JPS6121477B2 - - Google Patents
Info
- Publication number
- JPS6121477B2 JPS6121477B2 JP14634378A JP14634378A JPS6121477B2 JP S6121477 B2 JPS6121477 B2 JP S6121477B2 JP 14634378 A JP14634378 A JP 14634378A JP 14634378 A JP14634378 A JP 14634378A JP S6121477 B2 JPS6121477 B2 JP S6121477B2
- Authority
- JP
- Japan
- Prior art keywords
- trimethoxysilane
- reaction mixture
- methyl alcohol
- present
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 45
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 claims description 26
- 239000011541 reaction mixture Substances 0.000 claims description 21
- 150000001413 amino acids Chemical class 0.000 claims description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 8
- 239000010949 copper Substances 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 8
- 239000003054 catalyst Substances 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 4
- 230000000087 stabilizing effect Effects 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 11
- 238000004821 distillation Methods 0.000 description 10
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 8
- 235000001014 amino acid Nutrition 0.000 description 8
- 229940024606 amino acid Drugs 0.000 description 8
- 239000004471 Glycine Substances 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 3
- QPUYECUOLPXSFR-UHFFFAOYSA-N 1-methylnaphthalene Chemical compound C1=CC=C2C(C)=CC=CC2=C1 QPUYECUOLPXSFR-UHFFFAOYSA-N 0.000 description 2
- 239000005749 Copper compound Substances 0.000 description 2
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 2
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 2
- 235000004279 alanine Nutrition 0.000 description 2
- OCKPCBLVNKHBMX-UHFFFAOYSA-N butylbenzene Chemical compound CCCCC1=CC=CC=C1 OCKPCBLVNKHBMX-UHFFFAOYSA-N 0.000 description 2
- 150000001880 copper compounds Chemical class 0.000 description 2
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- 229940045803 cuprous chloride Drugs 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- KWKXNDCHNDYVRT-UHFFFAOYSA-N dodecylbenzene Chemical compound CCCCCCCCCCCCC1=CC=CC=C1 KWKXNDCHNDYVRT-UHFFFAOYSA-N 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- RZJRJXONCZWCBN-UHFFFAOYSA-N octadecane Chemical compound CCCCCCCCCCCCCCCCCC RZJRJXONCZWCBN-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- BGHCVCJVXZWKCC-UHFFFAOYSA-N tetradecane Chemical compound CCCCCCCCCCCCCC BGHCVCJVXZWKCC-UHFFFAOYSA-N 0.000 description 2
- VIDOPANCAUPXNH-UHFFFAOYSA-N 1,2,3-triethylbenzene Chemical compound CCC1=CC=CC(CC)=C1CC VIDOPANCAUPXNH-UHFFFAOYSA-N 0.000 description 1
- WSSNQXJVTQOUMV-UHFFFAOYSA-N 1,2-dibenzyl-3,4-dimethylbenzene Chemical group C=1C=CC=CC=1CC1=C(C)C(C)=CC=C1CC1=CC=CC=C1 WSSNQXJVTQOUMV-UHFFFAOYSA-N 0.000 description 1
- PKQYSCBUFZOAPE-UHFFFAOYSA-N 1,2-dibenzyl-3-methylbenzene Chemical compound C=1C=CC=CC=1CC=1C(C)=CC=CC=1CC1=CC=CC=C1 PKQYSCBUFZOAPE-UHFFFAOYSA-N 0.000 description 1
- WJECKFZULSWXPN-UHFFFAOYSA-N 1,2-didodecylbenzene Chemical compound CCCCCCCCCCCCC1=CC=CC=C1CCCCCCCCCCCC WJECKFZULSWXPN-UHFFFAOYSA-N 0.000 description 1
- QWUWMCYKGHVNAV-UHFFFAOYSA-N 1,2-dihydrostilbene Chemical compound C=1C=CC=CC=1CCC1=CC=CC=C1 QWUWMCYKGHVNAV-UHFFFAOYSA-N 0.000 description 1
- KXTWDIPAGFPHCA-UHFFFAOYSA-N 1,2-dipropylnaphthalene Chemical compound C1=CC=CC2=C(CCC)C(CCC)=CC=C21 KXTWDIPAGFPHCA-UHFFFAOYSA-N 0.000 description 1
- HMAMGXMFMCAOPV-UHFFFAOYSA-N 1-propylnaphthalene Chemical compound C1=CC=C2C(CCC)=CC=CC2=C1 HMAMGXMFMCAOPV-UHFFFAOYSA-N 0.000 description 1
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 1
- AGPKZVBTJJNPAG-WHFBIAKZSA-N L-isoleucine Chemical compound CC[C@H](C)[C@H](N)C(O)=O AGPKZVBTJJNPAG-WHFBIAKZSA-N 0.000 description 1
- ROHFNLRQFUQHCH-YFKPBYRVSA-N L-leucine Chemical compound CC(C)C[C@H](N)C(O)=O ROHFNLRQFUQHCH-YFKPBYRVSA-N 0.000 description 1
- COLNVLDHVKWLRT-QMMMGPOBSA-N L-phenylalanine Chemical compound OC(=O)[C@@H](N)CC1=CC=CC=C1 COLNVLDHVKWLRT-QMMMGPOBSA-N 0.000 description 1
- KZSNJWFQEVHDMF-BYPYZUCNSA-N L-valine Chemical compound CC(C)[C@H](N)C(O)=O KZSNJWFQEVHDMF-BYPYZUCNSA-N 0.000 description 1
- ROHFNLRQFUQHCH-UHFFFAOYSA-N Leucine Natural products CC(C)CC(N)C(O)=O ROHFNLRQFUQHCH-UHFFFAOYSA-N 0.000 description 1
- KZSNJWFQEVHDMF-UHFFFAOYSA-N Valine Natural products CC(C)C(N)C(O)=O KZSNJWFQEVHDMF-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000004996 alkyl benzenes Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 239000013522 chelant Chemical class 0.000 description 1
- RFKZUAOAYVHBOY-UHFFFAOYSA-M copper(1+);acetate Chemical compound [Cu+].CC([O-])=O RFKZUAOAYVHBOY-UHFFFAOYSA-M 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 1
- ZKXWKVVCCTZOLD-UHFFFAOYSA-N copper;4-hydroxypent-3-en-2-one Chemical compound [Cu].CC(O)=CC(C)=O.CC(O)=CC(C)=O ZKXWKVVCCTZOLD-UHFFFAOYSA-N 0.000 description 1
- HFDWIMBEIXDNQS-UHFFFAOYSA-L copper;diformate Chemical compound [Cu+2].[O-]C=O.[O-]C=O HFDWIMBEIXDNQS-UHFFFAOYSA-L 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- 229940076286 cupric acetate Drugs 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 229940112669 cuprous oxide Drugs 0.000 description 1
- 229930007927 cymene Natural products 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- YQGOWXYZDLJBFL-UHFFFAOYSA-N dimethoxysilane Chemical compound CO[SiH2]OC YQGOWXYZDLJBFL-UHFFFAOYSA-N 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- -1 ditolylmethane Chemical compound 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- YUWFEBAXEOLKSG-UHFFFAOYSA-N hexamethylbenzene Chemical compound CC1=C(C)C(C)=C(C)C(C)=C1C YUWFEBAXEOLKSG-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229960000310 isoleucine Drugs 0.000 description 1
- AGPKZVBTJJNPAG-UHFFFAOYSA-N isoleucine Natural products CCC(C)C(N)C(O)=O AGPKZVBTJJNPAG-UHFFFAOYSA-N 0.000 description 1
- 229940057995 liquid paraffin Drugs 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229940038384 octadecane Drugs 0.000 description 1
- VXNSQGRKHCZUSU-UHFFFAOYSA-N octylbenzene Chemical compound [CH2]CCCCCCCC1=CC=CC=C1 VXNSQGRKHCZUSU-UHFFFAOYSA-N 0.000 description 1
- HFPZCAJZSCWRBC-UHFFFAOYSA-N p-cymene Chemical compound CC(C)C1=CC=C(C)C=C1 HFPZCAJZSCWRBC-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- COLNVLDHVKWLRT-UHFFFAOYSA-N phenylalanine Natural products OC(=O)C(N)CC1=CC=CC=C1 COLNVLDHVKWLRT-UHFFFAOYSA-N 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- 239000004474 valine Substances 0.000 description 1
Description
本発明はトリメトキシシラの安定化法に関す
る。詳しくは銅触媒の存在下に珪素とメチルアル
コールとを反応させて得られるトリメトキシシラ
ンを含む反応混合物中のトリメトキシシランを安
定化する方法に関する。
従来、トリメトキシシランの製法として、銅触
媒の存在下、100〜300℃で珪素金属とメチルアル
コールとを反応させ、生成するトリメトキシシラ
を未反応のメチルアルコールと共に系外に留出さ
せ、さらに留出反応混合物からトリメキシシラン
を蒸留分離する方法が知られている。
ところが、上記方法において、留出反応混合物
を保存し、あるいは留出反応混合物からトリメト
キシシランを蒸留分離するにあたり、留出反応混
合物中のトリメトキシシランと未反応メタノール
とが反応してテトラメトキシシランが生成し、こ
の結果、トリメトキシシラの生成量が減少すると
いう問題がある。
そこで、本発明者らは、上記反応混合物中のト
リメトキシシランを安定化する方法について検討
したところ、反応混合物中に特定のアミノ酸を存
させることにより、トリメトキシシランと本反応
メタノールとの反応を有効に抑止し、トリメトキ
シシランを著しく安定化し得ることを見出し、本
発明に到達した。
すなわち、本発明の目的は、銅触媒の存在下、
珪素とメチルアルコールとを反応させて得られる
反応混合物中のトリメトキシシランを安定化する
ことであり、この目的は、上記反応混合物中に、
一般式
The present invention relates to a method for stabilizing trimethoxysila. Specifically, the present invention relates to a method for stabilizing trimethoxysilane in a reaction mixture containing trimethoxysilane obtained by reacting silicon and methyl alcohol in the presence of a copper catalyst. Conventionally, trimethoxysilane is produced by reacting silicon metal and methyl alcohol at 100 to 300°C in the presence of a copper catalyst, distilling the resulting trimethoxysilane out of the system together with unreacted methyl alcohol, and then A method of separating trimexysilane by distillation from a distillation reaction mixture is known. However, in the above method, when storing the distillation reaction mixture or separating trimethoxysilane from the distillation reaction mixture by distillation, trimethoxysilane in the distillation reaction mixture and unreacted methanol react to form tetramethoxysilane. is produced, and as a result, there is a problem that the amount of trimethoxysila produced decreases. Therefore, the present inventors investigated a method for stabilizing trimethoxysilane in the above reaction mixture, and found that by allowing a specific amino acid to exist in the reaction mixture, the reaction between trimethoxysilane and methanol in the main reaction could be suppressed. It has been discovered that trimethoxysilane can be effectively suppressed and significantly stabilized, leading to the present invention. That is, the object of the present invention is to
The purpose is to stabilize trimethoxysilane in the reaction mixture obtained by reacting silicon and methyl alcohol;
general formula
【式】(Rは水素、炭素数1〜
20のアルキル基、または炭素数7〜20のアラルキ
ル基を示す)で表わされるアミノ酸を存在させる
ことによつて達成される。
次に、本発明を詳細に説明する。
本発明方法においては、珪素とメチルアルコー
ルとを銅触媒存在下、気相系又は液相系で反応さ
せて、トリメトキシシランを製造する。
珪素としては、通常、純度が88〜99.9%の珪素
金属を200μ以下、好ましくは100μ以下の平均粒
度に粉砕したものが用いられる。
銅触媒としては、金属銅または銅化合物などの
銅触媒が好適に用いられる。銅化合物としては、
ハロゲン化物、カルボン酸塩、キレート化合物、
酸化物などの種々のものを用いることができ、具
体的には、例えば、塩化第1銅、塩化第2銅、シ
ユウ化第1銅、シユウ化第2銅、ヨウ化第1銅、
ヨウ化第2銅、ギ酸銅、銅アセチルアセトナー
ト、酢酸第1銅、酢酸第2銅、酸化第1銅などが
挙げられる。銅触媒の使用量は珪素金属1モルに
対して0.0001〜0.5倍モルの範囲から選ばれる。
反応を液相系で行なう場合、珪素金属1gに対
して、1ml〜10の範囲で溶媒が使用される。溶
媒としては、例えば、クメン、n―ブチルベンゼ
ン、シメン、ヘキサメチルベンゼン、トリエチル
ベンゼン、オクチルベンゼン、ドデシルベンゼ
ン、ジドデシルベンゼン等のアルキルベンゼン
類、ナフタリン、メチルナフタリン、プロピルナ
フタリン、ジプロピルナフタリン、トリプロピル
ナフタリン等のアルキルナフタリン類、または、
n―デカン、ドデカン、テトラデカン、オクタデ
カン、流動パラフイン等の脂肪族炭化水素、また
は、ジフエニルメタン、トリフエニルメタン、ジ
トリルメタン、ベンジルトルエン、ジベンジルト
ルエン、ジベンジルキシレン等のアリールメタン
類などが用いられる。
メチルアルコールの使用量は珪素金属1モルに
対して0.1〜100倍モル、好ましくは1〜50倍モル
の範囲から選ばれる。
反応温度は、100〜300℃の範囲で適宜選ばれ
る。
反応圧は、減圧、常圧、加圧いずれでもよく、
好ましくは、500mmHg〜2000mmHgから選ばれ
る。
トリメトキシシランは、反応終了後、または反
応中連続的に系外へ留出させる。
得られる留出反応混合物中には、トリメトキシ
シランのほかに、モノメトキシシラン、ジメトキ
シシラン、テトラメトキシシランおよび、未反応
メチルアルコール等が含まれる。
本発明方法では、トリメトキシシランを含む反
応混合物中に一般式This is achieved by the presence of an amino acid represented by the formula: (R represents hydrogen, an alkyl group having 1 to 20 carbon atoms, or an aralkyl group having 7 to 20 carbon atoms). Next, the present invention will be explained in detail. In the method of the present invention, trimethoxysilane is produced by reacting silicon and methyl alcohol in the presence of a copper catalyst in a gas phase system or a liquid phase system. As silicon, silicon metal having a purity of 88 to 99.9% is usually ground to an average particle size of 200 microns or less, preferably 100 microns or less. As the copper catalyst, a copper catalyst such as metallic copper or a copper compound is preferably used. As a copper compound,
halides, carboxylates, chelate compounds,
Various oxides can be used, and specifically, for example, cuprous chloride, cupric chloride, cuprous oxalide, cupric oxalide, cuprous iodide,
Examples include cupric iodide, copper formate, copper acetylacetonate, cuprous acetate, cupric acetate, cuprous oxide, and the like. The amount of copper catalyst to be used is selected from the range of 0.0001 to 0.5 times the mole of silicon metal. When the reaction is carried out in a liquid phase system, a solvent is used in an amount of 1 ml to 10 ml per gram of silicon metal. Examples of solvents include alkylbenzenes such as cumene, n-butylbenzene, cymene, hexamethylbenzene, triethylbenzene, octylbenzene, dodecylbenzene, and didodecylbenzene, naphthalene, methylnaphthalene, propylnaphthalene, dipropylnaphthalene, and tripropyl. Alkylnaphthalenes such as naphthalene, or
Aliphatic hydrocarbons such as n-decane, dodecane, tetradecane, octadecane, and liquid paraffin, and arylmethanes such as diphenylmethane, triphenylmethane, ditolylmethane, benzyltoluene, dibenzyltoluene, and dibenzylxylene are used. The amount of methyl alcohol to be used is selected from the range of 0.1 to 100 times, preferably 1 to 50 times, per mole of silicon metal. The reaction temperature is appropriately selected within the range of 100 to 300°C. The reaction pressure may be reduced pressure, normal pressure, or increased pressure.
Preferably, it is selected from 500 mmHg to 2000 mmHg. Trimethoxysilane is distilled out of the system after the reaction is completed or continuously during the reaction. The resulting distillation reaction mixture contains, in addition to trimethoxysilane, monomethoxysilane, dimethoxysilane, tetramethoxysilane, unreacted methyl alcohol, and the like. In the method of the present invention, the general formula
【式】で表わされ
るアミノ酸を存在させることが必要である。
上記一般式でRは水素、炭素数1〜10のアルキ
ル基、または炭素数7〜20のアラルキル基を示
す。
具対的には、アルキル基としては、メチル、エ
チル、プロピル、ブチル、などが挙げられ、ま
た、アラルキル基としては、ベンジル、フエニル
エチルなどが挙げられる。
本発明で用いられるアミノ酸の具体例として
は、グリシン、アラニン、バリン、ロイシン、イ
ソロイシン、フエニルアラニンなどが挙げられ
る。
アミノ酸の添加量は、反応混合物に対して、
0.0001〜50重量%の範囲、好ましくは、0.001〜
1重量%である。
トリメトキシシランを含む反応混合物に上記ア
ミノ酸を存在させるには、トリメトキシシラン生
成反応後、留出する反応混合物に上記アミノ酸を
添加すれば良いが、原料(例えばメタノール)と
共に反応系に上記アミノ酸を添加し、あるいはト
リメトキシシラン生成反応終了後、トリメトキシ
シランを含む反応混合物を留出させる前に、反応
混合物中に上記アミノ酸を添加しても良い。
以上、詳細に説明したように、本発明によれば
珪素とメチルアルコールとから得られる反応混合
物中のトリメトキシシランを有効に安定化するこ
とができる。
次に、本発明を実施例により具体的に説明する
が、本発明はその要旨を超えない限り、以下の実
施例に限定されるものではない。
実施例 1
アルコール導入管、撹拌器、および生成物留出
管を有する500c.c.反応容器に珪素金属粉末(純度
98%)100.0g、塩化第1銅5.0gおよびドデシル
ベンゼン200c.c.を仕込んだ。留出管出口には冷却
器を付し留出する生成トリメトキシシランおよび
未反応メチルアルコール等を捕集できるようにし
た。
反応器を加温し、浴温が200℃に達したところ
で導入管よりメチルアルコールの導入を開始し
た。メチルアルコールの導入速度は反応中75c.c./
時で一定にした。
導入開始後、7.5時間経過した後の留出反応混
合物の全量は544.6gであつた。
混合物中の成分量は、メチルアルコール194.3
g、トリメトキシシラン286.9g、テトラメトキ
シシラン42.4g等であつた。
この反応混合物の1/10量をとり、これに、グリ
シン0.50gを添加し、室温で40時間放置したとこ
ろ、反応混合物中のトリメトキシシランの残存量
は27.2gであり、残存率は、94.8%であつた。
ここで残存率は、反応直後のトリメトキシシラ
ン量に対する40時間経過したのちトリメトキシシ
ラン量の割合(重量%)である。
比較のため、上記留出反応混合物を、グリシン
の添加を省略して40時間放置したところ、トリメ
トキシシランの残存率は50.1%であつた。
実施例 2
添加物としてグリシンの代りにアラニンを0.51
g添加した以外は、実施例1と全く同様に、留出
反応混合物を40時間放置したところ、トリメトキ
シシランの残存率は96.0%であつた。It is necessary for the amino acid represented by the formula to be present. In the above general formula, R represents hydrogen, an alkyl group having 1 to 10 carbon atoms, or an aralkyl group having 7 to 20 carbon atoms. Specifically, examples of alkyl groups include methyl, ethyl, propyl, butyl, and the like, and examples of aralkyl groups include benzyl, phenylethyl, and the like. Specific examples of amino acids used in the present invention include glycine, alanine, valine, leucine, isoleucine, and phenylalanine. The amount of amino acid added is based on the reaction mixture.
Range of 0.0001 to 50% by weight, preferably 0.001 to 50% by weight
It is 1% by weight. In order to make the above amino acid exist in a reaction mixture containing trimethoxysilane, it is sufficient to add the above amino acid to the reaction mixture distilled out after the trimethoxysilane production reaction. Alternatively, the above-mentioned amino acid may be added to the reaction mixture after the trimethoxysilane production reaction is completed and before the reaction mixture containing trimethoxysilane is distilled off. As described above in detail, according to the present invention, trimethoxysilane in a reaction mixture obtained from silicon and methyl alcohol can be effectively stabilized. Next, the present invention will be specifically explained using Examples, but the present invention is not limited to the following Examples unless it exceeds the gist thereof. Example 1 Silicon metal powder (purity
98%), 5.0 g of cuprous chloride, and 200 c.c. of dodecylbenzene. A condenser was attached to the outlet of the distillation tube to collect trimethoxysilane produced and unreacted methyl alcohol, etc., which were distilled out. The reactor was heated, and when the bath temperature reached 200°C, introduction of methyl alcohol was started from the introduction tube. The introduction rate of methyl alcohol is 75c.c./during the reaction.
It was kept constant over time. The total amount of the distilled reaction mixture 7.5 hours after the start of introduction was 544.6 g. The amount of ingredients in the mixture is methyl alcohol 194.3
g, trimethoxysilane 286.9g, tetramethoxysilane 42.4g, etc. When 1/10 of this reaction mixture was taken, 0.50 g of glycine was added thereto, and the mixture was left to stand at room temperature for 40 hours, the remaining amount of trimethoxysilane in the reaction mixture was 27.2 g, and the residual rate was 94.8. It was %. Here, the residual rate is the ratio (% by weight) of the amount of trimethoxysilane after 40 hours to the amount of trimethoxysilane immediately after the reaction. For comparison, when the distillation reaction mixture was allowed to stand for 40 hours without adding glycine, the residual rate of trimethoxysilane was 50.1%. Example 2 Add 0.51 alanine instead of glycine as an additive
When the distillation reaction mixture was left to stand for 40 hours in the same manner as in Example 1 except that g was added, the residual rate of trimethoxysilane was 96.0%.
Claims (1)
反応させて得られているトリメトキシシランを含
む反応混合物中に一般式【式】(Rは 水素、炭素数1〜20のアルキル基または炭素数7
〜20のアラルキル基を示す)で表わされるアミノ
酸を存在させることを特徴とするトリメトキシシ
ラの安定化方法。[Claims] 1. In a reaction mixture containing trimethoxysilane obtained by reacting silicon and methyl alcohol using a copper catalyst, a compound having the general formula [Formula] (R is hydrogen, and has 1 to 20 carbon atoms) Alkyl group or carbon number 7
1. A method for stabilizing trimethoxysila, characterized in that an amino acid represented by ~20 aralkyl groups is present.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14634378A JPS5572197A (en) | 1978-11-27 | 1978-11-27 | Stabilization of trimethoxysilane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14634378A JPS5572197A (en) | 1978-11-27 | 1978-11-27 | Stabilization of trimethoxysilane |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5572197A JPS5572197A (en) | 1980-05-30 |
| JPS6121477B2 true JPS6121477B2 (en) | 1986-05-27 |
Family
ID=15405546
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14634378A Granted JPS5572197A (en) | 1978-11-27 | 1978-11-27 | Stabilization of trimethoxysilane |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5572197A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1323037C (en) * | 1987-02-23 | 1993-10-12 | Yoshiro Ohta | Process for the production of trialkoxysilanes |
| US4727173A (en) * | 1987-03-31 | 1988-02-23 | Union Carbide Corporation | Process for producing trialkoxysilanes from the reaction of silicon metal and alcohol |
| US4761492A (en) * | 1987-09-28 | 1988-08-02 | Union Carbide Corporation | Process for recovering trimethoxysilane from a trimethoxysilane and methanol mixture |
| DE3829510C1 (en) * | 1988-08-31 | 1989-09-21 | Huels Ag, 4370 Marl, De |
-
1978
- 1978-11-27 JP JP14634378A patent/JPS5572197A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5572197A (en) | 1980-05-30 |
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