JPS6234821B2 - - Google Patents
Info
- Publication number
- JPS6234821B2 JPS6234821B2 JP59258303A JP25830384A JPS6234821B2 JP S6234821 B2 JPS6234821 B2 JP S6234821B2 JP 59258303 A JP59258303 A JP 59258303A JP 25830384 A JP25830384 A JP 25830384A JP S6234821 B2 JPS6234821 B2 JP S6234821B2
- Authority
- JP
- Japan
- Prior art keywords
- copper alloy
- pitting corrosion
- copper
- film
- corrosion resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000007797 corrosion Effects 0.000 claims description 54
- 238000005260 corrosion Methods 0.000 claims description 54
- 239000010949 copper Substances 0.000 claims description 47
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 28
- 239000001301 oxygen Substances 0.000 claims description 22
- 229910052760 oxygen Inorganic materials 0.000 claims description 22
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 21
- 229910052718 tin Inorganic materials 0.000 claims description 19
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 17
- 229910052698 phosphorus Inorganic materials 0.000 claims description 5
- 239000012535 impurity Substances 0.000 claims description 3
- 230000001105 regulatory effect Effects 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 33
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 19
- 150000002500 ions Chemical class 0.000 description 19
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 13
- 229910052802 copper Inorganic materials 0.000 description 13
- 239000005751 Copper oxide Substances 0.000 description 10
- 229910000431 copper oxide Inorganic materials 0.000 description 10
- 238000010828 elution Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 9
- 238000000034 method Methods 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000000956 alloy Substances 0.000 description 3
- 238000005275 alloying Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 238000005219 brazing Methods 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- -1 amine silicate Chemical class 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000013527 degreasing agent Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 239000003651 drinking water Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 1
- 239000008233 hard water Substances 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 1
- 229910052912 lithium silicate Inorganic materials 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000008234 soft water Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Description
〔産業上の利用分野〕
本発明は給水・給湯用配管材等として優れた耐
食性(殊に耐孔食性)と耐Cuイオン溶出性を有
する銅合金管に関するものである。
〔従来の技術〕
給水・給湯用等の配管材料としては耐食性及び
施工性の優れた脱酸銅が汎用されている。しかし
ながら脱酸銅にしても十分に要求特性を満たして
いるとは言えず、水質によつては徐々にCuイオ
ンが溶出し青水発生の問題を生ずることがある。
即ち配管からのCuイオン溶出量が多くなつて上
水の水質基準値(Cu:1.0ppm)を超えると、Cu
イオンにより洗濯物等が青く着色するといつた問
題が生じてくる。使用期間が経過するにつれて表
面に酸化皮膜が形成されCuイオンの溶出が無く
なることが知られている。しかしながら給水・給
湯用管の内面にその様な酸化銅皮膜が形成される
までには1〜2年といつた長期間を要し、その間
のCuイオンの溶出の問題は回避できない。
一方、また別の条件では局部的に腐食によつて
孔があく現象すなわち孔食現象が現われることが
あり、この場合は、短期間のうちに管壁が貫通さ
れて水洩れ事故を招来する。この孔食には通称
TypeとTypeの2種類がある。Type孔食
は硬水の冷水に発生するもので、Type孔食は
軟水の温水で経験されるものである。従つて腐食
要因特に水質との関係は異なつた挙動を示すと考
えられている。
Typeについては銅管の耐食性改善を期して
種々の研究が進められており、例えば
「INFLUENCE OF MINOR ALLOYING
ADDITIONS ON CORROSION OF COPPER
TUBES IN DRINKING WATERS by Diene
DEVROEY and claude DEPOMMIER」
INTERNATIONAL COPPER RESEARCH
ASSOCIATION,INC.(1970年9月)には脱酸
銅中へ微量のAlやSnを含有させることによつて
耐食性を改善する技術も提案されている。
一方TYpe孔食についてはHCO3 -/SO4 2-が
1以下でかつ残留塩素濃度が高い温水に発生しや
すいとされているが、この種の孔食に対して耐食
性を改善する合金の研究はされていない。
〔発明が解決しようとする問題点〕
TYpe孔食に有効とされる合金もTYpe孔
食に対しては要求を十分に満たすものとは言え
ず、適量のAlやSnを含有させた場合でも耐食性
能に著しいばらつきがあり、実用的な安定した耐
食効果を得ることはできない。本発明はこうした
状況のものとで水質の如何を問わずCuイオンの
溶出及び孔食を安定して確実に阻止することので
きる技術を提供しようとするものである。
〔問題点を解決する為の手段〕
本発明に係る耐食性銅合金管の構成は、下記の
元素を必須成分として含有する他
Al:0.01〜1.5%
Sn:0.03〜2.5%
但し(Al+Sn)≧0.1%
P,Mg,B,Mn及びSiの1種又は2種以上:
総量で0.005〜0.5%
酸素含有量が100ppm以下に規制され、残部がCu
及び不可避不純物からなる銅合金を管状に成形し
てなるところに要旨を有するものであり、本発明
の他の構成は、上記の要件を満たす銅合金管の内
面に、厚さ10〜100000Åのシリケート皮膜を形成
してなるところに要旨を有するものである。
〔作 用〕
以下、上記の要件を規定した理由を詳細に説明
しつつ本発明の作用を明確にして行く。
まず添加合金元素としてAl及びSnを選択した
理由について説明する。
水中、殊に温水中で銅管の内面に最初に形成さ
れる酸化皮膜はCu2Oであり、このCu2O皮膜が内
面に万遍なく形成されている限りCuイオンの溶
出及び孔食は生じ難い。しかし酸化剤(残留塩
素)濃度の高い温水中においては、Cu2Oは短期
間のうちにCuOにまで酸化され該酸化皮膜の大
部分はCuOに変換してしまう。
CuO皮膜は自然電位が高くて孔食発生電位を
容易に越えるので孔食発生に到る。従つて孔食を
無くす為には銅管の内面を常にCu2O皮膜で被つ
ておけばよいのであるが、Cu2Oは前述の様に短
期間でCuOに変換してしまう。そこで銅表面に
形成される酸化銅皮膜の構成々分をCu2O>CuO
の状態で安定に維持させる方策はないものかと考
え、種々の合金元素を用いて添加効果を調べた。
その結果、適量のAlとSnを共に添加してやれ
ば、酸化銅皮膜の構成々分をCu2O>CuOの状態
に保持し得ることが確認された。しかも水質の変
動に影響されることなく銅表面に形成される酸化
銅皮膜成分を〔Cu2O>CuO〕の状態に維持する
為には、後記実施例(特に第1図)でも明らかに
する如くAl及びSnの各添加量を0.01%以上及び
0.03%以上とし、且つ両者の総和を0.1%以上に
しなければならないことが確認された。
但しAl及びSnの添加量を厳密に設定したとし
てもそれだけで十分な耐孔食性が得られる訳では
なく、時として顕著な孔食現象を生じ得ることが
判明した。そこで孔食発生の他の原因を追求した
結果、銅合金中に含まれる酸素量によつて耐孔食
性は著しく変わり、特に銅合金中の酸素濃度が
100ppmを超えると、上記Al及びSnによる耐孔食
性改善効果が殆んど失なわれてしまうことが分か
つた。こうした傾向は後記実施例(特に第2図)
でも明らかにする通りであり、結局のところ高レ
ベルの耐食性を確保する為には適量のAl及びSn
を添加すると共に、酸素量を100ppm以下に抑え
ることが必須の要件となる。但しAlの添加量が
多過ぎると製管時の加工性が低下するので1.5%
以下に抑えるべきであり、又Snの添加量が多過
ぎると熱間加工性及び耐潰食性が低下するので
2.5%以下に抑えなければならない。
また本発明では、前述の如く低レベルの酸素濃
度を確保する為溶製段階でP,Mg,B,Mn及び
Siよりなる群から選択される1種以上の元素を脱
酸剤として含有させる必要がある。しかして第5
図は溶製終了段階における残存P濃度と酸素濃度
の関係を調べた結果を示したグラフであり、こう
した傾向はMg,B,Mn,Siについても同様であ
つた。即ちこれら脱酸性元素の量が0.005%未満
では銅合金中の酸素濃度を100ppm以下に抑える
ことができず、満足し得る耐孔食性を確保するこ
とができない。しかもこれらの脱酸性元素を適量
含有させておくことによつて水素脆性を抑制する
ことも可能になる。即ちろう付け作業時に、酸化
性雰囲気でトーチ加熱した後還元性雰囲気中で加
熱した場合、たとえば無酸素銅では脆化を起こし
易いことが知られており、これは、酸化性雰囲気
中で加熱される際に銅の中へ酸素が拡散侵入し、
この酸素が、還元性雰囲気中で加熱される際に侵
入してくる水素と反応して水素脆化現象を起こす
ものと考えられている。しかし上記の様に酸素と
の結合力の強い元素を微量含有させておくと、こ
れらの元素が、酸化性雰囲気中で加熱される際に
侵入してくる酸素と結合する為に酸素が深部まで
侵入し難く、その結果水素脆化を生じ難くなるも
のと考えられる。但しこれら脱酸性元素の量が多
過ぎると加工性が悪くなるので、多くとも総和で
0.5%以下、好ましくは0.1%以下に抑えるべきで
ある。
上記の構成要件を充足する銅合金管は前述の様
な作用を有しており、従来の耐食性銅合金管に比
べて卓越した耐孔食性を発揮する。しかしながら
使用開始初期の酸化銅皮膜(以下特記しない限り
Cu2O>CuOの酸化銅皮膜を意味する)形成が不
完全である時期においては、若干量のCuイオン
が溶出することは否めない。そこで使用開始期か
らCuイオンの溶出を実用上問題にならない程度
まで軽減する為には、上記銅合金管の内面に適当
な厚さのシリケート皮膜を形成しておくのがよ
い。
シリケート皮膜を形成させる化合物の具体例と
してはリチウムシリケート、ナトリウムシリケー
ト、カリウムシリケート、アミンシリケート、エ
チルシリケート、コロイダルシリカ等が挙げられ
るが、本発明で特にシリケート系を選択した理由
は次の通りである。
ろう付け時等の加熱によつて皮膜が劣化する
ことがなく、且つ有害ガスを生じない。
使用中に皮膜が剥離する場合、極めて微細
(100μm以下)な破片となつて溶出していくの
で管やバルブ等を閉塞する恐れがなく、且つ人
体に全く無害である。
シリケート皮膜は親水性で且つ多孔質である
為、該皮膜の下部(即ち銅合金素材の表面)で
は酸化銅皮膜が徐々に成長していいく。しかも
シリケート皮膜自体は水に可溶性であり、人体
に無害なSiO2となつて徐々に水中に溶出して
いくが、シリケート皮膜による表面皮膜効果が
失なわれた時点(シリケート皮膜が溶出してし
まつた時点)ではすでに耐食性の酸化銅皮膜の
形成が完了している為、使用の初期からCuイ
オンの溶出を実用上問題にならない程度に軽減
することができる。
上記の様なシリケート皮膜の効果を有効に発揮
させ、殊に使用開始期におけるCuイオンの溶出
量を1ppm未満に抑える為には、膜厚を10Å以上
にしなければならない。Cuイオンの溶出防止と
いう観点からした場合膜厚に上限は存在しない
が、厚くなり過ぎると管にたわみに等の外力が作
用したときに皮膜が亀裂乃至剥離を生じ易くなる
ので、こうした問題を回避する為には100000Å以
下に抑えるべきである。尚シリケート皮膜の形成
法は特に限定されないが、最も一般的なのは製管
工程で銅合金管内面に付着した潤滑油を脱脂剤に
より除去した後、前記シリケート系化合物の単独
若しくは2種以上を水に希釈して管内面に塗布
し、加熱炉或は熱風乾燥炉等で100〜200℃に数分
乃至数十分加熱し脱水する方法である。
ところで通常の脱酸銅管の場合、上記の様な方
法でシリケート皮膜を形成しても該皮膜を強固に
密着させることができず、3か月程度の通水で皮
膜の約5割が剥離して表面保護効果が有効に発揮
されない。しかしながら前述の如く適量のAlを
添加した銅合金管を使用するとシリケート皮膜の
密着性は飛躍的に向上し、シリケート皮膜の表面
保護効果が最大限有効に発揮される。この理由
は、銅合金中のAlとシリケート皮膜中のSiが接合
界面で共有結合を起こす為と考えられる。即ち本
明細書に開示する第2の発明(内面にシリケート
皮膜を形成した耐食性銅合金管)において管素材
中に配合されるAlは、前述の如くSnとの共存に
よる酸化銅皮膜組成の安定化(Cu2O>CuO)に
加えて、シリケート皮膜の密着性向上という重要
な機能を発揮するものである。
〔実施例〕
実施例 1
第1表に示す化学成分の銅合金を用いて内径
22.2mm〓×肉厚0.81mmの銅合金管を作製し、下記
の条件でモデル給湯水の通水試験を行ない、1年
後における各銅合金管内面の孔食状況を調べた。
結果を第1表に示す。
<実験条件>
水質 水温…60℃
HCO3 - 濃度…30ppm
SO4 2- 濃度…50ppm
Cl- 濃度…10ppm
ClO- 濃度…1〜3ppm
PH …7.0
流 速:2m/sec
試験期間:1年
孔食発生状況
発生孔食数/dm2
1未満…◎
1〜5…〇
5〜20…△
20超 …×
[Industrial Application Field] The present invention relates to a copper alloy pipe having excellent corrosion resistance (particularly pitting corrosion resistance) and Cu ion elution resistance as a piping material for water supply and hot water supply. [Prior Art] Deoxidized copper, which has excellent corrosion resistance and workability, is widely used as a piping material for water supply, hot water supply, etc. However, even with deoxidized copper, it cannot be said that it fully satisfies the required properties, and depending on the water quality, Cu ions may gradually elute, resulting in the problem of blue water formation.
In other words, when the amount of Cu ions eluted from pipes increases and exceeds the water quality standard value (Cu: 1.0ppm) for tap water, Cu
Problems arise when laundry, etc. is colored blue by ions. It is known that as the period of use passes, an oxide film is formed on the surface and the elution of Cu ions stops. However, it takes a long period of time, such as 1 to 2 years, for such a copper oxide film to be formed on the inner surface of water supply/hot water supply pipes, and the problem of Cu ion elution during that time cannot be avoided. On the other hand, under other conditions, a phenomenon in which pitting occurs locally due to corrosion may occur, and in this case, the pipe wall is penetrated within a short period of time, resulting in a water leakage accident. This pitting corrosion is commonly known as
There are two types: Type and Type. Type pitting occurs in cold water with hard water, while Type pitting corrosion occurs in warm water with soft water. Therefore, it is thought that the relationship between corrosion factors, especially water quality, shows different behavior. Various types of research are being carried out with the aim of improving the corrosion resistance of copper pipes, such as ``INFLUENCE OF MINOR ALLOYING''.
ADDITIONS ON CORROSION OF COPPER
TUBES IN DRINKING WATERS by Diene
DEVROEY and claude DEPOMMIER”
INTERNATIONAL COPPER RESEARCH
ASSOCIATION, INC. (September 1970) also proposed a technique to improve corrosion resistance by incorporating trace amounts of Al or Sn into deoxidized copper. On the other hand, type pitting corrosion is said to occur more easily in hot water where HCO 3 - /SO 4 2- is less than 1 and the residual chlorine concentration is high, but research into alloys that improve corrosion resistance against this type of pitting corrosion is underway. Not done. [Problems to be solved by the invention] Even alloys that are considered effective against TYPE pitting corrosion cannot be said to fully meet the requirements for TYPE pitting corrosion, and even when containing appropriate amounts of Al and Sn, corrosion resistance is poor. There are significant variations in performance, making it impossible to obtain a practical and stable corrosion resistance effect. The present invention aims to provide a technology that can stably and reliably prevent the elution of Cu ions and pitting corrosion regardless of the water quality. [Means for solving the problem] The structure of the corrosion-resistant copper alloy tube according to the present invention contains the following elements as essential components: Al: 0.01 to 1.5% Sn: 0.03 to 2.5%, provided that (Al+Sn)≧0.1 % One or more of P, Mg, B, Mn and Si:
Total amount: 0.005-0.5% Oxygen content is regulated to 100ppm or less, and the remainder is Cu
Another feature of the present invention is that a copper alloy containing unavoidable impurities is formed into a tube shape, and another structure of the present invention is to form a silicate layer with a thickness of 10 to 100,000 Å on the inner surface of a copper alloy tube that satisfies the above requirements. The gist is that it is formed by forming a film. [Function] Hereinafter, the reason for specifying the above requirements will be explained in detail, and the function of the present invention will be clarified. First, the reason for selecting Al and Sn as additive alloying elements will be explained. The first oxide film that forms on the inner surface of a copper tube in water, especially hot water, is Cu 2 O. As long as this Cu 2 O film is evenly formed on the inner surface, Cu ion elution and pitting corrosion will not occur. Hard to occur. However, in hot water with a high concentration of oxidizing agent (residual chlorine), Cu 2 O is oxidized to CuO in a short period of time, and most of the oxide film is converted to CuO. The CuO film has a high self-potential that easily exceeds the pitting corrosion potential, leading to pitting corrosion. Therefore, in order to eliminate pitting corrosion, the inner surface of the copper tube should always be covered with a Cu 2 O film, but as mentioned above, Cu 2 O converts to CuO in a short period of time. Therefore, the components of the copper oxide film formed on the copper surface are calculated as follows: Cu 2 O > CuO
We wondered if there was a way to maintain this state stably, and investigated the effects of addition using various alloying elements.
As a result, it was confirmed that by adding appropriate amounts of Al and Sn together, the components of the copper oxide film could be maintained in the state of Cu 2 O>CuO. Moreover, in order to maintain the copper oxide film component formed on the copper surface in a state of [Cu 2 O > CuO] without being affected by changes in water quality, it will be clarified in the examples later (particularly in Figure 1). The amount of Al and Sn added should be 0.01% or more.
It was confirmed that the content must be 0.03% or more, and the sum of both must be 0.1% or more. However, it has been found that even if the amounts of Al and Sn added are set strictly, sufficient pitting corrosion resistance cannot be obtained by itself, and that significant pitting corrosion phenomena may sometimes occur. As a result of searching for other causes of pitting corrosion, we found that pitting corrosion resistance significantly changes depending on the amount of oxygen contained in the copper alloy.
It was found that when the content exceeds 100 ppm, the above-mentioned effect of improving pitting corrosion resistance by Al and Sn is almost completely lost. This tendency can be seen in the examples described later (especially in Figure 2).
However, as is clear, in order to ensure a high level of corrosion resistance, appropriate amounts of Al and Sn must be added.
In addition to adding oxygen, it is essential to suppress the amount of oxygen to 100 ppm or less. However, if the amount of Al added is too large, the workability during pipe manufacturing will decrease, so the addition amount is 1.5%.
If the amount of Sn added is too large, hot workability and crushing corrosion resistance will decrease.
Must be kept below 2.5%. In addition, in the present invention, in order to ensure a low level of oxygen concentration as described above, P, Mg, B, Mn and
It is necessary to contain one or more elements selected from the group consisting of Si as a deoxidizing agent. However, the fifth
The figure is a graph showing the results of investigating the relationship between residual P concentration and oxygen concentration at the completion stage of melting, and this trend was the same for Mg, B, Mn, and Si. That is, if the amount of these deoxidizing elements is less than 0.005%, the oxygen concentration in the copper alloy cannot be suppressed to 100 ppm or less, and satisfactory pitting corrosion resistance cannot be ensured. Moreover, by containing appropriate amounts of these deoxidizing elements, hydrogen embrittlement can be suppressed. In other words, it is known that oxygen-free copper, for example, is prone to embrittlement if it is heated with a torch in an oxidizing atmosphere and then heated in a reducing atmosphere during brazing work; During the process, oxygen diffuses into the copper,
It is believed that this oxygen reacts with hydrogen that enters when heated in a reducing atmosphere, causing hydrogen embrittlement. However, if a small amount of elements that have a strong bond with oxygen are included as mentioned above, these elements will combine with the oxygen that enters when heated in an oxidizing atmosphere, causing oxygen to penetrate deep into the body. It is thought that it is difficult for hydrogen to penetrate and, as a result, it becomes difficult to cause hydrogen embrittlement. However, if the amount of these deoxidizing elements is too large, processability will deteriorate, so at most
It should be kept below 0.5%, preferably below 0.1%. A copper alloy tube that satisfies the above-mentioned structural requirements has the above-mentioned effects, and exhibits superior pitting corrosion resistance compared to conventional corrosion-resistant copper alloy tubes. However, the copper oxide film in the initial stage of use (unless otherwise specified below)
It is undeniable that some amount of Cu ions will be eluted during the period when the formation of copper oxide film (Cu 2 O > CuO) is incomplete. Therefore, in order to reduce the elution of Cu ions to a level that does not pose a practical problem from the beginning of use, it is recommended to form a silicate film of an appropriate thickness on the inner surface of the copper alloy tube. Specific examples of compounds that form a silicate film include lithium silicate, sodium silicate, potassium silicate, amine silicate, ethyl silicate, colloidal silica, etc., but the reason why silicate-based compounds were particularly selected in the present invention is as follows. . The coating does not deteriorate due to heating during brazing, etc., and no harmful gases are generated. When the film peels off during use, it elutes into extremely fine (100 μm or less) fragments, so there is no risk of clogging pipes, valves, etc., and it is completely harmless to the human body. Since the silicate film is hydrophilic and porous, a copper oxide film gradually grows under the film (ie, on the surface of the copper alloy material). Furthermore, the silicate film itself is soluble in water, and gradually dissolves into water as SiO 2 , which is harmless to the human body. Since the formation of a corrosion-resistant copper oxide film has already been completed by the time the product is used, the elution of Cu ions can be reduced to a level that does not pose a practical problem from the beginning of use. In order to effectively exhibit the effects of the silicate film as described above, and to suppress the amount of Cu ion elution to less than 1 ppm, especially at the beginning of use, the film thickness must be 10 Å or more. There is no upper limit to the film thickness from the perspective of preventing the elution of Cu ions, but if it is too thick, the film is likely to crack or peel when an external force such as bending is applied to the pipe, so avoid such problems. In order to do so, it should be kept below 100,000 Å. The method for forming the silicate film is not particularly limited, but the most common method is to remove lubricating oil adhering to the inner surface of the copper alloy pipe during the pipe manufacturing process with a degreaser, and then add one or more of the silicate compounds to water. This method involves diluting the solution, applying it to the inner surface of the tube, and dehydrating it by heating it at 100 to 200°C for several minutes to several tens of minutes in a heating furnace or hot air drying oven. However, in the case of ordinary deoxidized copper pipes, even if a silicate film is formed using the method described above, it is not possible to firmly adhere the film, and about 50% of the film peels off after about 3 months of water flow. surface protection effect cannot be effectively exerted. However, as described above, when a copper alloy tube to which an appropriate amount of Al is added is used, the adhesion of the silicate film is dramatically improved, and the surface protection effect of the silicate film is maximized. The reason for this is thought to be that Al in the copper alloy and Si in the silicate film form a covalent bond at the bonding interface. That is, in the second invention disclosed in this specification (corrosion-resistant copper alloy tube with a silicate coating formed on the inner surface), Al mixed into the tube material stabilizes the composition of the copper oxide coating by coexisting with Sn as described above. In addition to (Cu 2 O > CuO), it also performs the important function of improving the adhesion of the silicate film. [Example] Example 1 Using a copper alloy with the chemical composition shown in Table 1,
Copper alloy tubes of 22.2 mm × wall thickness of 0.81 mm were made, and a model hot water water flow test was conducted under the following conditions, and the pitting corrosion status of the inner surface of each copper alloy tube after one year was investigated. The results are shown in Table 1. <Experimental conditions> Water quality Water temperature...60℃ HCO 3 -Concentration ...30ppm SO 4 2- Concentration...50ppm Cl -Concentration ...10ppm ClO -Concentration ...1~3ppm PH...7.0 Flow rate: 2m/sec Test period: 1 year Pitting corrosion Occurrence status Number of pitting corrosion/dm 2 Less than 1…◎ 1-5…〇5-20…△ More than 20…×
【表】
第1表においてNo.1〜19は本発明の規定要件を
満たす実施例であり、何れも優れた耐孔食性を有
している。これに対しNo.20〜26は下記の如く本発
明で規定する何れかの要件を欠く比較例であり、
何れも耐孔食性が不十分である。
No.20,21:AlとSnの総和が0.1%未満である為
酸化銅皮膜の耐食性が不十分である。
No.22,23:Al又はSnの何れかが不足する為、
やはり十分な耐孔食性が得られない。
No.24,25,26:Al及びSnの一方若しくは双方
が含まれていない為耐孔食性が改善されて
いない。
また第1図は、第1表に示した実験結果を含め
た多数の実験の中から、酸素濃度が約30ppm、
燐含有率が約0.025%であるものを抜粋し、Al及
びSnの含有率が耐孔食性に与える影響をグラフ
化して示したものであり、図中の◎〜×は前記孔
食発生状況の判断基準と同じである。
第1図からも明らかな様に、満足な耐孔食性を
確保する為にはAl≧0.01%、Sn≧0.03%及び〔Al
+Sn〕≧0.1%の全ての要件を満たす様にAl及び
Snの含有率を定めなければならない。
次にAl含有率が0.1%、Sn含有率が0.5%で残部
が実質的にCuからなる基本組成の銅合金を対象
として酸素濃度だけが異なる数種類の銅合金管を
製造し、前記と同様にして孔食発生状況を調べ
た。
結果は第2図に示す通りであり、酸素濃度が
100ppm以下の場合孔食は殆んど発生していない
が、酸素濃度が100ppmを超えると発生孔食数が
急激に増大しており、Al及びSnによる耐食性改
善効果が実質的に失なわれていることが分かる。
実施例 2
第2表に示す化学成分の銅合金により22.2mm〓
×0.81mmt×1000mmの供試管を製造し、実施例
1で用いたのと同じ水質のモデル給湯水(流速:
2m/秒)を用いて通水開始期からの経時的なCu
イオン溶出量の変化を調べた。但しCuイオンの
溶出量は、所定の測定期に各供試管内にモデル給
湯水を充満して24時間放置し、この間に該給湯水
中に溶出したCuイオンを定量することによつて
求めた。[Table] In Table 1, Nos. 1 to 19 are examples that meet the specified requirements of the present invention, and all have excellent pitting corrosion resistance. On the other hand, Nos. 20 to 26 are comparative examples that lack any of the requirements specified in the present invention as shown below.
Both have insufficient pitting corrosion resistance. No. 20, 21: Since the sum of Al and Sn is less than 0.1%, the corrosion resistance of the copper oxide film is insufficient. No.22, 23: Due to lack of either Al or Sn,
After all, sufficient pitting corrosion resistance cannot be obtained. No. 24, 25, 26: Pitting corrosion resistance is not improved because one or both of Al and Sn is not included. In addition, Figure 1 shows that the oxygen concentration was approximately 30 ppm and
This is a graph showing the influence of Al and Sn content on pitting corrosion resistance by extracting samples with a phosphorus content of approximately 0.025%. It is the same as the judgment criteria. As is clear from Figure 1, in order to ensure satisfactory pitting corrosion resistance, Al≧0.01%, Sn≧0.03% and [Al
+Sn〕≧0.1% Al and
The Sn content must be determined. Next, using a copper alloy with a basic composition of 0.1% Al content, 0.5% Sn content, and the remainder being substantially Cu, several types of copper alloy tubes differing only in oxygen concentration were manufactured in the same manner as above. The occurrence of pitting corrosion was investigated. The results are shown in Figure 2, and the oxygen concentration
When the oxygen concentration is below 100ppm, almost no pitting corrosion occurs, but when the oxygen concentration exceeds 100ppm, the number of pitting corrosions that occur increases rapidly, and the corrosion resistance improvement effect of Al and Sn is virtually lost. I know that there is. Example 2 22.2mm with a copper alloy having the chemical composition shown in Table 2
×0.81mm t ×1000mm test tube was manufactured, and model hot water of the same water quality as used in Example 1 (flow rate:
2m/sec) to measure Cu over time from the start of water flow.
Changes in the amount of ion elution were investigated. However, the amount of Cu ions eluted was determined by filling each test tube with model hot water during a predetermined measurement period, leaving it for 24 hours, and quantifying the Cu ions eluted into the hot water during this period.
本発明は以上の様に構成されるが、要は銅合金
中に適量のAl及びSnを含有させると共に、酸素
量を著しく制限することによつて、卓越した耐食
性を示す銅合金管を得ることができた。しかもこ
の銅合金管の内面にシリケート皮膜を形成してや
れば、通水初期におけるCuイオンの溶出量も大
幅に低減することができ、輸送配管の寿命を大幅
に延長し得ると共に、配管素材の溶出による水質
劣化の発生を確実に防止し得ることになつた。
The present invention is constructed as described above, but the key point is to obtain a copper alloy tube that exhibits excellent corrosion resistance by containing appropriate amounts of Al and Sn in the copper alloy and by significantly limiting the amount of oxygen. was completed. Furthermore, by forming a silicate film on the inner surface of this copper alloy pipe, the amount of Cu ions eluted during the initial stage of water flow can be significantly reduced, greatly extending the life of the transport piping, and reducing the amount of leaching of the piping material. This made it possible to reliably prevent water quality deterioration.
第1〜5図は何れも実験結果を示すグラフであ
り、第1図は耐孔食性に及ぼすAl量及びSn量の
相互作用、第2図は銅合金中の酸素濃度と孔食数
の関係、第3図は通水期間とCuイオン溶出量の
関係、第4図はシリケート皮膜の厚さとCuイオ
ン溶出量、第5図は溶製物中の残存P量と酸素濃
度の関係を夫々示す。
Figures 1 to 5 are graphs showing the experimental results. Figure 1 is the interaction between the amount of Al and Sn on pitting corrosion resistance, and Figure 2 is the relationship between the oxygen concentration in the copper alloy and the number of pitting corrosion. , Figure 3 shows the relationship between the water flow period and the amount of Cu ions eluted, Figure 4 shows the relationship between the thickness of the silicate film and the amount of Cu ions eluted, and Figure 5 shows the relationship between the amount of residual P in the melt and the oxygen concentration. .
Claims (1)
上:総量で0.005〜0.5% 酸素含有量が100ppm以下に規制され、残部がCu
及び不可避不純物からなる銅合金を管状に成形し
てなることを特徴とする耐食性銅合金管。 2 下記の元素を必須成分として含む他、 Al:0.01〜1.5% Sn:0.03〜2.5% 但し(Al+Sn)≧0.1% P,Mg,B,Mn,及びSiの1種又は2種以
上:総量で0.005〜0.5% 酸素含有量が100ppm以下に規制され、残部がCu
及び不可避不純物からなる銅合金管の内面に、厚
さ10〜100000Åのシリケート皮膜を形成してなる
ことを特徴とする耐食性銅合金管。[Scope of Claims] 1 In addition to containing the following elements as essential components, Al: 0.01 to 1.5% (weight %: the same below) Sn: 0.03 to 2.5%, provided that (Al+Sn) ≧0.1% P, Mg, B, Mn , and one or more types of Si: 0.005 to 0.5% in total. Oxygen content is regulated to 100 ppm or less, and the remainder is Cu.
A corrosion-resistant copper alloy tube, characterized in that it is formed by forming a copper alloy containing unavoidable impurities into a tube shape. 2 In addition to containing the following elements as essential components, Al: 0.01-1.5% Sn: 0.03-2.5% However, (Al+Sn) ≧0.1% One or more of P, Mg, B, Mn, and Si: total amount 0.005~0.5% Oxygen content is regulated to 100ppm or less, and the remainder is Cu.
A corrosion-resistant copper alloy tube characterized in that a silicate film with a thickness of 10 to 100,000 Å is formed on the inner surface of the copper alloy tube consisting of unavoidable impurities.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25830384A JPS61136648A (en) | 1984-12-06 | 1984-12-06 | Corrosion resistant copper alloy pipe |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25830384A JPS61136648A (en) | 1984-12-06 | 1984-12-06 | Corrosion resistant copper alloy pipe |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61136648A JPS61136648A (en) | 1986-06-24 |
| JPS6234821B2 true JPS6234821B2 (en) | 1987-07-29 |
Family
ID=17318380
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25830384A Granted JPS61136648A (en) | 1984-12-06 | 1984-12-06 | Corrosion resistant copper alloy pipe |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61136648A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61221345A (en) * | 1985-03-27 | 1986-10-01 | Sumitomo Light Metal Ind Ltd | Copper alloy material for water or hot water supply piping |
| US20050161129A1 (en) | 2003-10-24 | 2005-07-28 | Hitachi Cable, Ltd. | Cu alloy material, method of manufacturing Cu alloy conductor using the same, Cu alloy conductor obtained by the method, and cable or trolley wire using the Cu alloy conductor |
| JP4497164B2 (en) * | 2007-02-02 | 2010-07-07 | 日立電線株式会社 | Copper alloy conductor and cable using the same |
-
1984
- 1984-12-06 JP JP25830384A patent/JPS61136648A/en active Granted
Non-Patent Citations (2)
| Title |
|---|
| METALS HANDBOOK=1961 * |
| PROCEEDINGS OF THE INTERNATIONAL SYMPOSIUM ON CORROSION OF COPPER AND COPPER ALLOYS IN BUILDING=1982 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61136648A (en) | 1986-06-24 |
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