JPS6233414A - Manufacture of magnetically soft material film - Google Patents
Manufacture of magnetically soft material filmInfo
- Publication number
- JPS6233414A JPS6233414A JP17343785A JP17343785A JPS6233414A JP S6233414 A JPS6233414 A JP S6233414A JP 17343785 A JP17343785 A JP 17343785A JP 17343785 A JP17343785 A JP 17343785A JP S6233414 A JPS6233414 A JP S6233414A
- Authority
- JP
- Japan
- Prior art keywords
- soft magnetic
- film
- magnetic
- magnetic film
- soft material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 19
- 239000007779 soft material Substances 0.000 title abstract 9
- 230000005291 magnetic effect Effects 0.000 claims abstract description 204
- 239000010408 film Substances 0.000 claims abstract description 126
- 239000010409 thin film Substances 0.000 claims abstract description 23
- 238000000034 method Methods 0.000 claims abstract description 17
- 238000000137 annealing Methods 0.000 claims abstract description 13
- 230000004907 flux Effects 0.000 claims description 35
- 230000008878 coupling Effects 0.000 claims description 6
- 238000010168 coupling process Methods 0.000 claims description 6
- 238000005859 coupling reaction Methods 0.000 claims description 6
- 238000010030 laminating Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 7
- 229910000808 amorphous metal alloy Inorganic materials 0.000 abstract description 4
- 238000005530 etching Methods 0.000 abstract description 4
- 229910000889 permalloy Inorganic materials 0.000 abstract description 4
- 230000005330 Barkhausen effect Effects 0.000 abstract description 3
- 230000006866 deterioration Effects 0.000 abstract description 3
- 239000002648 laminated material Substances 0.000 abstract 1
- 230000005415 magnetization Effects 0.000 description 43
- 230000005381 magnetic domain Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000000696 magnetic material Substances 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000001965 increasing effect Effects 0.000 description 2
- 230000005389 magnetism Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 235000010627 Phaseolus vulgaris Nutrition 0.000 description 1
- 244000046052 Phaseolus vulgaris Species 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、磁気センサ、磁気へ、ド等の磁気変換器に用
いられる軟磁性膜の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for manufacturing a soft magnetic film used in magnetic transducers such as magnetic sensors and magnetic converters.
tた本轄傷シ手の■萌占)
従来より、磁気テープ、磁気ディスク等の磁気記憶媒体
に磁気的情報を書き込んだり、読み出したりするために
、軟磁性膜を用いた種々の磁気変換器が知られている。Conventionally, various magnetic transducers using soft magnetic films have been used to write and read magnetic information on magnetic storage media such as magnetic tapes and magnetic disks. It has been known.
例えば、誘導型薄膜磁気へ、ドに用−られる軟磁性膜は
、磁気記憶媒体からの信号磁束を、有効に収束しコイル
と鎖交させることを目的としている。磁束応答型磁気へ
、ドとして知られる磁気抵抗効果型磁気ヘッドの磁気シ
ールドに用いられる軟磁性膜は、不要な磁界をしゃへい
し、再生分解能を向上させることを目的としている。こ
れらの目的のため、軟磁性膜には、高透磁率であること
、及びその周波数特性が良好であること等の性能が要求
される。従って、軟磁性膜には、一般に、−軸異方性が
付与され、その磁化困難軸と平行に信号磁束が導かれる
ように、形状及び磁気記憶媒体との位置関係が最適に設
計されろ。For example, the purpose of a soft magnetic film used in inductive thin film magnetism is to effectively converge signal magnetic flux from a magnetic storage medium and link it to a coil. The purpose of the soft magnetic film used in the magnetic shield of a magnetoresistive magnetic head known as a flux-responsive magnetic head is to block unnecessary magnetic fields and improve reproduction resolution. For these purposes, soft magnetic films are required to have high magnetic permeability and good frequency characteristics. Therefore, the soft magnetic film is generally given −axis anisotropy, and its shape and positional relationship with the magnetic storage medium should be optimally designed so that the signal magnetic flux is guided parallel to its axis of hard magnetization.
これに対し、軟磁性膜の磁化容易軸方向に信号磁束を導
入する様に設計された磁気ヘッドでは、低周波数領域に
おいて高透磁率が得られるものの、信号磁束の周波数が
増加するにつれ、その透磁率は急峻に低下し、この結果
、コイルと鎖交する信号磁束も減少し、再生出力の急峻
な減衰が見られる。更に、磁壁の移動及び磁区形状の変
化に伴うバルクハウゼンノイズ及び再生出力の変動等も
観測される。On the other hand, a magnetic head designed to introduce signal magnetic flux in the direction of the easy axis of magnetization of a soft magnetic film can obtain high magnetic permeability in the low frequency region, but as the frequency of the signal magnetic flux increases, the permeability increases. The magnetic flux sharply decreases, and as a result, the signal magnetic flux interlinking with the coil also decreases, resulting in a sharp attenuation of the reproduction output. Furthermore, Barkhausen noise and fluctuations in reproduction output due to movement of domain walls and changes in the shape of magnetic domains are also observed.
上述した様に、軟磁性膜を用いた磁気変換器においては
、軟磁性膜に一軸異方性を付与すると共に、その磁化困
難軸と平行(即ち、磁化容易軸と直交方向)に信号磁束
を径由させることが、良好な特性を得るための必須条件
となる。As mentioned above, in a magnetic transducer using a soft magnetic film, uniaxial anisotropy is imparted to the soft magnetic film, and signal magnetic flux is directed parallel to the axis of hard magnetization (that is, in a direction orthogonal to the axis of easy magnetization). It is an essential condition to obtain good characteristics.
こう言った軟磁性膜に、−軸異方性を付与する方法とし
て、従来、基体上に真空蒸着、スバ、タリング及び電着
等の手法を用いて、均一磁界中で、軟磁性膜を成膜した
り、あるいは、成膜後、均一磁界中で、アニール処理を
施したりして、該磁界と平行に磁化容易軸を生成し、−
軸蟲方性を付与していた。その後、基体上に、成膜され
た該軟磁性膜はフォトリングラフィ技術により、その磁
化容易軸と所定の配置関係を有するコアパターンの形状
に加工され、コイル等の他の機能部分を形成して、磁気
変換器として完成させていた。Conventionally, as a method of imparting -axis anisotropy to such soft magnetic films, soft magnetic films are formed on a substrate in a uniform magnetic field using techniques such as vacuum evaporation, sputtering, taring, and electrodeposition. A film is formed, or after film formation, annealing is performed in a uniform magnetic field to generate an axis of easy magnetization parallel to the magnetic field, and -
It was given axial orientation. Thereafter, the soft magnetic film formed on the substrate is processed into a core pattern shape having a predetermined arrangement relationship with the axis of easy magnetization using photolithography technology to form other functional parts such as a coil. It was completed as a magnetic transducer.
しかし、上記の製造工程で、軟磁性膜のコア形状と、そ
の磁化容易軸との配置関係Vi設定通りにはならず、バ
ラツキを生じる。これは、−軸異方性を付与する際の磁
界分布及び膜質の不均一性により、必ずしも、磁化容易
軸方向が基体全面で均一でないためである。又、軟磁性
膜をコア形状に加工する際の、磁化容易軸との配置ズレ
も反11!すれる。これらは、結果として、磁気変換器
の特性の?くラツキ及び製造歩留の低下を招いていた。However, in the above manufacturing process, the arrangement relationship Vi between the core shape of the soft magnetic film and its axis of easy magnetization does not match the setting Vi, and variations occur. This is because the easy axis direction of magnetization is not necessarily uniform over the entire surface of the substrate due to non-uniform magnetic field distribution and film quality when imparting -axis anisotropy. Also, when processing the soft magnetic film into a core shape, the misalignment with the axis of easy magnetization is also 11! I can pass. These are the resulting characteristics of the magnetic transducer? This resulted in dullness and a decrease in manufacturing yield.
更に、信号磁束の経路と磁化困難軸とが、必ずしも軟磁
性膜コアの全域で平行とならない磁気へ、ドも開示され
ている(例えば、第6回日本応用磁気学会学術講演概要
集、1982年、講演番号17aB−10)。かかる磁
気へ、ドけ、磁気記憶媒体必ら流入する信号磁束を軟磁
性膜の一端から膜面内を経由させ、他端から再び磁気記
憶媒体に戻す、曲線状のコア形状を有する。Furthermore, it has been disclosed that the path of the signal magnetic flux and the axis of hard magnetization are not necessarily parallel throughout the entire soft magnetic film core (for example, in the 6th Japanese Society of Applied Magnetics Academic Lecture Abstracts, 1982). , Lecture No. 17aB-10). It has a curved core shape that allows the signal magnetic flux that flows into the magnetic storage medium from one end of the soft magnetic film to pass through the film surface and returns to the magnetic storage medium from the other end.
従って、信号磁束経路が曲線状であるため、前述した均
一磁界を利用した軟磁性薄膜の製造方法では、磁化容易
軸と信号磁束の方向が一致する領域が存在し、周波数特
性の劣化、バルクハウゼンノイズの発生及び再生出力の
変動を招いていた。Therefore, since the signal magnetic flux path is curved, in the method for manufacturing soft magnetic thin films using the uniform magnetic field described above, there is a region where the axis of easy magnetization coincides with the direction of the signal magnetic flux, resulting in deterioration of frequency characteristics and Barkhausen This resulted in the generation of noise and fluctuations in the playback output.
一方、上述した、磁区形状の乱れ、磁壁移動を制御する
ために、多数の細い溝を形成した軟磁性膜を用いた磁気
へ、ドが開示されている(特開昭89−185013
)。小かる軟磁性膜は、磁壁が該溝の方向に揃えられる
ため、磁化回転によって信号磁束カ;伝播窟れる。従っ
て、信号磁束による磁壁の移動、磁区形状の変化が抑制
される。しかし、多数の溝の存在は、軟磁性膜の実質的
な磁気抵抗の増加をもたらし、信号磁束を大きく減衰さ
せてしまう。これは、結果的に磁気へ、ドとしての再生
出力を太きく減少させてしまうことになる。On the other hand, in order to control the disturbance of the magnetic domain shape and the movement of the domain walls, a method has been disclosed for magnetism using a soft magnetic film in which many thin grooves are formed (Japanese Patent Application Laid-Open No. 185013-1989).
). Since the domain walls of the small soft magnetic film are aligned in the direction of the groove, the signal magnetic flux propagates through the magnetization rotation. Therefore, movement of domain walls and changes in magnetic domain shape due to signal magnetic flux are suppressed. However, the presence of a large number of grooves results in a substantial increase in the magnetic resistance of the soft magnetic film, which significantly attenuates the signal magnetic flux. This results in a significant decrease in the reproduction output as a magnetic field.
(発明の目的) 本発明の目的は、前記従来の欠点を解決した。(Purpose of the invention) The object of the present invention is to solve the above-mentioned conventional drawbacks.
製造時の特性のバラツキが少くなく、磁壁移動及び磁区
形状の変化に伴う、バルクハウゼンノイズの晶出、百花
出力の亦11易rC恵因辿務鼓妊の少!kを抑制した軟
磁性膜の製造方法を提供することにある。There is little variation in characteristics during manufacturing, and there is little crystallization of Barkhausen noise due to domain wall movement and changes in magnetic domain shape, and less of the 11 easy rC effect on the output! An object of the present invention is to provide a method for manufacturing a soft magnetic film with suppressed k.
更に、本発明の他の目的は、曲線状の磁束経路であって
も、良好な特性を有する軟磁性膜の製造方法を提供する
ことにある。Furthermore, another object of the present invention is to provide a method for manufacturing a soft magnetic film that has good characteristics even when the magnetic flux path is curved.
(発明の構成)
本発明によれば、第1及び第2の軟磁性膜を非磁性薄膜
を介して静磁気的結合を行い得る間隔で積層する工程と
、前記第2の軟磁性膜の少くなくとも一面に、前記第1
の軟磁性膜を通る信号磁束の方向に直交する複数の溝を
形成する工程と、前記第1及び第2の軟磁性膜をアニー
ルする工程と、前記第2の軟磁性膜を除失する工程とを
備えたことを特徴とする軟磁性膜の製造方法が得られる
。(Structure of the Invention) According to the present invention, a step of laminating a first and a second soft magnetic film through a non-magnetic thin film at an interval that allows magnetostatic coupling, and At least in one aspect, the first
forming a plurality of grooves perpendicular to the direction of signal magnetic flux passing through the soft magnetic film; annealing the first and second soft magnetic films; and removing the second soft magnetic film. There is obtained a method for manufacturing a soft magnetic film characterized by comprising:
(構成の詳細な説明)
本発明は、上述の製造方法により、従来技術の問題点を
解決した。即ち、本発明では、第2の軟磁性膜上に直線
状の複数の溝を形成することにより、溝と直交する方向
の反磁界を大きくし、その磁化を溝の方向に揃えている
。しかも、第10軟磁性膜が、非磁性薄膜を介して、第
2の軟磁性膜と静磁気的結合を行い得る間隔で積JIし
てあるため、第1の軟磁性膜には、第2の軟磁性膜の磁
化と平行に磁化が揃えられる。従って、ガ都る状態で該
第1及び第2の軟磁性膜にアニール処理を施こすことに
より、複数の溝の直線方向に平行な磁化容JAIIJ1
w有する一軸貝方性を生成せしめることかできる。その
後、第2の&磁性膜を除去することにより、溝の直線方
向に平行な磁化容易軸を有する軟磁性膜が完成する。(Detailed Description of Configuration) The present invention solves the problems of the prior art by using the above-mentioned manufacturing method. That is, in the present invention, by forming a plurality of linear grooves on the second soft magnetic film, the demagnetizing field in the direction perpendicular to the grooves is increased and the magnetization thereof is aligned in the direction of the grooves. Moreover, since the tenth soft magnetic film is stacked with the second soft magnetic film through the nonmagnetic thin film at an interval that allows magnetostatic coupling with the second soft magnetic film, the first soft magnetic film has the second soft magnetic film. The magnetization is aligned parallel to the magnetization of the soft magnetic film. Therefore, by annealing the first and second soft magnetic films in a stable state, the magnetization capacitance JAIIJ1 parallel to the linear direction of the plurality of grooves is
It is possible to generate a uniaxial shell pattern with w. Thereafter, by removing the second magnetic film, a soft magnetic film having an axis of easy magnetization parallel to the linear direction of the groove is completed.
従って、直線状の溝の方向は、軟磁性膜のコア形状に基
づき、一意的に決定できるため、−軸異方性の方向は軟
磁性膜りコア形状に応じて一意的に決定される。これは
、軟磁性族のコアを同−基体上で、一括大童製造する際
に生ずる特性のバラツキを解消し、しかも、曲線状のコ
アパターンであっても、信号磁束の経路の全域で信号磁
束の方向と平行な磁化困難軸を有する軟磁性膜が実現さ
れる。Therefore, since the direction of the linear groove can be uniquely determined based on the core shape of the soft magnetic film, the direction of the -axis anisotropy is uniquely determined according to the core shape of the soft magnetic film. This eliminates the variations in characteristics that occur when manufacturing soft magnetic cores in bulk on the same substrate, and even with a curved core pattern, the signal can be transmitted throughout the signal magnetic flux path. A soft magnetic film with a hard axis of magnetization parallel to the direction of magnetic flux is realized.
以下、本発明について、図面を参照して更に詳細に説明
する。第1餡発明の製造工程を示す概略斜視図である。Hereinafter, the present invention will be explained in more detail with reference to the drawings. It is a schematic perspective view showing the manufacturing process of the 1st bean paste invention.
まず、!!1図(b)において、ガラス、セラミックス
等の表面が滑らふな非磁性材料から成る基体1上に、軟
磁性アモルファス合金(例えば、0oZrs Co’[
’a等のCo−メタA、!アモルファス)、パーマロイ
等の高a磁率磁性体から成る第1の軟磁性膜2を、スバ
、タリング、真空蒸着、あるいけ電着等の手法で形成す
る。該第1の軟磁性膜2の上には、非磁性薄膜3を積層
し、該非磁性薄膜30表面に、フォトリソグラフィ技術
及びイオンエツチング技術等の手法を用いて、多数の溝
5をy軸方向に伸びる直線状に形成する。続いて、該多
数の#!J5上に、軟磁性アモルファス合金、パーマロ
イ等から成る第2の軟磁性膜4を形成する。従って、非
磁性薄膜3の上に種線方向(y軸方向)を基準として第
1及び第2の軟磁性膜2及び4、及び非磁性薄膜3を一
括して、所定のコア形状にエツチングする。第1図では
、X軸方向に信号磁束を経由させることを目的に、X軸
方向に伸た短冊状のコアに加工されている。first,! ! In FIG. 1(b), a soft magnetic amorphous alloy (for example, 0oZrs Co'[
'a etc. Co-meta A,! The first soft magnetic film 2 made of a high a magnetic material such as amorphous or permalloy is formed by a method such as sputtering, taring, vacuum deposition, or electrodeposition. A non-magnetic thin film 3 is laminated on the first soft magnetic film 2, and a large number of grooves 5 are formed on the surface of the non-magnetic thin film 30 in the y-axis direction using techniques such as photolithography and ion etching. Form into a straight line that extends to . Next, the corresponding number of #! A second soft magnetic film 4 made of soft magnetic amorphous alloy, permalloy, etc. is formed on J5. Therefore, the first and second soft magnetic films 2 and 4 and the non-magnetic thin film 3 are etched all at once on the non-magnetic thin film 3 with the seed line direction (y-axis direction) as a reference, into a predetermined core shape. . In FIG. 1, the core is processed into a strip-shaped core extending in the X-axis direction for the purpose of passing the signal magnetic flux in the X-axis direction.
非磁性薄膜3の膜厚け、第1及び第2の軟磁性膜2及び
4ボ静磁気的結合を行える範囲に選定される。例えば、
100AB至数μm程度の厚みが良い。又、非磁性薄膜
3の材質は、第1及び第2の軟磁性M2及び4と熱拡散
を生じない材料が選定される。例えば、Ti、TaSM
o等の導電性材料5i02、Alt03.5ilN、等
の絶縁性材料が良い。The thickness of the non-magnetic thin film 3 is selected within a range that allows magnetostatic coupling between the first and second soft magnetic films 2 and 4. for example,
A thickness of about 100AB to several μm is preferable. Further, the material of the non-magnetic thin film 3 is selected to be a material that does not cause thermal diffusion with the first and second soft magnetic materials M2 and 4. For example, Ti, TaSM
Conductive materials such as 5i02 and insulating materials such as Alt03.5ilN are preferable.
一方、第2の軟磁性膜4の厚みは、第1の軟磁性膜2の
厚み及び飽和磁化に応じて決定される。On the other hand, the thickness of the second soft magnetic film 4 is determined according to the thickness and saturation magnetization of the first soft magnetic film 2.
即ち、第2の軟磁性膜の厚みと飽和磁化のs−b:、第
1の軟磁性膜の厚みと飽和磁化の積に、はぼ等しくなる
様に設定することが、おおよその目安となる。In other words, a rough guideline is to set the thickness of the second soft magnetic film and the saturation magnetization s-b to be approximately equal to the product of the thickness of the first soft magnetic film and the saturation magnetization. .
ここまでの製造工程において、第2の軟磁性膜4の磁化
は、溝5の長手方向(y軸方向)に揃えられる。これ位
、該磁化が溝5の直線方向(X軸方向)に向こうとすれ
ば、溝5によって形成され発生し、その反磁界が増大す
るためである。従って、第2の軟磁性膜4の磁化を溝5
の直線方向に、より安定に揃えるためには、多数の溝5
のピッチを小さくするか、溝5の深さを大きくすること
により、X軸方向の反磁界を大きく設定すれば良い。In the manufacturing process up to this point, the magnetization of the second soft magnetic film 4 is aligned in the longitudinal direction (y-axis direction) of the groove 5. This is because if the magnetization is directed in the linear direction (X-axis direction) of the groove 5, it will be formed and generated by the groove 5, and the demagnetizing field will increase. Therefore, the magnetization of the second soft magnetic film 4 is reduced to the groove 5.
In order to align more stably in the linear direction of the
The demagnetizing field in the X-axis direction may be set large by decreasing the pitch of the grooves 5 or increasing the depth of the grooves 5.
又、第2の軟磁性膜4の磁化は、溝5の直線方向(y軸
方向)に揃っているなめ、第2の軟磁性膜4のy軸方向
の両端には、磁荷が発生する。該磁荷祉、第1の軟磁性
s2のy軸方向の両端に負符号の磁荷を誘起し、第1の
軟磁性膜2の磁化を第2の軟磁性FIX4の磁化の向き
と反平行に励磁する。即ち、第1の軟磁性膜2の磁化は
、第2の軟磁性膜4の磁化と同様、y軸方向に揃えられ
、かつ、その方向で安定となる。Furthermore, since the magnetization of the second soft magnetic film 4 is aligned in the linear direction (y-axis direction) of the groove 5, magnetic charges are generated at both ends of the second soft magnetic film 4 in the y-axis direction. . The magnetic charge induces negative-sign magnetic charges at both ends of the first soft magnetic film s2 in the y-axis direction, causing the magnetization of the first soft magnetic film 2 to be antiparallel to the direction of magnetization of the second soft magnetic FIX4. Excite to. That is, the magnetization of the first soft magnetic film 2, like the magnetization of the second soft magnetic film 4, is aligned in the y-axis direction and is stable in that direction.
続いての工程として、第1及び第2の軟磁性膜2及び4
0II!i層体を所定の時間及び温度の条件下でアニー
ル処理する。アニール処理の条件は、第1の軟磁性膜2
の材質に応じて選定される。即ち、アモルファス軟磁性
体を採用するなら、その結晶ダスト合金等の多結晶質の
材料であれば、グレイン成長を生じない温度(300〜
400°C)以下のアニール温度が望ましい。又、アニ
ール処理の雰囲気は真空中又は、水素、窒素ガス中で行
うのが望ましい。これは、@1及び第2の軟磁性膜2及
び4の酸化に伴う磁気特性の劣化を防止する。As a subsequent step, the first and second soft magnetic films 2 and 4 are
0II! The i-layer body is annealed under predetermined time and temperature conditions. The conditions for the annealing treatment are that the first soft magnetic film 2
The material is selected according to the material. In other words, if an amorphous soft magnetic material is used, if it is a polycrystalline material such as a crystal dust alloy, the temperature at which grain growth will not occur (300 -
An annealing temperature of 400° C. or less is desirable. Further, it is preferable that the annealing treatment be performed in a vacuum or in a hydrogen or nitrogen gas atmosphere. This prevents deterioration of magnetic properties due to oxidation of @1 and the second soft magnetic films 2 and 4.
以上のアニール工程の結果、第1の軟磁性膜2の磁化は
溝5の直線方向(y軸方向)に揃えられているため、y
軸方向に磁化容易軸E −A % X軸方向に磁化困難
軸を有する一軸異方性が生成される。As a result of the above annealing process, the magnetization of the first soft magnetic film 2 is aligned in the linear direction (y-axis direction) of the groove 5, so y
Uniaxial anisotropy is generated having an easy axis of magnetization E-A% in the axial direction and a hard axis of magnetization in the X-axis direction.
続いての工程として、第2の軟磁性膜4を工。As the next step, a second soft magnetic film 4 is formed.
チング等により除去する。これは、第1図(b)に示す
如く、非磁性薄膜3と同時に一括してエツチングして、
第1の軟磁性膜2のみを残しても良い。Remove by ching etc. As shown in FIG. 1(b), this is done by etching the non-magnetic thin film 3 all at once.
Only the first soft magnetic film 2 may be left.
以上、述べた工程で、コア形状に対して、所定の方向に
磁化容易軸E、Aを有する軟磁性膜が完成する。Through the steps described above, a soft magnetic film having easy magnetization axes E and A in predetermined directions with respect to the core shape is completed.
尚、第1図では、第2の軟磁性膜4に凹凸(溝)を形成
する際、予め、非磁性薄膜3に多数の溝5を形成し、該
溝5の凹凸を第2の軟磁性膜4に転写しているが、第2
図に示す概略斜視図の如く、第2の軟磁性膜4に直接、
多数の直線状の溝5を形成しても良い。第2図において
も、第1図を用いて説明した全つく同様の製造工程を経
ることにより、第1の軟磁性膜2には、溝5の直線方向
(y軸方向)と平行な磁化容易軸E、Aを有する一軸異
方性を生成できる。第1図の場合は、非磁性薄膜3の膜
)!yが、溝5の深さによっても規定されるのに対し、
第2図においては、第2の軟磁性膜4上に溝5が形成さ
れるため、非磁性薄膜3の厚みに溝5による制限かない
。従って、非磁性薄膜3の膜厚を極めて薄く設定できる
ため、第1及び第2の軟磁性膜2及び4聞の静磁気的結
合を更に強固にできる特徴がある。しかも、第2図では
、スパッタリング又tlX空蒸N等の手法を用いれは、
第1の軟磁性#2、非磁性薄膜3、及び第2の軟磁性膜
4を同一真空系内で、連続して成膜できるため、第1図
に示した場合よりも、製造工程が簡単になる。In FIG. 1, when forming the unevenness (grooves) in the second soft magnetic film 4, a large number of grooves 5 are formed in the non-magnetic thin film 3 in advance, and the unevenness of the grooves 5 is formed in the second soft magnetic film. Although it is transferred to the film 4, the second
As shown in the schematic perspective view shown in the figure, directly on the second soft magnetic film 4,
A large number of linear grooves 5 may be formed. In FIG. 2, the first soft magnetic film 2 is easily magnetized parallel to the linear direction (y-axis direction) of the groove 5 by going through the same manufacturing process as explained using FIG. 1. Uniaxial anisotropy with axes E and A can be generated. In the case of Figure 1, the non-magnetic thin film 3)! While y is also defined by the depth of the groove 5,
In FIG. 2, since the groove 5 is formed on the second soft magnetic film 4, the thickness of the non-magnetic thin film 3 is not limited by the groove 5. Therefore, since the thickness of the nonmagnetic thin film 3 can be set extremely thin, the magnetostatic coupling between the first and second soft magnetic films 2 and 4 can be further strengthened. Moreover, in Fig. 2, if a method such as sputtering or tlX vaporized N is used,
Since the first soft magnetic film #2, the non-magnetic thin film 3, and the second soft magnetic film 4 can be successively formed in the same vacuum system, the manufacturing process is simpler than in the case shown in Fig. 1. become.
更に、本発明を適用するに好適な軟磁性膜のコア形状を
第3図に示す。第3図は馬蹄形の曲線状磁束通路を有す
る軟磁性膜のコアを示し、第3図(a)はその平面図、
第3図(b)は、第3図(ωのA−λ断面を示す図であ
る。図において、基体1上に第1の軟磁性Ta2、非磁
性薄膜3、第2の軟磁性膜4が順次積層され、馬蹄形の
コア形状に加工されている。第2の軟磁性膜4の表面に
は、曲線状の磁束通路と直交する方向に多数の直線状の
溝5が形成されている。Further, FIG. 3 shows the core shape of a soft magnetic film suitable for applying the present invention. FIG. 3 shows a core of a soft magnetic film having a horseshoe-shaped curved magnetic flux path, and FIG. 3(a) is a plan view thereof;
FIG. 3(b) is a diagram showing the A-λ cross section of FIG. are sequentially laminated and processed into a horseshoe-shaped core shape.A large number of linear grooves 5 are formed on the surface of the second soft magnetic film 4 in a direction perpendicular to the curved magnetic flux path.
ここまでの製造工程において、第2の軟磁性膜4は、溝
5の直交方向に対して、大きな反磁界を有するため、そ
の磁化は、溝5の直線方向に揃えられろ。即ち、第2の
軟磁性膜4の磁化は曲線状コアの全域で、磁束通路に対
して直交方向に揃えられる。更に、第1の軟磁性膜2の
磁化も、第2の軟磁性膜4との静磁気的結合により、磁
束通路と直交する方向に固定される。かかる状態で第1
図を用いて説明したと同様のアニール処理を施すことに
より、第1の軟磁性膜2には、曲線状コアの全域で信号
磁束の通路と直交した磁化容易軸が形成される。その後
、第2の軟磁性膜4を除去することにより、コア全域で
信号磁束の通路と直交した磁化容易を有する軟磁性膜が
完成する(図示せず)。In the manufacturing process up to this point, the second soft magnetic film 4 has a large demagnetizing field in the direction orthogonal to the groove 5, so its magnetization should be aligned in the linear direction of the groove 5. That is, the magnetization of the second soft magnetic film 4 is aligned in the direction perpendicular to the magnetic flux path over the entire curved core. Furthermore, the magnetization of the first soft magnetic film 2 is also fixed in the direction perpendicular to the magnetic flux path due to the magnetostatic coupling with the second soft magnetic film 4. In this state, the first
By performing the same annealing treatment as explained using the figures, an axis of easy magnetization perpendicular to the path of the signal magnetic flux is formed in the first soft magnetic film 2 over the entire curved core. Thereafter, by removing the second soft magnetic film 4, a soft magnetic film having easy magnetization perpendicular to the path of the signal magnetic flux throughout the core is completed (not shown).
第3図においても、第2の軟磁性膜4上への凹凸の形成
方法として、第1図と同様、非磁性薄膜3に溝を形成し
、その凹凸を第2の軟磁性膜に転写しても良い。In FIG. 3, as well, the method of forming unevenness on the second soft magnetic film 4 is to form grooves in the nonmagnetic thin film 3 and transfer the unevenness to the second soft magnetic film, as in FIG. It's okay.
(実施例)
以下、本発明の具体的な材料、アニール条件を第3図の
コア形状による実施例を用いて説明する。(Example) Hereinafter, specific materials and annealing conditions of the present invention will be explained using an example using the core shape shown in FIG.
第3図において、第1の軟磁性膜2として、0o90%
−’I’alO%(at%)の組成から成るアモルファ
ス軟磁性膜を0.5μmの厚みに、非磁性薄[3として
Tiを0.02μmの厚みに、第2の軟磁性膜4として
Ni82%−Fe18%(wt%)の組成のパーマロイ
膜を1μmの厚みにスパッタ法により連続して成膜した
。これ等の積層体をフォ) IJソグラフィ技術を用い
て、f@50μmを有する馬蹄形パターンに加工し、第
2の軟磁性膜の表面に、平均的ピッチ5μm1深さ0.
5μmの多数の溝5を馬蹄形曲線と直交する方向に形成
した0
かかる軟磁性膜の積層体を真空中で250℃に昇温せし
め、この状態を4時間保持した。In FIG. 3, as the first soft magnetic film 2, 0o90%
An amorphous soft magnetic film having a composition of -'I'alO% (at%) is made to a thickness of 0.5 μm, a non-magnetic thin film [3 is made of Ti to a thickness of 0.02 μm, and a second soft magnetic film 4 is made of Ni82. A permalloy film having a composition of %-Fe18% (wt%) was continuously formed to a thickness of 1 μm by sputtering. These laminates were processed into a horseshoe-shaped pattern with f @ 50 μm using the IJ lithography technique, and formed on the surface of the second soft magnetic film with an average pitch of 5 μm and a depth of 0.5 μm.
A laminated body of soft magnetic films in which a large number of grooves 5 of 5 μm in diameter were formed in a direction perpendicular to the horseshoe curve was heated to 250° C. in a vacuum, and this state was maintained for 4 hours.
上記、アニール工程の後、塩化第2鉄を主成分とするエ
ツチング溶液で、第2の軟磁性膜4を除失し、軟磁性膜
のコアパターンを完成させた。After the above-mentioned annealing step, the second soft magnetic film 4 was removed using an etching solution containing ferric chloride as a main component to complete the core pattern of the soft magnetic film.
この本発明による実施例の軟磁性膜の磁区を、ビッタ−
法により観察したところ、コアパターンの全域で、馬蹄
形曲線と直交する方向に磁壁が観察され、磁化容易軸が
磁束通路と直交方向に生成されていることが確認された
。更に、前記軟磁性膜のコアパターンを囲む様に、フォ
トリングラフィ技術を用いてコイルを形成し、馬め6形
パターンの両端が信号磁束の流出入端となる様な磁気変
換器を作製したところ、雑音か小さく、低周波から10
M&以上の高周波にわたって、一様な信号出力が得られ
、優れた高周波特性を有していることが確認された。The magnetic domains of the soft magnetic film of this embodiment of the present invention are
When observed by the method, domain walls were observed in the direction perpendicular to the horseshoe curve throughout the core pattern, and it was confirmed that the axis of easy magnetization was generated in the direction perpendicular to the magnetic flux path. Furthermore, a coil was formed using photolithography technology so as to surround the core pattern of the soft magnetic film, and a magnetic transducer was fabricated such that both ends of the horse-shaped six-shaped pattern served as input and output ends of the signal magnetic flux. However, the noise is small, from low frequency to 10
It was confirmed that a uniform signal output was obtained over a high frequency of M& or higher, and that the device had excellent high frequency characteristics.
(比較例)
尚、比較のため、上記本発明の実施例と全く同一のコア
パターンを有するが、本発明による製造工程を施してい
ない軟磁性膜を製作し、磁区観察を行ったところ、パタ
ーンの全域でバックリングドメイン等の不規則な磁壁の
並びが見られた。更に、本発明の実施例と同様の磁気変
換器を作製しなところ、数百KHz以下の信号磁束周波
数では、比較的大きな信号出力が得られるものの、極め
て雑音が多く、しかも、周波数が高くなるにつれ、信号
出力の急減が見られた。(Comparative Example) For comparison, a soft magnetic film having the same core pattern as the example of the present invention but not subjected to the manufacturing process according to the present invention was fabricated, and when magnetic domains were observed, the pattern was An irregular arrangement of domain walls such as buckling domains was observed throughout the area. Furthermore, when a magnetic transducer similar to the embodiment of the present invention is manufactured, although a relatively large signal output can be obtained at a signal flux frequency of several hundred KHz or less, there is an extremely large amount of noise and the frequency becomes high. As time passed, a sharp decrease in signal output was observed.
(発明の効果)
以上説明した様に、本発明では、軟磁性膜のコアパター
ンを非磁性薄膜を介した軟磁性膜の多層構成とし、該軟
磁性膜の一方に形成された溝の直線方向に、他方の軟磁
性膜の磁化容易軸を形成できる。従って、コアパターン
上の信号磁束通路と直交する方向に該溝を形成しておく
ことにより、常に、信号磁束通路と直交する磁化容易軸
を有する軟磁性膜のコアパターンが製造できる。この結
果、軟磁性膜のコアパターンを一括大量製造する際の、
磁化容謳軸方向のズレな解消できるため、特性のバラツ
牛か極めて小さく、歩留の高い軟磁性膜が得られる。し
かも、溝は任意の方向に形成できるため、信号磁束の通
路と磁化容易軸とを常に直交させることができ、曲、i
nのコアパターンであっても周波数特性の優れ、パルク
ツ1ウゼンノイズの少ない軟磁性膜が得られる。(Effects of the Invention) As explained above, in the present invention, the core pattern of the soft magnetic film has a multilayer structure of soft magnetic films with non-magnetic thin films interposed therebetween, and the grooves formed on one side of the soft magnetic film are directed in the linear direction. The axis of easy magnetization of the other soft magnetic film can be formed in this manner. Therefore, by forming the grooves in the direction perpendicular to the signal magnetic flux path on the core pattern, a core pattern of a soft magnetic film having an axis of easy magnetization perpendicular to the signal magnetic flux path can always be manufactured. As a result, when mass-producing soft magnetic film core patterns,
Since the misalignment in the direction of the magnetization axis can be eliminated, a soft magnetic film with extremely small variations in properties and high yield can be obtained. Moreover, since the groove can be formed in any direction, the path of the signal magnetic flux and the axis of easy magnetization can always be perpendicular to each other.
Even with a core pattern of n, a soft magnetic film with excellent frequency characteristics and low noise is obtained.
更に、磁束通路となる軟磁性膜には、溝が形成されてい
ないため、溝の存在による磁気抵抗の増加及び信号磁束
の減衰を極めて小さくできる。Furthermore, since no grooves are formed in the soft magnetic film that serves as the magnetic flux path, the increase in magnetic resistance and the attenuation of the signal magnetic flux due to the presence of the grooves can be extremely minimized.
説明するための概略斜視図、第2図は、本発明の他の実
施例を説明するための概VJ斜視図、第3図(a)及び
(b)は、本発明の更に他の実施例を説明するための平
面肉及び断面図である。FIG. 2 is a schematic perspective view for explaining another embodiment of the present invention, FIG. 3 (a) and (b) are a schematic perspective view for explaining another embodiment of the present invention, and FIGS. FIG. 2 is a plan view and a cross-sectional view for explaining.
図において、1・・・基体、2・・・第1の軟磁性膜、
3・・・非磁性薄膜、4・・・第2の軟磁性膜、5・・
・溝。In the figure, 1... base body, 2... first soft magnetic film,
3... Non-magnetic thin film, 4... Second soft magnetic film, 5...
·groove.
1cm+i −xtTIn−+−内W !j第1図 1、基体 (b) 第2図 IP 1、基体 第3図 (a) 1、基体1cm+i -xtTIn-+- inside W! jFigure 1 1. Base (b) Figure 2 IP 1. Base Figure 3 (a) 1. Base
Claims (1)
的結合を行い得る間隔で積層する工程と、前記第2の軟
磁性膜の少なくとも一面に、前記第1の軟磁性膜を通る
信号磁束の方向に直交する複数の溝を形成する工程と、
前記第1及び第2の軟磁性膜をアニールする工程と、前
記第2の軟磁性膜を除去する工程とを備えたことを特徴
とする軟磁性膜の製造方法。a step of laminating first and second soft magnetic films via a non-magnetic thin film at intervals that allow magnetostatic coupling; and a step of laminating the first soft magnetic film on at least one surface of the second soft magnetic film. forming a plurality of grooves perpendicular to the direction of the signal magnetic flux passing therethrough;
A method for manufacturing a soft magnetic film, comprising the steps of annealing the first and second soft magnetic films, and removing the second soft magnetic film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17343785A JPS6233414A (en) | 1985-08-06 | 1985-08-06 | Manufacture of magnetically soft material film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17343785A JPS6233414A (en) | 1985-08-06 | 1985-08-06 | Manufacture of magnetically soft material film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6233414A true JPS6233414A (en) | 1987-02-13 |
Family
ID=15960449
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17343785A Pending JPS6233414A (en) | 1985-08-06 | 1985-08-06 | Manufacture of magnetically soft material film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6233414A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02181402A (en) * | 1988-08-03 | 1990-07-16 | Digital Equip Corp <Dec> | Thin-film magnetic device widening signal magnetic flux |
-
1985
- 1985-08-06 JP JP17343785A patent/JPS6233414A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02181402A (en) * | 1988-08-03 | 1990-07-16 | Digital Equip Corp <Dec> | Thin-film magnetic device widening signal magnetic flux |
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