JPS61209366A - Method for testing reliability of resin sealed type semiconductor apparatus - Google Patents

Method for testing reliability of resin sealed type semiconductor apparatus

Info

Publication number
JPS61209366A
JPS61209366A JP5004985A JP5004985A JPS61209366A JP S61209366 A JPS61209366 A JP S61209366A JP 5004985 A JP5004985 A JP 5004985A JP 5004985 A JP5004985 A JP 5004985A JP S61209366 A JPS61209366 A JP S61209366A
Authority
JP
Japan
Prior art keywords
liquid
flaw
chip
time
mold element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5004985A
Other languages
Japanese (ja)
Inventor
Hiroshi Higuchi
樋口 弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP5004985A priority Critical patent/JPS61209366A/en
Publication of JPS61209366A publication Critical patent/JPS61209366A/en
Pending legal-status Critical Current

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  • Testing Of Individual Semiconductor Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)

Abstract

PURPOSE:To make it possible to shorten a reliability testing time and to enable the detection of a fine flaw, by applying two kinds of liquid penetration treatment and liquid evaporation treatment to a mold element prior to conducting the reliability test of said mold element. CONSTITUTION:A mold element 1 is immersed in molten solder 13 for a predetermined time and the liquid penetrated in the surface of a chip by this treatment is exposed to high temp. of b.p. or more to be instantaneously evaporated At this time, said element 1 generates abrupt volumetric expansion but, because the surface of the chip is molded from a resin material, said volumetric change can not be escaped to the outside and said liquid comes to high pressure gas to collectively apply evaporation pressure to the flow area, especially, a pinhole or minute crack area of the protective film on the surface of the chip and said flaw area is enlarged or destructed. At the same time, an impurity ion is thrown into the flaw under high pressure. When thus pretreated mold element 1 is adapted to a reliability test, the promotion or destruction of the pretreated flaw part or the generation of trouble due to the impurity ion thrown into the flaw part consciously becomes fast and the shortening of a test time or the discovery of fine trouble is enabled.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は樹脂封止形半導体装置(以下モールド素子と略
記する)の信頼性試験、詳しくは、同モールド素子の劣
化促進を伴なう信頼性試験方法に関するものである。
[Detailed Description of the Invention] Industrial Field of Application The present invention relates to reliability testing of resin-sealed semiconductor devices (hereinafter abbreviated as molded elements), specifically, reliability testing that involves accelerated deterioration of the molded elements. It is about the method.

従来の技術 従来は完成したモールド素子をそのままJIS等に標準
化された信頼性試験方法にのっとって試験を実施してき
た。この場合主として耐久性試験及び環境試験を行なう
が、その主な目的を第6図。
BACKGROUND OF THE INVENTION Conventionally, completed molded devices have been tested as they are in accordance with reliability testing methods standardized by JIS and the like. In this case, durability tests and environmental tests are mainly conducted, and the main purpose is shown in Figure 6.

第6図により説明する。This will be explained with reference to FIG.

第6図は半導体集積回路装置(IC)を例にとったモー
ルド素子の断面図を示したもので、1はモールド素子本
体、4はリードワイヤ、5はリードフレイム、6はI(
jチップ、7はモールド樹脂であfi、ICチップ部6
の拡大したものが第6図である。第6図において、4は
ICチップからの引出しワイヤ、8は蒸着金属配線、6
はICチップ基板、9は保護膜%1oは絶縁膜、7は上
記すべてを包むように樹脂材料である。
FIG. 6 shows a cross-sectional view of a molded element taking a semiconductor integrated circuit device (IC) as an example, where 1 is the molded element body, 4 is a lead wire, 5 is a lead frame, and 6 is an I (
j chip, 7 is molded resin fi, IC chip part 6
Figure 6 shows an enlarged version of the figure. In FIG. 6, 4 is a lead wire from the IC chip, 8 is a vapor-deposited metal wiring, and 6
9 is an IC chip substrate, 9 is a protective film %1o is an insulating film, and 7 is a resin material so as to cover all of the above.

信頼性試験では保護膜9の局部9ムよシ入った不純物イ
オンによる特性の劣化、同他の局部9Bよシ入った不純
物イオンによる電極配線8の断線劣化、リードワイヤ4
と蒸着金属配線8のコンタクト劣化等を高温実動作耐久
性試験、高温逆バイアス耐久性試験、高温高湿バイアス
試験、高温高湿保存試験等の耐久性試験及び環境試験で
実施してきた。
In the reliability test, there was a deterioration in characteristics due to impurity ions that entered the local part 9 of the protective film 9, disconnection of the electrode wiring 8 due to impurity ions that entered the other local part 9B, and lead wire 4.
and contact deterioration of the vapor-deposited metal wiring 8 have been tested through durability tests and environmental tests such as high-temperature actual operation durability tests, high-temperature reverse bias durability tests, high-temperature and high-humidity bias tests, and high-temperature and high-humidity storage tests.

発明が解決しようとする問題点 このような従来の試験方法では材料、工法の向上による
故障発生率の減少にともない、試験時間の長期化が進む
と同時に微細欠陥の早期発見が困難であった。
Problems to be Solved by the Invention In such conventional testing methods, as the failure rate has decreased due to improvements in materials and construction methods, the testing time has become longer and it has been difficult to detect minute defects at an early stage.

本発明はかかる欠点を改善するためになされた、  も
ので、簡易な前処理方法を導入することにょシ、微細欠
陥の検出及び試験時間の短縮方法を提供することを目的
としている。
The present invention was made to improve these drawbacks, and aims to provide a method for detecting minute defects and shortening test time by introducing a simple pretreatment method.

問題点を解決するための手段 本発明は、前記の目的を達成せんがため、信頼性試験を
実施する直前に、大気圧もしくは高圧下で高湿状態にさ
らすかまたは高圧下で溶液中に浸漬して、チップ表面に
液体を浸透させた後前記液体の沸点以上に加熱処理を施
し、前記液体の気化圧を利用して、チップ表面の微細欠
陥を拡大かつ高圧により不純物イオンをその欠陥の中に
押し込む処理を行なうものである。
Means for Solving the Problems In order to achieve the above-mentioned object, the present invention provides a method of exposing to high humidity under atmospheric pressure or high pressure or immersing in a solution under high pressure immediately before conducting a reliability test. After infiltrating the chip surface with a liquid, heat treatment is performed to a temperature above the boiling point of the liquid, and the vaporization pressure of the liquid is used to enlarge minute defects on the chip surface and impurity ions are forced into the defects using high pressure. This process performs the process of pushing the

作用 本発明は上記した構成により、前処理と従来の信頼性試
験法を組み合せることにより、チップ表面の微細欠陥の
検出及び信頼性試験時間の著しい短縮を得ることができ
る。
Effect of the Invention With the above-described configuration, the present invention can detect minute defects on the chip surface and significantly shorten the reliability test time by combining pretreatment and conventional reliability testing methods.

実施例 次に本発明の一実施例を第1図のブロックダイヤグラム
により説明する。
Embodiment Next, an embodiment of the present invention will be explained with reference to the block diagram shown in FIG.

第1図において、モールド素子1に対して、本来の信頼
性試験を実行するまでに、液体浸入処理、および液体気
化処理を事前、なるべくは直前に行う。
In FIG. 1, a liquid infiltration process and a liquid vaporization process are performed on the molded element 1 in advance, preferably immediately before the actual reliability test is performed.

液体浸入処理はモールド素子1を大気圧もしくは高圧下
で高湿状態にさらすか、または高圧化で溶液中に浸漬し
て、水蒸気や溶液を意識的にチップ表面に浸入せしめる
。この場合高湿条件は、85°C196%RH,蒸気加
圧(4気圧142°C100%RH)が適当であり、ま
た、液体浸漬条件は、溶液(アルコール等)中に浸漬し
て高圧ガス(H・ガス、4気圧)下で浸入させる等の適
当な条件を設定する。
In the liquid immersion process, the mold element 1 is exposed to high humidity under atmospheric pressure or high pressure, or immersed in a solution under high pressure, so that water vapor or solution intentionally penetrates into the chip surface. In this case, the appropriate high humidity conditions are 85°C, 196% RH, and steam pressurization (4 atm, 142°C, 100% RH), and the liquid immersion conditions include immersion in a solution (alcohol, etc.) and high pressure gas ( Set appropriate conditions such as infiltration under H gas (4 atmospheres).

第2図は高湿条件設定用設備の一例を概略断面図で示す
もので、圧力釜の内部で、モールド素子1を高圧溶液1
2上に保存させたものである。この場合、モールド素子
1は第6図に示す通りのものであり、液体は樹脂7を直
接透過するもの、あるいはリードフレーム6と樹n旨7
との界面よシ浸入し、さらにリードワイヤ4と樹脂7と
界面に沿って、ICチップ6の表面に到る。処理時間は
処理方法9条件とのからみで適切なものを設定する。
FIG. 2 is a schematic cross-sectional view of an example of equipment for setting high humidity conditions.
This is what was saved on 2. In this case, the mold element 1 is as shown in FIG.
It penetrates through the interface between the lead wire 4 and the resin 7, and reaches the surface of the IC chip 6 along the interface between the lead wire 4 and the resin 7. The processing time is set appropriately based on the processing method 9 conditions.

第1図において、液体浸入処理を行った後、前記液体の
気化処理を行なうが、この場合、浸入、せしめた溶液の
沸点以上に加熱処理を施す必要が有り、できるだけ急激
な温度上昇になる方法を取ることが望ましい。加熱手段
は、70ロカーボン。
In Figure 1, after the liquid infiltration process is performed, the liquid is vaporized, but in this case, it is necessary to heat the liquid to a temperature higher than the boiling point of the infiltrated solution, and it is necessary to heat the liquid to a temperature that is as rapid as possible. It is desirable to take. The heating means is 70 Rocarbon.

シリコンオイル、溶融はんだ等の高温液体への直接浸漬
、またはヒータによる加熱、赤外線加熱等の高温雰囲気
にさらすなどのうちから、いずれか適切なものを設定す
れば良いが、前記理由によシ、前者つまり、高温液体へ
の直接□浸漬の方が望ましい。
Any suitable method may be used, such as direct immersion in a high-temperature liquid such as silicone oil or molten solder, or exposure to a high-temperature atmosphere such as heating with a heater or infrared heating. The former, that is, direct □ immersion in high-temperature liquid is preferable.

第3図にその一実施例の過程説明図を示す。FIG. 3 shows a process explanatory diagram of one embodiment.

13は溶融はんだであシ、例えば260.’Cの鉛−錫
合金はんだ浴にモールド素子1を30秒間直接浸漬する
。処理温度や処理時間については、樹脂の種類、チップ
の回路性能等により適当に設定すれば良い。
13 is molten solder, for example 260. The mold element 1 is directly immersed in a lead-tin alloy solder bath of 'C for 30 seconds. The processing temperature and processing time may be appropriately set depending on the type of resin, the circuit performance of the chip, etc.

この処理によりチップ表面に浸入した液体が沸点以上の
高温にさらされ、瞬時に気化する。この時急激な体積膨
張を起こすが、チップ底面は樹脂材料でモールドされて
いるため、この変化を外に逃がすことができず、高圧ガ
スとなって、チップ表面の保護膜特にピンホール、微小
クラック等欠陥のあるところに集中的に気化圧がかかシ
、これらの欠陥部分を拡大または破壊する。また同時に
これらの欠陥の中に不純物イオンを高圧でたたき込むこ
とにもなる。このことを、第6図示のモールド素子で対
応させてみると、保護膜9の表面に付着した液体が高温
に加熱されて高圧のガスとなり、同保護膜9の局部9ム
や同9Bにおいて、その膜質の弱い部分に集中して、こ
れらの欠陥を拡大または破壊する。たとえば、同腹の局
部9Bの弱い部分が速進または破壊されると電極配線劣
化断線につながシ、また、別の局部9人の弱い部分が速
進または破壊されるとMO3形半導体装置のV、やバイ
ポーラ形半導体装置のh□等の特性変動につながる。さ
らに、保護膜9の表面だけでなく、ワイヤ4と電極配線
8の界面にも強いガス圧を加え、その接触部の劣化を速
進する。
Through this process, the liquid that has penetrated the chip surface is exposed to high temperatures above the boiling point and instantly vaporizes. At this time, a rapid volumetric expansion occurs, but since the bottom of the chip is molded with a resin material, this change cannot escape and becomes a high-pressure gas, causing pinholes and minute cracks in the protective film on the chip surface. Vaporization pressure is applied intensively to areas where there are defects, enlarging or destroying these defective areas. At the same time, impurity ions are forced into these defects at high pressure. When this is dealt with using the molded element shown in FIG. 6, the liquid adhering to the surface of the protective film 9 is heated to a high temperature and becomes a high-pressure gas, and in the local parts 9 and 9B of the protective film 9, Focus on weak areas of the membrane to enlarge or destroy these defects. For example, if the weak part of the local part 9B of the same litter is accelerated or destroyed, it will lead to electrode wiring deterioration and disconnection, and if the weak part of another local part 9 is accelerated or destroyed, the V of the MO3 type semiconductor device, This leads to fluctuations in characteristics such as h□ and h□ of bipolar semiconductor devices. Further, strong gas pressure is applied not only to the surface of the protective film 9 but also to the interface between the wire 4 and the electrode wiring 8, thereby accelerating the deterioration of the contact portion.

以上の過程で前処理したモールド素子を、信頼性試験に
適用すると、前処理によシ行われた欠陥部分の速進また
は破壊や、意識的にたたき込まれた不純物イオンにより
、故障発生が著しく早くなり、試験時間の短縮が図れる
。また従来発見できなかった微細な故障の発見が可能と
なる。
When a molded element pretreated through the above process is applied to a reliability test, failures are significantly more likely to occur due to the acceleration or destruction of defective parts caused by the pretreatment and the intentionally introduced impurity ions. This makes it possible to shorten the test time. Furthermore, it becomes possible to discover minute failures that could not be detected conventionally.

第4図はモールド素子に本発明の前処理を施し友ものと
、施さないものとに対し、高温高湿バイアス試験および
高温動作耐久性試験を行い、その結果を比較したものを
示すもので、縦軸に累計数fi100分率、横軸は試験
時間を表わすワイブルチャートである。
FIG. 4 shows a comparison of the results of a high temperature, high humidity bias test and a high temperature operation durability test performed on mold elements with and without the pretreatment of the present invention. It is a Weibull chart in which the vertical axis represents the cumulative number fi100 percent and the horizontal axis represents the test time.

図中人、ム′は160°C実動作による耐久性試験の結
果、B 、 B’は86°C185%RHの高温高湿バ
イアス試験の結果であり、それぞれの試験条件は、信頼
性試験で一般に採用されている。この試験結果のうち、
実線で示す人、Bはモールド素子を3気圧飽和水蒸気圧
のもとに20時間保存し、しかる後260°Cの溶融ハ
ンダの中に30秒浸漬処理をしたものの例を示し、破線
で示すA′、B′はこれらの処理をしていないものを示
す。
In the figure, M' and M' are the results of a durability test using 160°C actual operation, and B and B' are the results of a high temperature, high humidity bias test at 86°C and 185% RH.The test conditions for each are the results of a reliability test. Generally adopted. Among the test results,
Person B, indicated by the solid line, shows an example in which the molded element was stored for 20 hours under a saturated water vapor pressure of 3 atm, and then immersed in molten solder at 260°C for 30 seconds, and Person B indicated by the broken line. ', B' indicate those not subjected to these treatments.

この図で明らかなように前処理をほどこした実線で示す
ム、Bとも、前処理を施さない破線で示すA′、B′の
方より故障発生率が高く、試験時間を短縮できることを
示している。
As is clear from this figure, both M and B, which are shown by solid lines that have been pretreated, have a higher failure rate than A' and B', which are not pretreated and are shown by broken lines, indicating that the test time can be shortened. There is.

発明の効果 以上の説明で明らかなように、本発明によれば、モール
ド素子を信頼性試験を実施する前に、液体浸入処理と液
体気化処理の2種類の処理による前処理を施すことによ
り、信頼性試験を短縮でき、また微細欠陥を検出する方
法として、実用的できわめて有用である。
Effects of the Invention As is clear from the above explanation, according to the present invention, before a reliability test is performed on a molded element, pretreatment is performed using two types of treatment: liquid immersion treatment and liquid vaporization treatment. It is practical and extremely useful as a method for shortening reliability tests and detecting minute defects.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施例を示すブロックダイヤグラム、
第2図は本発明処理の液体浸入処理例を示す設備概要断
面図、第3図は同じく液体気化処理例を示す溶融はんだ
浸漬過程説明図、第4図は本発明の詳細な説明するため
の高温実動作耐久性試験結果及び高温高湿バイアス試験
結果を示すワイプルチャート、第5図は樹脂封止彫工C
のチップ断面図、第6図は第6図に示すICチップ近傍
の拡大断面図である。 1・・・・・・モールド素子、4・・・・・・リードワ
イヤ、6・・・・・・リードフレイム、6・・・・・・
ICチップ、7・・・・・・モールド樹脂、8・・・・
・・蒸着金属配線、9・・・・・・保護膜、10・・・
・・・絶縁膜、12・・・・・・高圧溶液、13・・・
・・・溶融はんだ。 代理人の氏名 弁理士 中 尾 敏、11男 ほか1名
第1図 第2図 4η 第3図 ワイブルテペート t  (/LγS)−一一一 5−m−ワード7レイム 第 6rIA 4−一−ν−ドフイヤ 5−−ワー)″7レイム
FIG. 1 is a block diagram showing an embodiment of the present invention;
Fig. 2 is a schematic sectional view of the equipment showing an example of liquid immersion processing according to the present invention, Fig. 3 is an explanatory diagram of the molten solder immersion process also showing an example of liquid vaporization processing, and Fig. 4 is a diagram for explaining the details of the present invention. Wiple chart showing the high temperature actual operation durability test results and high temperature high humidity bias test results, Figure 5 is resin sealing carving C
FIG. 6 is an enlarged sectional view of the vicinity of the IC chip shown in FIG. 1...Mold element, 4...Lead wire, 6...Lead frame, 6...
IC chip, 7...Mold resin, 8...
...Vapour-deposited metal wiring, 9...Protective film, 10...
...Insulating film, 12...High pressure solution, 13...
...Melted solder. Name of agent: Patent attorney Satoshi Nakao, 11th son, and 1 other person Figure 1 Figure 2 Figure 4 η Figure 3 Weibltepet t (/LγS)-111 5-m- Word 7 Reim No. 6rIA 4-1-ν- Dofuiya 5--Wa) ``7 Reimu''

Claims (1)

【特許請求の範囲】[Claims] 樹脂封止した半導体装置において、耐久性試験及び環境
試験を実施する直前に、大気圧もしくは高圧下で高湿状
態にさらすか、または高圧下で溶液中に浸漬して、チッ
プ表面に液体を浸透させた後、加熱処理を施し、前記液
体の気化圧を利用して、微細欠陥の検出を行なうことを
特徴とする樹脂封止形半導体装置の信頼性試験方法。
Immediately before carrying out durability tests and environmental tests on resin-sealed semiconductor devices, the chip surface is exposed to high humidity under atmospheric pressure or high pressure, or immersed in a solution under high pressure to infiltrate the chip surface with liquid. 1. A method for testing the reliability of a resin-sealed semiconductor device, the method comprising: heating the liquid, and then performing a heat treatment, and detecting minute defects using the vaporization pressure of the liquid.
JP5004985A 1985-03-13 1985-03-13 Method for testing reliability of resin sealed type semiconductor apparatus Pending JPS61209366A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5004985A JPS61209366A (en) 1985-03-13 1985-03-13 Method for testing reliability of resin sealed type semiconductor apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5004985A JPS61209366A (en) 1985-03-13 1985-03-13 Method for testing reliability of resin sealed type semiconductor apparatus

Publications (1)

Publication Number Publication Date
JPS61209366A true JPS61209366A (en) 1986-09-17

Family

ID=12848134

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5004985A Pending JPS61209366A (en) 1985-03-13 1985-03-13 Method for testing reliability of resin sealed type semiconductor apparatus

Country Status (1)

Country Link
JP (1) JPS61209366A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5742863A (en) * 1980-08-26 1982-03-10 Mitsubishi Electric Corp Testing method for semiconductor device
JPS58165041A (en) * 1982-03-26 1983-09-30 Hitachi Ltd Method for testing humidity resistance of semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5742863A (en) * 1980-08-26 1982-03-10 Mitsubishi Electric Corp Testing method for semiconductor device
JPS58165041A (en) * 1982-03-26 1983-09-30 Hitachi Ltd Method for testing humidity resistance of semiconductor device

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