JPS62103378A - Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法 - Google Patents

Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法

Info

Publication number
JPS62103378A
JPS62103378A JP24366185A JP24366185A JPS62103378A JP S62103378 A JPS62103378 A JP S62103378A JP 24366185 A JP24366185 A JP 24366185A JP 24366185 A JP24366185 A JP 24366185A JP S62103378 A JPS62103378 A JP S62103378A
Authority
JP
Japan
Prior art keywords
vacuum chamber
dry etching
lid
liq
ceramic particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24366185A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6345466B2 (th
Inventor
Yutaka Kato
豊 加藤
Eizo Isoyama
礒山　永三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Altemira Co Ltd
Original Assignee
Showa Aluminum Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Aluminum Corp filed Critical Showa Aluminum Corp
Priority to JP24366185A priority Critical patent/JPS62103378A/ja
Publication of JPS62103378A publication Critical patent/JPS62103378A/ja
Publication of JPS6345466B2 publication Critical patent/JPS6345466B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • ing And Chemical Polishing (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP24366185A 1985-10-29 1985-10-29 Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法 Granted JPS62103378A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24366185A JPS62103378A (ja) 1985-10-29 1985-10-29 Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24366185A JPS62103378A (ja) 1985-10-29 1985-10-29 Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法

Publications (2)

Publication Number Publication Date
JPS62103378A true JPS62103378A (ja) 1987-05-13
JPS6345466B2 JPS6345466B2 (th) 1988-09-09

Family

ID=17107122

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24366185A Granted JPS62103378A (ja) 1985-10-29 1985-10-29 Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法

Country Status (1)

Country Link
JP (1) JPS62103378A (th)

Also Published As

Publication number Publication date
JPS6345466B2 (th) 1988-09-09

Similar Documents

Publication Publication Date Title
KR102193589B1 (ko) 열전도도가 개선된 알루미늄-그래핀 복합소재의 제조방법
EP0339343B1 (en) Improving the water-resistance of fine-vermiculite articles
JPS62103379A (ja) Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法
US3658581A (en) Coating for condenser surfaces
US3924032A (en) Surface modification of silica particles
TWI764329B (zh) 塗料組成物、保溫方法、能量消耗抑制方法、建築資材及建築物
CN105601341B (zh) 一种带β碳化硅涂层刹车盘制备的方法
JPS6345466B2 (th)
US3002862A (en) Inorganic compositions and method of making the same
US4720419A (en) Substrates for electronic devices
US4661138A (en) Method of strengthening the alkali resistance of a porous glass
JPH07156111A (ja) 改質木材の製法
US2957787A (en) Method of rendering titanium dioxide films electrically conductive
JPH0553870B2 (th)
Holland et al. Effects of oil vapour contamination on the adhesion of zinc sulphide films to glass and silica
JPH0393612A (ja) 耐水性窒化アルミニウム及びその製造法
US2897095A (en) Method of producing aluminized paper
JP2923752B2 (ja) 無機キセロゲル膜を備えた湿度応答膜
JPS62103380A (ja) Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法
JPS62168553A (ja) 表面処理容器
SU1158555A1 (ru) Способ гидрофобизации волокнистого кремнеземистого материала
JPH02111617A (ja) 沈降ケイ酸の調製方法、該ケイ酸からなる断熱材、成形体および該成形体の製造方法
JPH02298335A (ja) アルミニウム製真空チャンバの腐食、汚染防止方法
JP2599531B2 (ja) 親水性被膜
JP6768233B2 (ja) 基材を疎水化する方法