JPS6169959A - 多層膜の製造法 - Google Patents

多層膜の製造法

Info

Publication number: JPS6169959A
Authority: JP; Japan
Prior art keywords: film; reduced; multilayered film; silicon oxide; gas
Prior art date: 1984-03-09
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP4636384A

Other languages

English (en)

Japanese (ja)

Other versions

JPH0325507B2 (mo

Inventor

Hisanori Bando

坂東　尚周

Takahito Terajima

孝仁寺嶋

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Kyoto University NUC

Original Assignee

Kyoto University NUC

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1984-03-09

Filing date

1984-03-09

Publication date

1986-04-10

1984-03-09 Application filed by Kyoto University NUC filed Critical Kyoto University NUC

1984-03-09 Priority to JP4636384A priority Critical patent/JPS6169959A/ja

1986-04-10 Publication of JPS6169959A publication Critical patent/JPS6169959A/ja

1991-04-08 Publication of JPH0325507B2 publication Critical patent/JPH0325507B2/ja

Status Granted legal-status Critical Current

Links

238000004519 manufacturing process Methods 0.000 title claims abstract description 5
229910044991 metal oxide Inorganic materials 0.000 claims abstract description 17
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 16
229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 13
150000004706 metal oxides Chemical class 0.000 claims description 13
SZVJSHCCFOBDDC-UHFFFAOYSA-N ferrosoferric oxide Chemical compound O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 abstract description 12
239000007789 gas Substances 0.000 abstract description 10
239000001257 hydrogen Substances 0.000 abstract description 8
229910052739 hydrogen Inorganic materials 0.000 abstract description 8
239000002245 particle Substances 0.000 abstract description 8
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 7
239000000758 substrate Substances 0.000 abstract description 7
LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 abstract description 4
229910052681 coesite Inorganic materials 0.000 abstract 1
229910052906 cristobalite Inorganic materials 0.000 abstract 1
238000010030 laminating Methods 0.000 abstract 1
238000000034 method Methods 0.000 abstract 1
239000000377 silicon dioxide Substances 0.000 abstract 1
235000012239 silicon dioxide Nutrition 0.000 abstract 1
229910052682 stishovite Inorganic materials 0.000 abstract 1
229910052905 tridymite Inorganic materials 0.000 abstract 1
238000001771 vacuum deposition Methods 0.000 abstract 1
239000010408 film Substances 0.000 description 79
238000006722 reduction reaction Methods 0.000 description 12
239000010410 layer Substances 0.000 description 8
239000010409 thin film Substances 0.000 description 8
239000000463 material Substances 0.000 description 7
230000003647 oxidation Effects 0.000 description 6
238000007254 oxidation reaction Methods 0.000 description 6
238000002441 X-ray diffraction Methods 0.000 description 5
230000003287 optical effect Effects 0.000 description 5
238000010521 absorption reaction Methods 0.000 description 4
238000010586 diagram Methods 0.000 description 4
238000001704 evaporation Methods 0.000 description 4
239000002923 metal particle Substances 0.000 description 4
238000002834 transmittance Methods 0.000 description 4
239000011882 ultra-fine particle Substances 0.000 description 4
238000001816 cooling Methods 0.000 description 3
239000013078 crystal Substances 0.000 description 3
230000008020 evaporation Effects 0.000 description 3
230000005291 magnetic effect Effects 0.000 description 3
230000005415 magnetization Effects 0.000 description 3
239000002184 metal Substances 0.000 description 3
229910052751 metal Inorganic materials 0.000 description 3
238000001228 spectrum Methods 0.000 description 3
238000007738 vacuum evaporation Methods 0.000 description 3
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
239000010419 fine particle Substances 0.000 description 2
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
239000010931 gold Substances 0.000 description 2
229910052737 gold Inorganic materials 0.000 description 2
238000010438 heat treatment Methods 0.000 description 2
238000005259 measurement Methods 0.000 description 2
239000012528 membrane Substances 0.000 description 2
239000001301 oxygen Substances 0.000 description 2
229910052760 oxygen Inorganic materials 0.000 description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
239000002253 acid Substances 0.000 description 1
229910002091 carbon monoxide Inorganic materials 0.000 description 1
UBEWDCMIDFGDOO-UHFFFAOYSA-N cobalt(II,III) oxide Inorganic materials [O-2].[O-2].[O-2].[O-2].[Co+2].[Co+3].[Co+3] UBEWDCMIDFGDOO-UHFFFAOYSA-N 0.000 description 1
239000004020 conductor Substances 0.000 description 1
238000005336 cracking Methods 0.000 description 1
230000007423 decrease Effects 0.000 description 1
238000000151 deposition Methods 0.000 description 1
230000008021 deposition Effects 0.000 description 1
229910001882 dioxygen Inorganic materials 0.000 description 1
238000010894 electron beam technology Methods 0.000 description 1
238000000635 electron micrograph Methods 0.000 description 1
238000002474 experimental method Methods 0.000 description 1
230000005294 ferromagnetic effect Effects 0.000 description 1
239000003302 ferromagnetic material Substances 0.000 description 1
239000011521 glass Substances 0.000 description 1
150000002431 hydrogen Chemical class 0.000 description 1
238000010884 ion-beam technique Methods 0.000 description 1
150000002500 ions Chemical class 0.000 description 1
230000031700 light absorption Effects 0.000 description 1
239000007788 liquid Substances 0.000 description 1
230000005389 magnetism Effects 0.000 description 1
239000000203 mixture Substances 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
239000000615 nonconductor Substances 0.000 description 1
230000001590 oxidative effect Effects 0.000 description 1
230000001681 protective effect Effects 0.000 description 1
239000002356 single layer Substances 0.000 description 1
238000004544 sputter deposition Methods 0.000 description 1
239000000126 substance Substances 0.000 description 1
230000003746 surface roughness Effects 0.000 description 1
238000007740 vapor deposition Methods 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/085—Oxides of iron group metals
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physical Vapour Deposition (AREA)
Thermal Transfer Or Thermal Recording In General (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

JP4636384A 1984-03-09 1984-03-09 多層膜の製造法 Granted JPS6169959A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP4636384A JPS6169959A (ja)	1984-03-09	1984-03-09	多層膜の製造法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP4636384A JPS6169959A (ja)	1984-03-09	1984-03-09	多層膜の製造法

Publications (2)

Publication Number	Publication Date
JPS6169959A true JPS6169959A (ja)	1986-04-10
JPH0325507B2 JPH0325507B2 (mo)	1991-04-08

Family

ID=12745068

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP4636384A Granted JPS6169959A (ja)	1984-03-09	1984-03-09	多層膜の製造法

Country Status (1)

Country	Link
JP (1)	JPS6169959A (mo)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3595823B2 (ja) *	1994-07-28	2004-12-02	有限会社渕田ナノ技研	金属部分膜の形成装置およびその形成方法

1984
- 1984-03-09 JP JP4636384A patent/JPS6169959A/ja active Granted

Also Published As

Publication number	Publication date
JPH0325507B2 (mo)	1991-04-08

Legal Events

Date	Code	Title	Description
2004-03-09	EXPY	Cancellation because of completion of term

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