JPS61171192A - Formation of conductive circuit - Google Patents
Formation of conductive circuitInfo
- Publication number
- JPS61171192A JPS61171192A JP1148885A JP1148885A JPS61171192A JP S61171192 A JPS61171192 A JP S61171192A JP 1148885 A JP1148885 A JP 1148885A JP 1148885 A JP1148885 A JP 1148885A JP S61171192 A JPS61171192 A JP S61171192A
- Authority
- JP
- Japan
- Prior art keywords
- powder
- plating
- paste
- conductive circuit
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- Manufacturing Of Printed Wiring (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔利用分野〕
本発明は、導電回路の形成方法に係り、基体上に電気を
導通し几り、部品を塔載しfcり、又、導体間の接続を
し九りする回路、電極部、端末部(以下回路と略称する
)の形成方法に関するものである。[Detailed Description of the Invention] [Field of Application] The present invention relates to a method for forming a conductive circuit, which includes conducting electricity on a substrate, mounting components on a substrate, and making connections between conductors. The present invention relates to a method for forming a circuit, an electrode portion, and a terminal portion (hereinafter abbreviated as a circuit).
レジンやセラミックス等からなる絶縁性基体上に導電回
路を形成することは、プリント回路基板、電子部品等に
広く要求される。化学メッキや、蒸着等のPVD法、半
田等の鑞付は法等が行なわれる。BACKGROUND OF THE INVENTION Forming a conductive circuit on an insulating substrate made of resin, ceramics, or the like is widely required for printed circuit boards, electronic components, and the like. Chemical plating, PVD methods such as vapor deposition, and brazing methods such as soldering are performed.
最も普及している化学メッキ法では、 Pd等により触
媒化された表面にX=、 CU等を還元析出させている
、これらの方法はPdを充分に付着する友め、特殊なエ
ツチングにより表面を粗化・活性化して、Sn+1等で
増感する等の工夫が必要である。In the most popular chemical plating method, X=, CU, etc. are reduced and precipitated on a surface catalyzed by Pd, etc. These methods allow sufficient Pd to adhere, and the surface is etched by special etching. It is necessary to take measures such as roughening, activating, and sensitizing with Sn+1 or the like.
レジンのエツチングには強酸やクロム酸等の強酸化剤が
必要であり、又、セラミックスにはフッ酸等が必要であ
り、これらの方法は工程が煩雑であると同時に、安全・
公害対策上多大の負担となる。Etching of resin requires a strong oxidizing agent such as strong acid or chromic acid, and hydrofluoric acid is required for ceramics. These methods are complicated, and at the same time are not safe or
This poses a huge burden on pollution control measures.
しかし、これらの方法によつくも、一般基体上に、充分
な強度のメッキ層を得ることが困難な場合が多いO
この友めプリント回路基板等では、基体レジン中に予め
Pa粉を混合したものからなる特殊基板を用い友り、P
a粉を含有する特殊なゴム系接着剤を全面に塗布するな
どの方法が採られていた。However, even with these methods, it is often difficult to obtain a plating layer of sufficient strength on a general substrate. Using a special board consisting of
Methods such as applying a special rubber adhesive containing A powder to the entire surface were used.
しかし、これらの方策は高価なPdを多量に消費するば
かりでなく、全面に化学メッキが起こるので、メッキ後
、レジスト・エツチングにより所望のパターンに修正せ
ねばならない。However, these measures not only consume a large amount of expensive Pd, but also cause chemical plating to occur over the entire surface, so that after plating, the desired pattern must be modified by resist etching.
(解決すべき問題点〕
多くの電子・電気用途で、所望のパターンに導体回路を
直接形成すること、すなわち、前記の従来の多段な煩雑
な工程を回避することが強く求められている。そして形
成される回路は基体上に強固・に固着しており、充分な
導電性を有し、かつ多くの場合半田付けやワイヤーポン
ド等の部品接続特性の不可欠の場合が多い。又これらの
回路は短時間に経済的に形成できることが条件である。(Problems to be Solved) In many electronic and electrical applications, there is a strong demand to directly form conductor circuits in desired patterns, that is, to avoid the conventional multi-stage and complicated process described above. The circuits formed are firmly attached to the substrate, have sufficient electrical conductivity, and are often indispensable for component connection characteristics such as soldering and wire bonding.Also, these circuits are The condition is that it can be formed economically in a short period of time.
本発明は、このような従来の問題点を解消し、比較的簡
単に、強固に固着され、充分な導電性を確保し、さらに
部品の接続性の良い回路が得られる導電回路の形成方法
を提供しようとするものである。The present invention solves these conventional problems, and provides a method for forming a conductive circuit that is relatively simple, can be firmly fixed, has sufficient conductivity, and can provide a circuit with good connectivity between components. This is what we are trying to provide.
本発1!I11は、Ou又はCU合金粉と、Pd又はP
d合金粉とを粘稠媒体中に混和して成る導電性ペースト
を、絶縁性基体表面上に所望のパターンに付着固化せし
めてから、その表層に化学メッキにより連続した金属層
を形成せしめることを特徴とする。Main departure 1! I11 is Ou or CU alloy powder and Pd or P
A conductive paste made by mixing D alloy powder in a viscous medium is adhered and solidified in a desired pattern on the surface of an insulating substrate, and then a continuous metal layer is formed on the surface layer by chemical plating. Features.
前記本発明方法で用いる導電性ペーストとしてはPd量
が金属粉総量に対し5〜50重量%としたものが595
未満では触媒能が薄く、また50%:越え&ると、触媒
能の増大がなく不経済であるばかりでなく導電率の低下
を引起こすなどの理由から好ましいものであり、ま几金
属粉とレジン結合剤との配合割合が金属粉が60−未満
のものでは電 J導率が低いばかりでなく、化学メッキ
により連続メッキ層を安定して得難いメッキ層の接合力
を低下する。一方95%を越えるものではペースト部の
強度低下、粘度増大からスクリーン印刷性が不適となる
のに対して6 G、95重量嘩の金属粉を含むレジン性
ペーストではこのような事がないなどの理由から特に好
ましい。The conductive paste used in the method of the present invention has a Pd content of 5 to 50% by weight based on the total amount of metal powder.
If it is less than 50%, the catalytic ability will be weak, and if it exceeds 50%, the catalytic ability will not increase and it will not only be uneconomical but also cause a decrease in conductivity, which is preferable. If the blending ratio of the metal powder with the resin binder is less than 60%, not only the electric J conductivity is low, but also the bonding strength of the plating layer, which is difficult to stably obtain a continuous plating layer by chemical plating, is reduced. On the other hand, if it exceeds 95%, the strength of the paste part decreases and the viscosity increases, making screen printability unsuitable, whereas resinous pastes containing metal powder of 6G or 95% do not have this problem. Particularly preferred for these reasons.
本発明における用いる導電性ペースト中の前記Cu粉と
しては、純Ouのほか、0u−Ay (3u−an。As the Cu powder in the conductive paste used in the present invention, in addition to pure Ou, Ou-Ay (3u-an) is used.
cu−MtQu−Ti等の合金類をも包さするものであ
り、これらの金属粉は電解法、アトマイズ法、化学沈澱
法等で製造される。又、Pa粉としては、純Pd (Q
ほか、Pd−Ni、 Pd−Co、 Pa−0u、 P
(1−ムU。It also envelops alloys such as cu-MtQu-Ti, and these metal powders are manufactured by electrolysis, atomization, chemical precipitation, etc. In addition, as Pa powder, pure Pd (Q
In addition, Pd-Ni, Pd-Co, Pa-0u, P
(1-mu U.
Pd−ム、 Pd−Pt等の合金類をも包含するもの
であり、これらの金属粉も同様にして製造される。しか
して、これらの金属粉の粒径はQ、l −20μの範囲
又はこれ以下のものがスクリーン印刷により正確な回路
が得られる点から好ましいものである。It also includes alloys such as Pd-me and Pd-Pt, and these metal powders are also produced in the same manner. Therefore, it is preferable that the particle size of these metal powders be in the range of Q,l-20μ or less, since accurate circuits can be obtained by screen printing.
1次配合される金属粉の総量の5〜50重童饅をPdと
することが適度の触媒能が得られ、しかも4を率の低下
を引起さないなどの理由から望ましいものである。It is desirable to use Pd for 5 to 50% of the total amount of metal powders to be mixed in the first stage because a suitable catalytic ability can be obtained and the Pd ratio does not decrease.
又、これらの金騰粉末は、ガラスフリットや、エホキシ
、ポリイミド、ポリエステル、フェノール、メラミン、
シリコーン、変性フェノキシ等のレジンと混合される。In addition, these Jinteng powders can be used for glass frit, epoxy, polyimide, polyester, phenol, melamine,
Mixed with resins such as silicone and modified phenoxy.
両者の混合比率は金属が60〜95%である。なおペー
ストのvI4J1!にあたっては溶媒の#電か、必要に
応じて、粘度調整剤、安定化剤等が添加される。The mixing ratio of both is 60 to 95% metal. In addition, paste vI4J1! In this process, viscosity modifiers, stabilizers, etc. are added to the solvent, if necessary.
前記配合成分を混練して得られる導電性ペーストは、ス
クリーン印刷等により、基体上に所g パターンに付着
され、加熱固化される。加熱朱件はガラスの融解やレジ
ンの固化温度で決まる。ペーストが固化されてから、酸
、アルカリ等で必要に応じて前処理されてから、この上
に化学メッキが十+ 、+十
施こされる。この化学メッキは、Ou、N1 等の金
属成分と、ホルマリン、NaH2PO,ジメチルアミン
ボラン等の還元剤とを必須成分とする溶液を用いる。I
JTA 、エチレンジアミン四酢酸、ロッシェル塩等の
錯化剤や還元反応の調整添加剤も用いられる。all
−? N1の還元析出は、Pd −? Cu粒上で優先
的に起こるので、所望の回路が容易に形成できる。The conductive paste obtained by kneading the above-mentioned ingredients is applied onto a substrate in a predetermined pattern by screen printing or the like, and is heated and solidified. The heating conditions are determined by the melting temperature of the glass and the solidification temperature of the resin. After the paste is solidified, it is pretreated with acid, alkali, etc. as necessary, and then chemical plating is applied thereon. This chemical plating uses a solution whose essential components are metal components such as Ou and N1, and reducing agents such as formalin, NaH2PO, and dimethylamine borane. I
Complexing agents such as JTA, ethylenediaminetetraacetic acid, Rochelle's salt, and additives for adjusting the reduction reaction are also used. all
−? The reduction precipitation of N1 is Pd −? Since this occurs preferentially on Cu grains, a desired circuit can be easily formed.
以上述べ九本発明において、Cuペースト部は回路導体
と共に、後続する化学メッキの触媒として2回に動く。In the present invention as described above, the Cu paste portion moves twice together with the circuit conductor as a catalyst for the subsequent chemical plating.
金属粉は、密接して電気導体として動くと同時に、Pd
成分が触媒として迅速かつ強固な析出に寄与できる。O
uよりも卑金属であるN1は、Ou粉上に析出し罐いの
に比べ、本発明では、いずれの化学メッキも円滑に進行
できる。The metal powder moves closely as an electrical conductor, and at the same time Pd
The component can contribute to rapid and strong precipitation as a catalyst. O
N1, which is a more base metal than u, precipitates on the O powder, whereas in the present invention, any chemical plating can proceed smoothly.
以上の作用は前項の配合範囲において実用的に発現され
る。Pd分が過剰な場合は不経済であると同時に導電性
の低下をきたす。又、金属粉量が過剰な場合はレジン等
が不足して固着度を低下する。The above-mentioned effects can be practically achieved within the blending range described in the previous section. If the Pd content is excessive, it is uneconomical and at the same time causes a decrease in conductivity. Moreover, if the amount of metal powder is excessive, resin etc. will be insufficient and the degree of adhesion will be reduced.
レジンを固着剤とする場合、金属粉の配合量は特に、9
5係以下が望ましい。When resin is used as a fixing agent, the amount of metal powder mixed is particularly 9
Level 5 or below is desirable.
本発明によるペースト固化体は、その固有抵抗は大略l
O〜lOμΩ−口であり、これに化学メッキすると、1
.0〜100μΩ−αに低下する。The paste solidified body according to the present invention has a specific resistance of approximately l
O~lOμΩ-mouth, and when it is chemically plated, 1
.. It decreases to 0-100 μΩ-α.
実施例 l
平均粒径約7.5μの電解Qu粉と約0.8μの湿式還
元Pd粉とを各種割合で混合して得友混合粉と、メラミ
ン変性フェノキシレジンと、少量のブチルカルビノール
アセテートを表1に示し次配合にて混線分散した。こう
して得られ次導電性レジンペーストを、スクリーン印刷
法により、ガラスエポキシ基板上に約80μ厚、0.5
0m5幅の回路に印刷しこれを、200℃X8G分加熱
して固化させ友。Example l Electrolyzed Qu powder with an average particle size of about 7.5μ and wet-reduced Pd powder with an average particle size of about 0.8μ are mixed in various proportions to obtain mixed powder, melamine-modified phenoxy resin, and a small amount of butyl carbinol acetate. are shown in Table 1, and crosstalk was dispersed using the following formulation. The thus obtained conductive resin paste was printed on a glass epoxy substrate with a thickness of approximately 80 μm and a thickness of 0.5 μm by screen printing.
Print it on a 0m5 wide circuit and heat it at 200℃ x 8G to solidify it.
次に、これをN1メッキ液(奥野製薬社製トップニコロ
ン60)に90℃にて80分浸漬してから、次に、 Q
uメッキ液(上材工業社製ELO−Is浴)に65℃に
て2時間浸漬した。Next, this was immersed in N1 plating solution (Top Nikolon 60 manufactured by Okuno Pharmaceutical Co., Ltd.) at 90°C for 80 minutes, and then Q
It was immersed in u plating solution (ELO-Is bath manufactured by Uezai Kogyo Co., Ltd.) at 65° C. for 2 hours.
而して得た各々回路につきメッキ厚み、シート抵抗、ビ
ーリング強度を測定し穴。又これらの回路を共晶半田浴
に285℃にて5秒浸漬して半田濡れ面積を測定した。Then, measure the plating thickness, sheet resistance, and beering strength for each circuit obtained. Furthermore, these circuits were immersed in a eutectic solder bath at 285° C. for 5 seconds, and the solder wetting area was measured.
又、Aum(25μ−)を超音波熱圧着法(180℃、
50 KHz、 10G ? )でホンディングしてか
ら、プルテスターでプル強度を測定し J友。以
上の結果を表−1にまとめて示す。この表中、試料A1
〜6は本実施例のものを示す。In addition, Aum (25μ-) was bonded by ultrasonic thermocompression method (180℃,
50 KHz, 10G? ), then measure the pull strength with a pull tester. The above results are summarized in Table-1. In this table, sample A1
-6 show those of this example.
以上の表から明らかなように、本実施例では所望のNi
、 Ouメッキが強固に形成できるので、導電性、接合
強度、半田性、ボンディング性何れにも満足すべき結果
となつ几。As is clear from the above table, in this example, the desired Ni
Since Ou plating can be formed strongly, the results are satisfactory in terms of conductivity, bonding strength, solderability, and bonding properties.
これに比較して、 Pdが不足(Al)又は皆無(A8
)では、メッキ、特にN1メッキの析出が不充分のため
、接合強度等に不満足の結果となつ友。In comparison, Pd is insufficient (Al) or absent (A8
), the plating, especially the N1 plating, is insufficiently deposited, resulting in unsatisfactory results such as bonding strength.
又、レジ7分の過剰(屋9)では、メッキの析出が不光
分であり、諸特性に不満足となった。他方、レジン分の
不足の例(/l610)では、メッキは充分につい友が
、接合強度試験においてペースト層が破壊して不充分な
結果となってしまつ几。In addition, in the case of an excess of 7 minutes (Y9), the plating precipitation was non-luminous and the various properties were unsatisfactory. On the other hand, in the case of insufficient resin content (/l610), the plating was not sufficient, but the paste layer was destroyed in the bonding strength test, resulting in unsatisfactory results.
実施例 2
平均粒径1GμのアトマイズQu粉と約0.8μの還元
Pd粉とを各種割合で配合した混合粉と硼珪酸鉛カラス
とエチルセルロースとテレピネオールとを表2に示す割
合で配合し、これを枯潰機にて均一に混合して導電性ペ
ーストとした。このペーストを95 % AI!、O,
の基板にスクリーン印刷してから、窒素雰囲気中で86
0℃に?θ分間焼成して固化させて厚さ20μ、$ 0
.85 mmの回路とじ次・次いで、このもの全Ni化
学メッキ浴(ジャパンメタルフイニツシング社製ナイボ
ックLP)にて、pH7・0.90℃にて80分間浸漬
して化学メッキした。Example 2 A mixed powder in which atomized Qu powder with an average particle size of 1 Gμ and reduced Pd powder with an average particle size of about 0.8μ was blended in various proportions, lead borosilicate glass, ethyl cellulose, and terpineol were blended in the proportions shown in Table 2. were uniformly mixed in a crusher to form a conductive paste. This paste is 95% AI! ,O,
After screen printing on a substrate of
To 0℃? Baked for θ minutes and solidified to a thickness of 20μ, $0
.. After the 85 mm circuit was assembled, this product was chemically plated by immersion in an all-Ni chemical plating bath (Nibok LP manufactured by Japan Metal Finishing Co., Ltd.) at pH 7 and 0.90° C. for 80 minutes.
仁うして得られ友ものにつき、シート抵抗と半田付は性
とさらにボンディング強度とを前記実施例1と同様に測
定した。その結果を表−2にまとめて示す。この表−2
中にはN1メッキを行なわない例も併記した(Al a
)。化学メッキを省略し次側(/I616 )はペー
ストが適正であっても、半田付けやボンディングが不満
足となる。Pdを欠い次側(ムト1はN1メッキがうま
くできす、同様に不満足な結果となる。又、ガラス分の
過剰な例(415)も、多くの金属粉がガラスで蝋われ
てしまうので、充分な効果が得られない。The sheet resistance, soldering properties, and bonding strength of the resulting products were measured in the same manner as in Example 1 above. The results are summarized in Table-2. This table-2
Some examples are also shown in which N1 plating is not performed (Al a
). Even if chemical plating is omitted and the paste on the next side (/I616) is appropriate, soldering and bonding will be unsatisfactory. The next side lacking Pd (Muto 1 can be successfully plated with N1, but the result is similarly unsatisfactory.Also, in the case of excessive glass content (415), many metal powders are waxed with glass, so Not enough effect.
以上の実施例等からも明らかなように、本発明によると
、基板上に高能率に所望のパターンを形成することがで
き、しかも得られた回路は強固に結合した連続金属膜で
あり、電気−熱の良導体となり、かつ半田付けやワイヤ
ーボンディング等の接合も通常の金属回路と同様に高能
率に実施できる。例えば、従来のアディティブ法に比較
して経済的^性能なプリント回路板の製造に応用できる
ことも前記例示され次とおりである。As is clear from the above examples and the like, according to the present invention, a desired pattern can be formed on a substrate with high efficiency, and the resulting circuit is a continuous metal film that is strongly bonded, and is electrically - It is a good conductor of heat and can be used for soldering, wire bonding, etc. with high efficiency in the same way as ordinary metal circuits. For example, as exemplified above, this method can be applied to manufacturing printed circuit boards that are more economical than conventional additive methods.
Claims (1)
稠媒体中に混和して成る導電性ペーストを、絶縁性基体
表面上に所望のパターンに付着固化せしめてから、その
表層に化学メッキにより連続した金属層を形成せしめる
ことを特徴とする導電回路の形成方法。 2、前記導電性ペースト中のPd量が金属粉総量に対し
5〜50重量%であることを特徴とする特許請求の範囲
第1項記載の導電回路の形成方法。 3、前記導電性ペーストが、前記金属粉とレジン結合剤
との配合割合で60〜95重量%の金属粉を含むレジン
性ペーストであることを特徴とする特許請求の範囲第1
項記載の導電回路の形成方法。[Claims] 1. A conductive paste made by mixing Cu or Cu alloy powder and Pd or Pd alloy powder in a viscous medium is adhered and solidified in a desired pattern on the surface of an insulating substrate. A method for forming a conductive circuit, comprising forming a continuous metal layer on the surface thereof by chemical plating. 2. The method for forming a conductive circuit according to claim 1, wherein the amount of Pd in the conductive paste is 5 to 50% by weight based on the total amount of metal powder. 3. The first aspect of the present invention is characterized in that the conductive paste is a resinous paste containing 60 to 95% by weight of the metal powder and the resin binder.
A method for forming a conductive circuit as described in .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1148885A JPS61171192A (en) | 1985-01-24 | 1985-01-24 | Formation of conductive circuit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1148885A JPS61171192A (en) | 1985-01-24 | 1985-01-24 | Formation of conductive circuit |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61171192A true JPS61171192A (en) | 1986-08-01 |
Family
ID=11779425
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1148885A Pending JPS61171192A (en) | 1985-01-24 | 1985-01-24 | Formation of conductive circuit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61171192A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04326791A (en) * | 1991-04-26 | 1992-11-16 | Mitsubishi Materials Corp | Method of making wiring conductor on circuit board |
| JP2003008178A (en) * | 2001-06-25 | 2003-01-10 | Sony Corp | Manufacturing method of printed wiring board |
-
1985
- 1985-01-24 JP JP1148885A patent/JPS61171192A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04326791A (en) * | 1991-04-26 | 1992-11-16 | Mitsubishi Materials Corp | Method of making wiring conductor on circuit board |
| JP2003008178A (en) * | 2001-06-25 | 2003-01-10 | Sony Corp | Manufacturing method of printed wiring board |
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