、フェル
ト研摩またはダイス研摩が必要であるが、フェルト研摩
ではめっき金属の研摩粉が再付着するという難点があり
、またダイス研摩ではダイス管理の為の費用によりコス
トが上昇するという問題がある。さらに、外観の粗さ、
特にフェルト研摩での平滑性の不十分さの故に、抵抗器
組立工程のチャック、コンベア、ダイス等にカス付着や
カス詰まりが生じ、あるいは変色を生じ易くなる。加え
て、電気めっきには固有のピンホールが生じる為、金属
線が鉄の場合鋼が出易い。
That is, when it comes to electroplating, bright electroplating is brittle and cracks occur during self-diameter winding, etc., so it cannot be used, so only plating with a rough appearance can be obtained. Therefore, felt polishing or die polishing is necessary, but felt polishing has the disadvantage that polishing powder from the plated metal re-adheres, and die polishing has the problem of increased costs due to the cost of die management. In addition, the roughness of the appearance,
In particular, due to insufficient smoothness in felt polishing, chucks, conveyors, dies, etc. in the resistor assembly process tend to be prone to adhering to, clogging, or discoloring. In addition, electroplating produces pinholes, so if the metal wire is iron, steel tends to come out.

一方、溶融めっきでは、偏肉でめっきに薄い部分がある
為、加熱、加湿などによりハンダ付は性が著しく劣化す
る。
On the other hand, with hot-dip plating, the thickness is uneven and there are thin areas in the plating, so the soldering properties deteriorate significantly due to heating, humidification, etc.

本発明者らは、金属線の外周の錫または錫−鉛合金めっ
き層を二層とし、それらの中間に銅または銅合金の脂を
介在させ、さらにリフロー処理することにより、上述の
様な従来技術の欠点を解決した優れた電子部品用リード
線が製造できることを見い出し、本発明を完成するに至
った。
The present inventors have created two tin or tin-lead alloy plating layers on the outer periphery of the metal wire, interposed copper or copper alloy fat in between, and further reflowed the metal wire, thereby achieving the above-mentioned conventional method. We have discovered that it is possible to manufacture an excellent lead wire for electronic components that solves the technical drawbacks, and have completed the present invention.

すなわち、本発明の要旨は、錫または錫−鉛合金から成
る第1層、銅または銅合金から成る第2層および錫また
は錫−鉛合金から成る第3層を金属線外周上に有して成
り、リフロー処理されたことを特徴とする電子部品用リ
ード線、および金属線の外周に、錫または錫−鉛合金を
電気めっきして第1層を形成し、第1層の上に銅または
銅合金をめっきして第2層を形成し、さらに第2層の」
二に錫または錫−鉛合金を電気めっきして第3層を形成
し、次いでリフロー処理を施すことを特徴とする電子部
品用リード線の製造方法に存する。
That is, the gist of the present invention is to have a first layer made of tin or a tin-lead alloy, a second layer made of copper or a copper alloy, and a third layer made of tin or a tin-lead alloy on the outer periphery of the metal wire. A first layer is formed by electroplating tin or a tin-lead alloy on the outer periphery of the lead wire and metal wire, and copper or A second layer is formed by plating a copper alloy, and then a second layer is formed.
The present invention relates to a method of manufacturing a lead wire for an electronic component, which comprises secondly electroplating tin or a tin-lead alloy to form a third layer, and then performing a reflow treatment.

本発明において、金属線と[、では銅および銅合金線、
銅被覆鋼線、鉄線、鋼線などが例示できる。
In the present invention, a metal wire and a copper and copper alloy wire,
Examples include copper-coated steel wire, iron wire, and steel wire.

線径は特に制限されないが、電子部品用リード線として
は0.4〜0゜8φが通常の径である。
Although the wire diameter is not particularly limited, a typical diameter for lead wires for electronic components is 0.4 to 0°8φ.

鉛または錫−鉛合金の組成は特に限定されることはなく
、錫:鉛の比が100:O〜20 : 80のものが一
般に用いられる。めっきは、通常電気めっきにより行わ
れ、めっき厚は第1層では、特に限定されず、たとえば
4〜13μであり、第3層では通常1〜5μである。
The composition of lead or tin-lead alloy is not particularly limited, and those having a tin:lead ratio of 100:O to 20:80 are generally used. Plating is usually performed by electroplating, and the plating thickness is not particularly limited for the first layer, and is, for example, 4 to 13 μm, and usually 1 to 5 μm for the third layer.

第2層、すなわち中間層の銅または銅合金めっきも電気
めっきにより形成され、その厚さは通常0.05〜0.
5μである。銅合金としては、銅−錫合金、銅−亜鉛合
金が好ましく用いられる。
The second layer, that is, the intermediate layer of copper or copper alloy plating, is also formed by electroplating, and its thickness is usually 0.05-0.
It is 5μ. As the copper alloy, a copper-tin alloy and a copper-zinc alloy are preferably used.

第1層のめつき前に、金属線にニッケルまたは銅などの
下地めっきを形成してもよい。
Before plating the first layer, a base plating such as nickel or copper may be formed on the metal wire.

リフローは、従来の方法で行ってよく、たとえば、めっ
きされた金属線を連続的に供給しながら通電加熱または
高周波加熱して錫または錫−鉛合金を溶融させ、次いで
水冷することにより行われる。
Reflow may be performed in a conventional manner, such as by continuously feeding a plated metal wire while applying current or high frequency heating to melt the tin or tin-lead alloy, followed by water cooling.

本発明のリード線は、錫または錫−鉛合金めっき層の間
に銅または銅合金層が存在している為、リフローによっ
ても偏肉や長手方向の凸凹が生じない。従って均一なめ
っき厚さが得られ、表面光沢が良好で、変色しにくく、
カスも出難い。また銅または銅合金中間層が薄いので、
はんだ付性は同中間層が無い場合に比べ、劣ることはな
い。さらに電気めっきのため、めっき厚さが任意に選べ
るという利点もある。
Since the lead wire of the present invention has a copper or copper alloy layer between the tin or tin-lead alloy plating layers, uneven thickness and unevenness in the longitudinal direction do not occur even during reflow. Therefore, uniform plating thickness is obtained, surface gloss is good, and it is difficult to discolor.
It's hard to get any dregs out. Also, since the copper or copper alloy intermediate layer is thin,
Solderability is not inferior to that without the intermediate layer. Furthermore, since it is electroplated, there is the advantage that the plating thickness can be selected arbitrarily.

次に実施例および比較例を示し、本発明を具体的に説明
する。
Next, examples and comparative examples will be shown to specifically explain the present invention.

実施例1〜8および比較例1〜5 0.58φの軟銅線に、通常のアルカリ電解脱脂および
酸洗を施した後、ホウフッ化浴中で錫または錫−鉛合金
をめっきし、硫酸浴中で銅をめっきし、さらにホウフッ
化浴中て錫または錫−鉛合金をめっきした。次いで、め
っきした銅線を水洗、乾燥し、ロジンフラックスを塗付
してリフロー処理に付した。リフローは、1対の給電ロ
ール間にわたした銅線に給電し、抵抗加熱により錫また
は錫−鉛合金めっき層を溶融し、次いで下方給電ロール
の真下に設置した水槽に鉛垂に引き入れ、溶融しためつ
き層を凝固させた。
Examples 1 to 8 and Comparative Examples 1 to 5 A 0.58φ annealed copper wire was subjected to normal alkaline electrolytic degreasing and pickling, then plated with tin or tin-lead alloy in a borofluoride bath, and then plated in a sulfuric acid bath. Copper was plated in a borofluoride bath, and then tin or a tin-lead alloy was plated in a borofluoride bath. Next, the plated copper wire was washed with water, dried, coated with rosin flux, and subjected to reflow treatment. In reflow, power is supplied to a copper wire passed between a pair of power supply rolls, the tin or tin-lead alloy plating layer is melted by resistance heating, and then drawn into a water tank installed directly below the lower power supply roll, and then melted. The tightening layer was solidified.

また、比較の為、厚い鋼中間めっきを施した場合(比較
例1〜2)、鋼中間めっきを施さなかった場合(比較例
3〜5)についても、比較例5を除き、同様にリフロー
処理を行った。
In addition, for comparison, the reflow treatment was also performed in the cases where thick steel intermediate plating was applied (Comparative Examples 1 to 2) and the cases where steel intermediate plating was not applied (Comparative Examples 3 to 5), except for Comparative Example 5. I did it.

リード線の各性質を次の様にして測定または評価した。Each property of the lead wire was measured or evaluated as follows.

偏肉率 1断面のめつき厚さ分布を断面顕微鏡で測定し、最大め
つき厚−最小めっき厚 で算出した。
The plating thickness distribution of a cross section with a thickness unevenness rate of 1 was measured using a cross-sectional microscope, and calculated as the maximum plating thickness - the minimum plating thickness.

耐変色性 リフロー処理した銅線5〜を紙容器に収納し、恒温恒湿
槽中で、60℃×90%×12時間+40°C×60%
×12時間のサイクルを15サイクル行った後、外観観
察した。
Store the copper wires 5~ that have undergone colorfast reflow treatment in a paper container and heat them in a constant temperature and humidity chamber at 60°C x 90% x 12 hours + 40°C x 60%.
After 15 cycles of 12 hours, the appearance was observed.

リフロー処理した銅線を180℃で4時間加熱シ、銅線
にロジンフラックスをつけ、ソルダーグラフ(商標、用
材製作所製)により90°濡れ時間を測定した。
The reflow-treated copper wire was heated at 180° C. for 4 hours, rosin flux was applied to the copper wire, and the 90° wetting time was measured using Solder Graph (trademark, manufactured by Yizai Seisakusho).

カス発生 抵抗器キャップ溶接機を用い、チャック部でのはんだカ
ス発生が原因で溶接機が自動停止するまでの時間を測定
し、カス発生の尺度とした。
Using a scum-generating resistor cap welding machine, we measured the time until the welding machine automatically stopped due to the generation of solder scum in the chuck, and used this as a measure of scum generation.

結果を第1表に示す。The results are shown in Table 1.

実施例9〜12および比較例6〜9 0.5φの鉄線に実施例1と同様にめっきおよびリフロ
ー処理を施した。
Examples 9 to 12 and Comparative Examples 6 to 9 A 0.5φ iron wire was subjected to plating and reflow treatment in the same manner as in Example 1.

処理した鉄線について、塩水噴霧試験(JISZ 23
71に準拠)を72時間行った。
The treated iron wire was subjected to salt spray test (JISZ 23
71) for 72 hours.

結果を第2表に示す。The results are shown in Table 2.

第2表 23Table 2 23

Claims (1)

【特許請求の範囲】 1、錫または錫−鉛合金から成る第1層、銅または銅合
金から成る第2層および錫または錫−鉛合金から成る第
3層を金属線外周上に有して成り、リフロー処理された
ことを特徴とする電子部品用リード線。 2、金属線が、銅または銅合金線、銅被覆鋼線、鋼線も
しくは鉄線である特許請求の範囲第1項記載の電子部品
用リード線。 3、第1層の厚さが3〜15μである特許請求の範囲第
1項記載の電子部品用リード線。 4、第2層の厚さが0.05〜0,5μである特許請求
の範囲第1項記載の電子部品用リード線。 5、第3層の厚さが0.5〜2μである特許請求の範囲
第1項記載の電子部品用リード線。 6、金属線の外周に、錫または錫−鉛合金を電気めっき
して第1層を形成し、第1層の上に銅または銅合金をめ
っきして第2層を形成し、さらに第2層の上に錫または
錫−鉛合金を電気めっきして第3層を形成し、次いでリ
フロー処理を施すことを特徴とする電子部品用リード線
の製造方法。
[Claims] 1. A metal wire having a first layer made of tin or a tin-lead alloy, a second layer made of copper or a copper alloy, and a third layer made of tin or a tin-lead alloy on the outer periphery of the metal wire. A lead wire for electronic components, which is characterized by being made of aluminum and subjected to reflow treatment. 2. The lead wire for electronic components according to claim 1, wherein the metal wire is a copper or copper alloy wire, a copper-coated steel wire, a steel wire, or an iron wire. 3. The lead wire for electronic components according to claim 1, wherein the first layer has a thickness of 3 to 15 μm. 4. The lead wire for electronic components according to claim 1, wherein the second layer has a thickness of 0.05 to 0.5 μm. 5. The lead wire for electronic components according to claim 1, wherein the third layer has a thickness of 0.5 to 2 μm. 6. Electroplating tin or a tin-lead alloy on the outer periphery of the metal wire to form a first layer, plating copper or a copper alloy on the first layer to form a second layer, and further forming a second layer. A method for manufacturing a lead wire for electronic components, comprising forming a third layer by electroplating tin or a tin-lead alloy on the layer, and then performing a reflow treatment.
JP10848383A 1983-06-15 1983-06-15 Lead wire for electronic part and method of producing same Pending JPS606A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10848383A JPS606A (en) 1983-06-15 1983-06-15 Lead wire for electronic part and method of producing same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10848383A JPS606A (en) 1983-06-15 1983-06-15 Lead wire for electronic part and method of producing same

Publications (1)

Publication Number Publication Date
JPS606A true JPS606A (en) 1985-01-05

Family

ID=14485899

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10848383A Pending JPS606A (en) 1983-06-15 1983-06-15 Lead wire for electronic part and method of producing same

Country Status (1)

Country Link
JP (1) JPS606A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2295247A1 (en) 2003-07-07 2011-03-16 Fujifilm Corporation Lithographic printing plate precursor and lithographic printing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2295247A1 (en) 2003-07-07 2011-03-16 Fujifilm Corporation Lithographic printing plate precursor and lithographic printing method

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