JPS6074249A - Ion beam apparatus - Google Patents

Abstract

PURPOSE:To simplify an ion beam apparatus, by providing Wien filters for filtering desired ions from a plurality kinds of ion beams generated by an ion source, in two stages, and interposing beam blanking electrodes therebetween. CONSTITUTION:Under a convergent lens 4 of an ion beam apparatus using an EHD type ion source are disposed Wien filters 21, 22 for ion filtration in two stages, and beam blanking electrodes 19' are interposed therebetween. A power source 16 for the convergent lens is controlled by a control unit 15 so that the ion beam forms its crossover image C1 right in the middle of the filters 21 and 22 and then converges on a material 12 after passing through a slit 10. Thus, it has been made possible to make beam blanking at the crossover point of the beam without the need for other convergent lens, alignment electrodes, or the like, and to simplify the apparatus.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an Iζ ion system with a simplified structure.

FIG. 1 shows, for example, [Hf)(ELECTPO1-IY-D
R○ I) Abbreviation of YNAMIC3) ■ (Ion lIB;
! Schematic diagram of an ion beam device using an ion beam device using an ion beam device (, 1 is an L emitter (, 2 (, 11° source for heating in L), from which the ion beam 11 is released; 3 is a] extractor (1-' ,
X 'I'' R△CI-E R) , /l is a focusing lens C to focus the
-(, Said X [Ustnocta 3 and the same) J sword has a
A small hole has been made to pass through Mbino\. (3,7
The drawer main 1 for drawing out the ions 1-1\ is applied between the soil mitter 1 and the extractor 3, and the puller ↑15 source is used to accelerate the extracted ion beam l\. The accelerating power source (1 and 1 of the focusing lens 4) for applying a medium voltage between the emitter 1 and the cathode S5 includes two electrostatic deflection plates and two magnetic poles. A Wien-type filter 8 consisting of a plate is arranged (as indicated by the broken line (formed in the X-axis direction in the small region)) and the electric field and Yqη
The strength of the magnetic field formed in the 11 directions is varied by the output of the filter power supply 5). 104 Yo Surin 1-(・, cut the ion beam dispersed by the Noirta 8
It is for the purpose of The rA beam that has passed through the Surins 1 is focused onto a material 12 by an objective lens 11. 13 is a deflection electrode for position control; J and A are used to adjust the output of the deflection power source 14 applied to the electrode;
It is possible to control the shock [~(i'/iI-) of Nheel\\.

A converging lens power source 16 which is activated by a command from a control device 15 enters the device and emits an ion beam I containing a plurality of types of ions with different mass numbers from an upper emitter 1. ) and roll the output of C above,
The ion beam reaches the center of the filter E3 (-1) and covers it so as to form a bar image C1. (See Japanese Patent Application No. 57-186919 for the reason for this formation.) The filter is operated by the output of the filter power supply 9, which is activated in response to a command from the control device 15, so as to avoid only predetermined ions (Φ) from traveling straight. In response to the command of the control device 15, the output of the objective lens power supply 17 is applied to the output of the objective lens power source 17. 1
By rotating it, it focuses on phase 121-. At the same time, the position of the ion beam is controlled by the position control electrode 11.

C, lift the ion beam to +A (especially maskless ion 4J included 'k'?'+ <j・)
1 to 1 of time) -1 - Noro, 1
, the heap 1 path 1 (, -beam/'/nging electric 1 is distributed, and the 0th row is executed by the controller 14j. That is, the shot 1- from the controller i"i 'I is Shima I ^
Bows and non-bows are fixed at the same time (in the evening during the winter time)
A pulse wave r'i is supplied to the blanking electrode from a pulsed light source which generates a pulse signal that equals the width of the Ill portion and the width of the valley portion of the blanking electrode.
(Shoku[to time second] point 1-1-le <'i <:
I'Jiη, the pulse (l-, "'I LL general (, two stands)" - the pulse that is supplied to the flanging electrode (I'Jiη), (, rA Anheal
\Nori []] S A - C point C nonon - 1 Nk 4? 11 oscillates, and at a predetermined point, the beam is shunted to 1.
-1: If there is no iτl, but the iI
5 (+, 1, filter 330) 1+ It is difficult to arrange the beam blanking electrode in the shield part.
Even if it were possible to arrange it, the electric field and magnetic field of the filter would be disturbed, and it would be impossible to perform Blx blanking within the filter. 2 There, C1 As shown in Figure '1 above, below the filter 8), a new converging lens 18 is installed to form a crossover image C2 of the crossover image C1 formed at the center of the r filter. The beam flanking electrode 19 is rearranged at the crossover image C2, and the pulse generator 20 is connected to the electrode.
The new focusing lens is supplied with a pulse signal (not shown, but the power supply for the lens).
In addition, a phase electrode is also required for alignment 1 due to the high JI voltage.
As a result, the size of the equipment has increased by 11 times and by 1 time.

The present invention is aimed at solving such problems.

The present invention relates to an ion source that generates multiple types of ion beams with different mass numbers, and an ion beam generated from the ion source.
＼ includes a Wien filter that selects desired types of ions, an objective lens that avoids concentrating the ion beam that has passed through the sleeve 1- of the Wien filter onto the shrine II-; At point 11, 'i Itl is applied to a device consisting of one stage of deflection 1' for focusing at the position 'li.
The Wien type filter is arranged in two stages facing the heath and the bottom, and a ranking electrode is placed between the two stages of filters, and approximately at the center of the Wien filter. We provide a new 41-ion beam device equipped with a focusing lens for forming an ion source beam image.
3. Figure 2 [, ↓ An embodiment of the present invention is shown in Figure 1 of the Figures. 41.i component search.In this device, in d3, the same Vienna 4t1! filter 2'1.22 is spaced apart from the 1.
'(3 J, 1 non-) in the gap.
1 ng electric 14119- is placed! ':,! 13
In the figure, 20- is from the control device @15 to the first command signal FJ (pulse generator that emits a pulse signal/J7 device C''); 11 - There is a filter power source C. Fig. 3 shows the two-stage filter 21 (two plates L, I, L, electric deflection plates to 21, 21D, two magnetic plates (i plate to 21N, 21S) Tori-ru)
, 22 (two electrostatic deflection plates are 22△, 22D, two 1
, 11 electrode plates 22N, 22S) and the arrangement of the blanking electrode 19'.

In such a device, the control device 15 is injected into the cross A-bar (I) in the middle of the filters 21 and 22.
Focusing lens power supply 1 (3 to 21 to 1) to the river forming C+
To [1-luli-ru. Therefore, C1 is substantially at the center of the Wien filter, and 4T
Su, special gear It! -i 57-186919) In the two-stage filter, the Ihenbees are affected by the respective electromagnetic fields, and as a result, either the one that goes straight or the one that passes through the slit 10. passing through the objective lens 11
It is focused on one or two (materials) 112. Now, this O
N, control head 15 sends a signal to pulse generator 20- specifying times corresponding to predetermined shot 11 times and non-shock 1-times. Therefore, I is emitted from the emitter 1.
Koheem (ma-f run=X ngden 44i 'I 9'
-, the time heath \ corresponding to the time S j is deflected to the non-shot 1 at the top and N, and is directed to the slit C cup 1 (S J1,
(1) During this time, Beano ＼ was unbiased; (1) C', during which the beam is irradiated onto the material.
Install high-voltage power supply and alignment 1 to electric tllj ()
By placing the V sink 1 link 7i; The river (J
Is it possible to do something?

[Brief explanation of the drawing]

Fig. 1 shows the conventional ion engine with
Figure a'12 is an embodiment of the present invention' (schematic diagram of a small ion system device, Figure 3 shows a part of A with a - (V)).1. : Focusing lens 9': Filter power supply 10: To slot I 11: Objective lens 12: Filter 13: Deflection electrode for position control 15: Control device 16: Focusing lens power supply 17; Objective lens power supply 19' Second ranking electrode 20' :Pulse generator 21: 22:Vienna type filter C1, C2:Cross stabber image 1Si Tomari Applicant I"Representative of this electronic stock meeting 1111 bodies -Person

Claims (1)

[Claims] An ion source that generates ion beams of 1Φ class on the side with different mass numbers, a Wien filter that selects desired types of ions from the ion beam generated from the ion source, and a Wien filter that passes through the Surin [-] of the Wien filter. In the apparatus, the Wien type filter is arranged in two stages in the beam axis direction. A beam blanking electrode is placed between the two filters, and a focusing lens is placed approximately at the center of the blanking pole to form a crossover image of the ion source. Beam device.