JPS6235546A - Sealing resin for semiconductor element - Google Patents
Sealing resin for semiconductor elementInfo
- Publication number
- JPS6235546A JPS6235546A JP17448285A JP17448285A JPS6235546A JP S6235546 A JPS6235546 A JP S6235546A JP 17448285 A JP17448285 A JP 17448285A JP 17448285 A JP17448285 A JP 17448285A JP S6235546 A JPS6235546 A JP S6235546A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- semiconductor element
- sealing resin
- metal particles
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、充填剤に凝固時に膨脹する低融点物を配合
し、封止樹脂の総合的な熱膨脹を半導体素子に極めて近
似させるようにした半導体素子用封止樹脂に関するもの
である。[Detailed Description of the Invention] [Field of Industrial Application] This invention combines a low melting point substance that expands during solidification into the filler, so that the overall thermal expansion of the sealing resin is made to closely approximate that of a semiconductor element. The present invention relates to a sealing resin for semiconductor devices.
従来、半導体素子を低圧トランスファ成形法などによっ
て樹脂封止する場合において、無機材料からなる半導体
素子及びリードフレームと有機樹脂との間の熱膨脹係数
の差が大きいため、温度変化により歪みを生じて応力が
発生し、封止素子の信頼性を低下させるばかりでなく、
はなはだしい場合にはクランクを生じ、製造の歩留り低
下を来していた。Conventionally, when semiconductor elements are encapsulated with resin by low-pressure transfer molding, etc., there is a large difference in coefficient of thermal expansion between semiconductor elements and lead frames made of inorganic materials and organic resin, which causes distortion and stress due to temperature changes. This not only reduces the reliability of the sealing element, but also
In severe cases, cranking occurs, resulting in a decrease in manufacturing yield.
特に、エポキシ系樹脂では、通常150〜190℃の範
囲の温度で成形を行うため、成形後常温まで放冷させる
間に、半導体素子に比べて熱膨脹係数数の大きい樹脂が
相対的に熱収縮を起し、その結果、封止された半導体素
子に大きな応力歪みを生じる。この応力歪みは、半導体
素子の特性や信頼性を低下させるばかりでなく、割れや
クランクを生じ、半導体装置を不良にする場合があった
。In particular, since epoxy resins are usually molded at a temperature in the range of 150 to 190°C, the resin, which has a larger thermal expansion coefficient than the semiconductor element, experiences relative thermal contraction during cooling to room temperature after molding. As a result, large stress strains are generated in the encapsulated semiconductor element. This stress strain not only deteriorates the characteristics and reliability of the semiconductor element, but also causes cracks and cranks, which may cause the semiconductor device to be defective.
この応力歪みを減少させるために、従来の半導体素子封
止用樹脂には適当な無機質充填剤が加えられてきた。無
機質充填剤を添加すると、封止樹脂の熱膨脹係数が、そ
の添加量に応じて低下し、半導体素子に近づくという利
点があった。しかし、その添加量には実用的な限界があ
り、十分な熱膨脹の一致が得られず、大きな半導体素子
の封止には改善を要する。In order to reduce this stress strain, appropriate inorganic fillers have been added to conventional resins for encapsulating semiconductor devices. Addition of an inorganic filler has the advantage that the thermal expansion coefficient of the sealing resin decreases in accordance with the amount added and approaches that of a semiconductor element. However, there is a practical limit to the amount added, and sufficient thermal expansion matching cannot be achieved, so improvements are required for sealing large semiconductor devices.
従来の半導体素子用封止樹脂は以上のように構成されて
いるので、半導体素子やリードフレームとの熱膨脹係数
の差が大きく、それを緩和するための充填剤の添加量に
も限界があり、半導体素子に応力歪みを生じ、半導体素
子の特性や信頼性を低下させるばかりでなく、割れやク
ラックをも生じるという問題点があった。Conventional encapsulating resins for semiconductor devices have the above structure, so there is a large difference in coefficient of thermal expansion between them and the semiconductor device and lead frame, and there is a limit to the amount of filler added to alleviate this difference. There is a problem in that stress distortion is generated in the semiconductor element, which not only deteriorates the characteristics and reliability of the semiconductor element, but also causes cracks and cracks.
この発明は、上記のような問題点を解消するた脂を提供
することを目的とする。The object of the present invention is to provide a fat that solves the above-mentioned problems.
この発明に係る半導体素子用封止樹脂は、従来使用され
てきた熱膨脹係数の小さな無機質充填剤の代りに、凝固
時に膨脹する金属粒子を充填剤に用いたものである。The encapsulating resin for semiconductor elements according to the present invention uses metal particles that expand upon solidification as fillers instead of conventionally used inorganic fillers with a small coefficient of thermal expansion.
この発明においては、充填剤として凝固時に膨脹する金
属粒子を用いたことにより、半導体素子やリードフレー
ムと樹脂との熱膨脹がほぼ一致し、半導体素子に応力歪
みが生じなくなる。In this invention, by using metal particles that expand during solidification as a filler, the thermal expansions of the semiconductor element or lead frame and the resin almost match, and stress distortion does not occur in the semiconductor element.
以下、この発明の一実施例を図について説明する。第1
図はこの発明の一実施例による単導体素子用封止樹脂を
示し、図において、1は有機高分子、例えば、エポキシ
樹脂等からなる封止樹脂で、出来るだけガラス転移温度
の高いものが望ましい。An embodiment of the present invention will be described below with reference to the drawings. 1st
The figure shows a sealing resin for a single conductor element according to an embodiment of the present invention. In the figure, 1 is a sealing resin made of an organic polymer, such as an epoxy resin, and preferably has a glass transition temperature as high as possible. .
2は半導体素子3の電気信号等を外部に取りだすための
リード、4は該リード2と上記半導体素子3とを電気的
に接続するための金ワイヤ、11は上記封止樹脂]に配
合した充填剤であり、凝固時に膨脹するような材料によ
って構成される。例えば、ビスマス合金の一部は約3%
凝固時に膨脹するので、これを使用するときは封止樹脂
の見かけ上の熱膨脹を半導体素子材料であるシリコンに
一致させるためには重量比で0.2%程度配合すればよ
い。この程度の配合率であれば、充填剤間の接触による
電気的特性の劣化が認められず、熱応力によるひずみは
著しく低減できる。2 is a lead for taking out electrical signals etc. of the semiconductor element 3 to the outside, 4 is a gold wire for electrically connecting the lead 2 and the semiconductor element 3, and 11 is a filling compounded in the above-mentioned sealing resin. It is made of a material that expands when it solidifies. For example, some bismuth alloys have approximately 3%
Since it expands during solidification, when using it, it is sufficient to add about 0.2% by weight in order to make the apparent thermal expansion of the sealing resin match that of silicon, which is a semiconductor element material. At this level of blending ratio, no deterioration of electrical properties due to contact between fillers is observed, and distortion due to thermal stress can be significantly reduced.
−mに、封止樹脂の成形はトランスファモールド法で実
施される。即ち、予め成形された固形の樹脂タブレット
を加熱し溶融した後、型に圧入し凝固する。この時、ま
ず、樹脂中の有機高分子成分が凝固し、半固体状となる
適当な温度になると、該温度で凝固する選択された充填
剤であって溶融状態で島状に閉じ込められ分散していた
ものが、凝固し、先に凝固している樹脂領域に圧縮応力
を付与する。その後、徐々に冷却していく過程で作用す
る収縮応力(ここでは引張応力として作用す類や、その
添加量によって、目的のものを自由に得ることができる
。-m, molding of the sealing resin is performed by a transfer molding method. That is, a pre-shaped solid resin tablet is heated and melted, then press-fitted into a mold and solidified. At this time, first, when the organic polymer component in the resin solidifies and reaches a suitable temperature at which it becomes a semi-solid, the selected filler, which solidifies at that temperature, becomes trapped and dispersed in a molten state in the form of islands. The resin solidifies and applies compressive stress to the previously solidified resin region. After that, you can freely obtain the desired result by changing the shrinkage stress that acts during the gradual cooling process (here, it acts as tensile stress) and the amount added.
本実施例の樹脂においては、充填剤として凝固時に膨脹
する金属粒子を含んでいるので、温度変化によって生じ
る応力が緩和される。よって、これを用いた半導体装置
は半導体素子に応力歪みを生じず、高歩留り、高信頼度
を有したものとなる。Since the resin of this example contains metal particles that expand during solidification as a filler, stress caused by temperature changes is alleviated. Therefore, a semiconductor device using this device does not cause stress distortion in the semiconductor element, and has a high yield and high reliability.
また、上記実施例では、金属単体の微粒子を用いたが、
電気絶縁性を確保するため、予め、適当な絶縁物で金属
粒子を被覆するとさらに効果を奏する。In addition, in the above example, fine particles of a single metal were used, but
In order to ensure electrical insulation, it is more effective to cover the metal particles with a suitable insulator in advance.
以上のように、この発明によれば、有機樹脂からなる封
止樹脂に凝固時に膨脹する金属粒子を充填剤として添加
したので、封止樹脂の成形時に残留する熱応力を有機樹
脂と充填剤とによって総合的に零にすることができ、非
常に信頼性の高い安価な半導体装置を提供出来る効果が
ある。As described above, according to the present invention, metal particles that expand during solidification are added to the sealing resin made of an organic resin as a filler, so that thermal stress remaining during molding of the sealing resin is absorbed by the organic resin and filler. This has the effect of providing an extremely reliable and inexpensive semiconductor device.
図面は本発明の一実施例による半導体素子対土用樹脂を
用いた半導体装置の断面図である。
1・・・封止樹脂、2・・・リード、3・・・半導体素
子、11・・・充填剤。The drawing is a sectional view of a semiconductor device using a resin for semiconductor elements according to an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Sealing resin, 2... Lead, 3... Semiconductor element, 11... Filler.
Claims (3)
有機樹脂からなることを特徴とする半導体素子用封止樹
脂。(1) A encapsulating resin for semiconductor devices characterized by being made of an organic resin containing metal particles as a filler that expands during solidification.
れたことを特徴とする特許請求の範囲第1項記載の半導
体素子用封止樹脂。(2) The encapsulating resin for semiconductor elements according to claim 1, wherein the metal particles are coated with an organic polymer in advance.
点温度より低いことを特徴とする特許請求の範囲第1項
又は第2項記載の半導体素子用封止樹脂。(3) The encapsulating resin for semiconductor devices according to claim 1 or 2, wherein the metal particles have a melting point lower than the glass transition temperature of the organic resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17448285A JPS6235546A (en) | 1985-08-08 | 1985-08-08 | Sealing resin for semiconductor element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17448285A JPS6235546A (en) | 1985-08-08 | 1985-08-08 | Sealing resin for semiconductor element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6235546A true JPS6235546A (en) | 1987-02-16 |
Family
ID=15979250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17448285A Pending JPS6235546A (en) | 1985-08-08 | 1985-08-08 | Sealing resin for semiconductor element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6235546A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5057903A (en) * | 1989-07-17 | 1991-10-15 | Microelectronics And Computer Technology Corporation | Thermal heat sink encapsulated integrated circuit |
-
1985
- 1985-08-08 JP JP17448285A patent/JPS6235546A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5057903A (en) * | 1989-07-17 | 1991-10-15 | Microelectronics And Computer Technology Corporation | Thermal heat sink encapsulated integrated circuit |
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