JPS61111535A - Ｘ線露光方法 - Google Patents

Ｘ線露光方法

Info

Publication number
JPS61111535A
JPS61111535A JP60215085A JP21508585A JPS61111535A JP S61111535 A JPS61111535 A JP S61111535A JP 60215085 A JP60215085 A JP 60215085A JP 21508585 A JP21508585 A JP 21508585A JP S61111535 A JPS61111535 A JP S61111535A
Authority
JP
Japan
Prior art keywords
mask
wafer
rays
exposure method
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60215085A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62572B2 (2
Inventor
Seiichi Iwamatsu
誠一 岩松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP60215085A priority Critical patent/JPS61111535A/ja
Publication of JPS61111535A publication Critical patent/JPS61111535A/ja
Publication of JPS62572B2 publication Critical patent/JPS62572B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60215085A 1985-09-30 1985-09-30 Ｘ線露光方法 Granted JPS61111535A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60215085A JPS61111535A (ja) 1985-09-30 1985-09-30 Ｘ線露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60215085A JPS61111535A (ja) 1985-09-30 1985-09-30 Ｘ線露光方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP1977079A Division JPS55113330A (en) 1979-02-23 1979-02-23 X-ray exposure system and device

Publications (2)

Publication Number Publication Date
JPS61111535A true JPS61111535A (ja) 1986-05-29
JPS62572B2 JPS62572B2 (2) 1987-01-08

Family

ID=16666500

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60215085A Granted JPS61111535A (ja) 1985-09-30 1985-09-30 Ｘ線露光方法

Country Status (1)

Country Link
JP (1) JPS61111535A (2)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5057656A (2) * 1973-09-17 1975-05-20
JPS5057778A (2) * 1973-09-17 1975-05-20

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5057656A (2) * 1973-09-17 1975-05-20
JPS5057778A (2) * 1973-09-17 1975-05-20

Also Published As

Publication number Publication date
JPS62572B2 (2) 1987-01-08

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