JPS6139730B2 - - Google Patents
Info
- Publication number
- JPS6139730B2 JPS6139730B2 JP52024777A JP2477777A JPS6139730B2 JP S6139730 B2 JPS6139730 B2 JP S6139730B2 JP 52024777 A JP52024777 A JP 52024777A JP 2477777 A JP2477777 A JP 2477777A JP S6139730 B2 JPS6139730 B2 JP S6139730B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- coaxial
- discharge
- tube
- discharge tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2477777A JPS53110378A (en) | 1977-03-09 | 1977-03-09 | Plasma carrying device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2477777A JPS53110378A (en) | 1977-03-09 | 1977-03-09 | Plasma carrying device |
Related Child Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17294883A Division JPS59103341A (ja) | 1983-09-21 | 1983-09-21 | プラズマ処理装置 |
| JP58172946A Division JPS59103331A (ja) | 1983-09-21 | 1983-09-21 | プラズマ処理装置 |
| JP58172947A Division JPS59103340A (ja) | 1983-09-21 | 1983-09-21 | プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS53110378A JPS53110378A (en) | 1978-09-27 |
| JPS6139730B2 true JPS6139730B2 (fr) | 1986-09-05 |
Family
ID=12147595
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2477777A Granted JPS53110378A (en) | 1977-03-09 | 1977-03-09 | Plasma carrying device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS53110378A (fr) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5440078A (en) * | 1977-09-06 | 1979-03-28 | Fujitsu Ltd | Ion milling device |
| JPS56155535A (en) * | 1980-05-02 | 1981-12-01 | Nippon Telegr & Teleph Corp <Ntt> | Film forming device utilizing plasma |
| US4515107A (en) * | 1982-11-12 | 1985-05-07 | Sovonics Solar Systems | Apparatus for the manufacture of photovoltaic devices |
| JP5307383B2 (ja) * | 2007-11-26 | 2013-10-02 | 株式会社アルバック | 真空処理装置 |
| CN117105521B (zh) * | 2023-10-25 | 2024-01-19 | 武汉市飞瓴光电科技有限公司 | 一种制备掺杂二氧化硅材料的装置及方法 |
-
1977
- 1977-03-09 JP JP2477777A patent/JPS53110378A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS53110378A (en) | 1978-09-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4607073B2 (ja) | マイクロ波共鳴プラズマ発生装置、該装置を備えるプラズマ処理システム | |
| KR920002864B1 (ko) | 플라즈마 처리방법 및 그 장치 | |
| US4866346A (en) | Microwave plasma generator | |
| US4939424A (en) | Apparatus for producing a plasma and for the treatment of substrates | |
| KR101119627B1 (ko) | 플라즈마 처리 장치 | |
| US5053244A (en) | Process for depositing silicon oxide on a substrate | |
| US6225592B1 (en) | Method and apparatus for launching microwave energy into a plasma processing chamber | |
| JPS59103340A (ja) | プラズマ処理装置 | |
| JPS59103331A (ja) | プラズマ処理装置 | |
| JP2000073175A (ja) | 表面処理装置 | |
| JPS59103341A (ja) | プラズマ処理装置 | |
| KR970008650B1 (ko) | 여기원자선원 | |
| JP3089116B2 (ja) | 電子サイクロトロン共鳴プラズマcvd装置 | |
| JPH05290995A (ja) | プラズマ発生装置 | |
| JP2595128B2 (ja) | マイクロ波プラズマ処理装置 | |
| JPH1154296A (ja) | プラズマ発生装置およびプラズマ装置 | |
| JPH06101442B2 (ja) | Ecrプラズマ反応装置 | |
| JP2697464B2 (ja) | マイクロ波プラズマ処理装置 | |
| JP3208995B2 (ja) | プラズマ処理方法及び装置 | |
| JP2001118698A (ja) | 表面波励起プラズマの生成方法およびプラズマ発生装置 | |
| JPH08236448A (ja) | スパッタリング装置及びスパッタリング方法 | |
| JP2003086398A (ja) | プラズマ処理装置 | |
| JPS59161035A (ja) | プラズマ発生装置 | |
| JP2548785B2 (ja) | 電子サイクロトロン共鳴プラズマの化学蒸着装置 | |
| JP2974635B2 (ja) | マイクロ波プラズマ発生装置 |