JPS62148295A - Aluminum alloy base for planographic plate and production thereof - Google Patents
Aluminum alloy base for planographic plate and production thereofInfo
- Publication number
- JPS62148295A JPS62148295A JP60289577A JP28957785A JPS62148295A JP S62148295 A JPS62148295 A JP S62148295A JP 60289577 A JP60289577 A JP 60289577A JP 28957785 A JP28957785 A JP 28957785A JP S62148295 A JPS62148295 A JP S62148295A
- Authority
- JP
- Japan
- Prior art keywords
- less
- aluminum alloy
- elemental
- plate
- roughened surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
- B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
- B41N1/083—Printing plates or foils; Materials therefor metallic for lithographic printing made of aluminium or aluminium alloys or having such surface layers
Landscapes
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は陽極酸化処理、感光性物質塗布を施してから平
版印刷に用いるアルミニウム合金支持体に関し、さらに
詳しく言えば電気化学的処理により均一なm面となり、
印刷中の非画像部の耐汚れ性がきわめてす(゛れ、スト
リーク(筋ムラ)の発生もみられない平版印刷版をかえ
る、アルミニウム合金支持体とその製造方法に関するも
のである。Detailed Description of the Invention (Field of Industrial Application) The present invention relates to an aluminum alloy support that is used for planographic printing after anodizing and coating with a photosensitive material. It becomes m-plane,
The present invention relates to an aluminum alloy support for use in planographic printing plates that has extremely high stain resistance in non-image areas during printing (staining and no streaks), and a method for manufacturing the same.
(従来の技術)
平版印刷版は、平版印刷版用支持体としてのアルミニウ
ム合金板などを粗面化処理、陽極酸化皮膜処理などの表
面処理したのち感光性物質を塗布1、て4/[:濤六ハ
−スー不1.て7の亜1湯印伯11:υじ しt光、現
像等の製版処理を行なって画線部を形成した版板とし、
これを印刷機の円筒形版銅に巻き付けたのち、非画像部
にイ・1着した湿し水の存在のもとにインキを画線部上
に付着yせてこのインキをコムプランケントに転写し、
次いで1紙面に印刷することにより、平版印刷が行われ
る。(Prior art) A lithographic printing plate is produced by applying a photosensitive substance to an aluminum alloy plate or the like as a support for the lithographic printing plate after surface treatment such as roughening treatment and anodizing treatment. Taoroku Hearth Fu1. 7, A1 Yuinhaku 11: υji Shit A printing plate with image areas formed by plate-making processes such as light and development,
After wrapping this around the cylindrical copper plate of a printing press, the ink is applied to the printing area in the presence of dampening water applied to the non-image area, and this ink is applied to the printing press. transcribe,
Then, lithographic printing is performed by printing on one sheet of paper.
従来このような平版印刷用アルミニウム合金板としては
゛1株気化学的相面化処理に適するものとして・i’5
Fe 0、35〜1重量%(以下、爪ψ%を%と略記
する)、Si 0.2%以下のアルミニウム合金を均
質化処理後、熱間圧延し、40〜80%の冷間JE’y
4を行なったアルミニウム合金板(特開昭55−288
74号)、才>Fe 0、1〜10%、Si 0.
02〜0.15%、Cu0003%以下のアルミニウム
合金板(特開昭58−221254号)などが提案され
ており、その他、Fe及びSiを所定量含有させたアル
ミニウム合金板は特開昭58−42493号、同59−
67349号に開示されている。Conventionally, such an aluminum alloy plate for lithographic printing has been used as one suitable for vapor chemical phase treatment.
After homogenizing an aluminum alloy containing 0.35 to 1% by weight of Fe (hereinafter ψ% is abbreviated as %) and 0.2% or less of Si, it is hot rolled to form a cold JE' of 40 to 80%. y
4 aluminum alloy plate (Japanese Patent Application Laid-Open No. 55-288
No. 74), Fe 0, 1-10%, Si 0.
02 to 0.15% and Cu0003% or less (Japanese Unexamined Patent Publication No. 58-221254) has been proposed, and an aluminum alloy sheet containing a predetermined amount of Fe and Si has been proposed in Japanese Patent Application Laid-open No. 58-221254. No. 42493, 59-
No. 67349.
(発明か解決しようとする問題点)
用いれば、電気化学的11面化処理により均−粗面がゼ
1られる。しかし、これらのアルミニウム合金板は、中
ストリーク(筋状ムラ)が11面化処理時に発生し、は
なはだしく美観を損ねるか、 t′2’!大部攻(数刀
部以」二)を印刷した場合、非画像部にインクが付着し
、印刷物に汚れが発生するかのいずれか、問題点を克服
することはできなかった。(Problems to be Solved by the Invention) When used, a uniformly roughened surface can be formed by electrochemical 11-sided treatment. However, in these aluminum alloy plates, medium streaks (streak-like unevenness) occur during the 11-sided processing, which greatly impairs the aesthetic appearance, or t'2'! When printing Obe Ko (Satobu I'2), it was not possible to overcome the problems of ink adhering to non-image areas and staining the printed matter.
この中で・1.:・は熱間圧延条件が適当でない場合に
、熱延パス間で粗大(〜100μm以上)な再結晶粒が
発生し、これか最終冷間圧延後にもその輪郭が残存し電
解粗面化処理した際に圧延方向に延びた繊維状のストリ
ーク(筋状のムラ)として現出するためと考えられる。Among these: 1. :・If the hot rolling conditions are not appropriate, coarse recrystallized grains (~100 μm or more) are generated between hot rolling passes, and their outline remains even after the final cold rolling, resulting in electrolytic surface roughening treatment. This is thought to be because when the rolling direction is applied, fibrous streaks (streak-like unevenness) extending in the rolling direction appear.
また、′?;・の非画像部汚れは、特定の金属間化合物
が存在すると、陽極酸化皮11:マに不健全な部分が発
生し、またA♀マトリクスとの電位差が異なるため腐食
の起点となり、汚れが発生するものである。Also,'? Contamination in the non-image area of . is caused by the presence of a specific intermetallic compound, which causes unhealthy areas in the anodic oxidation skin 11:ma, and because the potential difference with the A♀ matrix is different, it becomes a starting point for corrosion, causing the contamination to occur. It is something that occurs.
したがって本発明の目的は、電気化学的粗面化処理によ
り均一、微細な粗面が得られ、ストリーク(筋状のムラ
)の発生がみられず、しかも印刷中に非画像部の汚れが
ほとんど発生しない平版印刷版用アルミニウム合金板を
Iに供することであ(問題点を解決するための手段)
木発明者らは、上記従来のアルミニウム合金板の欠貞を
克服するため鋭意研究を重ねた結果、アルミニウム合金
中のFe、Si及びCuの一■を所111囲に設定する
とともに、単体S+の9をある特定の栖以下に規制する
ようにしたアルミニウム・合金板が、ト記I]的を達成
しうろことを見出し この知見にノ、(つき本発明をな
すに至った。Therefore, it is an object of the present invention to obtain a uniform, finely roughened surface by electrochemical surface roughening treatment, to avoid the occurrence of streaks (streak-like unevenness), and to minimize stains in non-image areas during printing. By providing an aluminum alloy plate for lithographic printing plates that does not generate the above problems (means for solving the problem), the inventors of the present invention have conducted intensive research to overcome the deficiencies of the conventional aluminum alloy plates mentioned above. As a result, an aluminum alloy plate in which the concentrations of Fe, Si, and Cu in the aluminum alloy are set to 111, and the amount of 9 of S+ in the aluminum alloy is regulated to be below a certain limit, meets the requirements of item I. This discovery led us to create the present invention.
すなわち本発明は、Fe 0、05〜1%、Si
0.2%以下、Cu 0、05%以下、残r:’dA
Qと不可避の不純物がらなり1内部に分布するCti体
Siが0.012%以下であることを特徴と干る41+
に印刷版用アルミニウム合金支持体、及び、 Fe
o、05〜1%、Si 0.2%以ド、Cu 0、
05%以下、残部へ又と不可避の不純物からなるアルミ
ニウム合金鋳塊を均熱処理If−d、Aりへ〇I++1
〜1〒、1■コ^番−−のモ均冷却速度で冷却するか、
又は350〜450 ’Cの温度で30分以上保持して
から、熱間圧延又は熱間圧延後、冷間圧延と中間焼鈍を
行ない、これに減面率50%以上の最終冷間圧延を加え
ることにより、内部に分布する単体Siを0.012%
以下とすることを特徴とする平版印刷版用アルミニウム
合金支持体の製造方法を提供するものである。That is, in the present invention, Fe 0.05~1%, Si
0.2% or less, Cu 0.05% or less, remainder r:'dA
41+ characterized by Q and unavoidable impurities being distributed inside the Cti form Si of 0.012% or less
an aluminum alloy support for printing plates, and Fe
o, 05-1%, Si 0.2% or more, Cu 0,
05% or less, and the remainder contains unavoidable impurities, is subjected to soaking treatment If-d, A〇I++1
Cool at a uniform cooling rate of ~1〒, 1■
Or after holding at a temperature of 350 to 450'C for 30 minutes or more, hot rolling or after hot rolling, cold rolling and intermediate annealing, followed by final cold rolling with an area reduction of 50% or more. By this, the elemental Si distributed inside is reduced to 0.012%.
The present invention provides a method for producing an aluminum alloy support for a lithographic printing plate, which is characterized by the following.
まず、本発明に用いられる合金組成について説明する。First, the alloy composition used in the present invention will be explained.
合金組成においてFeはO、’05〜1%の範囲とする
。Feは゛電解粗面化面の均一化の作用と(Tする。F
eはアルミニウム合金中で他の元−kを結びつき、A立
−Fe系の共晶化合物を形成する元素であり、A交−F
e系の共晶化合物は再結晶粒の微細化に効果があると共
に、均一微細な電解11面を形成する効果があり、含有
量が0.05%未満では再結晶粒の微細化、電解粗面化
面の均−微Ml+効果が少なく、また、1ゾロを越える
含有7.1では−となる。In the alloy composition, Fe is O, and is in the range of '05 to 1%. Fe has the effect of making the electrolytically roughened surface uniform (T.F
e is an element that binds other elements -k in the aluminum alloy to form a eutectic compound of A-Fe system, and
E-based eutectic compounds are effective in refining recrystallized grains and forming uniformly fine electrolytic surfaces.If the content is less than 0.05%, recrystallized grains are refined and electrolytically coarsened. The uniform-fine Ml+ effect on the planarized surface is small, and - when the content exceeds 1 zoro of 7.1.
Siは0.2%以下とする。Siは通常の不純物として
含まれ、0.2%を越えると11而の均一−性が害され
また。後述の単体Siの析出が起こりやすくなるため非
画像部の汚れも発生しやすい。The content of Si is 0.2% or less. Si is included as a normal impurity, and if it exceeds 0.2%, the uniformity of the particles will be impaired. Since the precipitation of elemental Si, which will be described later, is likely to occur, stains in non-image areas are also likely to occur.
Cuを0.05%以下に限定したのは、不純物としてC
uが0.05%を越えると電気化学的粗面化処理によっ
て生成する四部(ピント)が粗大になりやすく、また、
印刷版として非画像部の酎汚れ性が低下するからである
。また、最終冷間圧延板中の単体Siの存在量を0.0
12%以ドと限定したのは、単体5jは陽極酸化処理に
より陽極酸化皮膜中に残存して皮膜欠陥を形成し、これ
が印刷中に非画像部の汚れ発生の起点となるためであり
、単体Siの存在量を0.012%12%以下すること
により、非画面部の汚れが発生しにくい、印刷適性の極
めて優れた印刷版とすることができることを見出したも
のである。The reason why Cu is limited to 0.05% or less is because C is an impurity.
If u exceeds 0.05%, the four parts (pinto) produced by electrochemical roughening treatment tend to become coarse, and
This is because the stain resistance of non-image areas of the printing plate is reduced. In addition, the amount of elemental Si in the final cold-rolled plate was set to 0.0
The reason for limiting the amount to 12% or less is that the single substance 5j remains in the anodized film due to the anodizing treatment and forms film defects, which becomes the starting point for staining in non-image areas during printing. It has been discovered that by reducing the amount of Si to 0.012% to 12% or less, a printing plate that is less likely to stain in non-screen areas and has excellent printability can be obtained.
本発明における平版印刷版用支持体を構成するアルミニ
ウム合金中に含まれる不純物としては。Impurities contained in the aluminum alloy constituting the lithographic printing plate support in the present invention include:
通常市販されているAl地金に含まれる不純物程度であ
れば本発明の目的を損なうものではない。The purpose of the present invention will not be impaired if the impurities are at the same level as those contained in commercially available Al ingots.
1!pちMn0.05%以下、Cr 0、05%以下
、Zn 0、05%以下ならば特に問題はない。1! There is no particular problem if p, Mn is 0.05% or less, Cr is 0.05% or less, and Zn is 0.05% or less.
また、t4j塊の製造に際し、結晶微細化剤として通常
使用されているTi、BはTi 0.05%以下、B
0、01%以下の添加であれば合金組織の均一微細
化に有効であるに
のように本発明における上版印刷版用支持体はその製造
において110記組成のアルミニウム合金鋳塊を均熱処
理して、不純物を固溶させるとともにFeの一部を固溶
させ、一部のFeの金属間化合物を均−a細に分散させ
る。この灼熱処理は500〜620℃の温度で3時間以
上行なうことが望ましい。次にこれを430℃以下の温
度に達するまで50℃/時以下の平均冷却速度で冷却す
るか、又は350〜450℃の温度で30分以上保持す
ることにより鋳塊中に金談れるSi原子をAl−Fe−
5i系の金属間化合物として析出させ、続く工程での単
体Si析出量を減じる。また、このAM−Fe−3i系
金金属化合物は、熱延パス間での再結晶の核として作用
するため、再結晶粒微細化効果を41し、ストリーク発
生防止に極めて有効である。しかる後通常の方法で熱間
圧通し、又は熱間圧延後冷間圧延と中間焼鈍を行なう。In addition, when producing t4j lumps, Ti and B, which are usually used as crystal refiners, contain less than 0.05% Ti and B
Addition of 0.01% or less is effective in uniformly refining the alloy structure.The support for the upper printing plate of the present invention is produced by soaking an aluminum alloy ingot having a composition of 110. In this way, impurities are dissolved in solid solution, a portion of Fe is dissolved in solid solution, and a portion of the intermetallic compound of Fe is uniformly and finely dispersed. This scorching treatment is desirably carried out at a temperature of 500 to 620° C. for 3 hours or more. Next, Si atoms are released into the ingot by cooling it at an average cooling rate of 50°C/hour or less until it reaches a temperature of 430°C or less, or by holding it at a temperature of 350 to 450°C for 30 minutes or more. Al-Fe-
It is precipitated as a 5i-based intermetallic compound to reduce the amount of elemental Si precipitated in the subsequent process. Moreover, since this AM-Fe-3i gold metal compound acts as a nucleus for recrystallization between hot rolling passes, it has a recrystallized grain refinement effect and is extremely effective in preventing the occurrence of streaks. Thereafter, hot rolling or hot rolling followed by cold rolling and intermediate annealing are performed in a conventional manner.
熱間圧延温度は450〜200℃で行なうのが適当であ
る。熱間圧延開始温度が450℃を越えると、熱延パス
間での再結晶粒が100μm以トと粗大になり、ストリ
ークが発生しやすい。心安に応して行なう熱間圧延後の
中間焼鈍は350〜500℃で2〜5時間あるいは連続
焼鈍炉において400〜550℃で120秒以ド行なう
ことか望ましい。The hot rolling temperature is suitably 450 to 200°C. When the hot rolling start temperature exceeds 450° C., recrystallized grains between hot rolling passes become coarse, 100 μm or more, and streaks are likely to occur. It is desirable that the intermediate annealing after hot rolling be carried out at 350 to 500°C for 2 to 5 hours or in a continuous annealing furnace at 400 to 550°C for 120 seconds or more.
このようにして得られた板は減面率が50%以−にとな
るよう最終冷間圧延される。この最終冷却圧延において
金属間化合物が分散し、結晶組織が均一となる。この減
面率が50%未満では金属間化合物の分散が不充分で結
晶MIN&か不均一とない。The plate thus obtained is finally cold rolled so that the reduction in area is 50% or more. In this final cooling rolling, intermetallic compounds are dispersed and the crystal structure becomes uniform. If the area reduction rate is less than 50%, the intermetallic compound will not be sufficiently dispersed, resulting in uneven crystal formation.
このようにして得られた冷間圧延板は、内部に存在する
rri体Siが0.012%以下であり、゛ル解$11
面化処理により均一な粗面が得られ、ストリークの発生
もみられず印刷中の非画像部の酎汚れ性も極めてすぐれ
た丑版印刷版をかえる。The cold-rolled plate thus obtained has 0.012% or less of ri-form Si present inside, and the solution is $11.
A uniformly roughened surface is obtained by the surface treatment, and the ox printing plate is used, which does not cause streaks and has excellent stain resistance in non-image areas during printing.
なお、この最終冷間圧延板に適度の延性をダ、えて疲労
強度を向とさせるために、単体Siの析出が起こらない
、以下の条件でならば、調質焼鈍を施しても良い。調質
焼鈍は、6常のパッチ炉においては70〜180’0で
30分以上行なうのがめ当である。70℃以ドまたは3
0分未満ではあまり効果がなく、180℃以上ではrJ
’+体Siの析出が起こり、非画像部の耐汚れ性を損な
う。調質焼鈍は、急速昇温・短時間加熱を特徴とする連
続焼鈍炉で行なっても良く、この場合は150〜400
℃で120秒以秒以11′I熱するのが適当である。Incidentally, in order to impart appropriate ductility to the final cold-rolled sheet and improve its fatigue strength, temper annealing may be performed under the following conditions in which precipitation of elemental Si does not occur. Temperature annealing is preferably carried out at 70 to 180'0 for 30 minutes or more in a 6-way patch furnace. 70℃ or higher or 3
Less than 0 minutes is not very effective, and above 180℃ rJ
Precipitation of + form Si occurs, impairing the stain resistance of non-image areas. Temperature annealing may be carried out in a continuous annealing furnace that is characterized by rapid temperature rise and short-time heating, and in this case, the
It is suitable to heat at 11'C for 120 seconds or more.
150″C未満では効果が不足、400 ’Cを越える
と仮が軟化しすぎてしまい8また120秒以1− M
m+ 0ILnu l!n −n I−) /←+*
種a< +llj / h・ス次に本発明による平
版印刷版用支持体の表面処理方法について詳細に説明す
る。If it is less than 150'C, the effect will be insufficient, and if it exceeds 400'C, the temporary will become too soft, and it will not last longer than 8 or 120 seconds.
m+ 0ILnu l! n −n I−) /←+*
Species a<+llj/h・S Next, the method for surface treatment of a support for a lithographic printing plate according to the present invention will be described in detail.
本発明における砂目立て方法は塩酸又は硝酸電解液中で
電解化学的に砂目立てする電気化学的砂目立て法、及び
アルミニウム表面を金属ワイヤーでひっかくワイヤーブ
ラシグレイン法、研摩法と研摩剤でアルミニウム表面を
砂目立てするボールグレイン法、ナイロンブラシと研摩
剤で表面を砂目立てするブラシグレイン法のような機械
的砂目立て法を用いることができ、上記のいずれの砂目
立て方法を単独あるいは組合せて用いることもできる。The graining methods used in the present invention include an electrochemical graining method in which graining is carried out electrochemically in a hydrochloric acid or nitric acid electrolyte, a wire brush graining method in which the aluminum surface is scratched with a metal wire, and a polishing method in which the aluminum surface is polished using an abrasive. Mechanical graining methods such as the ball grain method for graining and the brush grain method for graining the surface using a nylon brush and abrasive can be used, and any of the above graining methods can be used alone or in combination. can.
このように砂目立て処理したアルミニウムは。Aluminum grained in this way.
酸又はアルカリにより化学的にエツチングされる。酸を
エツチング剤として用いる場合は、微細構造を破壊する
のに時間がかかり、工業的に本発明を適用するに際して
は不利であるが、アルカリをエツチング剤として用いる
ことにより改善できる。Chemically etched with acid or alkali. When an acid is used as an etching agent, it takes time to destroy the fine structure, which is disadvantageous in industrial application of the present invention, but this can be improved by using an alkali as an etching agent.
本発明において好適に用いられるアルカリ剤は、j+’
(性ソーダ、炭酸ソータ、アルミン酸ソータ、メタケイ
酸ンーダ、リン酸ソーダ、水酸化カリウム、水酸化リチ
ウム等を用い、濃度と温度の好ましい範囲はそれぞれ1
〜50%、20〜100℃であり、A!;Lの溶解量が
5〜20g/rrI′となるような条件が好ましい。The alkaline agent suitably used in the present invention is j+'
(Use sodium hydroxide, carbonate sorter, aluminate sorter, metasilicate soda, sodium phosphate, potassium hydroxide, lithium hydroxide, etc., and the preferred range of concentration and temperature is 1.
~50%, 20-100°C, and A! ; Conditions are preferred such that the amount of L dissolved is 5 to 20 g/rrI'.
エンチングのあと表面に残留する汚れ(スマット)を除
去するために酸洗いが行なわれる。用いられる酸は硝酸
、硫酸、リン酸、クロム酸、フッ酸、ホウフッ化水#酸
等が用いられる。特に電気化学的粗面化処理後のスマン
ト除去処理には好ましくは特開昭33−12739号公
報に記載されているような50〜90℃の温度の15〜
65川量%の硫酸と接触させる方法及び特公昭48−2
8123号公報に記載されているアルカリエツチングす
る方法である。After etching, pickling is performed to remove dirt (smut) remaining on the surface. The acids used include nitric acid, sulfuric acid, phosphoric acid, chromic acid, hydrofluoric acid, and fluoroboric acid. In particular, for smant removal treatment after electrochemical surface roughening treatment, it is preferable to
Method of contacting with 65% sulfuric acid and Special Publication No. 1973-2
This is an alkali etching method described in Japanese Patent No. 8123.
以上のようにして処理されたアルミニウム板は平版印刷
版用支持体として使用することができるが、さらに必要
に応じて陽極酸化皮11Q%理、化成処理などの処理を
施すことが好ましい。The aluminum plate treated as described above can be used as a support for a lithographic printing plate, but it is preferable to further perform treatments such as anodizing 11Q% treatment and chemical conversion treatment as necessary.
陽極酸化処理はこの分野で従来より行われている方法で
行うことができる。具体的には硫酸、リン耐、クロム酸
、シュウ酸、スルファミン酸、ベンゼンスルホン酸等あ
るいはこれらの二種類以上を組み合わせた水溶液又は非
水溶液中でアルミニウムに直流又は交流の電流を流すと
アルミニウム支持体表面に陽極酸化皮膜を形成すること
ができる。The anodic oxidation treatment can be performed by a method conventionally used in this field. Specifically, when a direct or alternating current is passed through aluminum in an aqueous or non-aqueous solution of sulfuric acid, phosphorous, chromic acid, oxalic acid, sulfamic acid, benzenesulfonic acid, etc. or a combination of two or more of these, the aluminum support becomes An anodic oxide film can be formed on the surface.
陽極酸化の処理条件は使用される電解液によって種々変
化するので一概には決定され得ないが。The treatment conditions for anodic oxidation vary depending on the electrolyte used, so they cannot be determined unconditionally.
一般的には電解液の濃度が1〜80%、液温5〜70℃
,電流密度0.5〜60アンペア/ d m’ 。Generally, the concentration of electrolyte is 1-80%, and the liquid temperature is 5-70℃.
, current density 0.5-60 ampere/d m'.
゛重圧1〜toov、電解時間10−100秒の範囲か
適当である。A range of heavy pressure of 1 to 10 m and electrolysis time of 10 to 100 seconds is appropriate.
これらの陽極酸化皮膜処理の内でも特に英国時1:1第
1,412,768号明細占に記載されている発明で使
用されている。硫酸中で高電流密度で陽極酸化する方法
及び米国特許iR3,511゜661号明細書に記載さ
れているリン酸を電解浴陽極酸化されるアルミニウム板
はさらに米国特許第2,714,066号及び同第3,
181゜461号の各明細書に記されているようにアル
カリ金属シリケート、例えばケイ酸ナトリウムの水溶液
で浸漬などの方法により処理したり、米国特許第386
0426号明細書に記載されているように、水溶性金属
塩(例えば酢酸亜鉛など)を含む親水性セルロース(例
えば、カルボキシメチルセルロースなど)の下塗り層を
設けることもできる。Among these anodic oxide coating treatments, it is particularly used in the invention described in British Time 1:1 Specification No. 1,412,768. The method of anodizing at high current density in sulfuric acid and the phosphoric acid electrolytic bath anodized aluminum plate described in U.S. Pat. Same 3rd,
No. 181.461, by dipping in an aqueous solution of an alkali metal silicate, for example, sodium silicate, or
A subbing layer of hydrophilic cellulose (such as carboxymethylcellulose) containing a water-soluble metal salt (such as zinc acetate) may also be provided, as described in US Pat. No. 0,426.
本発明による平版印刷版用支持体の上には、PS版の感
光層として従来より知られている感光層を設けて感光性
平版印刷版を得ることができ、これを製版処理して得た
平版印刷版はすぐれた性能を有している。A photosensitive layer conventionally known as a photosensitive layer of a PS plate can be provided on the support for a planographic printing plate according to the present invention to obtain a photosensitive planographic printing plate, which can be obtained by plate-making processing. Lithographic printing plates have excellent performance.
上記感光層に用いる組成物としては次のようなものが含
まれる。The compositions used in the photosensitive layer include the following.
(Oジアゾ樹脂とバインダーとからなる感光層米国特許
第2063631号及び同第1667415−Jiの各
明細書に開示されているジアゾニウム塩とアルドールや
アセタールのような反応性カルボニル基を含有する有機
縮合剤との反応生成物であるジフェニルアミン−p−ジ
アンニウム塩とホルムアルデヒドとの縮合生成物(いわ
ゆる感光性ジアゾ樹脂)が好適に用いられる。この外の
有用な縮合ジアゾ化合物は特公昭49−48001号、
同49−45322号、同49−45323号の各公報
等に開示されている。(A photosensitive layer consisting of a diazo resin and a binder) A diazonium salt and an organic condensing agent containing a reactive carbonyl group such as an aldol or an acetal are disclosed in U.S. Pat. A condensation product (so-called photosensitive diazo resin) of diphenylamine-p-dianium salt, which is a reaction product with formaldehyde, is preferably used.Other useful condensed diazo compounds are described in Japanese Patent Publication No. 49-48001,
It is disclosed in the respective publications such as No. 49-45322 and No. 49-45323.
これらの型の感光性ジアゾ化化合物は通常水溶性無機塩
の型で得られ、従って水溶液から塗布することができる
。又はこれらの水溶性ジアゾ化合物を特公昭47−11
67号公報に開示された方法により1個又はそれ以上の
フェノール性水酸基、スルホン酸基又はその両者を有す
る芳香族又は樹脂族化合物と反応させ、その反応生成物
である実質的に水不溶性の感光性ジアゾ樹脂を使用する
こともできる。また、特開昭56−121031号公報
に記載されているようにヘキサフルオロリン酸塩または
テトラルオロホウ酸塩との反応生成物として使用するこ
ともできる。そのほか英国特許第1312925号明細
古に記載されているジアゾ樹脂も好ましい。These types of photosensitive diazotized compounds are usually obtained in the form of water-soluble inorganic salts and can therefore be coated from aqueous solution. Or these water-soluble diazo compounds
A substantially water-insoluble photosensitive reaction product obtained by reacting with an aromatic or resinous compound having one or more phenolic hydroxyl groups, sulfonic acid groups, or both by the method disclosed in Publication No. 67 Polymeric diazo resins can also be used. It can also be used as a reaction product with hexafluorophosphate or tetraroborate as described in JP-A-56-121031. In addition, diazo resins described in British Patent No. 1,312,925 are also preferred.
■0−キノンジアジド化合物からなる感光層特に好まし
い0−キノンジアジド化合物は〇−ナフトキノンジアジ
ド化合物であり例えば米国特許第2766118号、同
第2767092号、同第2772972号、同第28
59112号、同第2907665号、同第30461
10号、同第3046111号、同第3046115号
、同第3046118号、同第3046119号、同第
3046120号、同第3046121号、同第304
6122号、同第3046123号、同第306143
0号、同第3102809号、同第3106465号、
同第3635709号、同第3647443号の各明細
書をはじめ多数の刊行物に記されており、これらは好適
に使用することができる。(2) Photosensitive layer made of 0-quinonediazide compound Particularly preferred 0-quinonediazide compounds are 0-naphthoquinonediazide compounds, such as U.S. Pat.
No. 59112, No. 2907665, No. 30461
No. 10, No. 3046111, No. 3046115, No. 3046118, No. 3046119, No. 3046120, No. 3046121, No. 304
No. 6122, No. 3046123, No. 306143
No. 0, No. 3102809, No. 3106465,
It is described in numerous publications including the specifications of the same No. 3635709 and the same No. 3647443, and these can be suitably used.
■アジド化合物とバインダー(高分子化合物からなる感
光層)
例えば英国特許第1235281号、同第149586
1号の各明細書及び特開昭51−32331号公報、同
51−36128号公報に記載されているアジド化合物
と水溶性またはアルカリ可溶性高分子化合物からなる組
成 。■Azide compound and binder (photosensitive layer consisting of a polymer compound) For example, British Patent No. 1235281, British Patent No. 149586
A composition comprising an azide compound and a water-soluble or alkali-soluble polymer compound described in the specifications of No. 1 and JP-A-51-32331 and JP-A-51-36128.
物の他、特開昭50−5102号、同5〇−84302
号、同50−84303号、同53−12984号の各
公報に記されているアジド基を含むポリマーとバインダ
ーとしての高分子化合物からなる組成物が含まれる。In addition to objects, JP-A-50-5102, JP-A No. 50-84302
The present invention includes compositions comprising a polymer containing an azide group and a polymer compound as a binder, which are described in the following publications: No. 1, No. 50-84303, and No. 53-12984.
174)その他の感光性樹脂層
例えば特開昭52−96696号公報に開示されている
ポリエステル化合物、英国特許第112277号、同第
1313309号公報、同第1341004号公報、同
fm1377747号等の各明細書に記載のポリビニル
シンナメート系樹脂、米国特許第4072528号及び
同第4072527号の各明細書などのに記まれる。支
持体上に設けらえる感光層の量は、約0.1〜約7g/
m?、好ましくは0.5〜4g/rn’の範囲である。174) Other photosensitive resin layers, such as polyester compounds disclosed in JP-A-52-96696, British Patent No. 112277, British Patent No. 1313309, British Patent No. 1341004, British Patent No. FM1377747, etc. Polyvinyl cinnamate resins are described in US Pat. No. 4,072,528 and US Pat. No. 4,072,527. The amount of photosensitive layer provided on the support is about 0.1 to about 7 g/
M? , preferably in the range of 0.5 to 4 g/rn'.
PS版は画像露出されたのち、常法により現像を含む処
理によって樹脂画像が形成される。After the PS plate is image exposed, a resin image is formed by processing including development using conventional methods.
例えばジアゾ樹脂とバインダーとからなる前記感光層■
を有するPS版の場合には画像露出後、未露光部分の感
光層が現像により除去されて平版印刷版が得られる。ま
た感光層■を有するPS版の場合には画像露光後、アル
カリ水溶液で現像することにより露光部分が除去されて
平版印刷版が得られる。For example, the photosensitive layer consisting of a diazo resin and a binder
In the case of a PS plate having a lithographic printing plate, after image exposure, the unexposed portions of the photosensitive layer are removed by development to obtain a lithographic printing plate. In the case of a PS plate having a photosensitive layer (1), after image exposure, the exposed portion is removed by developing with an alkaline aqueous solution to obtain a lithographic printing plate.
(実施例) 以下、実施例に基いて更に詳細に説明する。(Example) Hereinafter, it will be explained in more detail based on Examples.
実施例1
第1表に示す組成のアルミニウム合金No、1〜No、
12を溶解鋳造し、両面を面出して厚さ350■、長さ
2000!llの鋳塊とし、これを560℃の温度で1
0時間均熱処理した。これを℃〜260℃の温度で熱間
圧延し板厚4.0mmとした後、さらに板厚0.3mm
まで冷間圧延(減面=F 92 、5%)して、41版
印刷版用アルミニウム合金板を製造した。Example 1 Aluminum alloys No. 1 to No. 1 with the composition shown in Table 1
12 is melted and cast, both sides are exposed to a thickness of 350cm and a length of 2000mm! 1 liter of ingot, and this is heated to 560°C.
Soaking treatment was carried out for 0 hours. This was hot-rolled at a temperature of ℃ to 260℃ to a plate thickness of 4.0 mm, and then further rolled to a plate thickness of 0.3 mm.
The aluminum alloy plate for a 41st edition printing plate was produced by cold rolling (area reduction=F 92 , 5%).
次にNo、1−No、12のアルミニウム合金圧延板及
びNo、13(板厚0 、30mmJ T 51050
−H18アルミニウム合金)、No。Next, No. 1-No. 12 aluminum alloy rolled plates and No. 13 (plate thickness 0, 30 mm J T 51050
-H18 aluminum alloy), No.
14(板厚0.30mmJIS1100−H16アルミ
ニウム合金)をパミストンと水のQ%液中で回転ナイロ
ンブラシで砂目立て処理したのち、苛性ソータ20%水
溶液を用いてアルミニウムの溶Nf/ ’+fか5 g
/ m2となるようにニー、チングした。流水で充分に
洗ったのち25%硝酸水溶液で酸洗し、水洗して基板を
用意した。このように用意したノ、(板を特開昭54−
146234号公報に記載されているように、硝酸1.
5%を含む電解浴中で゛屯IR,’!E度20A/dm
″以上で交流電解した。ひきつづき15%硫酸の50℃
水溶液に3分間浸漬して表面を清浄化したのち20%の
硫酸を主成分とする電解液中で浴温30℃で3 g /
m″の酸化皮膜を設けた。14 (plate thickness 0.30 mm JIS1100-H16 aluminum alloy) was grained with a rotating nylon brush in a Q% solution of pumice stone and water, and then the aluminum was dissolved Nf/'+f or 5 g using a caustic sorter 20% aqueous solution.
/ m2. After thoroughly washing with running water, pickling with a 25% nitric acid aqueous solution and washing with water, a substrate was prepared. The board prepared in this way was
As described in Japanese Patent No. 146234, nitric acid 1.
In an electrolytic bath containing 5% IR,'! E degree 20A/dm
AC electrolysis was carried out at a temperature of 15% sulfuric acid at 50°C.
After cleaning the surface by immersing it in an aqueous solution for 3 minutes, it was immersed in an electrolytic solution containing 20% sulfuric acid as a main component at a bath temperature of 30°C and 3 g/
An oxide film of m'' was provided.
このようにして作成したサンプルに下記の感光層を乾燥
時の塗rlj :Itが2.5g/m’となるように設
けた。The following photosensitive layer was provided on the sample prepared in this manner so that the dry coating rlj:It was 2.5 g/m'.
ナフトキノン−1,2−ジアジド−5−スルホニルクロ
リドとピロガロール、
アセトン樹脂とのエステル化合物
(米国特許3635709号明細書実施例に記載されて
いるもの) −−−−−0、75gクレゾールノボラッ
ク樹脂−−−−2,OOgオイルブルー#603
(オリエント化学製) −−、−−−−0、04gエチ
レンジクロリドー−−−−一−16g2−メトキシエチ
ルアセテ−)−−12gかくして得られた感光性平版印
刷版を透明陽画に密着させて1mの距離からPSライト
(東芝メタルハライドランプMU2000−2−OL型
3KVの抗原を有し、富士写真フィルム株より販売され
ているもの)で30秒間露光を行った後ケイ酸ナトリウ
ム5重量%水溶液に約1分間浸漬して現像し、水洗、乾
燥し試料N001〜No。Ester compound of naphthoquinone-1,2-diazido-5-sulfonyl chloride, pyrogallol, and acetone resin (described in the Examples of US Pat. No. 3,635,709) ----0, 75g Cresol novolac resin-- --2, OOg Oil Blue #603 (manufactured by Orient Chemical Co., Ltd.) --, ---0, 04 g Ethylene dichloride ---1-16 g 2-Methoxyethyl acetate) --12 g Photosensitive lithographic plate thus obtained The printing plate was brought into close contact with the transparency and exposed for 30 seconds from a distance of 1 m using PS light (Toshiba metal halide lamp MU2000-2-OL type 3KV antigen, sold by Fuji Photo Film Co., Ltd.). After that, it was immersed in a 5% by weight aqueous sodium silicate solution for about 1 minute, developed, washed with water, and dried.
15を作成した。15 was created.
このようにして作成した試料No、1−No。Sample No. 1-No. prepared in this manner.
15の電解エツチング粗面の均一性非画像部の汚れ、ス
トリークの発生状況について試験を実施し、その結果を
第1表に示す。A test was conducted to determine the uniformity of the electrolytically etched rough surface of No. 15, the occurrence of stains and streaks in the non-image area, and the results are shown in Table 1.
(試験方法)
(1)−itE解エツチング粗面の均一性表面状態を走
査型電子顕微鏡にて観察
し、ピントの均一性を評価し優れたちの○印、良好なも
のΔ印、劣るものX印で表わした。(Test method) (1) - Uniformity of the itE-etched rough surface The surface condition was observed with a scanning electron microscope, and the uniformity of focus was evaluated: excellent (○), good (Δ), poor (X) Represented by a mark.
(2)ストリークの発生状況
電解エツチング粗面を目視で観察し、ストリークの発生
していないものO印、一部に発生しているものΔ印、全
面的に発生しているものX印で表わした。(2) Status of streak occurrence Visually observe the electrolytically etched rough surface and mark O if no streaks have occurred, mark Δ if streaks have occurred in some areas, and mark X if streaks have occurred over the entire surface. Ta.
(3)非画像部の汚れ
オフセット印刷機KORにて10万部印浦1の鴻 jb
iiψ熊の泊幻−ル鍾価1− 優幻六ものO印、良好
なものΔ印、劣るものX印で表わした。(3) Dirt in the non-image area 100,000 copies printed on the KOR offset printer
iiψKuma no Hakugen - Le Chosen Price 1 - The six excellent ones were marked with an O mark, good ones with a Δ mark, and poor ones with an X mark.
なお、単体S i jilは特開昭60−82642号
記戦の分析方法により定量分析した。Incidentally, the simple substance S i jil was quantitatively analyzed by the analytical method described in Japanese Patent Application Laid-open No. 82642/1983.
第1表から明らかなように本発明方法により得られた印
刷用アルミニウム合金板No、l〜No、7は何れも内
部に分布する虫体S+量が0.012%以下で 、電解
エツチング粗面の均一性、印刷中の非画像部の耐汚れ性
、ストリーク性の点においていずれの特性も満足し、従
来のJIS1050.1100よりもすぐれていること
がわかる。これに対し本発明法におけるアルミニウム合
金板の組成範囲より外れる比較合金成分のアルミニウム
合金板N018〜12では内部に分布する単体5ilz
が0.012%以下であっても11面の均一性、印刷中
の非画像部の汚れのいずれ実施例2
実施例1における第1表のN002の合金鋳塊を、55
0℃の温度で8時間の均熱処理を行ない、これを第2表
に示す種々の冷却条件で冷却した後、板厚4.5mmま
で熱間圧延し、更に板厚2.0mmまで冷間圧延した後
、連続焼鈍炉により480℃の温度で20秒間中間焼鈍
してから板1”7.0 、3 m mまで冷間圧延して
、印刷版用アルミニウム合金板を製造した。As is clear from Table 1, the aluminum alloy plates No. 1 to No. 7 for printing obtained by the method of the present invention all had the amount of insect S+ distributed inside them being 0.012% or less, and had a rough electrolytically etched surface. It can be seen that all properties were satisfied in terms of uniformity of color, stain resistance in non-image areas during printing, and streak resistance, and were superior to the conventional JIS 1050.1100. On the other hand, in aluminum alloy plates No. 18 to 12 with comparative alloy compositions outside the composition range of aluminum alloy plates in the method of the present invention, single 5ilz is distributed inside.
Example 2 The alloy ingot of N002 in Table 1 in Example 1 was 55%
After performing soaking treatment at a temperature of 0°C for 8 hours and cooling it under various cooling conditions shown in Table 2, it was hot rolled to a plate thickness of 4.5 mm, and further cold rolled to a plate thickness of 2.0 mm. After that, it was intermediately annealed in a continuous annealing furnace at a temperature of 480° C. for 20 seconds, and then cold-rolled to a plate size of 1”7.0 and 3 mm to produce an aluminum alloy plate for printing plates.
これらについて実施例1と同様に表面処理し、同一条件
で製版を行ない、試料No、15〜24を作成した。These were subjected to surface treatment in the same manner as in Example 1, and plate making was performed under the same conditions to create Samples Nos. 15 to 24.
これ等の試料について実施例1と同様の試験を11″″
°゛・+ty>、&’;果812表101・ 、/
′、/”
、、¥
/”
第2表から明らかなように鋳塊を均熱処理した後、43
0℃以下の温I■まで50℃/時以下の平均冷却速1バ
で冷却し、しかる後熱間圧延、冷間圧延、中間焼鈍、冷
却圧延した本発明による印刷版No、15〜19は内部
に分布する単体Si量が0.012%以下で、粗面の均
一性、画像部の汚れ性、ストリーク性が潰れていること
が判る。These samples were subjected to the same test as in Example 1 for 11""
°゛・+ty>, &'; 812 Table 101・ , /
′, /” ,,¥ /” As is clear from Table 2, after soaking the ingot, 43
Printing plates Nos. 15 to 19 according to the present invention were cooled at an average cooling rate of 1 bar at 50° C./hour or less to a temperature of 0° C. or less, and then hot rolled, cold rolled, intermediate annealed, and cool rolled. It can be seen that when the amount of elemental Si distributed inside is 0.012% or less, the uniformity of the rough surface, the staining property of the image area, and the streaking property are impaired.
これに対し、内部に分布する単体Si量が0012%を
越える比較印刷版No、20〜24、即ち均熱処理後の
冷却条件が外れる印刷版用アルミニウム合金板では非画
像部の汚れが改善されないうえにストリークも発生して
いることが判る。On the other hand, in comparative printing plates No. 20 to 24, in which the amount of elemental Si distributed inside exceeds 0.012%, that is, aluminum alloy plates for printing plates where the cooling conditions after soaking treatment are different, stains in non-image areas are not improved and It can be seen that streaks also occur.
実施例3
実施例1における第1表のNo、2の合金鋳塊を用い、
これを540℃で8時間均熱処理した後、第3表に示す
条件で保持してから、板厚3.5mmまで熱間圧延し、
しかる後板厚0.3mmまで冷間圧延した。これに実施
例1と同様に表面処理を施して試料No、25〜33を
作成した。Example 3 Using alloy ingots No. 2 in Table 1 in Example 1,
After soaking it at 540°C for 8 hours, holding it under the conditions shown in Table 3, hot rolling it to a thickness of 3.5 mm,
Thereafter, it was cold rolled to a thickness of 0.3 mm. This was subjected to surface treatment in the same manner as in Example 1 to prepare samples Nos. 25 to 33.
これらについて実施例1と同様の試験を行な第3表から
明らかなように、均熱処理後350〜450℃の温度で
30分以上保持した本発明による印刷版No、25〜2
9はいずれも単体Si酸が0.012%以下で、粗面の
均一性、非画像部の汚れ、ストリーク性が優れているこ
とが判る。The same tests as in Example 1 were conducted on these, and as is clear from Table 3, printing plates Nos. 25 to 2 according to the present invention were kept at a temperature of 350 to 450°C for 30 minutes or more after soaking.
It can be seen that Sample No. 9 all contained 0.012% or less of elemental Si acid, and were excellent in uniformity of the rough surface, staining in non-image areas, and streak resistance.
これに対し、均熱処理後の鋳塊保持条件が外れる比較印
刷版No、30〜33ではいずれも内部に分布する単体
Siが0.012%を越え、非画像部の汚れが改善され
ないことが判る。On the other hand, in comparison printing plates Nos. 30 to 33, in which the ingot retention conditions after soaking treatment are different, the amount of elemental Si distributed inside exceeds 0.012%, indicating that stains in non-image areas are not improved. .
(発明の効果)
このように本発明の平版印刷版用支持体はすぐれた粗面
の均一性をもち、印刷物の非画像部の汚れも生じにくく
、ストリークの発生も防止することができ、いずれの特
性もかねそなえた平版印刷版として顕著な効果を奏する
ものである。(Effects of the Invention) As described above, the lithographic printing plate support of the present invention has excellent rough surface uniformity, is less likely to cause stains in the non-image areas of printed matter, and can prevent the occurrence of streaks. It has remarkable effects as a lithographic printing plate that also has the following characteristics.
Claims (2)
、05%以下、残部Alと不可避の不純物からなり、内
部に分布する単体Siが0.012%以下(以上、%は
重量%を示す)であることを特徴とする平版印刷版用ア
ルミニウム合金支持体。(1) Fe0.05-1%, Si0.2% or less, Cu0
, 0.05% or less, the balance being Al and unavoidable impurities, and the elemental Si distributed inside is 0.012% or less (wherein, % indicates weight %). body.
.05%以下、残部Alと不可避の不純物からなるアル
ミニウム合金鋳塊を均熱処理した後、430℃以下の温
度まで50℃/時以下の平均冷却速度で冷却するか、又
は350〜450℃の温度で30分以上保持してから、
熱間圧延又は熱間圧延後、冷間圧延と中間焼鈍を行ない
、これに減面率50%以上の最終冷間圧延を加えること
により、内部に分布する単体Siを0.012%(以上
、%は重量%を示す)以下とすることを特徴とする平版
印刷版用アルミニウム合金支持体の製造方法。(2) Fe0.05-1%, Si0.2% or less, Cu0
.. After soaking an aluminum alloy ingot consisting of 0.5% or less, the balance being Al and unavoidable impurities, it is cooled to a temperature of 430°C or less at an average cooling rate of 50°C/hour or less, or at a temperature of 350 to 450°C. After holding for more than 30 minutes,
By performing hot rolling or after hot rolling, cold rolling and intermediate annealing, and adding final cold rolling with an area reduction rate of 50% or more, the elemental Si distributed inside is reduced to 0.012% (or more, (% indicates weight %) or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60289577A JPS62148295A (en) | 1985-12-23 | 1985-12-23 | Aluminum alloy base for planographic plate and production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60289577A JPS62148295A (en) | 1985-12-23 | 1985-12-23 | Aluminum alloy base for planographic plate and production thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62148295A true JPS62148295A (en) | 1987-07-02 |
| JPH0528198B2 JPH0528198B2 (en) | 1993-04-23 |
Family
ID=17745035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60289577A Granted JPS62148295A (en) | 1985-12-23 | 1985-12-23 | Aluminum alloy base for planographic plate and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62148295A (en) |
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01162751A (en) * | 1987-12-17 | 1989-06-27 | Kobe Steel Ltd | Manufacture of aluminum plate for planographic printing plate |
| JPH03122241A (en) * | 1989-10-06 | 1991-05-24 | Fuji Photo Film Co Ltd | Aluminum alloy material for lithographic printing plate and its manufacture |
| JPH03177529A (en) * | 1989-12-06 | 1991-08-01 | Sky Alum Co Ltd | Aluminum alloy sheet stock for supporting body of printing form plate |
| JPH04165041A (en) * | 1990-10-26 | 1992-06-10 | Sky Alum Co Ltd | Aluminum alloy plate for printing supporting body and manufacture thereof |
| JPH04254545A (en) * | 1991-02-01 | 1992-09-09 | Furukawa Alum Co Ltd | Aluminum alloy substrate for planographic printing plate |
| EP0581321A3 (en) * | 1992-07-31 | 1994-08-03 | Fuji Photo Film Co Ltd | |
| EP0615801A1 (en) * | 1993-03-09 | 1994-09-21 | Fuji Photo Film Co., Ltd. | Method of producing support for planographic printing plate |
| JPH06346176A (en) * | 1993-06-08 | 1994-12-20 | Kobe Steel Ltd | Aluminum sheet for printing plate and its production |
| EP0770911A1 (en) | 1995-10-23 | 1997-05-02 | Fuji Photo Film Co., Ltd. | Light-sensitive sheet having aluminum alloy support and silver halide light-sensitive material using the same |
| US6387198B1 (en) | 1998-03-09 | 2002-05-14 | Nippon Light Metal Co., Ltd. | Process for producing aluminum alloy substrate for lithographic printing plate |
| EP0978573A3 (en) * | 1998-07-30 | 2003-01-08 | Nippon Light Metal, Co. Ltd. | Aluminium alloy support for lithographic printing plate and process for producing substrate for support |
| EP1625944A1 (en) | 2004-08-13 | 2006-02-15 | Fuji Photo Film Co., Ltd. | Method of manufacturing lithographic printing plate support |
| EP1712368A1 (en) | 2005-04-13 | 2006-10-18 | Fuji Photo Film Co., Ltd. | Method of manufacturing a support for a lithographic printing plate |
| JP2008232772A (en) * | 2007-03-20 | 2008-10-02 | Chuo Motor Wheel Co Ltd | X-ray residual stress measuring method of casting |
| WO2010038812A1 (en) | 2008-09-30 | 2010-04-08 | 富士フイルム株式会社 | Electrolytic treatment method and electrolytic treatment device |
| WO2010150810A1 (en) | 2009-06-26 | 2010-12-29 | 富士フイルム株式会社 | Light reflecting substrate and process for manufacture thereof |
| WO2011078010A1 (en) | 2009-12-25 | 2011-06-30 | 富士フイルム株式会社 | Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5365211A (en) * | 1976-11-25 | 1978-06-10 | Sumitomo Electric Ind Ltd | Manufacture of al-fe alloy for electroconductive material |
| JPS58221254A (en) * | 1982-06-18 | 1983-12-22 | Furukawa Alum Co Ltd | Aluminum blank for offset printing |
| JPS5967349A (en) * | 1982-10-12 | 1984-04-17 | Kobe Steel Ltd | Aluminum strip for photosensitive lithographic printing plate |
| JPS60103164A (en) * | 1983-11-10 | 1985-06-07 | Kobe Steel Ltd | Production of aluminum alloy for vessel of the like |
| JPS62146694A (en) * | 1985-12-23 | 1987-06-30 | Nippon Light Metal Co Ltd | Method for manufacturing aluminum alloy support for lithographic printing |
| JPH0311635A (en) * | 1989-06-08 | 1991-01-18 | Sekiyu Sangyo Katsuseika Center | Manufacture of compound semiconductor device |
-
1985
- 1985-12-23 JP JP60289577A patent/JPS62148295A/en active Granted
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5365211A (en) * | 1976-11-25 | 1978-06-10 | Sumitomo Electric Ind Ltd | Manufacture of al-fe alloy for electroconductive material |
| JPS58221254A (en) * | 1982-06-18 | 1983-12-22 | Furukawa Alum Co Ltd | Aluminum blank for offset printing |
| JPS5967349A (en) * | 1982-10-12 | 1984-04-17 | Kobe Steel Ltd | Aluminum strip for photosensitive lithographic printing plate |
| JPS60103164A (en) * | 1983-11-10 | 1985-06-07 | Kobe Steel Ltd | Production of aluminum alloy for vessel of the like |
| JPS62146694A (en) * | 1985-12-23 | 1987-06-30 | Nippon Light Metal Co Ltd | Method for manufacturing aluminum alloy support for lithographic printing |
| JPH0311635A (en) * | 1989-06-08 | 1991-01-18 | Sekiyu Sangyo Katsuseika Center | Manufacture of compound semiconductor device |
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01162751A (en) * | 1987-12-17 | 1989-06-27 | Kobe Steel Ltd | Manufacture of aluminum plate for planographic printing plate |
| JPH03122241A (en) * | 1989-10-06 | 1991-05-24 | Fuji Photo Film Co Ltd | Aluminum alloy material for lithographic printing plate and its manufacture |
| JPH03177529A (en) * | 1989-12-06 | 1991-08-01 | Sky Alum Co Ltd | Aluminum alloy sheet stock for supporting body of printing form plate |
| JPH04165041A (en) * | 1990-10-26 | 1992-06-10 | Sky Alum Co Ltd | Aluminum alloy plate for printing supporting body and manufacture thereof |
| JPH04254545A (en) * | 1991-02-01 | 1992-09-09 | Furukawa Alum Co Ltd | Aluminum alloy substrate for planographic printing plate |
| EP0581321A3 (en) * | 1992-07-31 | 1994-08-03 | Fuji Photo Film Co Ltd | |
| US5462614A (en) * | 1993-03-09 | 1995-10-31 | Fuji Photo Film Co., Ltd. | Method of producing support for planographic printing plate |
| EP0615801A1 (en) * | 1993-03-09 | 1994-09-21 | Fuji Photo Film Co., Ltd. | Method of producing support for planographic printing plate |
| JPH06346176A (en) * | 1993-06-08 | 1994-12-20 | Kobe Steel Ltd | Aluminum sheet for printing plate and its production |
| EP0770911A1 (en) | 1995-10-23 | 1997-05-02 | Fuji Photo Film Co., Ltd. | Light-sensitive sheet having aluminum alloy support and silver halide light-sensitive material using the same |
| US6387198B1 (en) | 1998-03-09 | 2002-05-14 | Nippon Light Metal Co., Ltd. | Process for producing aluminum alloy substrate for lithographic printing plate |
| EP0978573A3 (en) * | 1998-07-30 | 2003-01-08 | Nippon Light Metal, Co. Ltd. | Aluminium alloy support for lithographic printing plate and process for producing substrate for support |
| EP1625944A1 (en) | 2004-08-13 | 2006-02-15 | Fuji Photo Film Co., Ltd. | Method of manufacturing lithographic printing plate support |
| EP1712368A1 (en) | 2005-04-13 | 2006-10-18 | Fuji Photo Film Co., Ltd. | Method of manufacturing a support for a lithographic printing plate |
| JP2008232772A (en) * | 2007-03-20 | 2008-10-02 | Chuo Motor Wheel Co Ltd | X-ray residual stress measuring method of casting |
| WO2010038812A1 (en) | 2008-09-30 | 2010-04-08 | 富士フイルム株式会社 | Electrolytic treatment method and electrolytic treatment device |
| WO2010150810A1 (en) | 2009-06-26 | 2010-12-29 | 富士フイルム株式会社 | Light reflecting substrate and process for manufacture thereof |
| WO2011078010A1 (en) | 2009-12-25 | 2011-06-30 | 富士フイルム株式会社 | Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0528198B2 (en) | 1993-04-23 |
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