JPS61176252U - - Google Patents
Info
- Publication number
- JPS61176252U JPS61176252U JP5747585U JP5747585U JPS61176252U JP S61176252 U JPS61176252 U JP S61176252U JP 5747585 U JP5747585 U JP 5747585U JP 5747585 U JP5747585 U JP 5747585U JP S61176252 U JPS61176252 U JP S61176252U
- Authority
- JP
- Japan
- Prior art keywords
- cooling water
- circuit
- water pipe
- vacuum chamber
- baking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000498 cooling water Substances 0.000 claims description 4
- 239000012530 fluid Substances 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000011261 inert gas Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Particle Accelerators (AREA)
- Physical Vapour Deposition (AREA)
- Furnace Housings, Linings, Walls, And Ceilings (AREA)
Description
図面は本考案の実施例を示すもので、第１図は
全体の配管図、第２図はベーキング特性を示す説
明図である。 １…チヤンバー部、２…冷却水管、１０…高圧
ポンプ、１６…貫流式ボイラ、１９…密閉循環回
路、２１…リリーフタンク。
全体の配管図、第２図はベーキング特性を示す説
明図である。 １…チヤンバー部、２…冷却水管、１０…高圧
ポンプ、１６…貫流式ボイラ、１９…密閉循環回
路、２１…リリーフタンク。
Claims (1)
- 真空チヤンバー部の冷却水管の冷却水系と切換
可能に設けた分岐回路に於いて、高圧循環ポンプ
と、温度測定手段及び内部流体の加熱手段を有す
る貫流式ボイラと、不活性ガス導入部を有するリ
リーフタンクとを連結して密閉循環回路を設け、
この回路内の流体を加熱して前記チヤンバー部の
冷却水管によりベーキングを行うことを特徴とす
る高真空チヤンバーのベーキング装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985057475U JPH0248421Y2 (ja) | 1985-04-19 | 1985-04-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985057475U JPH0248421Y2 (ja) | 1985-04-19 | 1985-04-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61176252U true JPS61176252U (ja) | 1986-11-04 |
| JPH0248421Y2 JPH0248421Y2 (ja) | 1990-12-19 |
Family
ID=30582039
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985057475U Expired JPH0248421Y2 (ja) | 1985-04-19 | 1985-04-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0248421Y2 (ja) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7166166B2 (en) | 2002-09-30 | 2007-01-23 | Tokyo Electron Limited | Method and apparatus for an improved baffle plate in a plasma processing system |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56149443U (ja) * | 1980-04-07 | 1981-11-10 |
-
1985
- 1985-04-19 JP JP1985057475U patent/JPH0248421Y2/ja not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56149443U (ja) * | 1980-04-07 | 1981-11-10 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0248421Y2 (ja) | 1990-12-19 |
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