JPS623046U - - Google Patents

Info

Publication number
JPS623046U
JPS623046U JP9455885U JP9455885U JPS623046U JP S623046 U JPS623046 U JP S623046U JP 9455885 U JP9455885 U JP 9455885U JP 9455885 U JP9455885 U JP 9455885U JP S623046 U JPS623046 U JP S623046U
Authority
JP
Japan
Prior art keywords
electron beam
sputtering
beam gun
gun
output
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9455885U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9455885U priority Critical patent/JPS623046U/ja
Publication of JPS623046U publication Critical patent/JPS623046U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本考案の一実施例を示す装置の構成
図、第2図は、同上装置の動作を示す説明図、及
び第3図は、従来のスパツタリング法を示す説明
図である。 1……真空容器、2……試料台、3……イオン
銃、4……電子銃、5……質量分析計、6……電
流制御回路。
FIG. 1 is a configuration diagram of an apparatus showing an embodiment of the present invention, FIG. 2 is an explanatory diagram showing the operation of the same apparatus, and FIG. 3 is an explanatory diagram showing a conventional sputtering method. 1... Vacuum vessel, 2... Sample stage, 3... Ion gun, 4... Electron gun, 5... Mass spectrometer, 6... Current control circuit.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 真空容器内にスパツタリングガスイオン銃と、
電子ビーム銃と、試料台と、スパツタリング時に
試料から放出される二次イオンを検出する質量分
析計と、該分析計からの出力信号に基づいて前記
電子ビーム銃の出力を制御する制御回路を備えて
なる表面分析用スパツタリング装置。
A sputtering gas ion gun in a vacuum container,
It includes an electron beam gun, a sample stage, a mass spectrometer that detects secondary ions emitted from the sample during sputtering, and a control circuit that controls the output of the electron beam gun based on the output signal from the analyzer. A sputtering device for surface analysis.
JP9455885U 1985-06-22 1985-06-22 Pending JPS623046U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9455885U JPS623046U (en) 1985-06-22 1985-06-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9455885U JPS623046U (en) 1985-06-22 1985-06-22

Publications (1)

Publication Number Publication Date
JPS623046U true JPS623046U (en) 1987-01-09

Family

ID=30653165

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9455885U Pending JPS623046U (en) 1985-06-22 1985-06-22

Country Status (1)

Country Link
JP (1) JPS623046U (en)

Similar Documents

Publication Publication Date Title
JPS58110956U (en) Charged particle irradiation device
JPS623046U (en)
EP0003659A3 (en) Apparatus for and method of analysing materials by means of a beam of charged particles
JPS6031655U (en) ion micro analyzer
JPH0229151U (en)
JPH067471B2 (en) Mass spectrometer
JPS5943374A (en) Secondary electron multiplier tube gain detector
JPS61151333U (en)
JPS63112747U (en)
JP2555359Y2 (en) Semiconductor device manufacturing equipment
JPS6339855U (en)
JPH0214358U (en)
JPS6119774U (en) Potential measurement device using a scanning electron microscope
JPS63167655U (en)
JPS6312153U (en)
JPH0388258U (en)
JPH02118254U (en)
JPS6339853U (en)
JPS6398369U (en)
JPH01112554U (en)
JPS58182140U (en) Vapor deposition equipment
JPH0455754U (en)
JPS6398368U (en)
JPS60143759A (en) mass spectrometer
JPS62157968U (en)