JPS6186936U - - Google Patents

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Publication number
JPS6186936U
JPS6186936U JP17038084U JP17038084U JPS6186936U JP S6186936 U JPS6186936 U JP S6186936U JP 17038084 U JP17038084 U JP 17038084U JP 17038084 U JP17038084 U JP 17038084U JP S6186936 U JPS6186936 U JP S6186936U
Authority
JP
Japan
Prior art keywords
semiconductor wafer
inert gas
heating chamber
heating device
heat source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17038084U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP17038084U priority Critical patent/JPS6186936U/ja
Publication of JPS6186936U publication Critical patent/JPS6186936U/ja
Pending legal-status Critical Current

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Description

【図面の簡単な説明】
第１図は本考案の一実施例の要部の断面図、第
２図はその一部を截断した正面図を示す。 １…ベル・ジヤー、２…基台、３…加熱室、４
…支持棒、５…半導体ウエハ、６…反射板、７…
ランプ熱源、８…端面部、９…赤外線ランプ、１
０…リフレクタ、１１…ランプハウス、１２…モ
ータ、１３…カム、１４…ガイドシヤフト、１５
…真空排気孔、１６…不活性ガス吸入孔、１７…
ガイドウオール、１８…ケーシング、１９…間隙
、２０…冷却空気吸入孔、２１…冷却空気排出管
。

Claims (1)

    【実用新案登録請求の範囲】
  1. 排気されている加熱室内に配置された半導体ウ
    エハをランプ熱源で加熱する加熱装置において、
    半導体ウエハの面を覆つて一方から他方に不活性
    ガスが流れるように加熱室の内外に連通して形成
    された不活性ガスの流通路を設けたことを特徴と
    する半導体ウエハの加熱装置。
JP17038084U 1984-11-12 1984-11-12 Pending JPS6186936U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17038084U JPS6186936U (ja) 1984-11-12 1984-11-12

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17038084U JPS6186936U (ja) 1984-11-12 1984-11-12

Publications (1)

Publication Number Publication Date
JPS6186936U true JPS6186936U (ja) 1986-06-07

Family

ID=30728087

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17038084U Pending JPS6186936U (ja) 1984-11-12 1984-11-12

Country Status (1)

Country Link
JP (1) JPS6186936U (ja)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5681928A (en) * 1979-10-17 1981-07-04 Itt Semiconductor annealing treatment
JPS5977289A (ja) * 1982-10-26 1984-05-02 ウシオ電機株式会社 光照射炉

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5681928A (en) * 1979-10-17 1981-07-04 Itt Semiconductor annealing treatment
JPS5977289A (ja) * 1982-10-26 1984-05-02 ウシオ電機株式会社 光照射炉

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