JPS62152702A - Manufacture of anisotropic ceramics - Google Patents
Manufacture of anisotropic ceramicsInfo
- Publication number
- JPS62152702A JPS62152702A JP29326085A JP29326085A JPS62152702A JP S62152702 A JPS62152702 A JP S62152702A JP 29326085 A JP29326085 A JP 29326085A JP 29326085 A JP29326085 A JP 29326085A JP S62152702 A JPS62152702 A JP S62152702A
- Authority
- JP
- Japan
- Prior art keywords
- ceramics
- ceramic material
- plastic deformation
- electric field
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000919 ceramic Substances 0.000 title claims description 29
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 229910010293 ceramic material Inorganic materials 0.000 claims description 24
- 230000005684 electric field Effects 0.000 claims description 15
- 238000010438 heat treatment Methods 0.000 claims description 11
- 238000003825 pressing Methods 0.000 claims description 6
- 239000013078 crystal Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000003990 capacitor Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- -1 ferride Chemical class 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 229910003781 PbTiO3 Inorganic materials 0.000 description 1
- 229910020698 PbZrO3 Inorganic materials 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000005686 electrostatic field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003826 uniaxial pressing Methods 0.000 description 1
Landscapes
- Press-Shaping Or Shaping Using Conveyers (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はセラミックス、特に各種電子部品の素材として
有益な異方性セラミックスの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for producing ceramics, particularly anisotropic ceramics useful as materials for various electronic components.
セラミックスは電子部品の素材として今日重要な役割を
果たしており、例えば圧電セラミックス、コンデンサセ
ラミックス、抵抗セラミックス等々多くの利用分野があ
る。Ceramics play an important role today as materials for electronic components, and have many fields of use, such as piezoelectric ceramics, capacitor ceramics, and resistance ceramics.
これらの所謂ファインセラミックスは、金属の酸化物、
炭化物、窒化物、はう化物、ハロゲン化物等の微粉末を
所望の形状に成形した後、これを高温焼成することによ
り製造されている。These so-called fine ceramics are made of metal oxides,
It is manufactured by molding fine powder of carbide, nitride, ferride, halide, etc. into a desired shape and then firing it at a high temperature.
然しなから、上記の如く高温焼成して得られたセラミッ
クスは、その結晶の方向がランダムであり、電気的特性
や磁気的特性が充分でなかったり、所望の機械的強度が
得られないという欠点があった。However, ceramics obtained by high-temperature firing as described above have drawbacks such as random crystal orientation, insufficient electrical and magnetic properties, and inability to obtain the desired mechanical strength. was there.
本発明は上記の問題点を解決するためなされたものであ
り、その目的とするところは、各種電子部品用素材とし
て優れた電気的及び／又は磁気的特性を有すると共に、
充分な機械的強度を有する異方性セラミックスを製造す
る方法を提供することにある。The present invention was made to solve the above problems, and its purpose is to have excellent electrical and/or magnetic properties as a material for various electronic components, and to
An object of the present invention is to provide a method for manufacturing anisotropic ceramics having sufficient mechanical strength.
而して、上記の目的は、常法により製造されたセラミッ
ク素材を１ 、０００℃以上の高温度に加熱すると共に
、加圧して一軸方向に塑性変形を生じさせること、又は
前記加熱すると共に強磁界若しくは強電界内で加圧して
磁界又は電界方向に塑性変形を生じさせることによって
達成される。The above purpose is to heat a ceramic material produced by a conventional method to a high temperature of 1,000°C or more and pressurize it to cause plastic deformation in the uniaxial direction, or to This is achieved by applying pressure in a magnetic or strong electric field to produce plastic deformation in the direction of the magnetic or electric field.
特に上記塑性変形量を上記一軸方向長さで０．１以上１
０％以下とすることによって良好な結果が得られること
が判明している。In particular, the above-mentioned plastic deformation amount is 0.1 or more and 1 in the above-mentioned uniaxial length.
It has been found that good results can be obtained by setting the content to 0% or less.
上記の如き方法であると、セラミック素材は高温度に加
熱されることにより非晶又は準非晶状態となり、その状
態で、又はさらに磁界中若しくは電界中で一軸方向に塑
性変形を生しさせると結晶の方向が揃えられて異方性の
セラミックスが得られるものである。In the above method, the ceramic material becomes an amorphous or quasi-amorphous state by being heated to a high temperature, and then plastic deformation is caused in a uniaxial direction in that state or in a magnetic field or an electric field. Anisotropic ceramics can be obtained by aligning the crystal directions.
上記の如く結晶方向の揃った異方性セラミックスは、所
謂分極性セラミックスとして高い電気又は磁気−機械的
変換効率を有すると共に強度的にも優れた特性を有する
ものである。Anisotropic ceramics with uniform crystal orientation as described above have high electrical or magneto-mechanical conversion efficiency as so-called polarizable ceramics, and also have excellent properties in terms of strength.
以下、図面を参照しつ＼本発明に係る方法を具体的に説
明する。Hereinafter, the method according to the present invention will be specifically explained with reference to the drawings.
第１図及び第２図は本発明に係る方法を実施するための
装置の一実施例の斜視図及び断面図、第３図は本発明を
実施する装置の他の実施例の説明図である。1 and 2 are perspective views and sectional views of one embodiment of an apparatus for implementing the method according to the present invention, and FIG. 3 is an explanatory view of another embodiment of the apparatus for implementing the present invention. .
図中、１は処理すべきセラミック素材、２は上記セラミ
ック素材１を収容すべき溝２ａを有するダイ、３は上記
溝２８内に嵌合し得るパンチ、４は例えば電熱線４８等
を具えた加熱装置である。In the figure, 1 is a ceramic material to be treated, 2 is a die having a groove 2a to accommodate the ceramic material 1, 3 is a punch that can fit into the groove 28, and 4 is a heating wire 48, for example. It is a heating device.
パンチ３及び加熱装置４は、いずれも図では省略した駆
動機構によりダイ２へ向けてそれぞれ進退可能なよう構
成されている。The punch 3 and the heating device 4 are configured to be able to move forward and backward toward the die 2 by drive mechanisms not shown in the drawings.
第１図の斜視図及び第１図のＡ−Ａ線断面図として示し
た第２図の本発明第１の実施例の場合は、処理すべきセ
ラミック素材１を、その素材１の長尺板状をした形状、
寸法の短軸方向に塑性変化させようとするもので、ダイ
２は上下２部分２Ａ、 ２Ｂに分割形成したものを組合
せて接離可能に構成してあり、上記上部分２Ａに形成さ
れているセラミック素材ｌを収容すべき溝２ａが下部分
２Ｂとの会合部に於て上記短軸方向に拡大した溝部分２
ｂを有しており、これにより、セラミック素材１がパン
チ３による一軸加圧により、該加圧軸と直角な上記短軸
方向に塑性変形し得るようになっている。In the case of the first embodiment of the present invention shown in FIG. 2, which is shown as a perspective view in FIG. 1 and a sectional view taken along line A-A in FIG. shape,
The die 2 is designed to cause a plastic change in the direction of the short axis of the dimension, and the die 2 is constructed by combining upper and lower parts 2A and 2B so that they can be brought into contact with and separated from each other, and the die 2 is formed in the upper part 2A. A groove portion 2 in which the groove 2a in which the ceramic material 1 is to be accommodated is enlarged in the short axis direction at the meeting point with the lower portion 2B.
b, so that the ceramic material 1 can be plastically deformed in the short axis direction perpendicular to the pressing axis by uniaxial pressing by the punch 3.
これに対し、第３図の本発明方法の他の実施例を示す斜
視図は、上記長尺板状のセラミック素材１を上述の短軸
方向とは直角の、また上記−軸加圧方向の加圧軸とも直
角の長軸方向に塑性変形させる場合のもので、該実施例
の場合には上述拡大した溝部分２ｂが上記溝２ａの上記
長軸方向に形成されていて、図示の場合には上記溝２ａ
の長軸方向の両端がダイ２に於て開放した状態に構成さ
れている。On the other hand, FIG. 3 is a perspective view showing another embodiment of the method of the present invention, in which the elongated plate-shaped ceramic material 1 is placed in the direction perpendicular to the short axis direction and in the -axis pressing direction. This is for plastic deformation in the long axis direction perpendicular to the pressurizing axis, and in the case of this embodiment, the enlarged groove portion 2b is formed in the long axis direction of the groove 2a. is the groove 2a above.
Both ends of the die 2 in the longitudinal direction are open.
なお、セラミック素材１は、予め別途加熱して使用され
ることが少なくないが、加熱装置は、装置４の外に、ダ
イ２中に収納設置される場合も少なくない。Note that although the ceramic material 1 is often heated separately before use, the heating device is often housed and installed in the die 2 outside the device 4.
而して、本発明方法を実施するに当っては、先ず、常法
により製造されたセラミック素材１をダイ２の溝２ａ内
にセットする。セラミック素材１としては、ＣａＴｉＯ
３，５ｒＴｉ０３ 、ＢａＴｉＯ３、Ｔｉ０２−Ｎｂ２
Ｏ３、ＴｉＯ２・Ｓｎ２０３ 、ＲｕＯ２，５ｒ０２、
Ｌａ２０３ 、Ｎｂ２０３ 、ＴｉＯ２・Ｙ２’０３
、ＴｉＯ２・ＭｇＯ−Ｎｂ２０３ 、ＢａＴｉＯ３−Ｌ
ａ２ ｏ、 、ＰｂＺｒＯ３・ＰｂＴｉＯ３、Ｐｂ（ｔ
’１ｇ １／３ 、 Ｎｂ ２／３） ０３ 、Ｐｂ（
Ｍｎ １／ ３ 、 Ｎｂ ２／ ３ ） ０３等の組
成のもの、更には上記化学式中に於けるＭｇがＹ、 Ｃ
ｏ、 Ｓｂ、若しくはＮｉ等に入れ替った組成のもの、
或いは金属炭化物、金属窒化物、又は金属硼化物を一部
有効成分として含むか、又は主成分となっているセラミ
ック素材等々各種公知のセラミックス材料が使用される
。To carry out the method of the present invention, first, a ceramic material 1 manufactured by a conventional method is set in the groove 2a of the die 2. As the ceramic material 1, CaTiO
3,5rTi03, BaTiO3, Ti02-Nb2
O3, TiO2・Sn203, RuO2,5r02,
La203, Nb203, TiO2・Y2'03
, TiO2・MgO-Nb203, BaTiO3-L
a2 o, , PbZrO3・PbTiO3, Pb(t
'1g 1/3, Nb 2/3) 03, Pb(
Those with compositions such as Mn 1/3, Nb 2/3) 03, etc., and those in which Mg in the above chemical formula is Y, C
o, with a composition replaced with Sb, or Ni, etc.
Alternatively, various known ceramic materials may be used, such as ceramic materials containing metal carbide, metal nitride, or metal boride as a partial or main component.
次いで、第２図に示す如く加熱装置４を溝２ａ内へ進入
させてセラミック素材Ｉ並びにその周囲のダイ２及びパ
ンチ３等を加熱する。その場合、セラミック素材１が１
、０００℃以上となるまで加熱する。Next, as shown in FIG. 2, the heating device 4 is advanced into the groove 2a to heat the ceramic material I and the die 2, punch 3, etc. around it. In that case, ceramic material 1 is 1
, 000°C or higher.
然る後、加熱装置４を退行させ、パンチ３を降下させて
セラミック素材ｌを高圧力で加圧する。Thereafter, the heating device 4 is retracted, the punch 3 is lowered, and the ceramic material 1 is pressurized at high pressure.
然るときは、高温度に加熱されたセラミック素材１は、
その加圧方向と直角な素材１の長軸方向へはダイのａ２
ａの壁面により阻止されているためパンチ３で強く加圧
されたときは、拡大溝部分２ｂがあるその短軸方向へ伸
長するような塑性変形を起す。即ち、高温度に加熱され
て非晶乃至は準非晶状態となったセラミック素材ｌは、
パンチ３で加圧されることにより前記短軸の一軸方向に
塑性変形を生じ、これにより結晶の方向が揃えられ、以
後これを徐々に冷却することにより異方性の結晶構造を
有するセラミックスが得られるものである。In such a case, the ceramic material 1 heated to a high temperature will
In the long axis direction of the material 1 perpendicular to the pressing direction, the a2 of the die is
Since it is blocked by the wall surface of a, when it is strongly pressed by the punch 3, plastic deformation occurs such that it expands in the short axis direction of the enlarged groove portion 2b. That is, the ceramic material l that has been heated to a high temperature and becomes an amorphous or quasi-amorphous state is
By being pressurized by the punch 3, plastic deformation occurs in the uniaxial direction of the short axis, thereby aligning the direction of the crystals, and then by gradually cooling this, a ceramic having an anisotropic crystal structure is obtained. It is something that can be done.
特に、上記加熱温度及びパンチ３による加圧力と拡大溝
部分２ｂの寸法を上記塑性変形量が上記短軸の一軸方向
長さで０．１以上ＩＯ％以下となるように調整したとき
に良好な結果が得られる。In particular, when the heating temperature, the pressing force by the punch 3, and the dimensions of the enlarged groove portion 2b are adjusted so that the amount of plastic deformation is 0.1 or more and IO% or less in the uniaxial length of the short axis, a good result can be obtained. Get results.
第３図は上記のようにして製造された異方性セラミック
スが、形状的に長軸方向に異方性を有するセラミックス
を切出すのではな（、前述と同様な製造方法により直接
形状の長軸方向に異方性を有するセラミックスを製造す
る装置の前述第１図に対応する斜視図であり、既述の如
く短軸方向の拡大溝部分２ｂに代えて、溝２ａの両端が
開放している実施例構成を示したものである。勿論この
溝２ａの長軸方向両端に、前記拡大溝部分２ｂと同等の
拡大溝部分を形成して、溝２ａが両端で開放しない構成
とすることができる。Figure 3 shows that the anisotropic ceramics manufactured as described above are not cut out from ceramics that have anisotropy in the long axis direction (instead of cutting out ceramics that have shape anisotropy in the long axis direction). 2 is a perspective view corresponding to the above-mentioned FIG. 1 of an apparatus for producing ceramics having anisotropy in the axial direction, in which both ends of the groove 2a are open instead of the enlarged groove portion 2b in the short axis direction as described above. Of course, it is possible to form enlarged groove portions equivalent to the enlarged groove portion 2b at both ends of the groove 2a in the longitudinal direction so that the groove 2a does not open at both ends. can.
第４図は、前述第１図又は第３図の装置に磁場形成手段
を付設して磁気異方性を有するセラミックスを製作する
本発明第２の発明を実施するための一実施例断面図を示
すもので、上述第２図の断面図に対応する図であり、前
述第１〜３図と同一符号を付したものは同一物、又は同
−機能物を示す。５は励磁線輪６が巻回されたコの字状
磁気鉄心で、所定加熱状態でピストン３により圧縮され
るセラミック素材１に対し、前記拡大溝部分２ｂがある
短軸方向に磁極が７Ａ、７Ｂが相対向するように、ダイ
２に磁束漏洩材７を介在させて挿設してあり、前記線輪
６にはスイッチ８を介して、通常直流である励磁電源９
が接続しである。即ち、−軸加工によりセラミック素材
１が塑性変形をする方向に一致させて強磁場を作用させ
るもので、結晶が上記短軸方向に揃った状態の磁気異方
性セラミックスが得られるものである。FIG. 4 is a sectional view of an embodiment for carrying out the second invention of the present invention in which a magnetic field forming means is attached to the apparatus shown in FIG. 1 or 3 to produce ceramics having magnetic anisotropy. This is a diagram corresponding to the sectional view of FIG. 2 above, and the same reference numerals as in FIGS. 1 to 3 above indicate the same items or objects with the same functions. Reference numeral 5 denotes a U-shaped magnetic core around which an excitation wire ring 6 is wound.With respect to the ceramic material 1 which is compressed by the piston 3 in a predetermined heated state, the magnetic pole is 7A in the short axis direction where the enlarged groove portion 2b is located. A magnetic flux leakage material 7 is inserted into the die 2 so that the wires 7B face each other, and an excitation power source 9, which is usually a direct current, is connected to the wire ring 6 via a switch 8.
is connected. That is, a strong magnetic field is applied in the direction in which the ceramic material 1 is plastically deformed by -axis processing, and a magnetically anisotropic ceramic in which the crystals are aligned in the minor axis direction is obtained.
作用磁場としては、直流励磁による所定強度の静磁場で
あ−ても良いが、例えば１００１１ｚ以上等の所定周波
数の間歇的なパルス磁場とすることがより好ましく、該
パルス磁場とする場合には、コンデンサを比較的高電圧
の直流電源によって充電し、該コンデンサをスイッチ８
を介して線輪に放電させるパルス電源を用いることが望
ましい。The working magnetic field may be a static magnetic field of a predetermined strength due to direct current excitation, but it is more preferable to use an intermittent pulsed magnetic field with a predetermined frequency, such as 10011z or higher, and when the pulsed magnetic field is used, A capacitor is charged by a relatively high voltage DC power supply, and the capacitor is charged by a switch 8.
It is preferable to use a pulsed power source that discharges electricity to the coil through the coil.
第５図は、前述第１図又は第３図の装置に、電界形成手
段を付設して電界異方性を有するセラミックスを製作す
る本発明第３の発明を実施するための一実施例断面図を
示すもので、上述筒２圓断面図に対応する図であり、前
述第１〜３図と同一符号を付したものは同一物、又は同
−機能物を示す。FIG. 5 is a sectional view of an embodiment for carrying out the third invention of the present invention in which an electric field forming means is attached to the apparatus shown in FIG. 1 or 3 to produce ceramics having electric field anisotropy. This is a diagram corresponding to the above-mentioned two-round cross-sectional view of the cylinder, and the same reference numerals as in FIGS. 1 to 3 above indicate the same items or the same functional items.
１０Ａ及びＩＯＢは電極で、所定加熱状態でピストン３
により圧縮されるセラミック素材１に対し、前記拡大溝
部分２ｂがある短軸方向に磁極が相対向するように、ダ
イ２に耐熱電気絶縁物１１により覆って挿設してあり、
前記電極１０Ａ 、ＩＯＢにはスイッチ１２を介して通
常高電圧の直流電源である強電界形成電源１３が接続し
である。即ち、−軸加工によりセラミック素材１が塑性
変形する方向に一致させて強電圧を作用させるもので、
結晶が上記短軸方向に揃った状態の電界異方性セラミッ
クスが得られるものである。10A and IOB are electrodes that heat the piston 3 in a predetermined heated state.
The enlarged groove portion 2b is inserted into the die 2 and covered with a heat-resistant electrical insulator 11 so that the magnetic poles are opposite to each other in the short axis direction of the ceramic material 1 to be compressed.
A strong electric field forming power source 13, which is usually a high voltage DC power source, is connected to the electrode 10A and IOB through a switch 12. That is, a strong voltage is applied in the direction in which the ceramic material 1 is plastically deformed by -axis machining.
An electric field anisotropic ceramic in which crystals are aligned in the minor axis direction can be obtained.
作用電界としては、直流高電圧による所定強度の静電界
であっても良いが、例えば１００１１ｚ以上等の所定周
波数の間歇的なパルス電界とすることも推奨されるもの
で、場合によってはパルス電界の方向を電極１０Ａ 、
１０８間で周期的に転極する交番電界とか、交番の割合
が方向によって異なる不平衡交番電界等も利用されるこ
とがある。The working electric field may be an electrostatic field of a predetermined intensity due to a high DC voltage, but it is also recommended to use an intermittent pulsed electric field of a predetermined frequency, such as 10011z or more, and in some cases, the pulsed electric field may be direction to electrode 10A,
An alternating electric field whose polarity is periodically reversed between 108 and an unbalanced alternating electric field whose alternating ratio differs depending on the direction may also be used.
本発明は叙上の如く構成されるから、本発明によるとき
は、高い電気−機械的変換効率や磁気−機械的変換効率
を有すると共に強度的にも優れた特性を有する結晶方向
の揃った異方性セラミックスが製造されるものである。Since the present invention is constructed as described above, according to the present invention, crystals having uniformly oriented crystals that have high electro-mechanical conversion efficiency and magneto-mechanical conversion efficiency and excellent strength properties are provided. Oriented ceramics are produced.
なお本発明の構成は叙上の実施例に限定されるものでな
く、加圧手段、加熱手段等は本発明の目的の範囲内に於
て自由に変更し得るものであり、本発明はそれらすべて
の変更実施例を包摂するものである。Note that the configuration of the present invention is not limited to the embodiments described above, and the pressurizing means, heating means, etc. can be freely changed within the scope of the purpose of the present invention, and the present invention It is intended to include all modifications.
【図面の簡単な説明】
第１図及び第２図は本発明に係る方法を実施するための
装置の一実施例の斜視図及び断面図、第３図は本発明を
実施する装置の他の実施例の説明図、第４図及び第５図
は、夫々本発明の第２発明及び第３発明を実施するため
の前記第２図に対応する一実施例断面図である。[BRIEF DESCRIPTION OF THE DRAWINGS] FIGS. 1 and 2 are a perspective view and a cross-sectional view of one embodiment of the apparatus for carrying out the method according to the present invention, and FIG. The explanatory drawings of the embodiment, FIGS. 4 and 5, are sectional views of an embodiment corresponding to FIG. 2 for carrying out the second and third inventions of the present invention, respectively.
Claims (1)
すると共に、加圧して一軸方向に塑性変形を生じさせる
ことを特徴とする異方性セラミックスの製造方法。 ２）塑性変形量が上記一軸方向長さで０．１以上１０％
以下である特許請求の範囲第１項記載の異方性セラミッ
クスの製造方法。 ３）セラミック素材を１，０００℃以上の高温度に加熱
すると共に、強磁界内で加圧し、磁界方向に塑性変形を
生じさせることを特徴とする異方性セラミックスの製造
方法。 ４）塑性変形量が磁界方向長さで０．１以上１０％以下
である特許請求の範囲第３項記載の異方性セラミックス
の製造方法。 ５）セラミック素材を１，０００℃以上の高温度に加熱
すると共に、強電界内で加圧し、電界方向に塑性変形を
生じさせることを特徴とする異方性セラミックスの製造
方法。 ６）塑性変形量が電界方向長さで０．１以上１０％以下
である特許請求の範囲第５項記載の異方性セラミックス
の製造方法。[Scope of Claims] 1) A method for producing anisotropic ceramics, which comprises heating a ceramic material to a high temperature of 1,000° C. or higher and applying pressure to cause plastic deformation in a uniaxial direction. 2) The amount of plastic deformation is 0.1 or more and 10% in the above uniaxial length.
A method for producing anisotropic ceramics according to claim 1, which is as follows. 3) A method for producing anisotropic ceramics, which comprises heating a ceramic material to a high temperature of 1,000°C or higher and pressurizing it in a strong magnetic field to cause plastic deformation in the direction of the magnetic field. 4) The method for producing anisotropic ceramics according to claim 3, wherein the amount of plastic deformation is 0.1 or more and 10% or less in length in the magnetic field direction. 5) A method for producing anisotropic ceramics, which comprises heating a ceramic material to a high temperature of 1,000°C or higher and pressurizing it in a strong electric field to cause plastic deformation in the direction of the electric field. 6) The method for producing anisotropic ceramics according to claim 5, wherein the amount of plastic deformation is 0.1 or more and 10% or less in length in the electric field direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29326085A JPS62152702A (en) | 1985-12-27 | 1985-12-27 | Manufacture of anisotropic ceramics |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29326085A JPS62152702A (en) | 1985-12-27 | 1985-12-27 | Manufacture of anisotropic ceramics |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62152702A true JPS62152702A (en) | 1987-07-07 |
| JPH0576403B2 JPH0576403B2 (en) | 1993-10-22 |
Family
ID=17792522
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29326085A Granted JPS62152702A (en) | 1985-12-27 | 1985-12-27 | Manufacture of anisotropic ceramics |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62152702A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6463106A (en) * | 1987-09-03 | 1989-03-09 | Ig Tech Res Inc | Method for forming ceramic |
| US7008379B2 (en) | 2002-11-08 | 2006-03-07 | Nihon Seimitsu Sokki Co., Ltd. | Noninvasive sphygmomanometer |
| JP2008012691A (en) * | 2006-07-03 | 2008-01-24 | Sumitomo Electric Ind Ltd | Method for manufacturing ceramic molded part, molding die used therefor and ceramic part |
| JP2010000123A (en) * | 2008-06-18 | 2010-01-07 | Omron Healthcare Co Ltd | Auxiliary device for winding cuff band |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55144112A (en) * | 1979-04-28 | 1980-11-10 | Toshiba Ceramics Co | Preparation of ceramic sintered body |
| JPS6024758A (en) * | 1983-07-20 | 1985-02-07 | Matsushita Electric Ind Co Ltd | Portable input terminal device |
-
1985
- 1985-12-27 JP JP29326085A patent/JPS62152702A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55144112A (en) * | 1979-04-28 | 1980-11-10 | Toshiba Ceramics Co | Preparation of ceramic sintered body |
| JPS6024758A (en) * | 1983-07-20 | 1985-02-07 | Matsushita Electric Ind Co Ltd | Portable input terminal device |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6463106A (en) * | 1987-09-03 | 1989-03-09 | Ig Tech Res Inc | Method for forming ceramic |
| US7008379B2 (en) | 2002-11-08 | 2006-03-07 | Nihon Seimitsu Sokki Co., Ltd. | Noninvasive sphygmomanometer |
| US7104960B2 (en) | 2002-11-08 | 2006-09-12 | Nihon Seimitsu Sokki Co., Ltd. | Noninvasive sphygmomanometer |
| JP2008012691A (en) * | 2006-07-03 | 2008-01-24 | Sumitomo Electric Ind Ltd | Method for manufacturing ceramic molded part, molding die used therefor and ceramic part |
| JP2010000123A (en) * | 2008-06-18 | 2010-01-07 | Omron Healthcare Co Ltd | Auxiliary device for winding cuff band |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0576403B2 (en) | 1993-10-22 |
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