JPS6236862Y2 - - Google Patents
Info
- Publication number
- JPS6236862Y2 JPS6236862Y2 JP8510384U JP8510384U JPS6236862Y2 JP S6236862 Y2 JPS6236862 Y2 JP S6236862Y2 JP 8510384 U JP8510384 U JP 8510384U JP 8510384 U JP8510384 U JP 8510384U JP S6236862 Y2 JPS6236862 Y2 JP S6236862Y2
- Authority
- JP
- Japan
- Prior art keywords
- current
- plating
- output
- current transformer
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 55
- 239000000654 additive Substances 0.000 claims description 17
- 230000000996 additive effect Effects 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 7
- 238000009713 electroplating Methods 0.000 claims description 5
- 230000010354 integration Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
Landscapes
- Control Of Non-Electrical Variables (AREA)
- Electroplating Methods And Accessories (AREA)
Description
【考案の詳細な説明】
(産業上の利用分野)
本考案は、電気めつきにおける添加剤の補充を
自動的にすることができる電気めつき用添加剤補
充管理装置に関するものである。[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to an additive replenishment management device for electroplating that can automatically replenish additives in electroplating.
(従来技術)
電気めつきにおいては、めつきの光沢、つきま
わり等を改善するため種々の添加剤をめつき液に
添加するのが常であるが、これらの添加剤は、め
つき処理の経過に伴う通電電流量の増加に比例し
て消費される。(Prior art) In electroplating, various additives are usually added to the plating solution in order to improve the gloss, throw, etc. of the plating, but these additives affect the progress of the plating process. It is consumed in proportion to the increase in the amount of current flowing.
したがつて、同種のめつき槽が複数ある場合、
従来はめつき槽毎のめつき電流を分流器などの電
流検出器で検出し、その出力を直流電流積算計数
器に加え、一定数計数毎に出される出力により定
量移送装置を作動させて一定量の添加剤をめつき
槽に補充しめつき液を管理していたために、めつ
き槽毎に分流器などの電流検出器の出力によつて
作動する直流電流積算計数器、定量移送装置等か
らなる添加剤補充装置を設けてめつき槽毎に添加
剤の補充管理を行うので、複数のめつき槽のめつ
き液を同一組式にすることは困難で、めつきの仕
上りにばらつきを生ずる危険があつた。 Therefore, if there are multiple plating tanks of the same type,
Conventionally, the plating current for each plating tank was detected by a current detector such as a current shunt, and the output was added to a DC current integrating counter, and the output produced every fixed number of counts was used to operate a metering transfer device to transfer a fixed amount. In order to manage the plating solution by replenishing the plating tank with additives, each plating tank is equipped with a DC current integrating counter, quantitative transfer device, etc., which is activated by the output of a current detector such as a shunt. Since an additive replenishment device is installed to manage the replenishment of additives in each plating tank, it is difficult to use the same type of plating solution in multiple plating tanks, and there is a risk of variations in the plating finish. It was hot.
(考案の目的)
本考案は、従来の欠点を解消すべくなされたも
ので、複数のめつき槽のめつき液を同一組成とし
て、めつきの仕上りのばらつきをなくす電気めつ
き用添加剤補充管理装置を提供することにある。(Purpose of the invention) The present invention was made to eliminate the drawbacks of the conventional method.The present invention is an additive replenishment management for electroplating that eliminates variations in plating finish by making the plating liquid in multiple plating tanks the same composition. The goal is to provide equipment.
(考案の構成)
本考案は、複数のめつき槽と単一の調整槽と単
一の循環ポンプとからなるめつき液循環系と、各
めつき槽へ給電する正負極性の給電線の何れか一
方を直流側に貫通する直流変流器と、該直流変流
器の交流側出力を入力とする変流器と該変流器の
出力により前記給電線の夫々に流れる電流の総和
電流を検出する電流検出器と、該電流検出器の出
力を積分して一定数計数毎に出力を出す直流電流
積算計数器と、該直流電流積算計数器の出力によ
り作動され添加剤容器から調整槽へ一定量の添加
剤を移送する定量移送装置とから構成されたこと
を特徴とするものであり、以下、図面により詳細
に説明する。(Structure of the invention) The present invention consists of a plating liquid circulation system consisting of a plurality of plating tanks, a single adjustment tank, and a single circulation pump, and a power supply line with positive and negative polarity that supplies power to each plating tank. A DC current transformer that passes through one side to the DC side, a current transformer whose input is the AC side output of the DC current transformer, and a total current of the current flowing through each of the power supply lines due to the output of the current transformer. A current detector that detects, a DC current integration counter that integrates the output of the current detector and outputs an output every fixed number of counts, and a DC current integration counter that is operated by the output of the DC current integration counter and sends it from the additive container to the adjustment tank. This device is characterized by being comprised of a quantitative transfer device that transfers a fixed amount of additive, and will be explained in detail below with reference to the drawings.
第1図において1…1は同一のめつき種類のめ
つき液2…2を収容する複数のめつき槽である。 In FIG. 1, reference numerals 1...1 indicate a plurality of plating tanks 2...2 containing plating solutions 2...2 of the same type of plating.
該めつき槽1内のめつき液2は、常時循環ポン
プ3により単一の調整槽4のめつき液5を複数の
めつき槽1…1に分流供給し、該めつき槽1…1
の溢流口6…6から前記調整槽4へ流下させる事
により混合し同一組成とする。 The plating liquid 2 in the plating tank 1 is divided into a plurality of plating tanks 1...1 by supplying the plating liquid 5 from a single adjustment tank 4 in a divided manner to a plurality of plating tanks 1...1 by a constant circulation pump 3.
are mixed into the same composition by flowing down from the overflow ports 6...6 into the adjustment tank 4.
又、めつき槽1…1毎に直流電源装置7…7を
持ち、該複数台の直流電源装置7の直流出力を
夫々めつき槽1のめつき液2中に浸漬した陽極板
8および被めつき物9への給電にあたり、正負給
電線10…10,10′…10′の何れか一方を直
流変流器11の直流側に貫通させる。 Furthermore, each plating tank 1 has a DC power supply device 7...7, and the DC output of the plurality of DC power supply devices 7 is applied to the anode plate 8 and the cover immersed in the plating solution 2 of the plating tank 1, respectively. In order to supply power to the plated object 9, one of the positive and negative power supply lines 10...10, 10'...10' is passed through the DC side of the DC transformer 11.
この状態において、夫々のめつき槽1…1に直
流電流を流すと直流変流器11の交流側電流は、
第2図に示す直流変流器の原理図の如く、母線1
2を直流変流器11の直流側を貫通させた状態で
母線12に流れる直流側電流をIo、交流巻線の巻
線回数をNとする交流側電流Iは等アンペアター
ンの法則によつて
I=Io/N
となるので、給電線10に流れる電流を巻数比で
除した電流値となる。 In this state, when a DC current is passed through each plating tank 1...1, the AC side current of the DC current transformer 11 is as follows.
As shown in the principle diagram of a DC current transformer shown in Figure 2, bus 1
2 is passed through the DC side of the DC current transformer 11, and the DC side current flowing to the bus bar 12 is Io, and the number of turns of the AC winding is N. The AC side current I is determined by the law of equal ampere turns. Since I=Io/N, the current value is the current flowing through the power supply line 10 divided by the turns ratio.
このように求めた前記給電線10毎の直流変流
器11の交流側電流を夫々変流器13の入力側に
加える。 The AC side current of the DC current transformer 11 for each of the power supply lines 10 determined in this way is applied to the input side of the current transformer 13, respectively.
14は直流変流器11の交流捲線を附勢する単
相交流電源である。 14 is a single-phase AC power source that energizes the AC winding of the DC current transformer 11.
変流器13の出力電流は、前記の直流変流器の
原理と同様に巻数比で除した電流値となる。 The output current of the current transformer 13 is a current value divided by the turns ratio, similar to the principle of the DC current transformer described above.
ここで、変流器の入力電源がI1、I2…Ioと複数
である場合、その総和電流Ioは
Io=I1+I2…+Io
となるので、夫々の給電線10に流れる電流の総
和電流を直流変流器11と変流器13の巻数比で
除した電流値となる。 Here, if there are multiple input power sources of the current transformer such as I 1 , I 2 ...I o , the total current Io is Io = I 1 + I 2 ... + I o , so the current flowing through each feeder line 10 The current value is obtained by dividing the total current by the turns ratio of the DC current transformer 11 and the current transformer 13.
15は変流器13の出力端子と直列に設けられ
た単相ブリツジ整流器、16該変流器15の直流
端子間に接続された分流器などの総和電流を検出
する電流検出器である。 Reference numeral 15 designates a single-phase bridge rectifier provided in series with the output terminal of the current transformer 13, and 16 a current detector for detecting the total current of a shunt connected between the DC terminals of the current transformer 15.
なお、第2図の直流変流器の原理図では母線1
2の直流電流を直接直流電流計17により求めて
いる。 In addition, in the principle diagram of a DC current transformer in Figure 2, bus 1
The DC current of No. 2 is directly determined by a DC ammeter 17.
18は該電流検出器16の出力を入力とし、積
分して一定積分毎にパルスを出す積分器の出力パ
ルスを計数して、一定数計数毎に出力を発する直
流電流積算計数器である。 Reference numeral 18 denotes a DC current integration counter that receives the output of the current detector 16 as input, integrates it, and outputs a pulse at every predetermined integration, and counts the output pulses of the integrator and outputs an output every predetermined number of counts.
19は容器20から添加剤21を調整槽4に移
送する定量移送装置であつて、該定量移送装置1
9は例えばダイヤフラム式の定量ポンプとタイマ
から構成され、直流電流積算計数器18からの電
気信号が1回加わる毎に定量ポンプを一定時間作
動させて、添加剤を一定量ずつ移送するものであ
る。 Reference numeral 19 denotes a quantitative transfer device for transferring the additive 21 from the container 20 to the adjustment tank 4;
Reference numeral 9 is composed of, for example, a diaphragm-type metering pump and a timer, and each time an electric signal from the DC current integrating counter 18 is applied, the metering pump is operated for a fixed period of time to transfer a fixed amount of additive. .
(考案の効果)
本考案は、以上の説明からも明らかなように、
複数のめつき槽内にあるめつき液は、常時循環ポ
ンプにより調整槽のめつき液を複数のめつき槽に
分流供給し、該めつき槽の溢流口から調整槽へ流
下させる事により混合され同一組成となるので、
めつき槽毎にめつき処理量が異なり光沢、つきま
わり等の改善のため種々添加される添加剤の消費
が異なつても複数のめつき槽のめつき液を同一組
成とすることができる。(Effects of the invention) As is clear from the above explanation, the invention has the following effects:
The plating liquid in multiple plating tanks is supplied by a continuous circulation pump that divides the plating liquid from the adjustment tank to the multiple plating tanks, and allows it to flow down from the overflow port of the plating tank to the adjustment tank. Because they are mixed and have the same composition,
Even if the plating processing amount differs from plating tank to plating tank and the consumption of various additives added to improve gloss, throw, etc. differs, the plating solution in a plurality of plating tanks can have the same composition.
又、めつき槽毎に持つ直流電源装置から前記め
つき槽内のめつき液中に浸漬される陽極板および
被めつき物に給電される電流を直流変流器を介し
て変流器で総和し、電流検出器の出力を直流電流
積算計数器に入力として加え一定数計数毎に発す
る電気信号で定量移送装置から添加剤を一定量ず
つ調整槽に補充され混合されるので、めつき槽毎
に電流検出器の出力によつて作動する直流電流積
算計数器、定量移送装置等からなる添加剤補充装
置を設ける必要がないので設備が簡略化できる。 In addition, the current supplied to the anode plate and the objects to be plated immersed in the plating solution in the plating tank from the DC power supply device provided in each plating tank is passed through a DC current transformer to a current transformer. The output of the current detector is added as an input to the DC current integration counter, and an electric signal is generated every fixed number of counts.The additive is replenished and mixed into the adjustment tank from the quantitative transfer device in fixed amounts, so the plating tank Since there is no need to provide an additive replenishing device consisting of a DC current integration counter, fixed amount transfer device, etc. that is activated by the output of the current detector at each time, the equipment can be simplified.
又、めつき槽に給電する電流が大きい場合、め
つき槽への給電路が短かくできるため工事費およ
び電力損失を軽減することができる。 Furthermore, when the current supplied to the plating tank is large, the power supply path to the plating tank can be shortened, thereby reducing construction costs and power loss.
その上に、複数のめつき槽内のめつき液の組成
を同一に保つことができるので、めつき槽毎の上
りのばらつきがなくなり、品質管理も容易等の多
くの利点を有する。 Furthermore, since the composition of the plating solution in a plurality of plating tanks can be kept the same, there are many advantages such as eliminating variations in the quality of the plating solution from one plating tank to another and facilitating quality control.
第1図は、本考案の一実施例を示すブロツク
図、第2図は直流変流器の原理図である。
1:めつき槽、3:循環ポンプ、4:調整槽、
6:溢流口、8:陽極、9:被めつき物、11:
直流変流器、13:変流器、16:電流検出器、
18:直流電流積算計数器、19:定量移送装
置、20:容器。
FIG. 1 is a block diagram showing an embodiment of the present invention, and FIG. 2 is a diagram showing the principle of a DC current transformer. 1: Plating tank, 3: Circulation pump, 4: Adjustment tank,
6: Overflow port, 8: Anode, 9: Covering object, 11:
DC current transformer, 13: Current transformer, 16: Current detector,
18: DC current integration counter, 19: Fixed amount transfer device, 20: Container.
Claims (1)
るめつき液循環系と、各めつき槽への正負給電線
の何れか一方を直流側に貫通してなる直流変流器
と、該直流変流器の交流側出力を入力とする変流
器と、該変流器の出力より前記給電線の夫々に流
れる電流の総和電流を検出する電流検出器と、該
電流検出器の出力を積分して一定数計数毎に出力
を出す直流電流積算計数器と、該直流電流積算計
数器の出力により作動され容器から調整槽へ一定
量の添加剤を移送する定量移送装置とから構成さ
れたことを特徴とする電気めつき用添加剤補充管
理装置。 A plating liquid circulation system consisting of a plurality of plating tanks, an adjustment tank, and a circulation pump, a DC current transformer formed by passing one of the positive and negative power supply lines to each plating tank to the DC side, and the DC current A current transformer that receives the AC side output of the current transformer, a current detector that detects the sum of the currents flowing through each of the power supply lines from the output of the current transformer, and integrates the output of the current detector. and a metering transfer device that is activated by the output of the DC current integrating counter and transfers a fixed amount of additive from the container to the adjustment tank. An additive replenishment management device for electroplating, which is characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8510384U JPS612459U (en) | 1984-06-07 | 1984-06-07 | Additive replenishment management device for electroplating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8510384U JPS612459U (en) | 1984-06-07 | 1984-06-07 | Additive replenishment management device for electroplating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS612459U JPS612459U (en) | 1986-01-09 |
| JPS6236862Y2 true JPS6236862Y2 (en) | 1987-09-19 |
Family
ID=30635187
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8510384U Granted JPS612459U (en) | 1984-06-07 | 1984-06-07 | Additive replenishment management device for electroplating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS612459U (en) |
-
1984
- 1984-06-07 JP JP8510384U patent/JPS612459U/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS612459U (en) | 1986-01-09 |
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