JPS61197638A - プラズマ処理装置及び方法 - Google Patents

プラズマ処理装置及び方法

Info

Publication number
JPS61197638A
JPS61197638A JP60037463A JP3746385A JPS61197638A JP S61197638 A JPS61197638 A JP S61197638A JP 60037463 A JP60037463 A JP 60037463A JP 3746385 A JP3746385 A JP 3746385A JP S61197638 A JPS61197638 A JP S61197638A
Authority
JP
Japan
Prior art keywords
electrode
plastic tube
side electrode
insulating layer
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60037463A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0576759B2 (2
Inventor
Masahiro Takeuchi
正浩 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP60037463A priority Critical patent/JPS61197638A/ja
Publication of JPS61197638A publication Critical patent/JPS61197638A/ja
Publication of JPH0576759B2 publication Critical patent/JPH0576759B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma Technology (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP60037463A 1985-02-28 1985-02-28 プラズマ処理装置及び方法 Granted JPS61197638A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60037463A JPS61197638A (ja) 1985-02-28 1985-02-28 プラズマ処理装置及び方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60037463A JPS61197638A (ja) 1985-02-28 1985-02-28 プラズマ処理装置及び方法

Publications (2)

Publication Number Publication Date
JPS61197638A true JPS61197638A (ja) 1986-09-01
JPH0576759B2 JPH0576759B2 (2) 1993-10-25

Family

ID=12498216

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60037463A Granted JPS61197638A (ja) 1985-02-28 1985-02-28 プラズマ処理装置及び方法

Country Status (1)

Country Link
JP (1) JPS61197638A (2)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01296600A (ja) * 1988-05-23 1989-11-29 Nissin Electric Co Ltd プラズマ発生源
WO1999036586A1 (en) * 1998-01-15 1999-07-22 Torrex Equipment Corporation Apparatus and method for plasma enhanced chemical vapor deposition (pecvd) in a single wafer reactor
US6352593B1 (en) 1997-08-11 2002-03-05 Torrex Equipment Corp. Mini-batch process chamber
US6352594B2 (en) 1997-08-11 2002-03-05 Torrex Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectors
US6780464B2 (en) 1997-08-11 2004-08-24 Torrex Equipment Thermal gradient enhanced CVD deposition at low pressure
US7393561B2 (en) 1997-08-11 2008-07-01 Applied Materials, Inc. Method and apparatus for layer by layer deposition of thin films
JP2019077104A (ja) * 2017-10-25 2019-05-23 泉工業株式会社 チューブの表面処理装置及びプラズマ処理装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01296600A (ja) * 1988-05-23 1989-11-29 Nissin Electric Co Ltd プラズマ発生源
US6352593B1 (en) 1997-08-11 2002-03-05 Torrex Equipment Corp. Mini-batch process chamber
US6352594B2 (en) 1997-08-11 2002-03-05 Torrex Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectors
US6780464B2 (en) 1997-08-11 2004-08-24 Torrex Equipment Thermal gradient enhanced CVD deposition at low pressure
US7393561B2 (en) 1997-08-11 2008-07-01 Applied Materials, Inc. Method and apparatus for layer by layer deposition of thin films
WO1999036586A1 (en) * 1998-01-15 1999-07-22 Torrex Equipment Corporation Apparatus and method for plasma enhanced chemical vapor deposition (pecvd) in a single wafer reactor
US6167837B1 (en) 1998-01-15 2001-01-02 Torrex Equipment Corp. Apparatus and method for plasma enhanced chemical vapor deposition (PECVD) in a single wafer reactor
JP2019077104A (ja) * 2017-10-25 2019-05-23 泉工業株式会社 チューブの表面処理装置及びプラズマ処理装置

Also Published As

Publication number Publication date
JPH0576759B2 (2) 1993-10-25

Similar Documents

Publication Publication Date Title
DE50015635D1 (en) Bstraten
JP2001148378A5 (2)
JPS61197638A (ja) プラズマ処理装置及び方法
CN105792495A (zh) 一种产生大气压均匀等离子体刷的装置和方法
CN104994673B (zh) 一种产生空气环境中大气压下均匀等离子体刷的装置和方法
CN106488639A (zh) 大尺度脉冲冷等离子体射流产生装置
JPS61226925A (ja) 放電反応装置
KR20030095256A (ko) 동시 방전화 장치
KR20130037441A (ko) 플라즈마를 이용하는 알루미늄 표면개질방법
JPS60258234A (ja) プラスチック管内面のプラズマ処理装置及び方法
JPS587653B2 (ja) プラスチツクチユ−ブ管内表面の処理方法
KR102722787B1 (ko) 이중의 고주파수를 이용한 플라즈마의 시스와 벌크의 확장방법
JP2003049276A (ja) 放電プラズマ処理装置及びそれを用いた処理方法
JPH0560493B2 (2)
JPS62180747A (ja) 放電反応装置
JP2004522255A (ja) プラズマを励起させる方法および装置
CN114126181A (zh) 一种介质阻挡放电等离子体发生器
JP2502632B2 (ja) 低温プラズマ処理装置
JPS6263183A (ja) Rf型イオン源
JPS6226879A (ja) 金属蒸気レ−ザ発振管
US6291937B1 (en) High frequency coupler, and plasma processing apparatus and method
KR102946737B1 (ko) 플라즈마 수처리 장치 및 플라즈마 수처리 방법
JPH07102090A (ja) 弗素樹脂製チューブの表面改質法
JP3618129B2 (ja) 放電処理用電極及び放電処理装置
JPH11251088A (ja) 誘導結合プラズマ装置