JPS6141902A - Detecting device for position - Google Patents

Detecting device for position

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Publication number
JPS6141902A
JPS6141902A JP16399184A JP16399184A JPS6141902A JP S6141902 A JPS6141902 A JP S6141902A JP 16399184 A JP16399184 A JP 16399184A JP 16399184 A JP16399184 A JP 16399184A JP S6141902 A JPS6141902 A JP S6141902A
Authority
JP
Japan
Prior art keywords
optical
optical system
sample
signal
sample surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16399184A
Other languages
Japanese (ja)
Inventor
Takeshi Yamaguchi
武 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP16399184A priority Critical patent/JPS6141902A/en
Publication of JPS6141902A publication Critical patent/JPS6141902A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To perform accurate position detection even when a distribution having locally different reflection characteristics on a sample surface where a photomark is formed is provided by using the signal of an optical system which is not affected by irregular reflection characteristics between orthogonal oblique incidence type position detection optical systems. CONSTITUTION:Oblique incidence type position detection optical systems each consisting of a projection optical system which consists of a light source 1, condenser lens 2, rectangular aperture stop 3, and projection lens 4 and projects a photomark on the surface of a sample 5 slantingly and a convergence optical system which has an optical axis l2 in the same plane with the optical axis l1 of the projection optical system and converges reflected light from the photomark on a two-dimensional optical position detector 8 are arranged in a couple while planes containing their optical axes cross each other at right angles so that photomarks are superposed one over another on the surface of the sample 5. Then, the output coordinate signal of one two-dimensional optical position detector 8 or 8' is monitored to decide whether the movement of the gravity center of the light quantity of the other detector is caused by movement perpendicular to the surface of the sample 5 or irregularity of reflection characteristics on the surface of the sample 5.

Description

【発明の詳細な説明】 (発明の技術分野) 本発明は、試料面の位t’を検出する位置検出装置に関
する。
DETAILED DESCRIPTION OF THE INVENTION (Technical Field of the Invention) The present invention relates to a position detection device for detecting the position t' of a sample surface.

(発明の背景) 従来、位置検出装置として斜入射型のものが知られてい
る。この種のものは、例えば試料面に斜め方向から元ビ
ームを投影する投影光学系を設けると共に、試料面から
の反射光ビームを受光する友めの光電変換素子を有する
受光光学系金膜け、光電変換素子の受光面での反射光ビ
ームの位置変化から試料面の位置を検出しようと−rる
ものであって、焦点位置の設定を自動的に行なう装置等
に用いられている。
(Background of the Invention) Oblique incidence type position detection devices have been known as position detection devices. This type of device is, for example, provided with a projection optical system that projects the original beam onto the sample surface from an oblique direction, and a gold-plated light receiving optical system that has a companion photoelectric conversion element that receives the reflected light beam from the sample surface. It attempts to detect the position of a sample surface from changes in the position of a reflected light beam on the light receiving surface of a photoelectric conversion element, and is used in devices that automatically set the focal position.

一方、例えば%開昭56−137101号公報に開示さ
れている如く、所定の面積を有する充電変換層と、4辺
に位置信号端子を有すると共に前記光電変換層に積層し
た均一な抵抗層と、前記光電変換層の前記抵抗層と反対
の面に積層した共通端子を有する導電層とからなり、光
の入射し九点(光量分布の中心位置・・・以下重心位置
と称す)で充電変換層に生じ7t1!荷゛金前記抵抗層
と前記位置信号端子を経由して放電するとき、対向する
前記位置信号端子に分流しt電荷の差によって入射光の
重心位置を直交座標系による座標信号V、Hとして出力
する2次元光位置検出器が知られている。
On the other hand, as disclosed in, for example, Japanese Patent Publication No. 56-137101, a charge conversion layer having a predetermined area, a uniform resistance layer having position signal terminals on four sides and laminated on the photoelectric conversion layer, The photoelectric conversion layer is composed of a conductive layer laminated on the opposite side of the resistive layer and has a common terminal, and the photoelectric conversion layer is charged at nine points where light is incident (the center position of the light intensity distribution...hereinafter referred to as the center of gravity position). Occurred on 7t1! When a charge is discharged via the resistive layer and the position signal terminal, it is shunted to the opposing position signal terminal and outputs the center of gravity position of the incident light as coordinate signals V and H based on a rectangular coordinate system based on the difference in charges. Two-dimensional optical position detectors are known.

そこでこのような2次元光位置検出器を上述の光電変換
素子として用いると、座標信号としては入射光ビームの
重心位置に対応し九座標信号が得られるから(試料面の
一方向の移動は受光面では反射光ビームの一方向の移動
となるから、この一方向を受光面での座標系の一方に一
致させておけば、例えば座標信号Vにのみ着目すれば良
い。勿論この場合には一次元の光位置検出器を用いるこ
とができる。)所定の形状の光マークを斜め方向から試
料面に投影する投影光学系と、この投影光学系と同一平
面内に光軸を有し、上記2次元光位置検出器に上記光マ
ークを結はする結處光学系を設けることにより、2次元
光位置検出器の座標信号v、Hを試料面の位置に対応す
るように簡単に構成することもできる。
Therefore, if such a two-dimensional optical position detector is used as the above-mentioned photoelectric conversion element, a nine-coordinate signal corresponding to the barycenter position of the incident light beam can be obtained as a coordinate signal (movement of the sample surface in one direction is caused by light reception). Since the reflected light beam moves in one direction on the surface, if this one direction is made to coincide with one of the coordinate systems on the light receiving surface, it is sufficient to focus only on the coordinate signal V.Of course, in this case, the first-order (The original optical position detector can be used.) A projection optical system that projects an optical mark of a predetermined shape onto the sample surface from an oblique direction, and an optical axis in the same plane as this projection optical system; By providing an optical system that connects the optical mark to the dimensional optical position detector, the coordinate signals v and H of the two-dimensional optical position detector can be easily configured to correspond to the position on the sample surface. can.

しかしながら、このような2次元光位置検出器金光電変
換素子として用いると、光マークの形成される試料面の
反射特性が場所的に異なり九分布を与えるような場合、
信号V、Hと試料面の位置とが対応しなくなってしまう
However, when such a two-dimensional optical position detector is used as a gold photoelectric conversion element, when the reflection characteristics of the sample surface on which optical marks are formed vary depending on the location and give a nine-dimensional distribution,
The signals V and H no longer correspond to the position of the sample surface.

従って、正確な位置測定ができなくなるという欠点が生
じてしまう。
Therefore, there arises a drawback that accurate position measurement cannot be performed.

(発明の目的) 本発明はこのように光電変換素子として2次元光位置検
出器を用いた場合の欠点を解消し、光マークの形成され
る試料面の反射特性が場所的に異なった分布金与えても
、正確に位置検出を行なうことのできる位置検出装置を
得ることを目的とする。
(Objective of the Invention) The present invention solves the drawbacks of using a two-dimensional optical position detector as a photoelectric conversion element, and solves the problem of distributing metals in which the reflection characteristics of the sample surface on which optical marks are formed differ depending on the location. It is an object of the present invention to provide a position detection device capable of accurately detecting a position even when the load is given.

(発明の概要) 本発明は、所定の形状の光マークを試料面に斜め方向か
ら投影する投影光学系と、この投影光学系の光軸と同一
平面内圧光軸を有し、光量重心位置に相当する直交座標
信号を出力する2次元光位置検出器に前記光マークの試
料面での反射光金集光する集光光学系と、からなる斜入
射型位置検出光学系を、試料面が所定の位置にあるとき
に互いの光マークが試料面上で重なるように各々の光軸
を含むak直交せしめて一対配設し、前記2次元光位置
検出器の一方における光量重心位置の移動が、試料面に
垂直な方向への移動によるのか、試料面の反射特性の不
均一性によるのかを前記2次元元位置検出器の他方の出
力座標信号をモニターして判定する判定手段を設は文位
置検出装置である。
(Summary of the Invention) The present invention has a projection optical system that projects an optical mark of a predetermined shape onto a sample surface from an oblique direction, and an internal pressure optical axis that is coplanar with the optical axis of this projection optical system, and has a light intensity center position. When the sample surface is at a predetermined position, an oblique incidence type position detection optical system consisting of a condensing optical system that collects the reflected light from the sample surface of the optical mark on a two-dimensional optical position detector that outputs a corresponding orthogonal coordinate signal is used. A pair of optical marks including the respective optical axes are arranged perpendicularly to each other so that the optical marks overlap on the sample surface when the two-dimensional optical position detector is on the sample surface. A determination means is provided for monitoring the output coordinate signal of the other two-dimensional position detector to determine whether the movement is due to the movement in the direction perpendicular to the sample surface or the non-uniformity of the reflection characteristics of the sample surface. It is.

(実施例) 第1図は本発明の第1実施例に用いられる斜入射光学系
の基本的な構成を示す図である。光源lからの光はコン
デンサレンズ21に通して矩形開口絞り3i裏面から照
射する。矩形開口絞り3の矩形開口は投影レンズ4によ
って試料5の表面(試料面)に結像する。試料5は観察
用の対物レンズ6の光軸方向へ上下する不図示のステー
ジ上に載置され、第1図の状態では試料5の表面対物レ
ーンズ6の合焦位置に設定されているものと仮定する。
(Embodiment) FIG. 1 is a diagram showing the basic configuration of an oblique incidence optical system used in a first embodiment of the present invention. Light from the light source 1 passes through the condenser lens 21 and is irradiated from the back surface of the rectangular aperture diaphragm 3i. The rectangular aperture of the rectangular aperture stop 3 forms an image on the surface of the sample 5 (sample surface) by the projection lens 4 . The sample 5 is placed on a stage (not shown) that moves up and down in the optical axis direction of an observation objective lens 6, and in the state shown in FIG. Assume.

試料50表面に結像した矩形開口による反射光は焦光レ
ンズ7によって、2次元光位置検出器8上に集光し、検
出器8上には矩形開口が結欧する。
The reflected light from the rectangular aperture formed on the surface of the sample 50 is focused onto the two-dimensional optical position detector 8 by the focusing lens 7, and the rectangular aperture is focused on the detector 8.

そして、光源1.コンデンサレンズ2.矩形開口絞り3
.投影レンズ4によって形成される第1投影光学系の光
軸t1と試料50表面に垂直な対物レンズ60光軸ちと
なす角度は−ψ、でおり、集光レンズ7.2次元光位置
検出器8によって形成される第1集光光学系の光軸t、
と光軸4となす角度はψ1であり、第1投影光学系と第
1集光光学系とで第1の斜入射型位置検出光学系を形成
する。
And light source 1. Condenser lens 2. Rectangular aperture 3
.. The angle between the optical axis t1 of the first projection optical system formed by the projection lens 4 and the optical axis of the objective lens 60 perpendicular to the surface of the sample 50 is -ψ. The optical axis t of the first condensing optical system formed by
The angle formed between this and the optical axis 4 is ψ1, and the first projection optical system and the first condensing optical system form a first oblique incidence type position detection optical system.

そして本実施例では、US2図に示されたような概略的
な原理の平面図のように、試料の表面に垂直でかつ光軸
At 、4 k含む平面に直交する面内にも、第1図に
示した第1の斜入射型位置検出光学系と全く同一の光学
系にて形成される第2の斜入射型位置検出光学系が配設
されている。すなわち、第2の斜入射型位置検出光学系
を形成する投影光学系の光軸t1と第2集光光学系の光
軸t、が配設されている。なお、WJ1投影光学系、第
1集光光学系の各要素に対応するものにはプライムを付
して示す。そして、試料5が対物レンズ60合焦位置に
設定されている場合、両投形光学系によって試料5の表
面に形成される矩形開口像は互いに重なるように位置合
わせがなされている。
In this example, as shown in the schematic plan view of the principle shown in Fig. US2, the first A second oblique incidence position detection optical system is provided which is formed of the same optical system as the first oblique incidence position detection optical system shown in the figure. That is, the optical axis t1 of the projection optical system and the optical axis t of the second condensing optical system forming the second oblique incidence type position detection optical system are arranged. Note that elements corresponding to the WJ1 projection optical system and the first condensing optical system are indicated with a prime. When the sample 5 is set at the focal position of the objective lens 60, the rectangular aperture images formed on the surface of the sample 5 by both projection optical systems are aligned so as to overlap with each other.

いま、矩形開口1a30の生じている試料5の表面に反
射率の差が6v、具体的には第2図の斜線の部分が他の
部分より反射率が低いとすれば、2次元光位置検出器8
.8′上の矩形開口@は第2図に平面的に示した如く罠
なる。すなわち、2次元光位置検出器8では図のように
座標系の方向V。
Now, if there is a difference in reflectance of 6V on the surface of the sample 5 where the rectangular aperture 1a30 is formed, specifically, the shaded area in FIG. 2 has a lower reflectance than the other areas, two-dimensional optical position detection Vessel 8
.. The rectangular opening @ on 8' becomes a trap as shown in plan in FIG. That is, in the two-dimensional optical position detector 8, the direction V of the coordinate system is as shown in the figure.

Ht一定め、(第1斜入射光学系の光軸を含む面の方向
1v、それに直交する方向iHとする)かつ光電変換面
の中心t−原点とすれば、座標信号はvA=α、HA=
Oとなる。すなわち、斜線部分は光量が落ちるので、本
来はV、 W Oであるべきなのであるが、重心位置Q
Aは明るい方向(Vの正方向)に片寄るからである。従
りて、2次元光位置検出器8の出力信号のみから位置検
出を行なう場合には、試料が合焦位置裏り対物レンズ6
側にある、すなわち後ビン、と判断されてしまうわけで
ある。
If Ht is constant (the direction of the plane containing the optical axis of the first oblique incidence optical system is 1v, and the direction iH is orthogonal thereto), and the center of the photoelectric conversion surface is t - the origin, the coordinate signals are vA = α, HA =
It becomes O. In other words, since the light intensity falls in the shaded area, it should originally be V, W O, but the center of gravity position Q
This is because A is biased towards the bright direction (positive direction of V). Therefore, when position detection is performed only from the output signal of the two-dimensional optical position detector 8, if the sample is located behind the focal position of the objective lens 6.
It is judged that it is on the side, that is, in the rear bin.

一方、2次元光位置検出器8′側では図のように座標系
V、Hg定め(第2斜入射光学系の光軸と含む面の方向
1v、それに直交する方向をHとする)かり光電変換面
の中心を原点とすれば、座標信号はV1工Q 、 Hi
 =βとなる。
On the other hand, on the two-dimensional optical position detector 8' side, as shown in the figure, the coordinate system V, Hg is determined (direction 1v of the plane included in the optical axis of the second oblique incidence optical system, direction perpendicular to it is H), and the photoelectric If the center of the conversion plane is the origin, the coordinate signals are V1, Q, Hi
= β.

ここで、2次元光位置検出器8のV方向と2次元光位置
検出器8′のH方向の座標信号は近似的に等しく(すな
わち、上述の例ではαキβでおる)。
Here, the coordinate signals in the V direction of the two-dimensional optical position detector 8 and the coordinate signals in the H direction of the two-dimensional optical position detector 8' are approximately equal (that is, in the above example, α and β).

ま九2次元光位置検出器8のH方向と2次元光位置検出
器8′のV方向の座標信号も近似的に等しい(上の例で
は共に0とし九)。従って、もし2次元光位置検出器8
′のH方向での重心移動が見られない場合には、2次元
光位置検出器8のV方向の座標信号は試料の位置にのみ
起因するものであり、位置の正しい情報を与えているこ
とになる。逆に2次元光位置検出器8のH方向での重心
移動が見られない場合には、2次元光位置検出器8′の
■方向の座標信号は試料の位@VCのみ起因するもので
ろる。それ故、2次元光位置検出器8,8′の各々を互
いにモニターすることによって、正しい位置信号のみt
弁別することができる。
Also, the coordinate signals in the H direction of the two-dimensional optical position detector 8 and the coordinate signals in the V direction of the two-dimensional optical position detector 8' are approximately equal (both are set to 0 in the above example). Therefore, if the two-dimensional optical position detector 8
' If no movement of the center of gravity in the H direction is observed, the coordinate signal of the two-dimensional optical position detector 8 in the V direction is due only to the position of the sample and is providing correct positional information. become. On the other hand, if the center of gravity of the two-dimensional optical position detector 8 is not observed to move in the H direction, the coordinate signal in the ■ direction of the two-dimensional optical position detector 8' can be attributed only to the sample position @VC. . Therefore, by mutually monitoring each of the two-dimensional optical position detectors 8, 8', only the correct position signal t
can be discriminated.

@4図は2次元光位置検出器8,8′から得られる座標
信号を処理する回路の一実施例である。
Figure @4 shows an embodiment of a circuit that processes coordinate signals obtained from the two-dimensional optical position detectors 8 and 8'.

2次元光位置検出器8から得られる座標信号VAは、ア
ナログデジタルコンバーター(以下A/D変換器と称す
)9にてデジタル座標信号剋に変換され友後、第1セレ
クタlOの一方の入力端子に入力される。第1セレクタ
lOの他方の入力端子には、2次元光位置検出器8′か
らの座標信号v1’iA/D変換器11にて変換したデ
ジタル信号V≦が入力されている。第1セレクタ10の
制御端子vcは、2次元光位置検出器8′の座標信号H
aが所定の範囲に入っているか否か判定する第1ウイン
ドコンパレータ12の出力端子が接続されている。
The coordinate signal VA obtained from the two-dimensional optical position detector 8 is converted into a digital coordinate signal by an analog-to-digital converter (hereinafter referred to as A/D converter) 9, and then sent to one input terminal of the first selector IO. is input. The coordinate signal v1'i from the two-dimensional optical position detector 8' is inputted to the other input terminal of the first selector lO, and the digital signal V≦ converted by the A/D converter 11 is input. The control terminal VC of the first selector 10 receives the coordinate signal H of the two-dimensional optical position detector 8'.
The output terminal of a first window comparator 12 that determines whether or not a is within a predetermined range is connected.

第1ウインドコンパレータ12は位置検出の精度にエフ
決定される電圧”t + vt t”上限、下限の電圧
として有し、座標信号H1がウィンド電圧■I rV!
の間にあれば第1信号を、それ以外のときは一第2信号
を出力する。第1セレクタ10は制御信号として第1信
号が入力されるとA/D変換器9の出力信号Vi k出
力端子に出力し、制御信号として第2gI号が入力され
るとA/D変換器11の出力信号vIt−出力端子に出
力する。第1セレクタ10の出力端子は第2セレクタ1
4の一方の入力端子に接続される。第2セレクタ14の
他方の入力端子はアース電位に落とされている。第2セ
レクタ14の制御端子にはオアゲート15の出力端子が
接続されており、オアゲート15の一方の入力端子には
@1ウィンドコンパレータ12の出力端子が接続され、
他方の入力端子には、2次元光位置換出器8の座標信号
HAt−ウィンド電圧vI +Vtと比較する第2ウイ
ンドコンパレータ13の出力端子が接続されている。第
2ウインドコンパレータ13は第1ウインドコンパレー
タ12と同じものであって、座標信号H^がウィンド電
圧V、、V、の間にあれば第1信号【出力し、それ以外
のときは第2信号を出力する。第2セレクタ14は制御
端子に8gl信号が入力されれば第1セレクタ10から
の信号を出力し、第2信号が入力されればアース電位音
出力する。オアゲート15はいずれかの入力端子が@1
信号であると第1信号倉出力し、それ以外のときは第2
信号を出力する。オアゲート15から出力される第2信
号は異状警告信号としても用いられている。
The first window comparator 12 has a voltage "t + vt t" as the upper and lower limit voltages determined by the accuracy of position detection, and the coordinate signal H1 is the window voltage ■I rV!
If there is a difference between the two, the first signal is output, and otherwise, the first and second signals are output. When the first selector 10 receives the first signal as a control signal, it outputs it to the output signal Vi k of the A/D converter 9, and when the second gI signal is input as the control signal, it outputs it to the A/D converter 11. The output signal vIt- is outputted to the output terminal. The output terminal of the first selector 10 is the second selector 1
Connected to one input terminal of 4. The other input terminal of the second selector 14 is grounded. The output terminal of the OR gate 15 is connected to the control terminal of the second selector 14, and the output terminal of the @1 window comparator 12 is connected to one input terminal of the OR gate 15.
The other input terminal is connected to the output terminal of a second window comparator 13 which is compared with the coordinate signal HAt of the two-dimensional light position displacement device 8 minus the window voltage vI +Vt. The second window comparator 13 is the same as the first window comparator 12, and outputs the first signal if the coordinate signal H^ is between the window voltages V, , V, and otherwise outputs the second signal. Output. The second selector 14 outputs the signal from the first selector 10 when the 8gl signal is input to the control terminal, and outputs a ground potential sound when the second signal is input. Either input terminal of OR gate 15 is @1
If it is a signal, the first signal is output, otherwise the second signal is output.
Output a signal. The second signal output from the OR gate 15 is also used as an abnormality warning signal.

このような宿造であるから、座標信号Haがウィンド電
圧■1とvtの間にあってウィンドコンパレータ12か
ら第1信号が生じていれば、セレクタ10はA/D変換
器9からの座標信号Va’ k出力する。そして、オア
ゲート15は、入力信号の少くともいずれか一方が第1
信号であれば、セレクタ10からの信号を出力するから
、セレクタ14からは座標信号■ム′が出力される。こ
の信号は不図示のステージの合焦位置からのずれに対応
したvt有する。また、ウィンドコンパレータ12から
第2信号が生じていれば、セレクタlOはA/D変換器
11からの座標信号V1’を出力する。そしてこの場合
は、座標信号H^がウィンド電圧V。
Because of this arrangement, if the coordinate signal Ha is between the window voltages 1 and vt and the first signal is generated from the window comparator 12, the selector 10 selects the coordinate signal Va' from the A/D converter 9. Output k. The OR gate 15 is configured such that at least one of the input signals is the first one.
If it is a signal, the signal from the selector 10 is output, and the selector 14 outputs the coordinate signal ``M''. This signal has vt corresponding to the deviation of the stage (not shown) from the in-focus position. Further, if the second signal is generated from the window comparator 12, the selector lO outputs the coordinate signal V1' from the A/D converter 11. In this case, the coordinate signal H^ is the window voltage V.

と■!の間にあって、第2ウインドコンパレータ13が
第1信号を出力していれば、座標信号y 、1はセレク
タ14金通って出力される(この信号もステージの合焦
位置からのずれに対応した値を有する。)が、第2ウイ
ンドコンパレータ13が第2信号を出力していれば、セ
レクタ14はアース電位全出力し、一方、オアゲート1
5の第2信号は異状信号として測定不能の警告用に使わ
れる。
And■! If the second window comparator 13 is outputting the first signal during this period, the coordinate signal y, 1 is output through the selector 14 (this signal also has a value corresponding to the deviation from the focus position of the stage). ), if the second window comparator 13 outputs the second signal, the selector 14 outputs the full ground potential, while the OR gate 1
The second signal No. 5 is used as an abnormality signal to warn that measurement is not possible.

従って、本実施例の装置に裏れば、矩形開口像の生じて
いる標本の表面の反射特性が部分的に異なっていても、
直交する斜入射型位置検出光学系のうち、上述の不均一
な反射特性の影響?受けない方の光学系による信号音用
いるようにしているので精度の良い位置検出が可能であ
る。
Therefore, according to the apparatus of this embodiment, even if the reflection characteristics of the surface of the specimen on which the rectangular aperture image is generated are partially different,
What is the effect of the above-mentioned non-uniform reflection characteristics in the orthogonal oblique incidence position detection optical system? Since the signal sound from the optical system that does not receive the signal is used, highly accurate position detection is possible.

そして得られ九合焦位置からのずれに対応する信号はず
れの方向tも示しているものであるから不図示のステー
ジの上下動を制御するモータの駆動回路にセレクタ14
の出力信号を入力するようにしておけば、オートフォー
カスが実現できる。
Since the obtained signal corresponding to the deviation from the nine in-focus position also indicates the direction t of the deviation, the selector 14 is used in the drive circuit of the motor that controls the vertical movement of the stage (not shown).
Autofocus can be achieved by inputting the output signal of

勿論、セレクタ14の出力信号t−表示し、表示値がO
になるようにステージをマニュアル駆動するように成し
ても良い。ま九、試料5の対物レンズ60光軸方向の位
置を表示するように成しても良い。
Of course, the output signal t of the selector 14 is displayed, and the displayed value is O.
The stage may be manually driven so as to achieve this. Furthermore, the position of the sample 5 in the optical axis direction of the objective lens 60 may be displayed.

第2図の状態のときには、l(s+βであるが、この場
合は重心移動が許容範囲外で心り、βは電圧V、 、 
V、の間にはない。従って、セレクタ10はV11′=
0ヲ出力し、セレクタ14はHム;0であるからセレク
タ10からのV++’ = Of、出力する。従って、
試料50表面は合焦位置にあることがわかる。
In the state shown in Fig. 2, l(s+β), but in this case, the center of gravity moves outside the allowable range, and β is the voltage V,
It is not between V. Therefore, the selector 10 has V11'=
0 is output, and the selector 14 outputs Hm;0, so V++' = Of from the selector 10. Therefore,
It can be seen that the surface of the sample 50 is in the focused position.

なお、以上の実施例では矩形開口絞り3金用いたが、絞
り開口の形状は矩形に限らず、円形その他であっても構
わず、また、一つの斜入射型位置検出器において投影光
学系と集光光学系が試料面に立てた法線となす角度の絶
対値は等しくなくてもよい。ただし試料面が鏡面に近い
場合は等しくなくてはいけない。
In the above embodiments, a rectangular aperture diaphragm was used, but the shape of the diaphragm aperture is not limited to rectangular, and may be circular or other shapes. The absolute values of the angles that the condensing optical system makes with the normal to the sample surface do not have to be equal. However, if the sample surface is close to a mirror surface, they must be equal.

また、上述の実施例の如く、2次元光位置検出器の座標
の一方が試料面の移動方向に対応していることが信号処
理の上で簡単になる利点はある−が、この工うな位置関
係にしなければ目的が達成されないわけではなく、補正
演算上すること?いとわなければ、同様のことが行なえ
る。
Furthermore, as in the above embodiment, one of the coordinates of the two-dimensional optical position detector corresponds to the moving direction of the sample surface, which has the advantage of simplifying signal processing. It doesn't mean that the purpose cannot be achieved unless it is related, but is it something to do in the correction calculation? You can do the same thing if you are willing.

また、対物レンズ6の合焦位置に試料面がある二きに2
次元光位置検出器と試料面とが共役になっていることは
必ずしも必要ではなく、いずれも電気的な座標位置の補
正全行なうことにエフ本発明の目的を達成することがで
きる。
In addition, when the sample surface is at the focal position of the objective lens 6,
It is not necessarily necessary that the dimensional optical position detector and the sample surface be conjugated, and the object of the present invention can be achieved by performing all electrical coordinate position corrections in either case.

また、測定面がウェハの如き直交する方向へ規則性を有
するパターンの形成されたものの場合、パターンの各々
の方向へ一対の斜光照明光学系の光軸を含む面?各々一
致させる如く構成すれば、反射特性の不均一性の方向も
パターンの方向へ一致している場合が多いので、測定不
能の確率?小さくすることができる。
In addition, in the case of a measurement surface having a pattern formed with regularity in orthogonal directions, such as a wafer, a surface including the optical axes of a pair of oblique illumination optical systems in each direction of the pattern? If they are configured so that they match, the direction of the non-uniformity of the reflection characteristics will often match the direction of the pattern, so there is a probability that it will not be measurable. Can be made smaller.

(発明の効果) 以上述べた如く本発明によれば、反射面にムラがあって
も正しい位置情報のみが得られるから、例えばステージ
?連続移動させて試料面の高さ金堂に一定の位置に設定
しておく必要のある各種の装置に有効である。
(Effects of the Invention) As described above, according to the present invention, only correct position information can be obtained even if there is unevenness on the reflecting surface. This method is effective for various types of equipment that require continuous movement and setting of the sample surface at a constant height.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の第1実施例に用いられる斜入射光学系
の基本的な構成を示す図、第2図は本発明の第1実施例
の原理を概略的に示す平面図、第3図は第2図の2次元
光位置検出器から得られる座標信号金処理する電気ブロ
ック図である。 (主要部分の符号の説明) 1・1′・・・光源、2・2′・・・コンデンサレンズ
。 3・3′・・・矩形開口絞り、4・4′、・・・投影レ
ンズ。 5・・・試料、7・7′・・・集光レンズ、8・8′・
・・2次元光位置検出器、10・14・・・セレクタ、
12・13・・・ウィンドコンパレータ、15・・・オ
アゲート。
FIG. 1 is a diagram showing the basic configuration of the oblique incidence optical system used in the first embodiment of the present invention, FIG. 2 is a plan view schematically showing the principle of the first embodiment of the present invention, and FIG. The figure is an electrical block diagram for processing the coordinate signals obtained from the two-dimensional optical position detector of FIG. 2. (Explanation of symbols of main parts) 1・1'...Light source, 2/2'...Condenser lens. 3, 3'... Rectangular aperture diaphragm, 4, 4',... Projection lens. 5...Sample, 7.7'...Condensing lens, 8.8'.
...Two-dimensional optical position detector, 10/14...Selector,
12/13...Window comparator, 15...Or gate.

Claims (1)

【特許請求の範囲】[Claims] 所定の形状の光マークを試料面に斜め方向から投影する
投影光学系と、前記投影光学系の光軸と同一平面内に光
軸を有し、光量重心位置に相当する直交座標信号を出力
する2次元光位置検出器に前記光マークの試料面での反
射光を集光する集光光学系と、からなる斜入射型位置検
出光学系を、試料面が所定の位置にあるときに互いの光
マークが試料面上で重なるように各々の光軸を含む面を
直交せしめて一対配設し、前記2次元光位置検出器の一
方における光量重心位置の移動が、試料面に垂直な方向
への移動によるのか、試料面の反射特性の不均一性によ
るのかを前記2次元光位置検出器の他方の出力座標信号
をモニターして判定する判定手段を設けたことを特徴と
する位置検出装置。
a projection optical system that projects an optical mark of a predetermined shape onto a sample surface from an oblique direction; and an optical axis that is in the same plane as the optical axis of the projection optical system, and outputs an orthogonal coordinate signal that corresponds to the position of the center of gravity of the light amount. A condensing optical system that condenses the reflected light from the sample surface of the optical mark onto a two-dimensional optical position detector, and an oblique incidence position detection optical system that A pair of optical marks are arranged with their optical axes perpendicular to each other so that they overlap on the sample surface, and the light intensity center position of one of the two-dimensional optical position detectors moves in a direction perpendicular to the sample surface. 2. A position detecting device comprising a determining means for monitoring the output coordinate signal of the other of the two-dimensional optical position detectors to determine whether the change is due to movement of the sample surface or non-uniformity of reflection characteristics of the sample surface.
JP16399184A 1984-08-04 1984-08-04 Detecting device for position Pending JPS6141902A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16399184A JPS6141902A (en) 1984-08-04 1984-08-04 Detecting device for position

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16399184A JPS6141902A (en) 1984-08-04 1984-08-04 Detecting device for position

Publications (1)

Publication Number Publication Date
JPS6141902A true JPS6141902A (en) 1986-02-28

Family

ID=15784680

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16399184A Pending JPS6141902A (en) 1984-08-04 1984-08-04 Detecting device for position

Country Status (1)

Country Link
JP (1) JPS6141902A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01205118A (en) * 1988-02-10 1989-08-17 Topcon Corp Device for confirming leading end position of operating tool to be observed of optical apparatus
JPH0552550A (en) * 1991-08-28 1993-03-02 Hamamatsu Photonics Kk Detecting apparatus of distance
JP2010256178A (en) * 2009-04-24 2010-11-11 Mitaka Koki Co Ltd Non-contact surface shape measuring device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01205118A (en) * 1988-02-10 1989-08-17 Topcon Corp Device for confirming leading end position of operating tool to be observed of optical apparatus
JPH0552550A (en) * 1991-08-28 1993-03-02 Hamamatsu Photonics Kk Detecting apparatus of distance
JP2010256178A (en) * 2009-04-24 2010-11-11 Mitaka Koki Co Ltd Non-contact surface shape measuring device

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