JPS6198745A - Production of prepreg for printed circuit board - Google Patents
Production of prepreg for printed circuit boardInfo
- Publication number
- JPS6198745A JPS6198745A JP22182384A JP22182384A JPS6198745A JP S6198745 A JPS6198745 A JP S6198745A JP 22182384 A JP22182384 A JP 22182384A JP 22182384 A JP22182384 A JP 22182384A JP S6198745 A JPS6198745 A JP S6198745A
- Authority
- JP
- Japan
- Prior art keywords
- prepreg
- epoxy resin
- dicyandiamide
- resin
- varnish
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000003822 epoxy resin Substances 0.000 claims abstract description 24
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 24
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 claims abstract description 19
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000011521 glass Substances 0.000 claims abstract description 15
- 229920003986 novolac Polymers 0.000 claims abstract description 11
- 239000002966 varnish Substances 0.000 claims abstract description 10
- 238000001035 drying Methods 0.000 claims abstract description 6
- 239000004745 nonwoven fabric Substances 0.000 claims abstract description 6
- -1 imidazole compound Chemical class 0.000 claims abstract description 5
- 239000004744 fabric Substances 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 3
- 125000001841 imino group Chemical group [H]N=* 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 13
- 229920005989 resin Polymers 0.000 abstract description 10
- 239000011347 resin Substances 0.000 abstract description 10
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract description 9
- 239000011889 copper foil Substances 0.000 abstract description 9
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract description 6
- 238000002156 mixing Methods 0.000 abstract description 5
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 abstract description 3
- QCTJRYGLPAFRMS-UHFFFAOYSA-N prop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical compound OC(=O)C=C.NC1=NC(N)=NC(N)=N1 QCTJRYGLPAFRMS-UHFFFAOYSA-N 0.000 abstract description 3
- 150000001412 amines Chemical class 0.000 abstract description 2
- 125000003700 epoxy group Chemical group 0.000 abstract description 2
- 239000012948 isocyanate Substances 0.000 abstract description 2
- 150000002513 isocyanates Chemical class 0.000 abstract description 2
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 abstract description 2
- 239000004841 bisphenol A epoxy resin Substances 0.000 abstract 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- 239000004593 Epoxy Substances 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 7
- 238000005553 drilling Methods 0.000 description 6
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229920003319 Araldite® Polymers 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000003063 flame retardant Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- LLPKQRMDOFYSGZ-UHFFFAOYSA-N 2,5-dimethyl-1h-imidazole Chemical compound CC1=CN=C(C)N1 LLPKQRMDOFYSGZ-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000004843 novolac epoxy resin Substances 0.000 description 2
- 235000013824 polyphenols Nutrition 0.000 description 2
- BDPMIHVEHJUJIW-UHFFFAOYSA-N (2,3-dichlorophenyl)-phenylmethanediamine Chemical class C=1C=CC(Cl)=C(Cl)C=1C(N)(N)C1=CC=CC=C1 BDPMIHVEHJUJIW-UHFFFAOYSA-N 0.000 description 1
- MTZUIIAIAKMWLI-UHFFFAOYSA-N 1,2-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC=C1N=C=O MTZUIIAIAKMWLI-UHFFFAOYSA-N 0.000 description 1
- ZXHZWRZAWJVPIC-UHFFFAOYSA-N 1,2-diisocyanatonaphthalene Chemical compound C1=CC=CC2=C(N=C=O)C(N=C=O)=CC=C21 ZXHZWRZAWJVPIC-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- ZXTHWIZHGLNEPG-UHFFFAOYSA-N 2-phenyl-4,5-dihydro-1,3-oxazole Chemical compound O1CCN=C1C1=CC=CC=C1 ZXTHWIZHGLNEPG-UHFFFAOYSA-N 0.000 description 1
- FUOZJYASZOSONT-UHFFFAOYSA-N 2-propan-2-yl-1h-imidazole Chemical compound CC(C)C1=NC=CN1 FUOZJYASZOSONT-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- CPHGOBGXZQKCKI-UHFFFAOYSA-N 4,5-diphenyl-1h-imidazole Chemical compound N1C=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 CPHGOBGXZQKCKI-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- WHHGLZMJPXIBIX-UHFFFAOYSA-N decabromodiphenyl ether Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1OC1=C(Br)C(Br)=C(Br)C(Br)=C1Br WHHGLZMJPXIBIX-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 150000008442 polyphenolic compounds Chemical class 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0366—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement reinforced, e.g. by fibres, fabrics
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Reinforced Plastic Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は印刷配線板の材料であるエポキシ−ガラス布、
エポキシ−ガラス不織布プリプレグの製造方法に関する
ものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to epoxy glass cloth, which is a material for printed wiring boards;
The present invention relates to a method for producing an epoxy-glass nonwoven fabric prepreg.
印刷配線板の高密度化に伴ない多膚化、スルーホール小
径化などが進みドリル加工性の良好な印刷配線板用プリ
プレグ、およびプリプレグを用いて得らnた金属張積層
板が要求さr′L″′Cいる。ドリル加工性のなかでも
スミアの発生は内層回路銅とスルーホールめっき銅との
導通を妨げることによって著しくスルーホール信頼性を
損なう。スミアを除去するために印刷配線板メーカーで
はスミア除去処理を行なうが、#−硫酸フッ化水素酸な
どな用いるため安全上の問題がありまたスルーホール内
壁をあらし信頼性を低下させる原因ともなる。スミアの
発生原因はドリル加工時の摩擦熱により軟化した樹脂が
ドリルによって内層回路銅断面に付N−することにある
。As the density of printed wiring boards increases, they become more flexible and the diameter of through holes becomes smaller, creating a demand for prepregs for printed wiring boards with good drillability and metal-clad laminates obtained using prepregs. 'L'''C. Among drilling processability, the occurrence of smear significantly impairs through-hole reliability by interfering with the conduction between the inner layer circuit copper and the through-hole plating copper.Printed wiring board manufacturers have to remove smear. In this case, smear removal treatment is performed, but since #-sulfuric acid, hydrofluoric acid, etc. are used, there are safety issues, and it also roughens the inner wall of the through hole, reducing reliability.The cause of smearing is friction during drilling. The resin softened by heat is attached to the cross section of the inner layer circuit copper using a drill.
従来エポキシ−ガラス布プリプレグ用硬化剤として用い
らnていたジシアンジアミドは樹脂との相溶性が悪く未
反応で残余することが多い。Dicyandiamide, which has been conventionally used as a curing agent for epoxy glass fabric prepregs, has poor compatibility with resins and often remains unreacted.
そのため樹脂硬化物は250℃以上の温度では分解を伴
ない軟化する。このような硬化物の軟化を防ぐためには
エポキシ樹脂と十分に相浴し、しかも反応性の良い硬化
剤が必要とされる。Therefore, the cured resin material decomposes and softens at temperatures of 250° C. or higher. In order to prevent such softening of the cured product, a curing agent is required that sufficiently coexists with the epoxy resin and has good reactivity.
本発明は従来のエポキシ樹脂−ジシアンジアミド系の欠
点であるドリル加工性の改良およびエポキシ樹脂−ポリ
フェノール系の欠点である銅箔引きはがし強さ、保存安
定性の改良を目的とした印刷配線板用エポキシ−ガラス
布プリプレグならびにエポキシ−ガラス不織布プリプレ
グの製造方法に関するものである。The present invention is an epoxy resin for printed wiring boards that aims to improve drill workability, which is a drawback of conventional epoxy resin-dicyandiamide-based systems, and copper foil peel strength and storage stability, which are drawbacks of epoxy resin-polyphenol-based systems. - A method for producing glass cloth prepreg and epoxy-glass nonwoven prepreg.
本発明は
(atエポキシ位1脂、
(bンノボラック樹刀L
(cl硬化促進剤および
(d)ジシアンジアミドまfc/riジシアンジアミド
誘導体を必須成分として配合したワニスをガラス布また
はガラス不織布に含浸後、乾燥させることを特徴とする
印刷配線板用プリプレグの製造方法である。In the present invention, after impregnating a glass cloth or a glass nonwoven fabric with a varnish containing (at epoxy position 1 resin, (b) novolak tree L (cl hardening accelerator) and (d) dicyandiamide or fc/ri dicyandiamide derivative as essential components, This is a method for manufacturing a prepreg for a printed wiring board, which is characterized by drying the prepreg.
以下本発明の詳細な説明する。The present invention will be explained in detail below.
(a)のエポキシ樹脂としてはビスフェノールA型エポ
キシ側脂、ビスフェノールp5エポキシ樹脂、ビスフェ
ノールS型エポキシ樹脂、フェノールノボラック型エポ
キシ樹脂、クレゾールノボラック型エポキシ樹脂、ビス
フェノールAノボラック型エポキシ樹脂、ビスフェノー
ルFノボラック型エポキシ樹脂、脂環式エポキシ樹脂、
グリシジルエステル型エポキシ樹脂、グリシジルアミン
型エポキシ樹脂、ヒダントイン型エポキシ樹脂、インシ
アヌレート型エポキシ樹脂、およびそれらの/Sロゲン
化物、水素添加物などがあり何種類かを併用することも
できる。The epoxy resins in (a) include bisphenol A epoxy side fat, bisphenol p5 epoxy resin, bisphenol S epoxy resin, phenol novolac epoxy resin, cresol novolak epoxy resin, bisphenol A novolac epoxy resin, and bisphenol F novolac epoxy. resin, alicyclic epoxy resin,
There are glycidyl ester-type epoxy resins, glycidylamine-type epoxy resins, hydantoin-type epoxy resins, incyanurate-type epoxy resins, and /S halides and hydrogenated products thereof, and several types thereof can be used in combination.
またこnらのエポキシ樹脂を混合使用することもできる
。It is also possible to use a mixture of these epoxy resins.
製造さrしたプリプレグに難燃化が必峻とさnる場合に
は、ハロゲン化エポキシ樹脂が必費となる。When it is necessary to make the manufactured prepreg flame retardant, halogenated epoxy resin is necessary.
ハロゲン化エポキシ樹脂だけでは十分な難燃性が得ろr
しない場合vcはテトラブロモビスフェノールA%デカ
ブロモジフェニルエーテル、三酸化アンチモン、テトラ
フェニルホスフィンなど一般に難燃剤と称さnる化合物
を配合することが好ましい。印刷配線板用プリプレグと
しての特性を保たせるためにはノ・ロゲン化エポキシ樹
月6以外の難燃剤の配@童は必侠最少量にとどめるべき
であり、多くともエポキシ憎tlW100重量部に対し
て60車量部以下であることが好ましい。Sufficient flame retardancy cannot be obtained with halogenated epoxy resin alone.
If not, it is preferable that VC contains compounds generally called flame retardants such as tetrabromobisphenol A% decabromodiphenyl ether, antimony trioxide, and tetraphenylphosphine. In order to maintain the properties of the prepreg for printed wiring boards, the amount of flame retardants other than the epoxy resin 6 should be kept to the minimum amount, and at most 100 parts by weight of the epoxy tlW. It is preferable that the amount is 60 parts by volume or less.
(b)のノボラック樹脂としてはエポキシ位I脂と重合
すればどのようなものでもよく1例えばフェノール、ク
レゾール、アルキルフェノール。The novolac resin (b) may be any resin as long as it polymerizes with the epoxy position I fat, such as phenol, cresol, and alkylphenol.
カテコール、ビスフェノールA、ビス2エノールFなど
のノボラック樹脂、およびこnらのノボラック樹脂のハ
ロゲン化物などがある。こnらのノボラック樹脂は、(
irI種類かな併用することもできる。配@tはエポキ
シ基に対してフェノール性水酸基が0.5〜1.5当量
の範囲になるように配合することが好ましい。この範囲
を外γしると十分な架槁智度は得らrLf、 ドリル
加工性は向上しない。Examples include novolak resins such as catechol, bisphenol A, and bis-2-enol F, and halogenated products of these novolac resins. These novolac resins are (
The irI type can also be used together. It is preferable to mix @t so that the amount of phenolic hydroxyl group is in the range of 0.5 to 1.5 equivalents to the epoxy group. If γ is outside this range, sufficient drilling depth will not be obtained and drilling workability will not improve.
(C)の硬化促進剤としてはイミダゾール化合物。The curing accelerator (C) is an imidazole compound.
有機リン化合物、第3級アミン、第4級アンモニウム塩
などか用(・らfLるが、第2級アミノ基をアクリロニ
トリル、インシアネート、メラミンアクリレートなどで
マスク化さnたイミダゾール化合物ケ用いると従来の2
倍以上の保存安定性を持つプリプレグを得ることができ
る。ここで用いらnるイミダゾール化合物とし′1:は
イミダゾール、2−エチルイミダゾール、2−エチル−
4−メチルイミダゾール%2−フェニルイミダゾール%
2−ウンデシルイミダゾール、1−ベンジル−2−メ
チルイミタソール、2−ヘプタデシルイミダゾール、4
,5−ジフェニルイミダゾール、2−メチルイミダシリ
ン、2−エチル−4−メチルイミダシリン、2−フェニ
ルイミダシリン、2−ウンデシルイミダシリン、2−ヘ
プタデシルイミダシリン、2−イソプロピルイミダゾー
ル、2.4−ジメチルイミダゾール%2−2エニルー4
−メチルイミダゾール。Organic phosphorus compounds, tertiary amines, quaternary ammonium salts, etc. are used, but imidazole compounds whose secondary amino groups are masked with acrylonitrile, incyanate, melamine acrylate, etc. are conventionally used. 2
It is possible to obtain a prepreg with storage stability that is more than twice as stable. The imidazole compound used here is imidazole, 2-ethylimidazole, 2-ethyl-
4-Methylimidazole% 2-phenylimidazole%
2-undecylimidazole, 1-benzyl-2-methylimitasole, 2-heptadecyl imidazole, 4
, 5-diphenylimidazole, 2-methylimidacillin, 2-ethyl-4-methylimidacillin, 2-phenylimidacilline, 2-undecylimidacilline, 2-heptadecylimidacillin, 2-isopropyl Imidazole, 2,4-dimethylimidazole%2-2enyl4
-Methylimidazole.
2−エチルイミダシリン、2−イソプロピルイミダシリ
ン、2.4−ジメチルイミダシリン、2−フェニル−4
−メチルイミダシリンなどかあり、マスク化剤としては
アクリロニトリル、フェニレンジイソシアネート、トル
エンジイソシアネート、ナフタレンジイソシアネート、
ヘキサメチレンジイソシアネート、メチレンとスフェニ
ルイソシアネート、メラミンアクリレートなどがある。2-ethylimidacillin, 2-isopropylimidacillin, 2,4-dimethylimidacillin, 2-phenyl-4
-Methylimidacillin, etc., and masking agents include acrylonitrile, phenylene diisocyanate, toluene diisocyanate, naphthalene diisocyanate,
Examples include hexamethylene diisocyanate, methylene and sphenyl isocyanate, and melamine acrylate.
こnらの硬化促進剤は何種類かを併用してもよく配合量
は好ましくはエポキシ樹脂100貞騎部に対して0.0
1〜51量都である。0.01重量部より少なζ・と効
果が小さく5車量部より多(・とドリル加工性が悪くな
る。Several types of these curing accelerators may be used in combination, and the blending amount is preferably 0.0 per 100 parts of the epoxy resin.
1 to 51 quantities. If the amount is less than 0.01 parts by weight, the effect will be small, and if it is more than 5 parts by weight, the drilling workability will be poor.
を
ン)のジシアンジアミドまたはジシアンジアミド誘導体
のうち、ジシアンジアミド誘導体とはジシアンジアミド
にアミンを付加させて得られるものであり、ジシアンジ
アミド−アニリン付加物、ジシアンジアミド−メチルア
ニリン付加物、ジシアンジアミド−ジアミノジフェニル
メタン付加物、ジシアンジアミド−ジクロロジアミノジ
フェニルメタン付加物などがある。こnらのジシアンジ
アミドまたはジシアンジアミド誘導体は何種類かを併用
することもできる。配合量はエポキシ樹脂100重量部
に対して0.1〜1.0重量部とすることが好ましい。Among the dicyandiamide or dicyandiamide derivatives in (1), dicyandiamide derivatives are those obtained by adding an amine to dicyandiamide, and include dicyandiamide-aniline adduct, dicyandiamide-methylaniline adduct, dicyandiamide-diaminodiphenylmethane adduct, dicyandiamide- Examples include dichlorodiaminodiphenylmethane adducts. Several kinds of these dicyandiamides or dicyandiamide derivatives can be used in combination. The blending amount is preferably 0.1 to 1.0 parts by weight per 100 parts by weight of the epoxy resin.
1重量部を越えて配合すると樹脂硬化物の分解軟化温度
が低下し、スミア発生率が大きくなる。まfco。If more than 1 part by weight is added, the decomposition and softening temperature of the cured resin will decrease, and the smear generation rate will increase. Mafco.
1重量部未満だと銅箔引きはがし強さが低下する。If it is less than 1 part by weight, the copper foil peel strength will decrease.
ワニス作製の際の溶剤としてはアセトン、メチルエチル
ケトン、トルエン、キシレン、メチルインブチルケトン
、酢酸エチル、エチレングリコールモノメチルエーテル
、N、N−ジメチルホルムアミド、 N、N−ジメチル
アセトアミド、メタノール、エタノールなどがあり、こ
nらは何種類かを混合して用いてもよ(・。Solvents used in varnish production include acetone, methyl ethyl ketone, toluene, xylene, methyl imbutyl ketone, ethyl acetate, ethylene glycol monomethyl ether, N,N-dimethylformamide, N,N-dimethylacetamide, methanol, and ethanol. You can also use a mixture of several types of these.
また上記(a)、(b)、 (C)、 (d)は必須成
分であり他の化合物を混合することも可能である。Moreover, the above (a), (b), (C), and (d) are essential components, and it is also possible to mix other compounds.
上記(aJ、(bれ(C)、(dlを配合して得たワニ
スをガラス布またはガラス不織布に含授後、乾燥炉中で
80〜200℃の範囲で乾燥させ、印刷配線板用プリプ
レグを得る。プリプレグは加熱加圧して印刷配線板また
は金属5iX積層板を製造することに用いらnる。After impregnating the varnish obtained by blending the above (aJ, (b) (C), (dl) into a glass cloth or glass nonwoven fabric, it is dried in a drying oven at a temperature of 80 to 200°C to form a prepreg for printed wiring boards. The prepreg is heated and pressed to produce printed wiring boards or metal 5iX laminates.
〔実施例〕 以下本発明の実施例を記載する。〔Example〕 Examples of the present invention will be described below.
実施例1
アラルダイト8011(臭素化ビス
フェノールA型エポキシ樹脂) 7ON量部(商品名二
日本チバガイギー)
Ep−154(フェノールノボラッ
ク型エポキシ樹脂) 30貞量部(商品名:
油化シェルエポキシ)
HP−607(フェノールノボラッ
ク樹脂) 3ON景部(商品名:
日立化成)
ジシアンジアミド 0.3重量部GX−8
009H(インシアネート
マスクイミダゾール)0.5重量部
(商品名:第一工業!!!薬)
メチルエチルケトン 6ON量部上記配合物
よりなるワニスをQ、 1mm厚のガラス布に含浸させ
、150℃で10分間乾燥してプリプレグを得た。Example 1 Araldite 8011 (brominated bisphenol A type epoxy resin) 7ON parts (product name Nippon Ciba Geigy) Ep-154 (phenol novolac type epoxy resin) 30 parts (product name:
Oil-based shell epoxy) HP-607 (phenol novolac resin) 3ON Kabe (product name:
Hitachi Chemical) Dicyandiamide 0.3 parts by weight GX-8
009H (incyanate mask imidazole) 0.5 parts by weight (product name: Daiichi Kogyo!!!Yaku) Methyl ethyl ketone 6 parts by weight A 1 mm thick glass cloth was impregnated with the varnish made of the above composition and heated at 150°C for 10 minutes. A prepreg was obtained by drying for a minute.
実施例2
実施例1におけるジシアンジアミドの代わりにDX−1
47(ジシアンジアミド−メチルアニリン付加物、商品
名ニジエル化学)を1重量部を配合して実施例1と同様
にしてプリプレグを得之。Example 2 DX-1 instead of dicyandiamide in Example 1
A prepreg was obtained in the same manner as in Example 1 by blending 1 part by weight of 47 (dicyandiamide-methylaniline adduct, trade name Niziel Chemical).
実施例3
実施例1におけるジシアンジアミドのかわりKLX−1
006F(ジシアンジアミドージフミノジ2エニルメタ
ン付加吻、部品名:第−工業製薬)を0.5車量部配台
し、さらVCG X −8009Hツカbr)vccl
、Z−CN (?スクイミダゾール、酉品名:信越化学
)Y17重量部を配合して実施例1と同様にしてフリプ
レグを得た。Example 3 KLX-1 instead of dicyandiamide in Example 1
006F (dicyandiamide difuminodi-2-enylmethane addition nose, part name: Dai-Kogyo Seiyaku) was installed in 0.5 parts, and VCG
, Z-CN (?squimidazole, product name: Shin-Etsu Chemical) Y17 parts by weight were blended, and a Flipreg was obtained in the same manner as in Example 1.
比較例1
アラルダイト8011 70重量部Ep−15
430g
HP−60730#
2E4MZ<イミダゾール) 0.2 #(部品
名:四国化成)
メチルエチルケトン 60 l上記配合物よ
りなるワニスを用いて実施例1と同様にしてプリプレグ
を得た。Comparative Example 1 Araldite 8011 70 parts by weight Ep-15
430 g HP-60730# 2E4MZ<imidazole) 0.2 # (Part name: Shikoku Kasei) Methyl ethyl ketone 60 l A prepreg was obtained in the same manner as in Example 1 using a varnish made of the above blend.
比較例2
アラルダイト8011 70貞童部Ep−15
430#
ジシアンジアミド 312E4MZ
0.2 #メチルエチルケトン
203!jitt部メチルセロソルブ
40 l上記配合物よりなるワニスをQ、 i
mm1!i!、のガラス布に含浸させ160℃で10
分間乾燥してプリプレグを得た。Comparative Example 2 Araldite 8011 70 Sadadobu Ep-15
430# Dicyandiamide 312E4MZ
0.2 #Methyl ethyl ketone
203! jitt part methyl cellosolve
40 l Varnish made of the above formulation Q, i
mm1! i! , impregnated into glass cloth and heated at 160℃ for 10
A prepreg was obtained by drying for a minute.
上記実施例1〜6、比較例1,2で得たプリプレグ15
枚と35μ銅箔6枚を用いて170℃で60分間加熱加
圧成形して6層印刷配勝板を作製し、ドリル加工性、銅
箔引きはがし弦さ。Prepreg 15 obtained in Examples 1 to 6 and Comparative Examples 1 and 2 above
A 6-layer printed distribution board was fabricated by heat-pressing molding at 170°C for 60 minutes using six sheets of 35μ copper foil, and the drill workability and copper foil peelability were evaluated.
はんだ耐熱性、プリプレグ保存安定性の試験を行な−)
た。ドリル加工条件は回転数60 krpm送り速度1
0m/min、穴径1.Qmm、束ね枚数2枚で12,
000 bits まで穴あけし、スミア発生率を測
定した。Conducted tests on solder heat resistance and prepreg storage stability.
Ta. Drilling conditions are rotation speed 60 krpm feed rate 1
0m/min, hole diameter 1. Qmm, the number of bundled sheets is 12,
Holes were drilled to 000 bits and the smear occurrence rate was measured.
特性試験結果を表NC示す。Characteristic test results are shown in Table NC.
表 1 特性試験結果
注1)スルーホール内層銅断面のスミア占有率の20穴
の平均値。Table 1 Characteristic test results Note 1) Average value of the smear occupancy rate of the cross-section of the copper layer inside the through-hole for 20 holes.
注2)35t1片面相化銅箔、10flIITl巾。Note 2) 35t1 single-sided phased copper foil, 10flIITl width.
注5)銅箔光沢面に酸化銅処理を行なった場合。Note 5) When copper oxide treatment is applied to the glossy surface of copper foil.
表1に示さnるように実施例1〜6および比較例1は比
較例2のポリフェノールを用いな(・ −系に比べてス
ミア発生率はいずnも低く良好である。As shown in Table 1, in Examples 1 to 6 and Comparative Example 1, the smear occurrence rate was lower and better than in Comparative Example 2, which did not use the polyphenol.
銅箔引きはがし強さは比較例1に比べて実施例1〜3は
実用上問題のない値となっ工いることがわかる。It can be seen that, compared to Comparative Example 1, Examples 1 to 3 have a value that does not cause any problem in terms of copper foil peeling strength.
またフリプレグの保存安定性も比較例1に比べて、マス
クイミダゾールを用(・た実施例1〜3では大幅に向上
している。Furthermore, compared to Comparative Example 1, the storage stability of Flipreg was significantly improved in Examples 1 to 3 in which mask imidazole was used.
本発明の印刷配線板用プリプレグはドリル加工性銅箔引
きはがし強さ、保存安定性におい又。The printed wiring board prepreg of the present invention has excellent drill workability, copper foil peeling strength, and storage stability.
従来技術に比べ、大幅に向上している。This is a significant improvement over conventional technology.
〈1.二 、 \−−5r<1. Two, \--5r
Claims (1)
を必須成分として配合したワニスをガラス布またはガラ
ス不織布に含浸後、乾燥させることを特徴とする印刷配
線板用プリプレグの製造方法。 2、硬化促進剤がイミノ基がマスクされたイミダゾール
化合物であることを特徴とする特許請求の範囲第1項記
載の印刷配線板用プリプレグの製造方法。 3、ジシアンジアミドまたはジシアンジアミド誘導体の
配合量がエポキシ樹脂100重量部に対して0.1〜1
重量部であることを特徴とする特許請求の範囲第1項又
は第2項記載の印刷配線板用プリプレグの製造方法。[Claims] 1. After impregnating a glass cloth or glass nonwoven fabric with a varnish containing as essential components (a) an epoxy resin, (b) a novolac resin, (c) a curing accelerator, and (d) dicyandiamide or a dicyandiamide derivative. A method for producing prepreg for printed wiring boards, which comprises drying the prepreg. 2. The method for manufacturing a prepreg for a printed wiring board according to claim 1, wherein the curing accelerator is an imidazole compound with masked imino groups. 3. The amount of dicyandiamide or dicyandiamide derivative is 0.1 to 1 per 100 parts by weight of the epoxy resin.
The method for manufacturing a prepreg for a printed wiring board according to claim 1 or 2, characterized in that the amount is parts by weight.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22182384A JPS6198745A (en) | 1984-10-22 | 1984-10-22 | Production of prepreg for printed circuit board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22182384A JPS6198745A (en) | 1984-10-22 | 1984-10-22 | Production of prepreg for printed circuit board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6198745A true JPS6198745A (en) | 1986-05-17 |
Family
ID=16772744
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22182384A Pending JPS6198745A (en) | 1984-10-22 | 1984-10-22 | Production of prepreg for printed circuit board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6198745A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS641753A (en) * | 1987-06-24 | 1989-01-06 | Matsushita Electric Works Ltd | Epoxy resin composition for glass-epoxy laminate |
| JPS644090A (en) * | 1987-06-26 | 1989-01-09 | Toshiba Chem Corp | Multilayered copper-cladded laminate |
| WO2016035459A1 (en) * | 2014-09-02 | 2016-03-10 | 東レ株式会社 | Epoxy resin composition for fiber-reinforced composite materials, prepreg and fiber-reinforced composite material |
| EP2540754A4 (en) * | 2010-02-24 | 2017-05-31 | Hitachi Chemical Company, Ltd. | Varnish, prepreg, film with resin, metal foil-clad laminate, and printed circuit board |
| US10465089B2 (en) | 2009-02-24 | 2019-11-05 | Hitachi Chemical Company, Ltd. | Varnish, prepreg, film with resin, metal foil-clad laminate, and printed circuit board |
-
1984
- 1984-10-22 JP JP22182384A patent/JPS6198745A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS641753A (en) * | 1987-06-24 | 1989-01-06 | Matsushita Electric Works Ltd | Epoxy resin composition for glass-epoxy laminate |
| JPS644090A (en) * | 1987-06-26 | 1989-01-09 | Toshiba Chem Corp | Multilayered copper-cladded laminate |
| US10465089B2 (en) | 2009-02-24 | 2019-11-05 | Hitachi Chemical Company, Ltd. | Varnish, prepreg, film with resin, metal foil-clad laminate, and printed circuit board |
| EP2540754A4 (en) * | 2010-02-24 | 2017-05-31 | Hitachi Chemical Company, Ltd. | Varnish, prepreg, film with resin, metal foil-clad laminate, and printed circuit board |
| WO2016035459A1 (en) * | 2014-09-02 | 2016-03-10 | 東レ株式会社 | Epoxy resin composition for fiber-reinforced composite materials, prepreg and fiber-reinforced composite material |
| CN106687497A (en) * | 2014-09-02 | 2017-05-17 | 东丽株式会社 | Epoxy resin composition for fiber-reinforced composite materials, prepreg and fiber-reinforced composite material |
| JPWO2016035459A1 (en) * | 2014-09-02 | 2017-06-22 | 東レ株式会社 | Epoxy resin composition for fiber reinforced composite material, prepreg and fiber reinforced composite material |
| US10266641B2 (en) | 2014-09-02 | 2019-04-23 | Toray Industries, Inc. | Epoxy resin composition for fiber-reinforced composite material, prepreg and fiber-reinforced composite material |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0257812B2 (en) | ||
| JP3810954B2 (en) | Flame-retardant adhesive composition, flexible copper-clad laminate, coverlay and adhesive film | |
| EP0466299B1 (en) | Epoxy resin composition, epoxy resin cured material, and laminated sheet lined with copper | |
| JPS6336621B2 (en) | ||
| JPH05239238A (en) | Production of prepreg and laminate made therefrom | |
| JPS6198745A (en) | Production of prepreg for printed circuit board | |
| JP5717698B2 (en) | Epoxy resin composition | |
| KR100777500B1 (en) | Varnishes for laminated boards or prepregs, laminated boards or prepregs obtained from the varnishes, and printed wiring boards using the laminated boards or prepregs | |
| JP2000219799A (en) | Flame retardant epoxy resin composition and laminate | |
| JP2001181371A (en) | Build-up type multilayer printed circuit board, resin composition therefor, and resin film | |
| JPH03124735A (en) | Preparation of prepreg for printed circuit board | |
| JPH0528253B2 (en) | ||
| KR100225739B1 (en) | Epoxy resin composition for use in electrical laminates | |
| JP3126962B2 (en) | Flame retardant epoxy resin composition, prepreg and laminated product | |
| JPH0959346A (en) | Epoxy resin composition for laminate | |
| JPH10193516A (en) | Production of glass epoxy copper plated laminated sheet | |
| JP2833433B2 (en) | Epoxy resin composition for laminate and method for producing laminate | |
| JP3009947B2 (en) | Epoxy resin composition | |
| JPH0257813B2 (en) | ||
| JPH06136091A (en) | Epoxy resin composition | |
| JPH0759626B2 (en) | Epoxy resin composition for printed wiring board | |
| JP3326862B2 (en) | Manufacturing method of prepreg | |
| JP3360193B2 (en) | Heat resistant epoxy resin for laminate and composition thereof | |
| JPH08104737A (en) | Epoxy resin composition and prepreg using the same | |
| JP3089522B2 (en) | Method for producing prepreg for electric laminate, electric laminate using the prepreg, and printed wiring board using the laminate |