JPS6111222Y2 - - Google Patents
Info
- Publication number
- JPS6111222Y2 JPS6111222Y2 JP18165980U JP18165980U JPS6111222Y2 JP S6111222 Y2 JPS6111222 Y2 JP S6111222Y2 JP 18165980 U JP18165980 U JP 18165980U JP 18165980 U JP18165980 U JP 18165980U JP S6111222 Y2 JPS6111222 Y2 JP S6111222Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- base plate
- mask
- center
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 52
- 238000007740 vapor deposition Methods 0.000 claims description 12
- 239000010409 thin film Substances 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18165980U JPS6111222Y2 (2) | 1980-12-19 | 1980-12-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18165980U JPS6111222Y2 (2) | 1980-12-19 | 1980-12-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57106758U JPS57106758U (2) | 1982-07-01 |
| JPS6111222Y2 true JPS6111222Y2 (2) | 1986-04-09 |
Family
ID=29979331
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18165980U Expired JPS6111222Y2 (2) | 1980-12-19 | 1980-12-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6111222Y2 (2) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1998366B1 (en) * | 2007-04-27 | 2010-05-26 | Applied Materials, Inc. | Substrate processing device and method of placing a substrate |
| JP2010196126A (ja) | 2009-02-26 | 2010-09-09 | Canon Inc | 真空蒸着装置の重石板およびそれを用いた真空蒸着装置 |
| JP5950164B2 (ja) * | 2012-10-03 | 2016-07-13 | 日新イオン機器株式会社 | 基板ホルダ |
| US20210010128A1 (en) * | 2018-03-29 | 2021-01-14 | Oerlikon Surface Solutions Ag, Pfäffikon | Device and method for selective vapor coating of a substrate |
-
1980
- 1980-12-19 JP JP18165980U patent/JPS6111222Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57106758U (2) | 1982-07-01 |
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