JPS6169959A - 多層膜の製造法 - Google Patents

多層膜の製造法

Info

Publication number
JPS6169959A
JPS6169959A JP4636384A JP4636384A JPS6169959A JP S6169959 A JPS6169959 A JP S6169959A JP 4636384 A JP4636384 A JP 4636384A JP 4636384 A JP4636384 A JP 4636384A JP S6169959 A JPS6169959 A JP S6169959A
Authority
JP
Japan
Prior art keywords
film
reduced
multilayered film
silicon oxide
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4636384A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0325507B2 (da
Inventor
Hisanori Bando
坂東　尚周
Takahito Terajima
孝仁 寺嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyoto University
Original Assignee
Kyoto University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyoto University filed Critical Kyoto University
Priority to JP4636384A priority Critical patent/JPS6169959A/ja
Publication of JPS6169959A publication Critical patent/JPS6169959A/ja
Publication of JPH0325507B2 publication Critical patent/JPH0325507B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/085—Oxides of iron group metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Physical Vapour Deposition (AREA)
JP4636384A 1984-03-09 1984-03-09 多層膜の製造法 Granted JPS6169959A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4636384A JPS6169959A (ja) 1984-03-09 1984-03-09 多層膜の製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4636384A JPS6169959A (ja) 1984-03-09 1984-03-09 多層膜の製造法

Publications (2)

Publication Number Publication Date
JPS6169959A true JPS6169959A (ja) 1986-04-10
JPH0325507B2 JPH0325507B2 (da) 1991-04-08

Family

ID=12745068

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4636384A Granted JPS6169959A (ja) 1984-03-09 1984-03-09 多層膜の製造法

Country Status (1)

Country Link
JP (1) JPS6169959A (da)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3595823B2 (ja) * 1994-07-28 2004-12-02 有限会社 渕田ナノ技研 金属部分膜の形成装置およびその形成方法

Also Published As

Publication number Publication date
JPH0325507B2 (da) 1991-04-08

Similar Documents

Publication Publication Date Title
Wen et al. A review of the preparation, properties and applications of VO2 thin films with the reversible phase transition
Kadari et al. XPS and morphological properties of Cr2O3 thin films grown by thermal evaporation method
TWI474348B (zh) 磁性合金的序化方法
JP2017098423A (ja) 透光性磁性体
JP6873506B2 (ja) 垂直磁化膜の前駆体構造、垂直磁化膜構造、およびその製造方法、これらを用いた垂直磁化型トンネル磁気抵抗接合膜およびその製造方法、ならびにこれらを用いた垂直磁化型トンネル磁気抵抗接合素子
Wang et al. Tunable electrical resistivity of oxygen-deficient zinc oxide thin films
Domashevskaya et al. The Influence of Relative Content of a Metal Component in a Dielectric Matrix on the Formation and Dimensions of Cobalt Nanocrystallites in Co x (MgF2) 100–x Film Composites
JP2008091024A (ja) 垂直磁気記録媒体
JP4260801B2 (ja) 光情報記録媒体用薄膜の製造方法
Shen et al. Controlled growth of vertically aligned nanocomposites through a Au seeding-assisted method
WO2019193871A1 (ja) 面直電流巨大磁気抵抗素子、その前駆体、及びその製造方法
Garrido-Segovia et al. Engineered Fe-based nanocolumnar films
CN117651897B (zh) 磁光材料及其制造方法
JPH0325507B2 (da)
Ren et al. Structural and optical properties of Mn–Co–Ni–O and Mn–Zn–Ni–O medium-entropy oxide films
JPH0672298B2 (ja) 周期性を有する酸化物多層膜
CN104885154B (zh) 磁记录介质及其制造方法
Chiu et al. Effect of electron-beam deposition process variables on the film characteristics of the CrOx films
CN114420836A (zh) 一种Ru插层调节的超高各向异性磁电阻薄膜及其制备方法
Okumu et al. Formation mechanism of noble metal nanoparticles in reactively sputtered TiO2 films
CN113036034A (zh) 可调控Co2FeX合金垂直磁各向异性的磁性薄膜材料及方法
TWI855286B (zh) 磁性光學材料及其製造方法
JP7438074B2 (ja) 金属－酸化物系グラニュラー膜の製造方法
JPS60163233A (ja) 磁気記録媒体及びその製造法
Mhin et al. Ti/TiO2/SiO2 Multilayer Thin Films With Enhanced Spectral Selectivity For Optical Applications

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term