JPS6237078U - - Google Patents
Info
- Publication number
- JPS6237078U JPS6237078U JP12633885U JP12633885U JPS6237078U JP S6237078 U JPS6237078 U JP S6237078U JP 12633885 U JP12633885 U JP 12633885U JP 12633885 U JP12633885 U JP 12633885U JP S6237078 U JPS6237078 U JP S6237078U
- Authority
- JP
- Japan
- Prior art keywords
- incident angle
- substrate
- view
- holder
- slit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 238000001704 evaporation Methods 0.000 claims description 2
- 230000008020 evaporation Effects 0.000 claims description 2
- 239000000463 material Substances 0.000 claims 1
- 238000007738 vacuum evaporation Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Description
第１図は本考案の一実施例を示す構成図、第２
図ａはスリツトホルダー部の正面図、ｂは同縦断
面図、ｃは入射角収束板の正面図、ｄは同平面図
、第３図ａは本考案においてマスクによりドツト
状電極を形成した場合の断面図、ｂはリセス構造
の電極を形成した場合の断面図、第４図ａは従来
においてマスクによりドツト状電極を形成した場
合の断面図、ｂはリセス構造の電極を形成した場
合の断面図である。
１……真空槽、２……蒸発源（ソース）、３…
…シヤツター板、４……基板ホルダー部、５……
スリツトホルダー部、６……支持部、７……膜厚
モニターヘツド部、８……基板、９……基板加熱
ヒーター、１０……Ｃ―Ａ熱電対、１１……スリ
ツト、１２……入射角収束板。
Fig. 1 is a configuration diagram showing one embodiment of the present invention;
Figure a is a front view of the slit holder, b is a longitudinal sectional view of the same, c is a front view of the incident angle convergence plate, d is a plan view of the same, and Figure 3 a is a dot-shaped electrode formed using a mask in the present invention. Fig. 4a is a cross-sectional view when a dot-shaped electrode is formed using a conventional mask, and b is a cross-sectional view when a recessed electrode is formed. FIG. 1... Vacuum chamber, 2... Evaporation source (source), 3...
...Shutter plate, 4... Board holder part, 5...
Slit holder part, 6...Support part, 7...Film thickness monitor head part, 8...Substrate, 9...Substrate heating heater, 10...C-A thermocouple, 11...Slit, 12...Incidence Corner convergence plate.
Claims (1)
基板に対する蒸発物の入射角を揃える入射角収束
板をスリツトホルダー部に保持させて配設したこ
とを特徴とする真空蒸着装置。 1. A vacuum evaporation apparatus characterized in that an incident angle convergence plate is disposed between an evaporation source inside a vacuum chamber and a substrate holder to align the incident angle of the evaporated material with respect to the substrate, and is held by the slit holder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12633885U JPS6237078U (en) | 1985-08-19 | 1985-08-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12633885U JPS6237078U (en) | 1985-08-19 | 1985-08-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6237078U true JPS6237078U (en) | 1987-03-05 |
Family
ID=31020049
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12633885U Pending JPS6237078U (en) | 1985-08-19 | 1985-08-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6237078U (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59208068A (en) * | 1983-05-13 | 1984-11-26 | Hitachi Ltd | Thin film forming equipment |
-
1985
- 1985-08-19 JP JP12633885U patent/JPS6237078U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59208068A (en) * | 1983-05-13 | 1984-11-26 | Hitachi Ltd | Thin film forming equipment |