JPS62219928A - 絶縁膜の形成方法 - Google Patents

絶縁膜の形成方法

Info

Publication number
JPS62219928A
JPS62219928A JP61064609A JP6460986A JPS62219928A JP S62219928 A JPS62219928 A JP S62219928A JP 61064609 A JP61064609 A JP 61064609A JP 6460986 A JP6460986 A JP 6460986A JP S62219928 A JPS62219928 A JP S62219928A
Authority
JP
Japan
Prior art keywords
substrate
resin
insulating film
forming
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61064609A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0588540B2 (de
Inventor
Atsushi Tanaka
厚志 田中
Masato Kosugi
眞人 小杉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP61064609A priority Critical patent/JPS62219928A/ja
Publication of JPS62219928A publication Critical patent/JPS62219928A/ja
Publication of JPH0588540B2 publication Critical patent/JPH0588540B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Formation Of Insulating Films (AREA)
JP61064609A 1986-03-20 1986-03-20 絶縁膜の形成方法 Granted JPS62219928A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61064609A JPS62219928A (ja) 1986-03-20 1986-03-20 絶縁膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61064609A JPS62219928A (ja) 1986-03-20 1986-03-20 絶縁膜の形成方法

Publications (2)

Publication Number Publication Date
JPS62219928A true JPS62219928A (ja) 1987-09-28
JPH0588540B2 JPH0588540B2 (de) 1993-12-22

Family

ID=13263172

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61064609A Granted JPS62219928A (ja) 1986-03-20 1986-03-20 絶縁膜の形成方法

Country Status (1)

Country Link
JP (1) JPS62219928A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01193847A (ja) * 1988-01-29 1989-08-03 Konica Corp 塗布機構及びその塗布機構を有するｉｄカードの保護層形成装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4918587A (de) * 1972-06-13 1974-02-19
JPS5852330A (ja) * 1981-08-26 1983-03-28 サンド・アクチエンゲゼルシヤフト 原着ポリマ−材料
JPS58158952A (ja) * 1982-03-17 1983-09-21 Hitachi Ltd 半導体装置及びその製造法
JPS5957437A (ja) * 1982-09-28 1984-04-03 Fujitsu Ltd 酸化珪素膜の形成方法
JPS59178749A (ja) * 1983-03-30 1984-10-11 Fujitsu Ltd 配線構造体
JPS6024037A (ja) * 1983-07-20 1985-02-06 Comput Basic Mach Technol Res Assoc ポリイミド系樹脂膜の形成方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4918587A (de) * 1972-06-13 1974-02-19
JPS5852330A (ja) * 1981-08-26 1983-03-28 サンド・アクチエンゲゼルシヤフト 原着ポリマ−材料
JPS58158952A (ja) * 1982-03-17 1983-09-21 Hitachi Ltd 半導体装置及びその製造法
JPS5957437A (ja) * 1982-09-28 1984-04-03 Fujitsu Ltd 酸化珪素膜の形成方法
JPS59178749A (ja) * 1983-03-30 1984-10-11 Fujitsu Ltd 配線構造体
JPS6024037A (ja) * 1983-07-20 1985-02-06 Comput Basic Mach Technol Res Assoc ポリイミド系樹脂膜の形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01193847A (ja) * 1988-01-29 1989-08-03 Konica Corp 塗布機構及びその塗布機構を有するｉｄカードの保護層形成装置

Also Published As

Publication number Publication date
JPH0588540B2 (de) 1993-12-22

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