JPS61139932A - Production of magnetic recording medium - Google Patents
Production of magnetic recording mediumInfo
- Publication number
- JPS61139932A JPS61139932A JP26243284A JP26243284A JPS61139932A JP S61139932 A JPS61139932 A JP S61139932A JP 26243284 A JP26243284 A JP 26243284A JP 26243284 A JP26243284 A JP 26243284A JP S61139932 A JPS61139932 A JP S61139932A
- Authority
- JP
- Japan
- Prior art keywords
- plastic substrate
- glass transition
- ferromagnetic material
- temp
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔技術分野および目的〕
この発明は、強磁性金属薄膜層を記録層とする磁気記録
媒体の製造方法に関し、その目的とするところは強磁性
金属薄膜層形成時に発生するしわを抑制して、しわのな
い前記の磁気記録媒体を製造する方法を提供することに
ある。[Detailed Description of the Invention] [Technical Field and Objectives] The present invention relates to a method for manufacturing a magnetic recording medium having a ferromagnetic metal thin film layer as a recording layer, and the object thereof is to prevent the formation of the ferromagnetic metal thin film layer from It is an object of the present invention to provide a method for manufacturing the above-mentioned wrinkle-free magnetic recording medium by suppressing wrinkles.
強磁性金属薄膜層を記録層とする磁気記録媒体は、通常
、ポリエステルフィルムなどのプラスチック基板を真空
槽内に取りつけた円筒状の冷却ドラムの周側面に沿って
移動させ、この基板に強磁性材を真空蒸着するなどして
つくられており、冷却ドラムは、通常一定の温度以下に
冷却したものが使用されている。Magnetic recording media with a ferromagnetic metal thin film layer as a recording layer are usually produced by moving a plastic substrate such as a polyester film along the circumferential side of a cylindrical cooling drum installed in a vacuum chamber, and applying a ferromagnetic material to the substrate. The cooling drum is usually cooled to a certain temperature or lower.
ところが、中心線平均粗さRaが0.01μm以下の表
面性の良いプラスチック基板を用いる場合、従来の一定
の温度以下に冷却した冷却ドラムを使用したのでは、プ
ラスチック基板の材質が異なる場合充分に対応すること
ができず、使用するプラスチック基板に対して冷却ドラ
ムの温度が高すぎる場合は、強磁性材蒸発源からの輻射
熱の作用を充分に抑制することができないため、プラス
チック基板が伸びてプラスチック基板にしわが生しる。However, when using a plastic substrate with a good surface quality with a center line average roughness Ra of 0.01 μm or less, using a conventional cooling drum cooled to a certain temperature or less may not be sufficient when the plastic substrate is made of different materials. If this is not possible and the temperature of the cooling drum is too high for the plastic substrate used, the effect of radiant heat from the ferromagnetic material evaporation source cannot be sufficiently suppressed, causing the plastic substrate to stretch and damage the plastic. Wrinkles appear on the board.
また使用するプラスチック基板に対して冷却ドラムの温
度が低すぎる場合は、プラスチック基板が硬化し、ロー
ル系の平行度のずれなどで生じる不均一な張力を緩和で
きず、プラスチック基板にしわが生じたりする。Additionally, if the temperature of the cooling drum is too low for the plastic substrate being used, the plastic substrate will harden and the uneven tension caused by misalignment of the roll system cannot be alleviated, causing wrinkles on the plastic substrate. .
この発明はかかる欠点を改善するため冷却ドラム等のプ
ラスチック基板を支持する支持体について種々検討を行
った結果、支持体の温度を、中心線平均粗さRaが0.
01μm以下でかつガラス転移温度が20℃〜100℃
の範囲内のプラスチック基板のガラス転移温度より50
℃〜90 ’C低い温度に調整し、この支持体に沿って
移動するプラスチック基板に強磁性材蒸発源から強磁性
材を差し向けて、真空蒸着を行うと、支持体に沿って移
動するプラスチック基板の蒸着時の温度が適度な温度に
調整され、しわの発生を良好に抑制できることを見いだ
してなされたもので、真空雰囲気内で、少なくとも片面
の中心線平均粗さRaが0.01μm以下でかつガラス
転移温度が20℃〜100℃の範囲内のプラスチック基
板を支持する支持体の温度を、プラスチック基板のガラ
ス転移温度より50℃〜90℃低い温度に8周整し、こ
の支持体に沿って移動するプラスチ・7り基板に強磁性
材蒸発源から強磁性材を差し向けて、強磁性金属薄膜層
を形成することを特徴とするものである。In order to improve this drawback, the present invention has conducted various studies on supports for supporting plastic substrates such as cooling drums, and as a result, the temperature of the support has been adjusted so that the center line average roughness Ra is 0.
01 μm or less and a glass transition temperature of 20°C to 100°C
50% higher than the glass transition temperature of the plastic substrate within the range of
When the temperature is adjusted to a low temperature of ~90'C and the ferromagnetic material is directed from the ferromagnetic material evaporation source to the plastic substrate moving along the support and vacuum evaporation is performed, the plastic moving along the support is evaporated. This method was developed based on the discovery that the generation of wrinkles can be effectively suppressed by adjusting the temperature during vapor deposition of the substrate to an appropriate temperature. The temperature of a support supporting a plastic substrate with a glass transition temperature within the range of 20°C to 100°C was adjusted for 8 cycles to a temperature 50°C to 90°C lower than the glass transition temperature of the plastic substrate, and the temperature was adjusted along this support. The method is characterized in that a ferromagnetic material is directed from a ferromagnetic material evaporation source onto a moving plastic substrate to form a ferromagnetic metal thin film layer.
以下、図面を参照しながらこの発明について説明する。The present invention will be described below with reference to the drawings.
第1図は真空蒸着装置の断面図を示したものであり、1
は真空槽でこの真空槽1の内部は排気系2により真空に
保持される。3は真空槽1の中央部に配設された冷却ド
ラムであり、ポリエステルフィルム等の中心線平均粗さ
Raが0.01μm以下でかつガラス転移温度が20℃
〜100°Cの範囲内のプラスチック基板4は原反ロー
ル5からこの冷却ドラム30周側面に添って移動され、
巻き取りロール6に巻き取られる。この間冷却ドラム3
の周側面に沿って移動するプラスチック基板4に対向し
て真空槽1の下部に配設された強磁性材蒸発源7で強磁
性材8が加熱蒸発され、この蒸気流がプラスチ・ツク基
板4に差し向けられて真空蒸着が行われる。Figure 1 shows a cross-sectional view of the vacuum evaporation apparatus,
is a vacuum chamber, and the inside of this vacuum chamber 1 is maintained in a vacuum by an exhaust system 2. 3 is a cooling drum disposed in the center of the vacuum chamber 1, and is made of a polyester film or the like having a center line average roughness Ra of 0.01 μm or less and a glass transition temperature of 20°C.
The plastic substrate 4 within the range of ~100°C is moved from the raw roll 5 along the circumferential side of this cooling drum 30,
It is wound up on a winding roll 6. During this time, cooling drum 3
A ferromagnetic material 8 is heated and evaporated in a ferromagnetic material evaporation source 7 disposed at the bottom of the vacuum chamber 1 facing the plastic substrate 4 moving along the circumferential side of the plastic substrate 4 . vacuum deposition is performed.
ここで、真空槽lの中央部に配設された冷却ドラム3は
、内部にヒータおよび冷媒循環パイプを内臓し一1加熱
もしくは冷却が行われて、冷却ドラム3の周側面に沿っ
て移動するプラスチック基板4の材質に合わせて、その
ガラス転移温度より50℃〜90℃低い温度に調整され
る。このように冷却ドラム3の温度は、プラスチック基
板4のガラス転移温度より50℃〜90°C低い温度で
あることが好ましく、プラスチック基板4のガラス転移
温度より50℃未満低い温度では、強磁性材蒸発源7か
らの輻射熱の作用を充分に抑制することができず、プラ
スチック基板が伸びてプラスチック基板にしわが生じ、
またプラスチック基板4のガラス転移温度より90℃以
上低い温度では、プラスチック基板が硬化し、不均一な
張力を緩和できずプラスチック基板にしわが生じる。従
って、冷却ドラム3の周側面を移動するプラスチック基
板4は、常にそのガラス転移温度より50℃〜90℃低
い適度な温度に調整され、温度が高くな・りすぎて伸び
たり、あるいは温度が低くなりすぎてプラスチック基板
が硬化することもな(、しわの発生が良好に抑制される
。なお、図面では冷却ドラム3をプラスチック基板4の
支持体とした例を示したが、プラスチック基板4の支持
体はこのような冷却ドラム3に限定されず、プラスチッ
ク基板4を支持でき、かつ温度をプラスチック基板4の
ガラス転移温度より50’C〜90℃低い温度に制御で
きるものであれば、いかなる形状あるいは材質のもので
あってもよい。Here, the cooling drum 3 disposed in the center of the vacuum chamber 1 has a built-in heater and a refrigerant circulation pipe, and is heated or cooled and moves along the circumferential side of the cooling drum 3. Depending on the material of the plastic substrate 4, the temperature is adjusted to be 50 to 90 degrees Celsius lower than its glass transition temperature. As described above, the temperature of the cooling drum 3 is preferably 50°C to 90°C lower than the glass transition temperature of the plastic substrate 4. The action of radiant heat from the evaporation source 7 cannot be sufficiently suppressed, and the plastic substrate stretches and wrinkles occur on the plastic substrate.
Further, at a temperature that is 90° C. or more lower than the glass transition temperature of the plastic substrate 4, the plastic substrate is hardened and uneven tension cannot be alleviated, causing wrinkles in the plastic substrate. Therefore, the plastic substrate 4 moving on the circumferential surface of the cooling drum 3 is always adjusted to an appropriate temperature that is 50 to 90 degrees Celsius lower than its glass transition temperature. This prevents the plastic substrate from becoming too hard (and the generation of wrinkles is well suppressed. In addition, although the drawing shows an example in which the cooling drum 3 is used as a support for the plastic substrate 4, The body is not limited to such a cooling drum 3, but may be of any shape or shape as long as it can support the plastic substrate 4 and control the temperature to 50'C to 90C lower than the glass transition temperature of the plastic substrate 4. It may be of any material.
プラスチック基板としては、ポリエステル、ポリ塩化ビ
ニル、ポリアミド等一般に使用されているもので、ガラ
ス転移温度が20°C〜100℃の範囲内のものがいず
れも好適に使用され、これらのプラスチック基板はいず
れもガラス転移温度より50℃〜90℃低い適度な温度
に調整され、しわの発生が充分に抑制される。As the plastic substrate, commonly used materials such as polyester, polyvinyl chloride, and polyamide are suitably used, and those with a glass transition temperature in the range of 20°C to 100°C are preferably used. The temperature is also adjusted to an appropriate temperature, which is 50°C to 90°C lower than the glass transition temperature, and the generation of wrinkles is sufficiently suppressed.
また、強磁性金属薄膜層の形成は、コバルト、ニッケル
、鉄などの金属単体の他、これらの合金あるいは酸化物
、及びCo−P、 Co−Ni −Pなど一般に使用さ
れる強磁性材を真空蒸着することによって形成される。In addition, to form a ferromagnetic metal thin film layer, commonly used ferromagnetic materials such as single metals such as cobalt, nickel, and iron, their alloys or oxides, and Co-P and Co-Ni-P are heated in a vacuum. It is formed by vapor deposition.
次に、この発明の実施例について説明する。 Next, embodiments of the invention will be described.
実施例1〜5
第1図に示す真空蒸着装置を使用し、強磁性材を蒸着す
る表面の中心線平均粗さRaが0.0040μm、厚さ
が10μmでガラス転移温度が70℃のポリエステルベ
ースフィルム4を、原反ロール5より冷却ドラム3の周
側面に沿って移動させ、巻き取りロール6に巻き取るよ
うにセットするとともに、強磁性材蒸発#7にコバルト
8をセットした。次いで排気系2で真空槽1内を約5X
10−5トールにまで真空排気し、強磁性材蒸発源7内
のコバルト8を加熱蒸発するとともにポリエステルベー
スフィルム4を50m/分の速度で走行させ、冷却ドラ
ム3の温度を下記第1表に示すように、20℃から一2
0℃までの範囲内で5段階に制御して真空蒸着を行い、
ポリエステルベースフィルム4上にコバルトからなる厚
さが1000人の強磁性金属薄膜層を形成した。しかる
後、所定の幅に裁断して磁気テープをつくった。Examples 1 to 5 A ferromagnetic material was deposited using the vacuum evaporation apparatus shown in Fig. 1 on a polyester base whose surface had a centerline average roughness Ra of 0.0040 μm, a thickness of 10 μm, and a glass transition temperature of 70°C. The film 4 was moved along the circumferential surface of the cooling drum 3 from the original fabric roll 5 and set to be wound up on the take-up roll 6, and cobalt 8 was set in the ferromagnetic material evaporator #7. Next, the inside of the vacuum chamber 1 is pumped approximately 5X using the exhaust system 2.
The vacuum was evacuated to 10-5 Torr, and the cobalt 8 in the ferromagnetic material evaporation source 7 was heated and evaporated, and the polyester base film 4 was run at a speed of 50 m/min, and the temperature of the cooling drum 3 was set as shown in Table 1 below. As shown, from 20℃ to -2
Vacuum deposition is performed in 5 stages at a temperature of up to 0°C.
A ferromagnetic metal thin film layer made of cobalt and having a thickness of 1000 nm was formed on the polyester base film 4. After that, it was cut to a predetermined width to make magnetic tape.
比較例1〜5
実施例1〜5において、冷却ドラム3の温度を、下記第
1表に示すように、30℃以上の温度および一30℃以
下の温度の範囲内で5段階に分けて制御した以外は、実
施例1〜5と同様にして磁気テープをつくった。Comparative Examples 1 to 5 In Examples 1 to 5, the temperature of the cooling drum 3 was controlled in five stages within the range of 30°C or higher and -30°C or lower, as shown in Table 1 below. Magnetic tapes were produced in the same manner as in Examples 1 to 5, except for the following.
各実施例および各比較例で得られた磁気テープについて
、しわの発生の有無を観察した。The magnetic tapes obtained in each Example and each Comparative Example were observed for the presence or absence of wrinkles.
下記第1表はその結果である。Table 1 below shows the results.
第1表
〔発明の効果〕
上記第1表から明らかなように、冷却ドラムの温度をポ
リエステルベースフィルムのガラス転移温度70℃より
50℃〜90℃低い温度に制御して得られた磁気テープ
(実施例1〜5)はいずれもしわの発生が認められない
が、この範囲より冷却ドラムの温度を高くしたもの(比
較例1〜3)および低くしたもの(比較例4および5)
はしわの発生が認められ、このことからこの発明の製造
方法によれば、しわの発生が効果的に抑制され、しわの
ない磁気記録媒体が得られるのがわかる。Table 1 [Effects of the Invention] As is clear from Table 1 above, the magnetic tape ( No wrinkles were observed in any of Examples 1 to 5), but those in which the temperature of the cooling drum was higher than this range (Comparative Examples 1 to 3) and those in which it was lower (Comparative Examples 4 and 5)
The occurrence of wrinkles was observed, which indicates that according to the manufacturing method of the present invention, the generation of wrinkles can be effectively suppressed and a wrinkle-free magnetic recording medium can be obtained.
第1図はこの発明の製造方法を実施するために使用する
真空蒸着装置の1例を示す概略断面図である。FIG. 1 is a schematic cross-sectional view showing one example of a vacuum evaporation apparatus used to carry out the manufacturing method of the present invention.
Claims (1)
平均粗さRaが0.01μm以下でかつガラス転移温度
が20℃〜100℃の範囲内のプラスチック基板を強磁
性材蒸着時に支持する支持体の温度を、前記のプラスチ
ック基板のガラス転移温度より50℃〜90℃低い温度
範囲に調整し、この支持体に沿って移動するプラスチッ
ク基板に強磁性材蒸発源から強磁性材の蒸気流を差し向
けて、強磁性金属薄膜層を形成することを特徴とする磁
気記録媒体の製造方法1. A support that supports a plastic substrate running in a vacuum atmosphere and having a centerline average roughness Ra of at least one side of 0.01 μm or less and a glass transition temperature within the range of 20°C to 100°C during ferromagnetic material deposition. The temperature of the plastic substrate is adjusted to a temperature range of 50° C. to 90° C. lower than the glass transition temperature of the plastic substrate, and a vapor flow of the ferromagnetic material is directed from a ferromagnetic material evaporation source to the plastic substrate moving along the support. A method for producing a magnetic recording medium characterized by forming a ferromagnetic metal thin film layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26243284A JPS61139932A (en) | 1984-12-12 | 1984-12-12 | Production of magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26243284A JPS61139932A (en) | 1984-12-12 | 1984-12-12 | Production of magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61139932A true JPS61139932A (en) | 1986-06-27 |
Family
ID=17375702
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26243284A Pending JPS61139932A (en) | 1984-12-12 | 1984-12-12 | Production of magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61139932A (en) |
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-
1984
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