JPS62285057A - 電気めつき浴中の有機添加物の定量法 - Google Patents
電気めつき浴中の有機添加物の定量法Info
- Publication number
- JPS62285057A JPS62285057A JP62122355A JP12235587A JPS62285057A JP S62285057 A JPS62285057 A JP S62285057A JP 62122355 A JP62122355 A JP 62122355A JP 12235587 A JP12235587 A JP 12235587A JP S62285057 A JPS62285057 A JP S62285057A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- bath
- polarographic
- mercury
- additive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 11
- 238000009713 electroplating Methods 0.000 title claims description 5
- 239000006259 organic additive Substances 0.000 title claims description 4
- 239000000654 additive Substances 0.000 claims description 44
- 239000000080 wetting agent Substances 0.000 claims description 27
- 239000010949 copper Substances 0.000 claims description 23
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 22
- 230000000996 additive effect Effects 0.000 claims description 22
- 229910052802 copper Inorganic materials 0.000 claims description 22
- 229910052753 mercury Inorganic materials 0.000 claims description 19
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 18
- 238000005259 measurement Methods 0.000 claims description 14
- 239000007788 liquid Substances 0.000 claims description 12
- 238000007747 plating Methods 0.000 claims description 11
- 239000000243 solution Substances 0.000 claims description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 6
- 238000004445 quantitative analysis Methods 0.000 claims description 6
- 239000000872 buffer Substances 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 claims description 2
- 229910021607 Silver chloride Inorganic materials 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 claims description 2
- 235000011121 sodium hydroxide Nutrition 0.000 claims description 2
- 238000003556 assay Methods 0.000 claims 1
- 239000007853 buffer solution Substances 0.000 claims 1
- 238000004451 qualitative analysis Methods 0.000 claims 1
- 238000005282 brightening Methods 0.000 description 11
- 230000008021 deposition Effects 0.000 description 5
- 238000012544 monitoring process Methods 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 238000011088 calibration curve Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229910001431 copper ion Inorganic materials 0.000 description 2
- 238000001736 differential pulse polarography Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 238000000086 alternating current polarography Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000009614 chemical analysis method Methods 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 150000002730 mercury Chemical class 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Automation & Control Theory (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrolytic Production Of Metals (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3617046.1 | 1986-05-21 | ||
| DE3617046 | 1986-05-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62285057A true JPS62285057A (ja) | 1987-12-10 |
Family
ID=6301279
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62122355A Pending JPS62285057A (ja) | 1986-05-21 | 1987-05-19 | 電気めつき浴中の有機添加物の定量法 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0246494B1 (de) |
| JP (1) | JPS62285057A (de) |
| AT (1) | ATE49613T1 (de) |
| DE (1) | DE3761442D1 (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012177628A (ja) * | 2011-02-28 | 2012-09-13 | Meltex Inc | 無電解ニッケルめっき液の硫黄化合物定量分析方法 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1932953B1 (de) | 2006-12-11 | 2012-11-14 | Atotech Deutschland GmbH | Galvanisches Verfahren mit Analyse des Elektrolytbads durch Festphasenextraktion |
| CN103014823B (zh) * | 2013-01-05 | 2015-05-13 | 华进半导体封装先导技术研发中心有限公司 | 改进铜电沉积的添加剂效果快速判定方法 |
-
1987
- 1987-05-07 AT AT87106582T patent/ATE49613T1/de not_active IP Right Cessation
- 1987-05-07 DE DE8787106582T patent/DE3761442D1/de not_active Expired - Lifetime
- 1987-05-07 EP EP87106582A patent/EP0246494B1/de not_active Expired - Lifetime
- 1987-05-19 JP JP62122355A patent/JPS62285057A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012177628A (ja) * | 2011-02-28 | 2012-09-13 | Meltex Inc | 無電解ニッケルめっき液の硫黄化合物定量分析方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3761442D1 (de) | 1990-02-22 |
| ATE49613T1 (de) | 1990-02-15 |
| EP0246494A1 (de) | 1987-11-25 |
| EP0246494B1 (de) | 1990-01-17 |
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