JPS6163015U - - Google Patents

Info

Publication number
JPS6163015U
JPS6163015U JP14737184U JP14737184U JPS6163015U JP S6163015 U JPS6163015 U JP S6163015U JP 14737184 U JP14737184 U JP 14737184U JP 14737184 U JP14737184 U JP 14737184U JP S6163015 U JPS6163015 U JP S6163015U
Authority
JP
Japan
Prior art keywords
radial
diameter tapered
bearing
double
tapered surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14737184U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14737184U priority Critical patent/JPS6163015U/ja
Publication of JPS6163015U publication Critical patent/JPS6163015U/ja
Pending legal-status Critical Current

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Landscapes

  • Magnetic Bearings And Hydrostatic Bearings (AREA)

Description

【図面の簡単な説明】
第１図は本考案の実施例の縦断面図、第２図ａ
は第１図の荷重の大きい方の給気孔の軸方向Ａか
らみた配置図、第２図ｂは荷重の小さい方の給気
孔の軸方向Ｂからみた配置図で、符号２１，２２
は内径テーパ面３１１，３１２は外径テーパ面、
２４は給気孔である。

Claims (1)

  1. 【実用新案登録請求の範囲】 (1) ハウジングと、該ハウジングの内径に嵌合
    され、互いに内方もしくは外方に傾斜した２個所
    の内径テーパ面を有する外側輪と、前記内径テー
    パ面に対応する外径テーパ面を有する内側輪と、
    前記内側輪もしくは外側輪を所定間隔に離間する
    スペーサとを備え、前記内径テーパ面と前記外径
    テーパ面との間に気体薄膜が形成される複列のラ
    ジアル軸受部を有する複列静圧気体軸受において
    、それぞれの前記ラジアル軸受部に作用するラジ
    アル荷重の大きさが異る場合に、それぞれの前記
    ラジアル軸受部のラジアル変位がほぼ等しくなる
    ように、あらかじめそれぞれのラジアル軸受部の
    ラジアル剛性を違えたことを特徴とする複列静圧
    気体軸受。 (2) 前記ラジアル軸受部が前記内径テーパ面若
    しくは前記外径テーパ面に多数開口する給気孔を
    備える多数孔形絞りで構成されている実用新案登
    録請求の範囲第２項記載の複列静圧気体軸受。 (3) 一方の前記ラジアル軸受部が他方のラジア
    ル軸受部の給気孔の数よりも多い給気孔を備えて
    他方のラジアル軸受部よりも大きいラジアル負荷
    を支承する実用新案登録請求の範囲第２項記載の
    複列静圧気体軸受。
JP14737184U 1984-10-01 1984-10-01 Pending JPS6163015U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14737184U JPS6163015U (ja) 1984-10-01 1984-10-01

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14737184U JPS6163015U (ja) 1984-10-01 1984-10-01

Publications (1)

Publication Number Publication Date
JPS6163015U true JPS6163015U (ja) 1986-04-28

Family

ID=30705599

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14737184U Pending JPS6163015U (ja) 1984-10-01 1984-10-01

Country Status (1)

Country Link
JP (1) JPS6163015U (ja)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6855992B2 (en) 2001-07-24 2005-02-15 Motorola Inc. Structure and method for fabricating configurable transistor devices utilizing the formation of a compliant substrate for materials used to form the same
US6885065B2 (en) 2002-11-20 2005-04-26 Freescale Semiconductor, Inc. Ferromagnetic semiconductor structure and method for forming the same
US6916717B2 (en) 2002-05-03 2005-07-12 Motorola, Inc. Method for growing a monocrystalline oxide layer and for fabricating a semiconductor device on a monocrystalline substrate
US6965128B2 (en) 2003-02-03 2005-11-15 Freescale Semiconductor, Inc. Structure and method for fabricating semiconductor microresonator devices
US6992321B2 (en) 2001-07-13 2006-01-31 Motorola, Inc. Structure and method for fabricating semiconductor structures and devices utilizing piezoelectric materials
US7005717B2 (en) 2000-05-31 2006-02-28 Freescale Semiconductor, Inc. Semiconductor device and method
US7019332B2 (en) 2001-07-20 2006-03-28 Freescale Semiconductor, Inc. Fabrication of a wavelength locker within a semiconductor structure
US7020374B2 (en) 2003-02-03 2006-03-28 Freescale Semiconductor, Inc. Optical waveguide structure and method for fabricating the same
US7045815B2 (en) 2001-04-02 2006-05-16 Freescale Semiconductor, Inc. Semiconductor structure exhibiting reduced leakage current and method of fabricating same
US7067856B2 (en) 2000-02-10 2006-06-27 Freescale Semiconductor, Inc. Semiconductor structure, semiconductor device, communicating device, integrated circuit, and process for fabricating the same
US7105866B2 (en) 2000-07-24 2006-09-12 Freescale Semiconductor, Inc. Heterojunction tunneling diodes and process for fabricating same
US7161227B2 (en) 2001-08-14 2007-01-09 Motorola, Inc. Structure and method for fabricating semiconductor structures and devices for detecting an object
US7169619B2 (en) 2002-11-19 2007-01-30 Freescale Semiconductor, Inc. Method for fabricating semiconductor structures on vicinal substrates using a low temperature, low pressure, alkaline earth metal-rich process
US7211852B2 (en) 2001-01-19 2007-05-01 Freescale Semiconductor, Inc. Structure and method for fabricating GaN devices utilizing the formation of a compliant substrate
US7342276B2 (en) 2001-10-17 2008-03-11 Freescale Semiconductor, Inc. Method and apparatus utilizing monocrystalline insulator
JP2011229371A (ja) * 2010-04-20 2011-11-10 Gebruder Klocker Gmbh レノ耳を形成するための装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56131825A (en) * 1980-03-15 1981-10-15 Hamana Tekko Kk Gas bearing having guide hole on bearing part
JPS56131826A (en) * 1980-03-15 1981-10-15 Hamana Tekko Kk Box-type gas bearing with partition plate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56131825A (en) * 1980-03-15 1981-10-15 Hamana Tekko Kk Gas bearing having guide hole on bearing part
JPS56131826A (en) * 1980-03-15 1981-10-15 Hamana Tekko Kk Box-type gas bearing with partition plate

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7067856B2 (en) 2000-02-10 2006-06-27 Freescale Semiconductor, Inc. Semiconductor structure, semiconductor device, communicating device, integrated circuit, and process for fabricating the same
US7005717B2 (en) 2000-05-31 2006-02-28 Freescale Semiconductor, Inc. Semiconductor device and method
US7105866B2 (en) 2000-07-24 2006-09-12 Freescale Semiconductor, Inc. Heterojunction tunneling diodes and process for fabricating same
US7211852B2 (en) 2001-01-19 2007-05-01 Freescale Semiconductor, Inc. Structure and method for fabricating GaN devices utilizing the formation of a compliant substrate
US7045815B2 (en) 2001-04-02 2006-05-16 Freescale Semiconductor, Inc. Semiconductor structure exhibiting reduced leakage current and method of fabricating same
US6992321B2 (en) 2001-07-13 2006-01-31 Motorola, Inc. Structure and method for fabricating semiconductor structures and devices utilizing piezoelectric materials
US7019332B2 (en) 2001-07-20 2006-03-28 Freescale Semiconductor, Inc. Fabrication of a wavelength locker within a semiconductor structure
US6855992B2 (en) 2001-07-24 2005-02-15 Motorola Inc. Structure and method for fabricating configurable transistor devices utilizing the formation of a compliant substrate for materials used to form the same
US7161227B2 (en) 2001-08-14 2007-01-09 Motorola, Inc. Structure and method for fabricating semiconductor structures and devices for detecting an object
US7342276B2 (en) 2001-10-17 2008-03-11 Freescale Semiconductor, Inc. Method and apparatus utilizing monocrystalline insulator
US6916717B2 (en) 2002-05-03 2005-07-12 Motorola, Inc. Method for growing a monocrystalline oxide layer and for fabricating a semiconductor device on a monocrystalline substrate
US7169619B2 (en) 2002-11-19 2007-01-30 Freescale Semiconductor, Inc. Method for fabricating semiconductor structures on vicinal substrates using a low temperature, low pressure, alkaline earth metal-rich process
US6885065B2 (en) 2002-11-20 2005-04-26 Freescale Semiconductor, Inc. Ferromagnetic semiconductor structure and method for forming the same
US7020374B2 (en) 2003-02-03 2006-03-28 Freescale Semiconductor, Inc. Optical waveguide structure and method for fabricating the same
US6965128B2 (en) 2003-02-03 2005-11-15 Freescale Semiconductor, Inc. Structure and method for fabricating semiconductor microresonator devices
JP2011229371A (ja) * 2010-04-20 2011-11-10 Gebruder Klocker Gmbh レノ耳を形成するための装置

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