JPS6147507A - 結晶膜厚測定法 - Google Patents

結晶膜厚測定法

Info

Publication number
JPS6147507A
JPS6147507A JP59169126A JP16912684A JPS6147507A JP S6147507 A JPS6147507 A JP S6147507A JP 59169126 A JP59169126 A JP 59169126A JP 16912684 A JP16912684 A JP 16912684A JP S6147507 A JPS6147507 A JP S6147507A
Authority
JP
Japan
Prior art keywords
electron beam
diffraction
crystal
intensity
growth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59169126A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0358645B2 (2
Inventor
Suminori Sakamoto
坂本　統徳
Kimihiro Oota
太田　公廣
Itaru Nakagawa
格 中川
Naoyuki Kawai
直行 河合
Takeshi Kojima
猛 小島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP59169126A priority Critical patent/JPS6147507A/ja
Publication of JPS6147507A publication Critical patent/JPS6147507A/ja
Priority to US07/092,348 priority patent/US4855013A/en
Publication of JPH0358645B2 publication Critical patent/JPH0358645B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP59169126A 1984-08-13 1984-08-13 結晶膜厚測定法 Granted JPS6147507A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59169126A JPS6147507A (ja) 1984-08-13 1984-08-13 結晶膜厚測定法
US07/092,348 US4855013A (en) 1984-08-13 1987-09-02 Method for controlling the thickness of a thin crystal film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59169126A JPS6147507A (ja) 1984-08-13 1984-08-13 結晶膜厚測定法

Publications (2)

Publication Number Publication Date
JPS6147507A true JPS6147507A (ja) 1986-03-08
JPH0358645B2 JPH0358645B2 (2) 1991-09-06

Family

ID=15880759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59169126A Granted JPS6147507A (ja) 1984-08-13 1984-08-13 結晶膜厚測定法

Country Status (1)

Country Link
JP (1) JPS6147507A (2)

Also Published As

Publication number Publication date
JPH0358645B2 (2) 1991-09-06

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term