JPS6244591A - Electroplating method - Google Patents

Electroplating method

Info

Publication number
JPS6244591A
JPS6244591A JP18102785A JP18102785A JPS6244591A JP S6244591 A JPS6244591 A JP S6244591A JP 18102785 A JP18102785 A JP 18102785A JP 18102785 A JP18102785 A JP 18102785A JP S6244591 A JPS6244591 A JP S6244591A
Authority
JP
Japan
Prior art keywords
plating
metal
recovery
tank
electrolytic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18102785A
Other languages
Japanese (ja)
Other versions
JPH0510438B2 (en
Inventor
Kazuhiko Fukamachi
一彦 深町
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP18102785A priority Critical patent/JPS6244591A/en
Publication of JPS6244591A publication Critical patent/JPS6244591A/en
Publication of JPH0510438B2 publication Critical patent/JPH0510438B2/ja
Granted legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To reduce the loss of a metal for plating such as a noble metal by the drag-out of a plating soln. and to save recovering expenses by electrolyzing an electroplated metallic body as the cathode in an electrolyte soln. not contg. a metal for plating. CONSTITUTION:A metallic body electroplated with a noble metal is pulled up from a plating soln. and conveyed to a recovering tank, where the metallic body is electrolyzed as the cathode in an electrolyte soln. not contg. a metal for plating. By this electrolysis, metallic ions remaining in the plating soln. dragged out together with the metallic body is deposited on the metallic body, so plating is carried out in consideration of the thickness of a layer formed by said deposition.

Description

【発明の詳細な説明】 [目的コ 本発明は金属体の電気めっき、特に、金、銀、パラジウ
ム等の貴金属をめっきする電気めっきラインにおいて、
効率的かつ経済的に貴金属の汲み出しによる消耗を低減
させる方法に関するものである。
[Detailed Description of the Invention] [Objective] The present invention is directed to electroplating of metal bodies, particularly in an electroplating line for plating precious metals such as gold, silver, palladium, etc.
The present invention relates to a method for efficiently and economically reducing consumption due to pumping of precious metals.

[従来の技術及び問題点コ 一般に、金、銀、パラジウム等の貴金属めっき製品は外
観が美しいので装飾品として用いられたり、あるいは耐
食性や電気接続性が優れているために、電子・電気部品
などの用途に用いられる。
[Conventional technology and problems] In general, products plated with precious metals such as gold, silver, and palladium are used as decorative items because of their beautiful appearance, or are used as electronic and electrical components due to their excellent corrosion resistance and electrical connectivity. It is used for the following purposes.

被めっき金属体としては、銅や黄銅、りん青銅等の銅合
金、あるいは鉄、鋼(ステンレスなど)、42合金など
の鉄合金等が用いられる。
As the metal body to be plated, copper, brass, copper alloys such as phosphor bronze, iron, steel (stainless steel etc.), iron alloys such as 42 alloy, etc. are used.

めっき方法としては、予め金属条から個々の部品に成形
した後、この部品をバレルめっきやラック方式のめっき
によって被覆するいわゆる後めっき方法があるが、生産
性と経済性から個々の部品に成形する前に金属の条にめ
っきし、それを後に部品に成形することが多くなってい
る。
As a plating method, there is a so-called post-plating method in which metal strips are formed into individual parts in advance and then these parts are coated with barrel plating or rack plating, but from the viewpoint of productivity and economy, forming into individual parts is possible. Increasingly, metal strips are first plated and then formed into parts.

被めっき金属体に貴金属めっきを行う場合、貴金属めっ
き漕でめっきされた金属体は液切りをした(連続条の場
合にはエアーナイフなどで液切りをする)後、次の処理
槽へ搬送される。
When precious metal plating is performed on a metal object to be plated, the metal object plated in the precious metal plating tank is drained (in the case of continuous strips, the liquid is drained with an air knife, etc.), and then transported to the next processing tank. Ru.

被めっき金属体に付着しためっき液に含まれて、めっき
槽外に持ち出される貴金属の消費、すなわち汲み出しに
よる貴金属の消費は例えば上記のエアーナイフ等の液切
りをいくら強化しても1゛分ではない。
The consumption of precious metals contained in the plating solution that adheres to the metal objects to be plated and taken out of the plating tank, that is, the consumption of precious metals due to pumping out, cannot be achieved in just 1 minute, no matter how strong the liquid draining device, such as the air knife mentioned above, is. do not have.

前記のような汲み出し量を低く押えることは、Rfi属
めっきを低コストで行ううえで、非常に重要なa題とな
っている。
Keeping the pumping amount low as described above is a very important issue in performing Rfi metal plating at low cost.

このような問題に対処する一般的な方法としては水洗槽
などの貴金属回収槽を2段以上設置することにより、め
っきされた金属体から、貴金属骨を洗い落し種々の方法
で回収している。
A common method for dealing with such problems is to install two or more stages of precious metal recovery tanks, such as washing tanks, to wash away the precious metal bones from the plated metal body and recover them using various methods.

ところが複数の回収槽をめっき装置、特に連続めっき装
置内に設けることは、設置スペースがかさむばかりでは
なく、回収槽の液から貴金属を回収するためにさらに別
の処理設備で電解回収や、イオン交換樹脂による回収を
行なわなければならない。
However, installing multiple recovery tanks within a plating system, especially a continuous plating system, not only takes up a lot of installation space, but also requires additional processing equipment to perform electrolytic recovery or ion exchange in order to recover precious metals from the liquid in the recovery tank. Recovery with resin must be carried out.

[発明の構成] 本発明は、この点に鑑み金属の電気めっき設備において
、貴金属等のめっき金属の汲み出しによる消費をできる
だけおさえ、かつ効率的なめっきができるように種々の
検討を行った結果、貴金属の電気めっき槽に続いて該め
っき用貴金属等の金属イオンを含有させていない電解質
溶液槽(以下回収電解槽という)を設けこの回収電解槽
中で前記波めっき金属体を陰極として電解することによ
って貴金属等のめっき金属の汲み出しによるロスを低減
させ、回収設備の大幅な簡素化、および回収費用の節減
が可能であることを見い出したものである。
[Structure of the Invention] In view of this point, the present invention has been made as a result of various studies to minimize the consumption of plating metals such as precious metals due to pumping and to enable efficient plating in metal electroplating equipment. Following the precious metal electroplating tank, an electrolyte solution tank (hereinafter referred to as a recovery electrolytic tank) that does not contain metal ions such as the precious metal for plating is provided, and electrolysis is performed in this recovery electrolytic tank with the wave-plated metal body as a cathode. It has been discovered that the loss caused by pumping out plated metals such as precious metals can be reduced, and recovery equipment can be significantly simplified and recovery costs can be reduced.

[発明の詳細な説明コ 電気めっきした材料をめっき槽から前記回収電解槽へ移
動させる時に、めっき液が同時に汲み出され、該めっき
液に入っている貴金属等のめっき金属が回収電解槽の中
に移される。ここでさらに被めっき金属体を陰極として
電解することにより、前記汲み出されためっき液中に残
存するめっき金属が被めっき金属体に析出する。
[Detailed Description of the Invention] When the electroplated material is transferred from the plating tank to the recovery electrolytic tank, the plating solution is simultaneously pumped out, and the plating metals such as precious metals contained in the plating solution are transferred into the recovery electrolytic tank. will be moved to By further electrolyzing the metal body to be plated using the metal body as a cathode, the plating metal remaining in the pumped-out plating solution is deposited on the metal body to be plated.

めっき層の厚みはこの析出を計算に入れて総合的な厚さ
によってめっき処理が施される。
The thickness of the plating layer is determined by taking this precipitation into account and determining the overall thickness of the plating layer.

したがって前記のようなめっき液の汲み出しによるめっ
き金属のロスは著しく減少する。
Therefore, the loss of plating metal caused by pumping out the plating solution as described above is significantly reduced.

電気めっき液から回収電解槽へのめっき液の汲み出しに
より、回収電解槽の電解質溶液の濃度、成分、P H値
などが次第に変っていくので、電気めっき用電解液と回
収電解槽の電解液は同一系統であることが望ましく、め
っきが効果的になされるよう、電解液が適宜選択される
。また、同一系統の回収電解槽中のめっき液のめっき金
J01イオン濃度が高くなった場合には前記めっき液の
補充液として使用することもできる。
As the plating solution is pumped from the electroplating solution to the recovery electrolytic tank, the concentration, components, PH value, etc. of the electrolyte solution in the recovery electrolytic tank gradually change. It is desirable that they be of the same type, and the electrolytic solution is appropriately selected so that plating can be performed effectively. Furthermore, when the plating gold J01 ion concentration of the plating solution in the recovery electrolytic cell of the same system becomes high, it can also be used as a replenisher for the plating solution.

本発明において、「めっき金属を含有させていない電解
質溶液」とは、このようなめっき液の汲み出しによって
回収電解槽に必然的に入ってくるめっき金属は除外され
、当然汲み出しによってめっき液に含まれるめっき金属
が混入する回収電解槽の電解質溶液については、本願発
明の上記「めっき金属を含有されていない電解質溶液」
に包含されるものである。
In the present invention, "an electrolyte solution that does not contain plating metal" refers to the plating metal that inevitably enters the recovery electrolytic tank when the plating solution is pumped out, and excludes the plating metal that is naturally included in the plating solution when the plating solution is pumped out. Regarding the electrolyte solution in the recovery electrolytic tank in which plated metal is mixed, the above-mentioned "electrolyte solution that does not contain plated metal" of the present invention
It is included in.

金属条に連続的に電気めっきする場合には、前述によう
にエアーナイフを使用してもめっき液の汲み出しを充分
に防止できないので、本発明の回収電解槽を設けて、め
っき液のロスを防止することは極めて有効である。
When continuously electroplating metal strips, even if an air knife is used as described above, pumping out of the plating solution cannot be sufficiently prevented, so the recovery electrolytic tank of the present invention is provided to prevent loss of the plating solution. Prevention is extremely effective.

また一般に貴金属めっきを施す場合には、高価であるた
め、金属条の全面にめっきが施されることはむしろ希で
あり、片面、ストライプあるいはスボッ1−等の部分め
っきが主なめっき方法となっている。部分めっきの場合
には部分めっきのための付帯設備を必要とするので回収
電解槽も部分めっき槽と同一構造とすることが適当であ
る。
In addition, in general, when plating precious metals, it is expensive, so it is rather rare that the entire surface of the metal strip is plated, and the main plating method is partial plating, such as single-sided, stripe, or spot plating. ing. In the case of partial plating, since additional equipment for partial plating is required, it is appropriate that the recovery electrolytic tank has the same structure as the partial plating tank.

本発明のめっき用電解液と電解回収槽によるめっきの収
率の向上のための電解液の例を示すと次の通りである。
Examples of the electrolytic solution for plating and the electrolytic solution for improving the plating yield using the electrolytic recovery tank of the present invention are as follows.

めっき用  電解回収用 電解液 電解液 (1)銀めっき シアン化銀      80〜130 g / Qシア
ン化カリウム   90〜140 g / Q 40〜
80g/El炭ajj ’J ウA      40−
113g/Q30−50g/ Q水酸化カリウ1120
〜’IOg/Q (2)金めつき シアン化金カリウム  l〜1.2gIQシアン化カリ
ウム   10〜40g/Q  1.0〜40g/Qり
ん酸2ナトリウム  10〜40g、l  10〜40
gIQ(3)金、銀合金めっき シアン化金カリウム  6〜48g/ffシアン化銀カ
リウム  0.1〜25g/Qシアン化カリウ1110
〜200g/QIO〜200 g/ Qチタニウム化合
物   0.05〜5gIQ0.05〜5g/Qセレニ
ウム化合物   3g/Q以ド 3g/Q以丁(4)白
金めっき 塩化白金酸      2〜6gIQ りん酸アンモニウム  15〜25g/Q15〜25g
/Qりん酸ナトリウム   80〜120g/lio〜
120 g / Q(5)パラジウムめっき 塩化第1パラジウム  2〜5g/Q 第2りん酸ナトリウム 80〜120g/Q80〜12
0g/Q第2りん酸アンモニウム15〜25g/Q15
〜25gIQ安息香酸       2〜 :1g/1
22〜3g/Qこの様に、′電解回収用の電解液は、基
本的には、金、銀等のめっき金属イオンを添加しない点
を除けばめっき液と同等の組成であり、前述しためっき
以外にも本発明が適用できることはいうまでもない。
Electrolytic solution for electrolytic recovery for plating Electrolytic solution (1) Silver plating silver cyanide 80-130 g / Q Potassium cyanide 90-140 g / Q 40-
80g/El charcoal ajj 'J uA 40-
113g/Q30-50g/Q Potassium Hydroxide 1120
~'IOg/Q (2) Gold-plated gold potassium cyanide l~1.2gIQ potassium cyanide 10~40g/Q 1.0~40g/Q Disodium phosphate 10~40g, l 10~40
gIQ (3) Gold, silver alloy plating Potassium gold cyanide 6-48g/ff Potassium silver cyanide 0.1-25g/Q Potassium cyanide 1110
~200g/QIO~200g/Q Titanium compound 0.05~5gIQ0.05~5g/Q Selenium compound 3g/Q or more 3g/Q (4) Platinum plating Chloroplatinic acid 2~6gIQ Ammonium phosphate 15~ 25g/Q15~25g
/Q Sodium phosphate 80~120g/lio~
120 g/Q (5) Palladium plated palladium chloride 2-5 g/Q Sodium phosphate dibasic 80-120 g/Q80-12
0g/Q diammonium phosphate 15-25g/Q15
~25gIQ benzoic acid 2~: 1g/1
22~3g/Q In this way, the electrolytic solution for electrolytic recovery basically has the same composition as the plating solution except that no plating metal ions such as gold or silver are added, and it is It goes without saying that the present invention can be applied to other cases as well.

以下に実施例を用いて本発明の効果を具体的に示す。The effects of the present invention will be specifically illustrated below using Examples.

[実施例および比較例コ 板厚0.2nwn、板幅GOntnのりん青銅条に連続
的に金ス1〜ライブめっきを行なった。めっき幅は5■
でス1−ライブは1本である。条は金めっき槽の出[■
でエアナイフにより、金めつき液を液切りされた後回収
桔に搬送される。その際、回収槽で、純水浸漬処理した
場合(比較例)と、′電解回収した場合(本発明例)に
ついて、回収槽内の全濃度の変化を第1表に示す。
[Examples and Comparative Examples] A phosphor bronze strip having a plate thickness of 0.2 nwn and a plate width of GOntn was continuously plated with gold plate 1 to live. Plating width is 5■
There is only one live performance. The strips are from the gold plating tank [■
After the gold plating solution is drained off using an air knife, it is transported to a collection box. At that time, Table 1 shows the changes in the total concentration in the recovery tank for the case of immersion treatment in pure water in the recovery tank (comparative example) and the case of electrolytic recovery (example of the present invention).

尚、めっき条件は以下に示す通りである。In addition, the plating conditions are as shown below.

めっき条件: (1)通板速度       10m/m1n(2)金
めっき液 シアン化金カリウム   12g/Q くえん酸カリウム   125 g / Q酒石酸アン
チモニルカリ  1g/Q EDTAコバル1−塩    3g/Q(3)電祭′回
収用電解液 くえん酸カリウム   125g/Q 酒石酸アンチモニルカリ  1g/Q E L) T A ]パルh Jlj、     3 
g / Q(4)回収槽液量      50Q (純水tl漬、電解回収共) (5)電解回収電流密度 0.5A/dm2 以下余白 第1表 数値は回収液の全濃度(g/ Q )を示す第1表に示
されるように、X′l!、解回収槽にて金が電解回収さ
れ、全濃度が一定値以上にならないことが確認された。
Plating conditions: (1) Threading speed 10m/m1n (2) Gold plating solution Potassium gold cyanide 12g/Q Potassium citrate 125g/Q Potassium antimonyl tartrate 1g/Q EDTA Kobal 1-salt 3g/Q (3) Electrolyte for electrolyte recovery Potassium citrate 125g/Q Potassium antimonyl tartrate 1g/Q E L) T A ] Pal h Jlj, 3
g / Q (4) Recovery tank liquid volume 50Q (for both pure water TL immersion and electrolytic recovery) (5) Electrolytic recovery current density 0.5 A/dm2 The figures in Table 1 in the margin below are the total concentration of the recovered liquid (g/Q) As shown in Table 1 showing X′l! It was confirmed that gold was electrolytically recovered in the decomposition and recovery tank, and that the total concentration did not exceed a certain value.

さらにこの結果金の汲み出しによるロスは、純水浸漬式
の回収槽(回分式向流水洗槽)を3段設置した場合と、
電解回収槽1段と純水浸漬式の回収槽1段を組み合わせ
2段にした場合とでほぼ同等であることが確認された。
Furthermore, as a result, the loss caused by pumping out gold can be reduced by installing three stages of pure water immersion type recovery tanks (batch type countercurrent washing tank).
It was confirmed that the results were almost equivalent to a case where one stage of electrolytic recovery tank and one stage of pure water immersion type recovery tank were combined to form two stages.

Claims (3)

【特許請求の範囲】[Claims] (1)金属体の電気めっきにおいて、電気めっき後、め
っき金属を含有させていない電解質溶液中で前記被めっ
き金属体を陰極として電解することを特徴とする電気め
っき方法。
(1) An electroplating method for electroplating a metal body, which comprises electrolyzing the metal body to be plated as a cathode in an electrolyte solution that does not contain a plating metal after electroplating.
(2)めっき金属を含有しない、前記電気めっき用電解
液と同系統の電解質溶液を中で電解する前記特許請求の
範囲第1項記載の電気めっき方法。
(2) The electroplating method according to claim 1, wherein electrolysis is carried out in an electrolytic solution of the same type as the electrolytic solution for electroplating, which does not contain a plating metal.
(3)金属条に連続的に電気めっきする前記特許請求の
範囲第1項又は第2項記載の電気めっき方法。
(3) The electroplating method according to claim 1 or 2, wherein a metal strip is continuously electroplated.
JP18102785A 1985-08-20 1985-08-20 Electroplating method Granted JPS6244591A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18102785A JPS6244591A (en) 1985-08-20 1985-08-20 Electroplating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18102785A JPS6244591A (en) 1985-08-20 1985-08-20 Electroplating method

Publications (2)

Publication Number Publication Date
JPS6244591A true JPS6244591A (en) 1987-02-26
JPH0510438B2 JPH0510438B2 (en) 1993-02-09

Family

ID=16093485

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18102785A Granted JPS6244591A (en) 1985-08-20 1985-08-20 Electroplating method

Country Status (1)

Country Link
JP (1) JPS6244591A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57152489A (en) * 1981-03-13 1982-09-20 Furukawa Electric Co Ltd:The Manufacture of silver plated iron and iron alloy
JPS596393A (en) * 1982-07-01 1984-01-13 Nippon Kokan Kk <Nkk> Manufacturing method of tin-plated steel plate for welded cans
JPS59145793A (en) * 1983-02-08 1984-08-21 Toppan Printing Co Ltd Partial silver plating method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57152489A (en) * 1981-03-13 1982-09-20 Furukawa Electric Co Ltd:The Manufacture of silver plated iron and iron alloy
JPS596393A (en) * 1982-07-01 1984-01-13 Nippon Kokan Kk <Nkk> Manufacturing method of tin-plated steel plate for welded cans
JPS59145793A (en) * 1983-02-08 1984-08-21 Toppan Printing Co Ltd Partial silver plating method

Also Published As

Publication number Publication date
JPH0510438B2 (en) 1993-02-09

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