JPS6233329Y2 - - Google Patents

Info

Publication number
JPS6233329Y2
JPS6233329Y2 JP1982163787U JP16378782U JPS6233329Y2 JP S6233329 Y2 JPS6233329 Y2 JP S6233329Y2 JP 1982163787 U JP1982163787 U JP 1982163787U JP 16378782 U JP16378782 U JP 16378782U JP S6233329 Y2 JPS6233329 Y2 JP S6233329Y2
Authority
JP
Japan
Prior art keywords
insulating film
heat sink
resin material
semiconductor device
cavity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1982163787U
Other languages
Japanese (ja)
Other versions
JPS5967944U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1982163787U priority Critical patent/JPS5967944U/en
Publication of JPS5967944U publication Critical patent/JPS5967944U/en
Application granted granted Critical
Publication of JPS6233329Y2 publication Critical patent/JPS6233329Y2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • H10W72/884Die-attach connectors and bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/736Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked lead frame, conducting package substrate or heat sink
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/756Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink

Landscapes

  • Cooling Or The Like Of Electrical Apparatus (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)

Description

【考案の詳細な説明】 技術分野 この考案は電子機器等の半導体装置被取付部材
に放熱板兼用の固着基板を絶縁して取付ける樹脂
封止型半導体装置に関する。
[Detailed Description of the Invention] Technical Field This invention relates to a resin-sealed semiconductor device in which a fixed substrate that also serves as a heat sink is insulated and attached to a member to which the semiconductor device is attached, such as an electronic device.

背景技術 樹脂封止型半導体装置は一般に放熱板兼用の固
着基板の素子非固着面である裏面をシヤーシベー
スや放熱器等の半導体装置被取付部材に接合させ
てアースした状態で取付けているが、最近はコレ
クタ絶縁タイプのトランジスタのように放熱板を
被取付部材に絶縁して取付ける絶縁タイプのもの
が多く要求され、普及しつつある。この絶縁タイ
プの樹脂封止型半導体装置の一般的な構造は放熱
板の裏面を露出させて外装樹脂材をモールド成形
したもので、これの被取付部材への実装はその放
熱板と被取付部材との間にマイカ板等を熱伝導性
の良い薄い絶縁板を介在させて行つている。しか
し、この構造及び取付方法だと実装時に絶縁板を
位置決めして敷かねばならず取付工数が多くなつ
て作業性が極めて悪くなり、また半導体装置と絶
縁板が別個体であるので両者の保守管理が繁雑と
なる欠点があつた。
BACKGROUND ART Resin-sealed semiconductor devices are generally mounted with the back surface of a fixed substrate that also serves as a heat sink, which is the non-element fixed surface, bonded to a member to which the semiconductor device is mounted, such as a chassis base or a heat sink, and grounded. Insulated type transistors, such as collector insulated type transistors, in which the heat sink is insulated from and attached to the mounting member are in demand and are becoming popular. The general structure of this insulating type resin-encapsulated semiconductor device is one in which the back side of the heat sink is exposed and the outer resin material is molded. A thin insulating plate with good thermal conductivity, such as a mica plate, is interposed between the two. However, with this structure and mounting method, the insulating plate must be positioned and laid during mounting, which increases the number of installation steps and makes workability extremely poor.Also, since the semiconductor device and the insulating plate are separate entities, maintenance and management of both is required. The problem was that it was complicated.

上記欠点を解決するものとして、放熱板の裏面
に薄い樹脂膜を外装樹脂材と一体にモールド成形
した絶縁タイプの樹脂封止型半導体装置がある。
これの基本構造例を第1図に示すと、1は放熱
板、2は放熱板1上にマウントされた半導体ペレ
ツト、3は半導体ペレツト2の近傍より外方へ延
びるリード、4はリード3を半導体ペレツト2の
表面電極とを電気的接続する金属細線、6は放熱
板1の裏面を含む要部にモールド成形された外装
樹脂材である。外装樹脂材5の放熱板1裏面を覆
う一部は薄く均一な厚さの樹脂膜6として形成さ
れ、これが実装時に放熱板1を被取付部材7から
絶縁し、これにより実装作業などが大幅に改善さ
れる。
As a solution to the above drawbacks, there is an insulating type resin-sealed semiconductor device in which a thin resin film is integrally molded with an exterior resin material on the back surface of a heat sink.
An example of the basic structure of this is shown in FIG. 1. 1 is a heat sink, 2 is a semiconductor pellet mounted on the heat sink 1, 3 is a lead extending outward from the vicinity of the semiconductor pellet 2, and 4 is a lead 3. A thin metal wire 6 electrically connecting the surface electrode of the semiconductor pellet 2 is an exterior resin material molded on the main part including the back surface of the heat sink 1. A part of the exterior resin material 5 that covers the back surface of the heat sink 1 is formed as a thin and uniformly thick resin film 6, which insulates the heat sink 1 from the mounting member 7 during mounting, thereby greatly reducing the mounting work. Improved.

ところで、上記樹脂膜6を外装樹脂材5と同時
に且つ一体にモールド成形するためには、例えば
第2図に示すように樹脂モールド成形用の上金型
8と下金型9の衝合部分に形成されたキヤビテイ
10内に放熱板1をその裏面をキヤビテイ10の
底面から一定の高さに浮かせた状態で安定に支持
しておくキヤビテイ10内に溶融樹脂材を注入す
る必要がある。このキヤビテイ10内での放熱板
1の支持はリード3を介して行うことも可能であ
るが高い安定性が要求されるので、多くは図示の
如くキヤビテイ10の側面に突出退入自在に設け
た複数の支持ピン11,11……を突出させてそ
の先端で放熱板1の側端面を押圧して放熱板1を
支持し、樹脂モールド成形後支持ピン11,11
……を抜いて両金型8,9を外している。ところ
が、このように成形された半導体装置は外装樹脂
材5の側面に支持ピン11,11……の抜けた小
孔12,12……が残つたままとなつて外観を悪
くすると共に、小孔12,12……から放熱板1
の一部が外部に露出してしまい雰囲気中の水分侵
入路となり結局耐圧を悪くする問題があつた。更
には上記支持ピン11,11……を装備する金型
8,9は極めて複雑で高価なものが必要となり、
結果的に半導体装置を高価ならしめていた。
By the way, in order to mold the resin film 6 simultaneously and integrally with the exterior resin material 5, for example, as shown in FIG. It is necessary to inject a molten resin material into the cavity 10 to stably support the heat dissipation plate 1 in the formed cavity 10 with its back surface floating at a constant height above the bottom surface of the cavity 10. It is possible to support the heat dissipation plate 1 within the cavity 10 through the leads 3, but since high stability is required, in most cases it is provided on the side of the cavity 10 so as to be able to protrude and retract as shown in the figure. A plurality of support pins 11, 11, .
... is pulled out and both molds 8 and 9 are removed. However, in the semiconductor device molded in this way, the small holes 12, 12, . 12, 12... to heat sink 1
There was a problem that a part of the capacitor was exposed to the outside and became a path for moisture to enter the atmosphere, resulting in poor pressure resistance. Furthermore, the molds 8, 9 equipped with the support pins 11, 11, . . . need to be extremely complicated and expensive.
As a result, semiconductor devices became expensive.

考案の開示 本考案は上記問題点を解決することを目的と
し、これを達成したものである。本考案の特徴は
放熱板兼用の素子固着基板の裏面に予め薄く絶縁
膜を被着形成してから外装樹脂材を前記絶縁膜の
中央部を除く周縁部上を一部被覆させてモールド
成形することで、このようにすることにより樹脂
モールド成形用金型に構造簡単なものが使用で
き、また外装樹脂材に小孔が無くなり耐圧向上が
可能となる。
DISCLOSURE OF THE INVENTION The present invention aims to solve the above-mentioned problems, and has achieved this goal. The feature of the present invention is that a thin insulating film is formed in advance on the back side of the element fixing substrate which also serves as a heat sink, and then an exterior resin material is molded to cover a portion of the periphery of the insulating film except for the central part. By doing this, a mold with a simple structure can be used for resin molding, and there are no small holes in the exterior resin material, making it possible to improve pressure resistance.

考案を実施するための最良の形態 第1図と同一タイプのものに本考案を適用した
一例を第3図に示し、これを説明すると、20は
放熱板兼用の素子固着基板、21は半導体ペレツ
ト、22はリード、23は金属細線で、これらの
内容は第1図と同様である。24は固着基板20
の裏面に被着形成された均一な厚さで薄い絶縁
膜、25は要部にモールド成形された外装樹脂材
である。絶縁膜24は放熱性の良い絶縁材で、例
えばアルミナ(Al2O3)膜や有機高分子材料で形
成される。絶縁膜24がアルミナ膜のように耐熱
性の良好なものの場合、この絶縁膜24の形成は
例えば第5図に示すように固着基板20を打抜き
成形する時の金属板26の裏面全域に予め形成し
ておけばよい。また絶縁膜24が有機高分子材料
のように耐熱性の悪いものであれば固着基板20
の打抜き成形後で所望の熱処理が完了した後に塗
布する等の手段で形成すればよい。固着基板20
の裏面のエツジ部は面取りされてテーバエツジm
に成形され、このテーバエツジm上にも絶縁膜2
4を被着形成する。
BEST MODE FOR CARRYING OUT THE INVENTION FIG. 3 shows an example in which the present invention is applied to the same type of device as shown in FIG. , 22 is a lead, and 23 is a thin metal wire, the contents of which are the same as in FIG. 24 is a fixed substrate 20
A thin insulating film with a uniform thickness is formed on the back surface of the insulating film, and 25 is an exterior resin material molded onto the main part. The insulating film 24 is made of an insulating material with good heat dissipation properties, such as an alumina (Al 2 O 3 ) film or an organic polymer material. When the insulating film 24 is made of a material with good heat resistance such as an alumina film, the insulating film 24 is formed in advance over the entire back surface of the metal plate 26 when stamping the fixed substrate 20, as shown in FIG. Just do it. In addition, if the insulating film 24 is made of a material with poor heat resistance such as an organic polymer material, the fixed substrate 24
It may be formed by means such as coating after the desired heat treatment is completed after punching. Fixed board 20
The edges on the back side of
The insulating film 2 is also formed on this Taber edge m.
4 is deposited and formed.

このように裏面に絶縁膜24が予め形成された
固着基板20は例えば第4図に示す如き上金型2
7と下金型28で樹脂モールド成形される。つま
り、両金型27,28で形成されたキヤビテイ2
9の底面に固着基板20の絶縁膜24の裏面を密
着させてキヤビテイ29に溶融樹脂材を注入して
外装樹脂材25を形成する。この場合溶融樹脂材
は固着基板20の裏面絶縁膜24のテーパ状に浮
いた周縁部24′とキヤビテイ底面の間に回り込
み、従つて外装樹脂材25は絶縁膜24と面一に
且つ絶縁膜24の周縁部24′を抱き込む形で形
成され、絶縁膜24の取付強度が大きく安定す
る。両金型27,28はキヤビテイ29内で固着
基板20を浮かす必要がないので通常の構造簡単
で安価なものが使用できる。
The fixed substrate 20, on which the insulating film 24 has been formed in advance on the back surface, is attached to the upper mold 2 as shown in FIG. 4, for example.
7 and a lower mold 28 for resin molding. In other words, the cavity 2 formed by both molds 27 and 28
The back surface of the insulating film 24 of the fixed substrate 20 is brought into close contact with the bottom surface of the cavity 29, and a molten resin material is injected into the cavity 29 to form an exterior resin material 25. In this case, the molten resin material wraps around between the tapered floating peripheral edge 24' of the back insulating film 24 of the fixed substrate 20 and the bottom surface of the cavity, so that the exterior resin material 25 is flush with the insulating film 24 and It is formed in such a way as to embrace the peripheral edge 24' of the insulating film 24, and the mounting strength of the insulating film 24 is large and stable. Since it is not necessary to float the fixed substrate 20 in the cavity 29, the molds 27 and 28 can be of ordinary construction and simple and inexpensive.

以上のように、本考案によれば外装樹脂材から
内部の固着基板を一部露出させるような小孔を無
くすことができ、高耐圧化が可能で且つ外観向上
も図れる。また樹脂モールド成形用金型に簡単で
安価なものが使用できるので、製品のコストダウ
ンが図れる。
As described above, according to the present invention, it is possible to eliminate small holes that partially expose the internal fixed substrate from the exterior resin material, and it is possible to achieve high withstand voltage and improve the appearance. Furthermore, since a simple and inexpensive mold can be used for resin molding, the cost of the product can be reduced.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は従来の樹脂封止型半導体装
置の一例を示す実装時の断面図及び樹脂モールド
成形時の金型断面図、第3図は本考案の一実施例
を示す断面図、第4図及び第5図は第3図の半導
体装置の樹脂モールド成形時の金型断面図及び放
熱板成形時の概略断面図である。 20……固着基板、24……絶縁膜、25……
外装樹脂材。
1 and 2 are a cross-sectional view of an example of a conventional resin-sealed semiconductor device during mounting and a cross-sectional view of a mold during resin molding, and FIG. 3 is a cross-sectional view of an example of the present invention. , 4 and 5 are a cross-sectional view of a mold during resin molding of the semiconductor device of FIG. 3, and a schematic cross-sectional view during molding of a heat sink. 20...Fixed substrate, 24...Insulating film, 25...
Exterior resin material.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 放熱板兼用の固着基板の素子を固着しない裏面
に予め絶縁膜を被着形成させ、且つ、前記絶縁膜
の周縁部上まで外装樹脂材をモールド成形して、
絶縁膜の中央部を露出させたことを特徴とする樹
脂封止型半導体装置。
An insulating film is preliminarily formed on the back side of the fixing substrate that also serves as a heat sink, to which the elements are not fixed, and an exterior resin material is molded up to the periphery of the insulating film,
A resin-sealed semiconductor device characterized in that the central portion of an insulating film is exposed.
JP1982163787U 1982-10-27 1982-10-27 Resin-encapsulated semiconductor device Granted JPS5967944U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1982163787U JPS5967944U (en) 1982-10-27 1982-10-27 Resin-encapsulated semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1982163787U JPS5967944U (en) 1982-10-27 1982-10-27 Resin-encapsulated semiconductor device

Publications (2)

Publication Number Publication Date
JPS5967944U JPS5967944U (en) 1984-05-08
JPS6233329Y2 true JPS6233329Y2 (en) 1987-08-26

Family

ID=30359270

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1982163787U Granted JPS5967944U (en) 1982-10-27 1982-10-27 Resin-encapsulated semiconductor device

Country Status (1)

Country Link
JP (1) JPS5967944U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105531816A (en) * 2013-09-11 2016-04-27 三菱电机株式会社 Semiconductor device and manufacturing method thereof

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006086342A (en) * 2004-09-16 2006-03-30 Toyota Motor Corp Resin-encapsulated semiconductor device
JP5925052B2 (en) * 2012-05-23 2016-05-25 三菱電機株式会社 Semiconductor device and manufacturing method of semiconductor device
JP7633590B2 (en) * 2020-12-23 2025-02-20 株式会社オートネットワーク技術研究所 Circuit structure
JP7633591B2 (en) * 2020-12-23 2025-02-20 株式会社オートネットワーク技術研究所 Circuit structure

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105531816A (en) * 2013-09-11 2016-04-27 三菱电机株式会社 Semiconductor device and manufacturing method thereof
US9978662B2 (en) 2013-09-11 2018-05-22 Mitsubishi Electric Corporation Semiconductor device and manufacturing method for same

Also Published As

Publication number Publication date
JPS5967944U (en) 1984-05-08

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