JPS62201934U - - Google Patents
Info
- Publication number
- JPS62201934U JPS62201934U JP8857686U JP8857686U JPS62201934U JP S62201934 U JPS62201934 U JP S62201934U JP 8857686 U JP8857686 U JP 8857686U JP 8857686 U JP8857686 U JP 8857686U JP S62201934 U JPS62201934 U JP S62201934U
- Authority
- JP
- Japan
- Prior art keywords
- gas introduction
- gas
- semiconductor wafer
- wafer processing
- introducing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 4
Description
第１図乃至第５図は本考案の一実施例を示し、
第１図は側断面図、第２図は内部上面図、第３図
はカバー及びガス導入口を示す斜視図、第４図は
カバーの断面図、第５図はガスの流れを示すガス
導入状態図である。第６図は従来例を示す。
，′…パイプ、…半導体ウエハ処理部（
ヒータ上部）、１ａ，１ｂ…；１ａ′，１ｂ′…
ガス導入口、２ａ，２ｂ…半導体ウエハ処理装置
（ヒータ）、３…カバー、４…ガスの流れ。
1 to 5 show an embodiment of the present invention,
Fig. 1 is a side sectional view, Fig. 2 is an internal top view, Fig. 3 is a perspective view showing the cover and gas inlet, Fig. 4 is a sectional view of the cover, and Fig. 5 is a gas inlet showing the flow of gas. FIG. FIG. 6 shows a conventional example. ,′...pipe,...semiconductor wafer processing section (
upper part of the heater), 1a, 1b...; 1a', 1b'...
Gas inlet, 2a, 2b... semiconductor wafer processing equipment (heater), 3... cover, 4... gas flow.
Claims (1)
導入機構において、 半導体ウエハ処理部よりも下方に上記ガスを導
入する複数のガス導入口が設けられ、 該導入口はガス導入方向がほぼ上方に向けて配
され、 かつ上記ガス導入口に対応して上記ガスをほぼ
下方へ誘導するカバーが設けられたガス導入機構
。[Scope of Claim for Utility Model Registration] In a gas introduction mechanism for introducing gas into a semiconductor wafer processing apparatus, a plurality of gas introduction ports for introducing the above-mentioned gas are provided below the semiconductor wafer processing section, and the gas introduction ports are A gas introduction mechanism, wherein the gas introduction direction is arranged substantially upward, and a cover is provided that guides the gas substantially downward in correspondence with the gas introduction port.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8857686U JPS62201934U (en) | 1986-06-12 | 1986-06-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8857686U JPS62201934U (en) | 1986-06-12 | 1986-06-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62201934U true JPS62201934U (en) | 1987-12-23 |
Family
ID=30946797
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8857686U Pending JPS62201934U (en) | 1986-06-12 | 1986-06-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62201934U (en) |
-
1986
- 1986-06-12 JP JP8857686U patent/JPS62201934U/ja active Pending
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