JPS6190861U - - Google Patents
Info
- Publication number
- JPS6190861U JPS6190861U JP17522484U JP17522484U JPS6190861U JP S6190861 U JPS6190861 U JP S6190861U JP 17522484 U JP17522484 U JP 17522484U JP 17522484 U JP17522484 U JP 17522484U JP S6190861 U JPS6190861 U JP S6190861U
- Authority
- JP
- Japan
- Prior art keywords
- focal point
- sample
- chuck
- thermal
- light source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
第１図は従来の双楕円型のイメージ炉の加熱炉
の部分を示す縦断面図で、第２図は鉄試料を用い
て従来のイメージ炉と本考案によるイメージ炉（
いずれも双楕円型）に５００Ｗの電力を投入した
時の温度分布図である。
図において、１０１…反射鏡、１０３ａ，１０
３ｂ…熱光源ランプ、１０４…上側試料、１０５
…下側試料、１０７…炉心管、１０８…上側試料
チヤツク、１０９…上シヤフト、１１０…下側試
料チヤツク、１１１…下シヤフト、１１３，１１
４…Ｏリング。
Figure 1 is a vertical cross-sectional view showing the heating furnace part of a conventional bielliptical image furnace, and Figure 2 is a longitudinal cross-sectional view showing the heating furnace part of a conventional bielliptical image furnace.
It is a temperature distribution diagram when 500 W of power is applied to the bielliptic (both are bielliptical). In the figure, 101...Reflector, 103a, 10
3b... Heat light source lamp, 104... Upper sample, 105
...lower sample, 107...furnace tube, 108...upper sample chuck, 109...upper shaft, 110...lower sample chuck, 111...lower shaft, 113,11
4...O-ring.
Claims (1)
の一方の焦点に熱光源を配し、他の一方の焦点に
配した試料に光を集中して加熱するイメージ炉に
おいて、試料を保持するためのチヤツクに熱伝導
率０．０１ｃａｌ／ｃｍｓＫ以下且つ耐熱性７０
０°Ｃ以上の材料を用いたことを特徴とするイメ
ージ炉。 A thermal light source is placed at one focal point of a reflecting mirror consisting of one or more spheroidal surfaces, and the sample is heated by concentrating the light at the other focal point. The chuck has a thermal conductivity of 0.01 cal/cmsK or less and a heat resistance of 70
An image furnace characterized by using a material having a temperature of 0°C or higher.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17522484U JPS6190861U (en) | 1984-11-19 | 1984-11-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17522484U JPS6190861U (en) | 1984-11-19 | 1984-11-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6190861U true JPS6190861U (en) | 1986-06-12 |
Family
ID=30732828
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17522484U Pending JPS6190861U (en) | 1984-11-19 | 1984-11-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6190861U (en) |
-
1984
- 1984-11-19 JP JP17522484U patent/JPS6190861U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6190861U (en) | ||
| JPS60136367U (en) | image furnace | |
| JPS6148684U (en) | ||
| JPS62184685U (en) | ||
| JPS6287156U (en) | ||
| JPS6288390U (en) | ||
| JPS6187053U (en) | ||
| JPS61192963U (en) | ||
| JPS61199061U (en) | ||
| JPS63187292U (en) | ||
| JPS60176061U (en) | Concentrating heating device | |
| JPS6381863U (en) | ||
| JPS6146733U (en) | Heat treatment equipment for semiconductors | |
| JPS637746U (en) | ||
| JPS61206356U (en) | ||
| JPH0345602U (en) | ||
| JPS62157979U (en) | ||
| JPS62144982U (en) | ||
| JPS6193703U (en) | ||
| JPS5913946U (en) | heating device | |
| JPS63152533U (en) | ||
| JPS61109551U (en) | ||
| JPS6169771U (en) | ||
| JPS6257368U (en) | ||
| JPS6391192U (en) |