JPS6163521A - 自由膨潤型合成雲母 - Google Patents

自由膨潤型合成雲母

Info

Publication number: JPS6163521A
Authority: JP; Japan
Prior art keywords: synthetic mica; ion; mica; swelling; sodium
Prior art date: 1984-09-05
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP18469284A

Other languages

English (en)

Japanese (ja)

Other versions

JPH0459248B2 (da

Inventor

Toshihide Nishikawa

西川　敏秀

Tetsushi Kosugi

小杉　哲史

Akitsugu Andou

安藤　彰嗣

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Topy Industries Ltd

Original Assignee

Topy Industries Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1984-09-05

Filing date

1984-09-05

Publication date

1986-04-01

1984-09-05 Application filed by Topy Industries Ltd filed Critical Topy Industries Ltd

1984-09-05 Priority to JP18469284A priority Critical patent/JPS6163521A/ja

1986-04-01 Publication of JPS6163521A publication Critical patent/JPS6163521A/ja

1992-09-21 Publication of JPH0459248B2 publication Critical patent/JPH0459248B2/ja

Status Granted legal-status Critical Current

Links

RJDOZRNNYVAULJ-UHFFFAOYSA-L [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] Chemical compound [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] RJDOZRNNYVAULJ-UHFFFAOYSA-L 0.000 title claims abstract description 33
230000008961 swelling Effects 0.000 title abstract description 6
150000002500 ions Chemical class 0.000 claims abstract description 31
229910052783 alkali metal Inorganic materials 0.000 claims abstract description 9
150000001340 alkali metals Chemical class 0.000 claims abstract description 9
229910052784 alkaline earth metal Inorganic materials 0.000 claims abstract description 7
150000001342 alkaline earth metals Chemical class 0.000 claims abstract description 7
239000011734 sodium Substances 0.000 claims description 23
229910052708 sodium Inorganic materials 0.000 claims description 20
229910052744 lithium Inorganic materials 0.000 claims description 17
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 13
WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 8
239000011229 interlayer Substances 0.000 claims description 7
229910052700 potassium Inorganic materials 0.000 claims description 4
ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 3
239000011591 potassium Substances 0.000 claims description 3
239000010445 mica Substances 0.000 abstract description 16
229910052618 mica group Inorganic materials 0.000 abstract description 16
150000002892 organic cations Chemical class 0.000 abstract description 9
239000000725 suspension Substances 0.000 abstract description 7
239000000203 mixture Substances 0.000 abstract description 6
239000007864 aqueous solution Substances 0.000 abstract description 5
239000002131 composite material Substances 0.000 abstract description 5
238000001035 drying Methods 0.000 abstract description 3
239000002562 thickening agent Substances 0.000 abstract description 3
229910052731 fluorine Inorganic materials 0.000 abstract description 2
229910052710 silicon Inorganic materials 0.000 abstract description 2
230000003113 alkalizing effect Effects 0.000 abstract 1
238000000034 method Methods 0.000 description 15
KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
239000011777 magnesium Substances 0.000 description 9
239000000126 substance Substances 0.000 description 7
229910052749 magnesium Inorganic materials 0.000 description 6
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
238000002441 X-ray diffraction Methods 0.000 description 5
239000010410 layer Substances 0.000 description 5
239000003513 alkali Substances 0.000 description 4
BITYAPCSNKJESK-UHFFFAOYSA-N potassiosodium Chemical compound [Na].[K] BITYAPCSNKJESK-UHFFFAOYSA-N 0.000 description 4
239000000843 powder Substances 0.000 description 4
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
229920002125 Sokalan® Polymers 0.000 description 3
HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 3
KWLMIXQRALPRBC-UHFFFAOYSA-L hectorite Chemical compound [Li+].[OH-].[OH-].[Na+].[Mg+2].O1[Si]2([O-])O[Si]1([O-])O[Si]([O-])(O1)O[Si]1([O-])O2 KWLMIXQRALPRBC-UHFFFAOYSA-L 0.000 description 3
229910000271 hectorite Inorganic materials 0.000 description 3
-1 lesium Chemical compound 0.000 description 3
150000003839 salts Chemical class 0.000 description 3
230000002522 swelling effect Effects 0.000 description 3
ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
150000001341 alkaline earth metal compounds Chemical class 0.000 description 2
150000001875 compounds Chemical class 0.000 description 2
238000010586 diagram Methods 0.000 description 2
238000001704 evaporation Methods 0.000 description 2
238000009830 intercalation Methods 0.000 description 2
230000002687 intercalation Effects 0.000 description 2
238000005342 ion exchange Methods 0.000 description 2
VVNXEADCOVSAER-UHFFFAOYSA-N lithium sodium Chemical compound [Li].[Na] VVNXEADCOVSAER-UHFFFAOYSA-N 0.000 description 2
239000000463 material Substances 0.000 description 2
238000005259 measurement Methods 0.000 description 2
238000002844 melting Methods 0.000 description 2
230000008018 melting Effects 0.000 description 2
238000002156 mixing Methods 0.000 description 2
239000005416 organic matter Substances 0.000 description 2
WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
239000000243 solution Substances 0.000 description 2
238000003756 stirring Methods 0.000 description 2
RGCKGOZRHPZPFP-UHFFFAOYSA-N Alizarin Natural products C1=CC=C2C(=O)C3=C(O)C(O)=CC=C3C(=O)C2=C1 RGCKGOZRHPZPFP-UHFFFAOYSA-N 0.000 description 1
OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
238000010521 absorption reaction Methods 0.000 description 1
239000002253 acid Substances 0.000 description 1
239000003463 adsorbent Substances 0.000 description 1
235000004279 alanine Nutrition 0.000 description 1
HFVAFDPGUJEFBQ-UHFFFAOYSA-M alizarin red S Chemical compound [Na+].O=C1C2=CC=CC=C2C(=O)C2=C1C=C(S([O-])(=O)=O)C(O)=C2O HFVAFDPGUJEFBQ-UHFFFAOYSA-M 0.000 description 1
150000003973 alkyl amines Chemical class 0.000 description 1
235000001014 amino acid Nutrition 0.000 description 1
150000001413 amino acids Chemical class 0.000 description 1
229910021529 ammonia Inorganic materials 0.000 description 1
229910052788 barium Inorganic materials 0.000 description 1
DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
229910052790 beryllium Inorganic materials 0.000 description 1
ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
ICXXXLGATNSZAV-UHFFFAOYSA-N butylazanium;chloride Chemical compound [Cl-].CCCC[NH3+] ICXXXLGATNSZAV-UHFFFAOYSA-N 0.000 description 1
229910052792 caesium Inorganic materials 0.000 description 1
TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
229910052791 calcium Inorganic materials 0.000 description 1
239000011575 calcium Substances 0.000 description 1
150000004649 carbonic acid derivatives Chemical class 0.000 description 1
239000000969 carrier Substances 0.000 description 1
239000003054 catalyst Substances 0.000 description 1
239000000919 ceramic Substances 0.000 description 1
238000001816 cooling Methods 0.000 description 1
239000002537 cosmetic Substances 0.000 description 1
HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
238000007598 dipping method Methods 0.000 description 1
239000012153 distilled water Substances 0.000 description 1
239000003814 drug Substances 0.000 description 1
229940079593 drug Drugs 0.000 description 1
230000000694 effects Effects 0.000 description 1
239000011737 fluorine Substances 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
150000003840 hydrochlorides Chemical class 0.000 description 1
150000004679 hydroxides Chemical class 0.000 description 1
238000004898 kneading Methods 0.000 description 1
239000007788 liquid Substances 0.000 description 1
XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
229910052808 lithium carbonate Inorganic materials 0.000 description 1
OBTSLRFPKIKXSZ-UHFFFAOYSA-N lithium potassium Chemical compound [Li].[K] OBTSLRFPKIKXSZ-UHFFFAOYSA-N 0.000 description 1
NEMFQSKAPLGFIP-UHFFFAOYSA-N magnesiosodium Chemical compound [Na].[Mg] NEMFQSKAPLGFIP-UHFFFAOYSA-N 0.000 description 1
VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
239000000347 magnesium hydroxide Substances 0.000 description 1
229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
230000014759 maintenance of location Effects 0.000 description 1
239000011159 matrix material Substances 0.000 description 1
239000004570 mortar (masonry) Substances 0.000 description 1
239000003973 paint Substances 0.000 description 1
239000000049 pigment Substances 0.000 description 1
239000002994 raw material Substances 0.000 description 1
238000010992 reflux Methods 0.000 description 1
229910052701 rubidium Inorganic materials 0.000 description 1
IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
239000010703 silicon Substances 0.000 description 1
229910000029 sodium carbonate Inorganic materials 0.000 description 1
239000003381 stabilizer Substances 0.000 description 1
239000007858 starting material Substances 0.000 description 1
229910052712 strontium Inorganic materials 0.000 description 1
CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
238000003786 synthesis reaction Methods 0.000 description 1
238000004448 titration Methods 0.000 description 1
230000007704 transition Effects 0.000 description 1
238000004736 wide-angle X-ray diffraction Methods 0.000 description 1

Landscapes

Silicates, Zeolites, And Molecular Sieves (AREA)

JP18469284A 1984-09-05 1984-09-05 自由膨潤型合成雲母 Granted JPS6163521A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP18469284A JPS6163521A (ja)	1984-09-05	1984-09-05	自由膨潤型合成雲母

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP18469284A JPS6163521A (ja)	1984-09-05	1984-09-05	自由膨潤型合成雲母

Publications (2)

Publication Number	Publication Date
JPS6163521A true JPS6163521A (ja)	1986-04-01
JPH0459248B2 JPH0459248B2 (da)	1992-09-21

Family

ID=16157699

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP18469284A Granted JPS6163521A (ja)	1984-09-05	1984-09-05	自由膨潤型合成雲母

Country Status (1)

Country	Link
JP (1)	JPS6163521A (da)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS63183962A (ja) *	1987-01-26	1988-07-29	Shiseido Co Ltd	合成雲母粉体、その製造方法および該合成雲母粉体を配合した化粧料
JPH01199155A (ja) *	1987-10-31	1989-08-10	Shiseido Co Ltd	液体クロマトグラフィー用充填剤

Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS55142539A (en) *	1979-03-26	1980-11-07	Corning Glass Works	Inorganic gel and its preparation* and inorganic paper* film* fiber* board and coating manufactured from said inorganic gel and these preparation

1984
- 1984-09-05 JP JP18469284A patent/JPS6163521A/ja active Granted

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS55142539A (en) *	1979-03-26	1980-11-07	Corning Glass Works	Inorganic gel and its preparation* and inorganic paper* film* fiber* board and coating manufactured from said inorganic gel and these preparation

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS63183962A (ja) *	1987-01-26	1988-07-29	Shiseido Co Ltd	合成雲母粉体、その製造方法および該合成雲母粉体を配合した化粧料
JPH01199155A (ja) *	1987-10-31	1989-08-10	Shiseido Co Ltd	液体クロマトグラフィー用充填剤

Also Published As

Publication number	Publication date
JPH0459248B2 (da)	1992-09-21

Publication	Publication Date	Title
KR910007311B1 (ko)	1991-09-24	항균성 분체를 함유한 분산체의 제조방법
DE1262864B (de)	1968-03-07	Verfahren zur Herstellung von Glimmerplaettchen
JPS6270212A (ja)	1987-03-31	リン酸カルシウム系ヒドロキシアパタイト及びその製造方法
CH659463A5 (de)	1987-01-30	Verfahren zur herstellung eines zementartigen magnesiumglasmaterials.
CN114620698B (zh)	2023-05-05	一种大颗粒磷酸锆及其制备方法
CN104370296A (zh)	2015-02-25	一种超大孔硅酸盐分子筛nud-1及其制备方法
DE2504031C2 (da)	1988-06-30
US4312673A (en)	1982-01-26	Mixed alkali silicate compositions for coatings and cements
JPS6163521A (ja)	1986-04-01	自由膨潤型合成雲母
EP1268345B1 (de)	2006-03-15	Synthetische aluminiumsilikate mit nephelin- oder carnegietstruktur
JPH0648713A (ja)	1994-02-22	結晶質リン酸ジルコニウムの製造方法
CH501720A (de)	1971-01-15	Bindemittel auf Basis von Alkalisilikatlösung
DE2553409C3 (de)	1984-07-12	Chlor enthaltende Polymerisatmassen mit einem stabilisierenden Zusatz einer Calciumverbindung
JPS61209942A (ja)	1986-09-18	水ガラス用硬化剤
US2501127A (en)	1950-03-21	Basic zinc salicylate
JP2855371B2 (ja)	1999-02-10	結晶性層状珪酸の金属置換体及びその製造方法
JPH0569052B2 (da)	1993-09-30
JP2733266B2 (ja)	1998-03-30	帯電防止性塩素含有重合体組成物及び帯電防止剤
JPH04305018A (ja)	1992-10-28	組成式Ｈ２Ｔｉ５Ｏ１１・ｎＨ２Ｏで示される単斜晶の層状構造を有する化合物及びその製造方法
JPH0621026B2 (ja)	1994-03-23	フッ素マイカの製造方法
JP2802435B2 (ja)	1998-09-24	コーテイング用組成物
JPS6219389B2 (da)	1987-04-28
KR102597452B1 (ko)	2023-11-03	리튬 이온 전도성을 가진 할로겐계 고체전해질 및 이의 제조방법
Nicho et al.	1997	Preparation and properties of poly (acrylic acid)‐based hybrid compounds
SU579233A1 (ru)	1977-11-05	Способ гранулировани стекольной шихты

JPS6163521A - 自由膨潤型合成雲母 - Google Patents

Info

Links

Landscapes

Priority Applications (1)

Applications Claiming Priority (1)

Publications (2)

Family

ID=16157699

Family Applications (1)

Country Status (1)

Cited By (2)

Citations (1)

Patent Citations (1)

Cited By (2)

Also Published As

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