JPS6249231U - - Google Patents
Info
- Publication number
- JPS6249231U JPS6249231U JP14114985U JP14114985U JPS6249231U JP S6249231 U JPS6249231 U JP S6249231U JP 14114985 U JP14114985 U JP 14114985U JP 14114985 U JP14114985 U JP 14114985U JP S6249231 U JPS6249231 U JP S6249231U
- Authority
- JP
- Japan
- Prior art keywords
- outlet
- inert gas
- constant temperature
- gas inlet
- utility
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Packages (AREA)
Description
第１図は従来のこの種槽の例を示す略線的斜視
図、第２図は本考案の一実施例を示す斜視図、第
３図は小容器の例を示す斜視図、第４図及び第５
図は使用状態の例を示す図である。 ２……引き出し、７……扉、８……小容器、１
０……恒温槽、１５，１６……不活性ガスの導入
口及び排出口、２５……入口、２６……出口。
図、第２図は本考案の一実施例を示す斜視図、第
３図は小容器の例を示す斜視図、第４図及び第５
図は使用状態の例を示す図である。 ２……引き出し、７……扉、８……小容器、１
０……恒温槽、１５，１６……不活性ガスの導入
口及び排出口、２５……入口、２６……出口。
Claims (1)
- 不活性ガスの導入口と排出口とを具備した出し
入れ自由の複数の小容器で構成されたことを特徴
とする恒温槽。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14114985U JPS6249231U (ja) | 1985-09-14 | 1985-09-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14114985U JPS6249231U (ja) | 1985-09-14 | 1985-09-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6249231U true JPS6249231U (ja) | 1987-03-26 |
Family
ID=31048669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14114985U Pending JPS6249231U (ja) | 1985-09-14 | 1985-09-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6249231U (ja) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS485323U (ja) * | 1972-04-25 | 1973-01-22 | ||
| JPS5691436A (en) * | 1979-12-26 | 1981-07-24 | Fujitsu Ltd | Method for heating semiconductor substrate |
| JPS5691425A (en) * | 1979-12-25 | 1981-07-24 | Seiko Epson Corp | Resist heat treatment device |
| JPS5726433A (en) * | 1980-07-23 | 1982-02-12 | Hitachi Ltd | Bake of photoresist or the like and apparatus therefor |
-
1985
- 1985-09-14 JP JP14114985U patent/JPS6249231U/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS485323U (ja) * | 1972-04-25 | 1973-01-22 | ||
| JPS5691425A (en) * | 1979-12-25 | 1981-07-24 | Seiko Epson Corp | Resist heat treatment device |
| JPS5691436A (en) * | 1979-12-26 | 1981-07-24 | Fujitsu Ltd | Method for heating semiconductor substrate |
| JPS5726433A (en) * | 1980-07-23 | 1982-02-12 | Hitachi Ltd | Bake of photoresist or the like and apparatus therefor |