JPS6237924U - - Google Patents

Info

Publication number
JPS6237924U
JPS6237924U JP12963785U JP12963785U JPS6237924U JP S6237924 U JPS6237924 U JP S6237924U JP 12963785 U JP12963785 U JP 12963785U JP 12963785 U JP12963785 U JP 12963785U JP S6237924 U JPS6237924 U JP S6237924U
Authority
JP
Japan
Prior art keywords
processing apparatus
vacuum processing
light
reflecting mirror
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12963785U
Other languages
English (en)
Other versions
JPH0526737Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985129637U priority Critical patent/JPH0526737Y2/ja
Publication of JPS6237924U publication Critical patent/JPS6237924U/ja
Application granted granted Critical
Publication of JPH0526737Y2 publication Critical patent/JPH0526737Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Description

【図面の簡単な説明】
第１図は実施例の断面図、第２図は収納室の斜
視図、第３図は光センサを収納した収納室の断面
図、第４図は具体回路例である。 １…チヤンバ、２，３…ガラス窓、４…反射鏡
、５…投光器、６…光センサ。
補正 昭６０．１１．１３ 実用新案登録請求の範囲を次のように補正する
。
【実用新案登録請求の範囲】 (1) 真空処理装置のチヤンバに、透明部材から
なる２つの窓を所定間隔を隔てて設け、前記チヤ
ンバ内に少なくとも一つの反射鏡を設置し、一方
の窓の外に前記反射鏡に向けて光を投光する投光
手段を設け、さらに他方の窓の外に前記反射鏡の
反射光を受光してその受光の強さに応じた信号を
出力する受光手段を設けたことを特徴とする真空
処理装置。 (2) 前記受光手段は真空に排気した収納室に設
けたことを特徴とする実用新案登録請求の範囲第
１項記載の真空処理装置。 (3) 前記受光手段は冷却手段によつて冷却され
ることを特徴とする実用新案登録請求の範囲第１
項または第２項記載の真空処理装置。

Claims (1)

  1. 【実用新案登録請求の範囲】 (1) 真空処理装置のチヤンバに、透明部材から
    なる２つの窓を所定間隔を隔てて設け、前記チヤ
    ンバ内に少なくとも一つの反射鏡を設置し、一方
    の窓の外に前記反射鏡に向けて光を投光する投光
    手段を設け、さらに他方の窓の外に前記反射鏡の
    反射光を受光してその受光の強さに応じた信号を
    出力する受光手段を設けたことを特徴とする真空
    処理装置。 (2) 前記受講手段は真空に排気した収納室に設
    けたことを特徴とする実用新案登録請求の範囲第
    １項記載の真空処理装置。 (3) 前記受光手段は冷却手段によつて冷却され
    ることを特徴とする実用新案登録請求の範囲第１
    項または第２項記載の真空処理装置。
JP1985129637U 1985-08-26 1985-08-26 Expired - Lifetime JPH0526737Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985129637U JPH0526737Y2 (ja) 1985-08-26 1985-08-26

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985129637U JPH0526737Y2 (ja) 1985-08-26 1985-08-26

Publications (2)

Publication Number Publication Date
JPS6237924U true JPS6237924U (ja) 1987-03-06
JPH0526737Y2 JPH0526737Y2 (ja) 1993-07-07

Family

ID=31026382

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985129637U Expired - Lifetime JPH0526737Y2 (ja) 1985-08-26 1985-08-26

Country Status (1)

Country Link
JP (1) JPH0526737Y2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03166718A (ja) * 1989-11-27 1991-07-18 Mitsubishi Electric Corp 化学気相成長装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5353970U (ja) * 1976-10-08 1978-05-09
JPS5878428A (ja) * 1981-11-04 1983-05-12 Toshiba Corp 反応性イオンエツチングソ装置
JPS58131628A (ja) * 1982-01-31 1983-08-05 松下電工株式会社 消弧装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5353970U (ja) * 1976-10-08 1978-05-09
JPS5878428A (ja) * 1981-11-04 1983-05-12 Toshiba Corp 反応性イオンエツチングソ装置
JPS58131628A (ja) * 1982-01-31 1983-08-05 松下電工株式会社 消弧装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03166718A (ja) * 1989-11-27 1991-07-18 Mitsubishi Electric Corp 化学気相成長装置

Also Published As

Publication number Publication date
JPH0526737Y2 (ja) 1993-07-07

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