JPS61110140A - マスクリペア装置 - Google Patents

マスクリペア装置

Info

Publication number
JPS61110140A
JPS61110140A JP59232853A JP23285384A JPS61110140A JP S61110140 A JPS61110140 A JP S61110140A JP 59232853 A JP59232853 A JP 59232853A JP 23285384 A JP23285384 A JP 23285384A JP S61110140 A JPS61110140 A JP S61110140A
Authority
JP
Japan
Prior art keywords
compound vapor
nozzle
sample
compound
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59232853A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6319857B2 (it
Inventor
Mitsuyoshi Sato
佐藤　光義
Takashi Minafuji
孝 皆藤
Yoshitomo Nakagawa
良知 中川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments and Electronics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments and Electronics Ltd filed Critical Seiko Instruments and Electronics Ltd
Priority to JP59232853A priority Critical patent/JPS61110140A/ja
Priority to DE8585903053T priority patent/DE3579236D1/de
Priority to EP85903053A priority patent/EP0221184B1/en
Priority to PCT/JP1985/000349 priority patent/WO1986000426A1/ja
Publication of JPS61110140A publication Critical patent/JPS61110140A/ja
Publication of JPS6319857B2 publication Critical patent/JPS6319857B2/ja
Priority to US07/227,469 priority patent/US4930439A/en
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP59232853A 1984-06-26 1984-11-05 マスクリペア装置 Granted JPS61110140A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP59232853A JPS61110140A (ja) 1984-11-05 1984-11-05 マスクリペア装置
DE8585903053T DE3579236D1 (de) 1984-06-26 1985-06-21 Reparatur von masken.
EP85903053A EP0221184B1 (en) 1984-06-26 1985-06-21 Mask repairing apparatus
PCT/JP1985/000349 WO1986000426A1 (fr) 1984-06-26 1985-06-21 Dispositif de reparation de masques
US07/227,469 US4930439A (en) 1984-06-26 1988-08-02 Mask-repairing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59232853A JPS61110140A (ja) 1984-11-05 1984-11-05 マスクリペア装置

Publications (2)

Publication Number Publication Date
JPS61110140A true JPS61110140A (ja) 1986-05-28
JPS6319857B2 JPS6319857B2 (it) 1988-04-25

Family

ID=16945838

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59232853A Granted JPS61110140A (ja) 1984-06-26 1984-11-05 マスクリペア装置

Country Status (1)

Country Link
JP (1) JPS61110140A (it)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01150139A (ja) * 1987-11-09 1989-06-13 American Teleph & Telegr Co <Att> デバイスのマスク修正プロセスとマスク
US5591970A (en) * 1994-09-17 1997-01-07 Kabushiki Kaisha Toshiba Charged beam apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6320221U (it) * 1986-07-24 1988-02-10

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01150139A (ja) * 1987-11-09 1989-06-13 American Teleph & Telegr Co <Att> デバイスのマスク修正プロセスとマスク
US5591970A (en) * 1994-09-17 1997-01-07 Kabushiki Kaisha Toshiba Charged beam apparatus

Also Published As

Publication number Publication date
JPS6319857B2 (it) 1988-04-25

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