JPS61137373A - 半導体放射線検出器の製造方法 - Google Patents
半導体放射線検出器の製造方法Info
- Publication number
- JPS61137373A JPS61137373A JP59260157A JP26015784A JPS61137373A JP S61137373 A JPS61137373 A JP S61137373A JP 59260157 A JP59260157 A JP 59260157A JP 26015784 A JP26015784 A JP 26015784A JP S61137373 A JPS61137373 A JP S61137373A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- substrate
- single crystal
- electrode
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/29—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to radiation having very short wavelengths, e.g. X-rays, gamma-rays or corpuscular radiation
- H10F30/295—Surface barrier or shallow PN junction radiation detectors, e.g. surface barrier alpha-particle detectors
Landscapes
- Light Receiving Elements (AREA)
- Measurement Of Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59260157A JPS61137373A (ja) | 1984-12-10 | 1984-12-10 | 半導体放射線検出器の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59260157A JPS61137373A (ja) | 1984-12-10 | 1984-12-10 | 半導体放射線検出器の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61137373A true JPS61137373A (ja) | 1986-06-25 |
| JPH0543196B2 JPH0543196B2 (fr) | 1993-06-30 |
Family
ID=17344105
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59260157A Granted JPS61137373A (ja) | 1984-12-10 | 1984-12-10 | 半導体放射線検出器の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61137373A (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100435295B1 (ko) * | 2001-04-12 | 2004-06-10 | 가부시키가이샤 시마쓰세사쿠쇼 | 방사선 검출장치 |
-
1984
- 1984-12-10 JP JP59260157A patent/JPS61137373A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100435295B1 (ko) * | 2001-04-12 | 2004-06-10 | 가부시키가이샤 시마쓰세사쿠쇼 | 방사선 검출장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0543196B2 (fr) | 1993-06-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4196438A (en) | Article and device having an amorphous silicon containing a halogen and method of fabrication | |
| US4317844A (en) | Semiconductor device having a body of amorphous silicon and method of making the same | |
| US4109271A (en) | Amorphous silicon-amorphous silicon carbide photovoltaic device | |
| CA1113594A (fr) | Cellule solaire en silicium amorphe avec barriere de schottky et couche mince dopee, adjacente a la barriere metallique de schottky | |
| US4142195A (en) | Schottky barrier semiconductor device and method of making same | |
| US4064521A (en) | Semiconductor device having a body of amorphous silicon | |
| US4117506A (en) | Amorphous silicon photovoltaic device having an insulating layer | |
| US7858427B2 (en) | Crystalline silicon solar cells on low purity substrate | |
| CN101632180A (zh) | 混合硅太阳电池及其制造方法 | |
| US4543171A (en) | Method for eliminating defects in a photodetector | |
| GB1572846A (en) | Schottky barrier semiconductor device and method of making same | |
| US4595791A (en) | Thin-film photovoltaic devices incorporating current collector grid and method of making | |
| US4415760A (en) | Amorphous silicon solar cells incorporating an insulating layer in the body of amorphous silicon and a method of suppressing the back diffusion of holes into an N-type region | |
| JP3193287B2 (ja) | 太陽電池 | |
| JP2661676B2 (ja) | 太陽電池 | |
| TW201349526A (zh) | 太陽能電池及其製造方法 | |
| CN114744050A (zh) | 太阳能电池及光伏组件 | |
| JP3346907B2 (ja) | 太陽電池及びその製造方法 | |
| JPH08236799A (ja) | 半導体放射線検出素子および整流素子 | |
| JPH07297428A (ja) | 薄膜太陽電池とその製造方法 | |
| JPH0543196B2 (fr) | ||
| JP3197673B2 (ja) | 光起電力装置 | |
| JPH04290274A (ja) | 光電変換装置 | |
| JP3036258B2 (ja) | 半導体放射線検出器 | |
| JPH0447991B2 (fr) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |