JPS6249652B2 - - Google Patents
Info
- Publication number
- JPS6249652B2 JPS6249652B2 JP2431381A JP2431381A JPS6249652B2 JP S6249652 B2 JPS6249652 B2 JP S6249652B2 JP 2431381 A JP2431381 A JP 2431381A JP 2431381 A JP2431381 A JP 2431381A JP S6249652 B2 JPS6249652 B2 JP S6249652B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- thin film
- magnetic thin
- magnetic head
- gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 83
- 238000000034 method Methods 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 239000000696 magnetic material Substances 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 6
- 239000011162 core material Substances 0.000 description 22
- 230000004907 flux Effects 0.000 description 13
- 238000005520 cutting process Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000000427 thin-film deposition Methods 0.000 description 3
- 229910000859 α-Fe Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Description
【発明の詳細な説明】
本発明は磁性薄膜を用いたVTR用薄膜磁気ヘ
ツド及びその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a thin film magnetic head for a VTR using a magnetic thin film and a method for manufacturing the same.
VTR用磁気ヘツドは記録の高密度化に対処す
るため狭ギヤツプ長、狭トラツク幅、高保磁力テ
ープ対応等が要求されており、これに適したヘツ
ドコア材料としてセンダスト、パーマロイ等の強
磁性金属の磁性薄膜を用いた磁気ヘツドが種々提
案されている。 Magnetic heads for VTRs are required to have narrow gap lengths, narrow track widths, and support for high coercive force tapes in order to cope with higher recording densities. Various magnetic heads using thin films have been proposed.
この磁気ヘツドのギヤツプ形成法の一つは、従
来のフエライトヘツド等における製法と異なるも
ので、量産時の歩留りを左右していたコア半体ど
うしの突合せボンデイング工程を不要とし薄膜形
成技術により高精度ギヤツプを実現するものであ
る。第１図を用いてこれを説明すると、非磁性材
料からなる基板１表面の一半部上に平面度の良い
端面２ａを有する第１の磁性薄膜２を被着させ、
次にこれらの上に非磁性薄膜３を被着させ、最後
に基板の他半部上に前記非磁性薄膜３を挟んで第
２の磁性薄膜４を被着させたものである。磁気ヘ
ツドコアとなる第１及び第２の磁性薄膜２，４は
端面２ａにおいて互いに対向し磁気作動ギヤツプ
を形成し、ギヤツプ長は挟み込んだ非磁性薄膜３
で規制される。このような磁気ヘツドのギヤツプ
形成法によれば、突合せボンデイング法に比較
し、薄膜形成技術の利点を生かし、狭ギヤツプ、
狭トラツクヘツドを高精度に、かつ、原理的にト
ラツクずれをおこさずに実現でき有効である。上
記述べたギヤツプ形成法を従来法と区別して以下
ボンデイングレス法とよぶ。 One of the gap forming methods for this magnetic head is different from the manufacturing method for conventional ferrite heads, etc., and eliminates the butt bonding process of core halves, which affected yields during mass production, and achieves high precision using thin film forming technology. This is to realize the gap. To explain this using FIG. 1, a first magnetic thin film 2 having an end surface 2a with good flatness is deposited on a half part of the surface of a substrate 1 made of a non-magnetic material,
Next, a non-magnetic thin film 3 is deposited on these, and finally a second magnetic thin film 4 is deposited on the other half of the substrate with the non-magnetic thin film 3 interposed therebetween. The first and second magnetic thin films 2 and 4, which form the magnetic head core, face each other at the end surface 2a to form a magnetically actuated gap, and the gap length is determined by the sandwiched nonmagnetic thin film 3.
regulated by. This magnetic head gap formation method takes advantage of thin film formation technology compared to the butt bonding method, and can form narrow gaps.
It is effective because a narrow track head can be realized with high precision and, in principle, without causing track deviation. The gap forming method described above is hereinafter referred to as the bonding ingress method to distinguish it from the conventional method.
さて、従来のVTR用フエライトヘツドの如く
狭トラツク加工を施し、ギヤツプ近傍のコア幅を
絞つたいわゆる磁束絞り形状を有する磁気ヘツド
は、記録再生効率の点で優れており、これは、磁
性薄膜を用いたボンデイングレス磁気ヘツドの場
合も同様である。ボンデイングレス薄膜磁気ヘツ
ドにおいて、磁束絞り形状を得る従来例を第２図
に示した。すなわち、最終的に得られる磁気ヘツ
ドコアのギヤツプ位置近傍に対応する部分に凸形
の突起部１ａを有する非磁性材料からなる基板
１′を準備し、該基板１′の凹形の部分１ｂに前記
突起部１ａと同一高さになるまで、補助用磁性薄
膜５を埋込み被着させて磁束絞り付き基板６と
し、該磁束絞り付き基板６上に、第１図に述べた
構造の第１の磁性薄膜２、非磁性薄膜３、第２の
磁性薄膜４を被着させて、薄膜磁気ヘツドコアを
形成するものである。この場合、前記突起部１ａ
において、磁気ヘツドコアの絞り形状が実現され
る。 Now, a magnetic head that has a so-called magnetic flux constriction shape, which has a narrow track processed and narrowed the core width near the gap, like the conventional ferrite head for VTRs, is excellent in terms of recording and reproducing efficiency. The same holds true for the bondingless magnetic head used. A conventional example of obtaining a magnetic flux constriction shape in a bondingless thin film magnetic head is shown in FIG. That is, a substrate 1' made of a non-magnetic material having a convex protrusion 1a in a portion corresponding to the gap position of the finally obtained magnetic head core is prepared, and the concave portion 1b of the substrate 1' is An auxiliary magnetic thin film 5 is embedded and deposited to the same height as the projection 1a to form a substrate 6 with a magnetic flux constrictor, and a first magnetic film having the structure shown in FIG. 1 is placed on the substrate 6 with a magnetic flux constrictor. A thin film magnetic head core is formed by depositing a thin film 2, a nonmagnetic thin film 3, and a second magnetic thin film 4. In this case, the protrusion 1a
In this step, the aperture shape of the magnetic head core is realized.
次にコア絞り形状を得る薄膜磁気ヘツドの他の
従来例を第３図に示した。これは、第１図で述べ
た薄膜磁気ヘツドコアを形成した後、ヘツドコア
面上でギヤツプ位置に凹形の切欠部５ａを有する
補助用磁性薄膜５′を被着させたもので、前記切
欠部５ａにおいて、磁気ヘツドコアの絞り形状が
実現される。 Next, FIG. 3 shows another conventional example of a thin film magnetic head that obtains a core aperture shape. After the thin film magnetic head core described in FIG. 1 is formed, an auxiliary magnetic thin film 5' having a concave notch 5a at the gap position is deposited on the surface of the head core. In this step, the aperture shape of the magnetic head core is realized.
以上の第２図、第３図で述べたコア絞り付き薄
膜磁気ヘツドは、記録電流の低減と再生感度の向
上がはかられるものの、製造工程の中で磁束絞り
形状を得るために要する工程が、複雑であるとい
う欠点を有していた。具体的に述べると、第２図
の場合、基板に突起部１ａを形成する加工工程に
於て一般に基板材料として、耐摩耗性の観点から
高硬度材が用いられており、その高精度の加工は
必ずしも容易でない。また、第３図の場合、補助
用磁性薄膜５′に切欠部５ａを形成する加工工程
を要する。さらに共通の欠点として、補助用磁性
薄膜５，５′も含めて、磁性薄膜の被着工程が最
低３回と、これらに付随した切削、研摩等の薄膜
加工工程が必要であり、全体的にみて工程数が多
く、ボンデイングレス薄膜磁気ヘツドの量産性の
面に関して、まだ改善すべき問題が残つていた。 Although the thin-film magnetic head with a core aperture described in FIGS. 2 and 3 above reduces recording current and improves playback sensitivity, there are many steps required to obtain the magnetic flux aperture shape during the manufacturing process. , which had the disadvantage of being complex. Specifically, in the case of Fig. 2, a high-hardness material is generally used as the substrate material from the viewpoint of wear resistance in the processing process of forming the protrusion 1a on the substrate, and its high-precision processing is required. is not necessarily easy. Further, in the case of FIG. 3, a processing step is required to form a notch 5a in the auxiliary magnetic thin film 5'. Furthermore, a common drawback is that, including the auxiliary magnetic thin films 5 and 5', the magnetic thin film deposition process is required at least three times, and accompanying thin film processing processes such as cutting and polishing are required. However, there were still problems that needed to be improved regarding the mass production of bonding-less thin-film magnetic heads.
本発明の目的は、上記した従来の薄膜磁気ヘツ
ドの欠点をなくし、量産性に優れた薄膜磁気ヘツ
ドの構造及びその製造方法を提供することであ
る。 SUMMARY OF THE INVENTION An object of the present invention is to eliminate the above-described drawbacks of the conventional thin film magnetic head and to provide a structure of a thin film magnetic head and a method for manufacturing the same which can be easily mass-produced.
上記目的を達成するため本発明では、磁性薄膜
被着工程、及びこれに付随する薄膜加工工程を
各々２回行うだけで、磁束絞り形状を有する薄膜
磁気ヘツドを実現できるよう、その磁路構造を最
適化し、かつ具体的に量産性に優れた薄膜加工法
を採用したことに特徴がある。 In order to achieve the above object, the present invention has developed a magnetic path structure so that a thin film magnetic head having a magnetic flux constriction shape can be realized by performing the magnetic thin film deposition process and the accompanying thin film processing process twice each. It is characterized by the adoption of a thin film processing method that has been optimized and has excellent mass productivity.
次に本発明の実施例を図面を用いて詳細に説明
する。第１３図は本発明による薄膜磁気ヘツドの
完成斜視図であるが、その構造と製造方法に関し
て理解を容易にするため、第４図〜第１２図に示
す製造工程の図面に従い説明する。 Next, embodiments of the present invention will be described in detail using the drawings. FIG. 13 is a completed perspective view of the thin film magnetic head according to the present invention, and in order to facilitate understanding of its structure and manufacturing method, explanation will be given according to the drawings of the manufacturing process shown in FIGS. 4 to 12.
第４図は、表面を研摩した非磁性材料からなる
基板１０である。非磁性材料としては、後述する
磁性薄膜の熱膨張係数と近い特性を有し、耐摩耗
性の良いセラミツク材料、例えば非磁性フエライ
トやガラス系材料が用いられる。第５図は、前記
基板１０上に磁気ヘツドコア材となる第１の磁性
薄膜１１をスパツタや蒸着の技術により被着させ
る工程である。磁性薄膜１１の材料としてはセン
ダストやパーマロイ等の高飽和磁束密度、高透磁
率を有する金属材料を用いることができる。第６
図は、前記第１の磁性薄膜１１にその深さが少な
くとも前記基板１０面に達する断面がＶ字状の溝
部１２を形成する工程である。該第１の溝部１２
を形成する位置は最終的に得られる磁気ヘツドコ
アのギヤツプ位置に対応し、該溝部１２の一方の
内面１２ａが最終的にギヤツプ面となるものであ
り、この面の平面度および粗さは、高精度の鏡面
仕上げが要求される。該溝部１２形成法を具体的
に検討した結果、ダイヤモンド等の高硬質バイト
による切削加工法が被切削面の状態がきわめて良
好で、かつ、溝部の先端がシヤープに形成でき、
また高硬質バイトの刃先の角度を制御することに
より、任意のアジマス角度を実現できることから
有効な方法であることを見出した。かくして、該
溝部１２を挟んで、一方の側の磁性薄膜が最終的
に得られる磁気ヘツドコアの一半部の主磁路１１
ａとなり、他方の側が他半部の補助磁路１１ｂと
なるものである。第７図は、前記第１の磁性薄膜
１１の表面上及び前記第１の溝部１２内面上に連
続してSiO2等の非磁性薄膜１３をスパツタ等に
より被着させる工程である。このうち、前記第１
の溝部１２の一方の内面１２ａ、すなわち、前記
第１の磁性薄膜１１の主磁路１１ａ側の端面に被
着される非磁性薄膜１３の膜厚が、最終的に得ら
れる。磁気ヘツドコアの磁気作動ギヤツプ長とな
る。第８図は、前記非磁性薄膜１３の表面上に、
前記第１の磁性薄膜１１の形状に対応して、前記
磁性薄膜１１と同様の第２の磁性薄膜１４をスパ
ツタ、蒸着等により被着させる工程である。第９
図は、前記第２の磁性薄膜１４にその深さが少な
くとも前記第１の磁性薄膜１１の主磁路１１ａ側
の表面に達する断面がＵ字状の第２の溝部１５を
形成する工程である。該第２の溝部１５を形成す
る位置は、最終的に得られる磁気ヘツドコアのギ
ヤツプ位置、すなわち、前記第１の磁性薄膜１１
の主磁路１１ａ側の端面位置とする。また該第２
の溝部１５は、磁束絞り作用を与えるとともに、
その底面１５ａは最終的に磁気ヘツドコアの有効
トラツク幅を規制するものであり、その深さ精度
と面粗さは良好に形成せねばならない。 FIG. 4 shows a substrate 10 made of a nonmagnetic material with a polished surface. As the non-magnetic material, a ceramic material having a coefficient of thermal expansion close to that of a magnetic thin film described later and having good wear resistance, such as a non-magnetic ferrite or a glass-based material, is used. FIG. 5 shows a step of depositing a first magnetic thin film 11, which will become a magnetic head core material, on the substrate 10 by sputtering or vapor deposition techniques. As the material of the magnetic thin film 11, a metal material having high saturation magnetic flux density and high magnetic permeability, such as sendust or permalloy, can be used. 6th
The figure shows a step of forming a groove 12 having a V-shaped cross section and a depth reaching at least the surface of the substrate 10 in the first magnetic thin film 11. The first groove portion 12
The position where the groove 12 is formed corresponds to the gap position of the finally obtained magnetic head core, and one inner surface 12a of the groove 12 ultimately becomes the gap surface, and the flatness and roughness of this surface are high. Accurate mirror finish is required. As a result of specifically examining the method of forming the groove 12, we found that the cutting method using a high-hardness cutting tool such as a diamond produces an extremely good condition of the surface to be cut, and the tip of the groove can be formed sharply.
We also found that this method is effective because any azimuth angle can be achieved by controlling the angle of the cutting edge of the highly hard cutting tool. In this way, the main magnetic path 11 of the half of the magnetic head core from which the magnetic thin film on one side is finally obtained, with the groove portion 12 in between.
a, and the other side becomes the auxiliary magnetic path 11b of the other half. FIG. 7 shows a step of continuously depositing a non-magnetic thin film 13 such as SiO 2 on the surface of the first magnetic thin film 11 and the inner surface of the first groove 12 by sputtering or the like. Of these, the first
The thickness of the non-magnetic thin film 13 deposited on one inner surface 12a of the groove portion 12, that is, the end face of the first magnetic thin film 11 on the side of the main magnetic path 11a, is finally obtained. This is the magnetic actuation gap length of the magnetic head core. FIG. 8 shows that on the surface of the non-magnetic thin film 13,
This is a step of depositing a second magnetic thin film 14 similar to the magnetic thin film 11 by sputtering, vapor deposition, etc. in accordance with the shape of the first magnetic thin film 11. 9th
The figure shows a step of forming a second groove portion 15 having a U-shaped cross section in the second magnetic thin film 14, the depth of which reaches at least the surface of the first magnetic thin film 11 on the main magnetic path 11a side. . The position where the second groove portion 15 is formed is the gap position of the finally obtained magnetic head core, that is, the position where the second magnetic thin film 11 is formed.
This is the end face position on the main magnetic path 11a side. Also, the second
The groove portion 15 provides a magnetic flux throttling effect, and
The bottom surface 15a ultimately controls the effective track width of the magnetic head core, and must be formed with good depth accuracy and surface roughness.
該第２の溝部１４を形成する具体的な方法とし
て、前記第３図に示した工程に比べたのと同様に
ダイヤモンド等の高硬質バイトによる切削加工法
により良好な被切削面が得られ、有効な方法であ
ることを見出した。かくして、該第２の溝部１５
を挟んで第２の磁性薄膜１４の一方の側が最終的
に得られる磁気ヘツドコアの一半部の補助磁路１
４ｂとなり、他方の側が他半部の主磁路１４ａを
形成した。これにより、前記第１及び第２の磁性
薄膜１１，１４の各主磁路１１ａ，１４ａは、前
記第１の溝部１２の一方の内面１２ａに於て前記
非磁性薄膜１３を挟み、互いに対向する端面間に
於て磁気作動ギヤツプを形成し、前記各主磁路１
１ａ，１４ａは、ギヤツプ位置を除く部分に反対
称の配置に前記第１及び第２の磁性薄膜１１，１
４からなる各補助磁路１１ｂ，１４ｂを随伴して
おり、磁束絞り形状を有する薄膜磁気ヘツドコア
を実現させた。 As a specific method for forming the second groove portion 14, a good surface to be cut is obtained by a cutting method using a high-hardness cutting tool such as a diamond, similar to the process shown in FIG. We found this to be an effective method. Thus, the second groove portion 15
One side of the second magnetic thin film 14 with the auxiliary magnetic path 1 of the half of the magnetic head core finally obtained
4b, and the other side formed the main magnetic path 14a of the other half. As a result, the main magnetic paths 11a and 14a of the first and second magnetic thin films 11 and 14 face each other with the non-magnetic thin film 13 sandwiched between them on one inner surface 12a of the first groove portion 12. A magnetically actuated gap is formed between the end faces, and each of the main magnetic paths 1
1a, 14a are the first and second magnetic thin films 11, 1 arranged antisymmetrically in the portion excluding the gap position.
A thin film magnetic head core having a magnetic flux constriction shape has been realized.
第１０図は、この磁気ヘツドコアの表面に非磁
性材１６を被覆する工程である。非磁性材として
は、少なくとも前記磁性薄膜１１，１４より高硬
度で耐摩耗性の優れた材料、例えば、ガラス系材
料をスパツタやプラズマ溶射して被覆させるもの
で、その効果はヘツドコアを保護するとともにヘ
ツド摩耗を少なくし摺動時のテープタツチを良好
にさせるものである。第１１図は、巻線用穴１７
を穿孔する工程で超音波加工等によつて実現でき
る。なお、この工程は、第４図に示した基板の段
階であらかじめ行うことも可能である。第１２図
は、点線に沿つてヘツドコアを切断して個々のヘ
ツドチツプ１８を得る工程である。第１３図は該
ヘツドチツプ１８に巻線１９を施して薄膜磁気ヘ
ツド２０を完成させたものである。 FIG. 10 shows a step of coating the surface of this magnetic head core with a non-magnetic material 16. As the non-magnetic material, a material having higher hardness and better wear resistance than the magnetic thin films 11 and 14, for example, a glass material, is coated by sputtering or plasma spraying, and the effect is to protect the head core and to This reduces head wear and improves tape touch during sliding. Figure 11 shows the winding hole 17.
This can be achieved by ultrasonic processing etc. in the process of drilling holes. Note that this step can also be performed in advance at the stage of the substrate shown in FIG. 4. FIG. 12 shows the process of cutting the head core along dotted lines to obtain individual head chips 18. FIG. 13 shows a completed thin film magnetic head 20 by applying a winding 19 to the head chip 18.
このようにして得た薄膜磁気ヘツド２０を用い
てVTRの記録再生を行つた実験の結果、記録電
流は約１／２に低減し再生感度は３〜5dB向上し
これらの効果は第２図及び第３図に述べた従来の
磁束絞り形状の磁気ヘツドの性能に何ら遜色がな
かつた。 As a result of an experiment in which recording and reproduction of a VTR was performed using the thin film magnetic head 20 obtained in this way, the recording current was reduced to approximately 1/2, and the reproduction sensitivity was improved by 3 to 5 dB. These effects are shown in Figure 2 and There was no inferiority in performance to the conventional magnetic head having a magnetic flux constriction shape as shown in FIG.
上述した本発明の薄膜磁気ヘツド及びその製造
方法によれば、狭ギヤツプ長、狭トラツク幅で、
かつ、磁束絞り形状を有する磁性薄膜ヘツドをき
わめて容易に、かつ量産的に製造できる特徴を有
する。すなわち、ボンデイングレス磁気ヘツドの
もつ高精度ギヤツプ長、高精度トラツク幅という
基本的な特徴を保持しつつ、磁束絞り形状を得る
ための磁路構造を最適化したため、２回の磁性薄
膜被着工程と２回の溝部形成工程、具体的には高
硬質バイト切削加工法の採用により、高性能薄膜
磁気ヘツドを実現することができる。これによ
り、従来法に比較し、製造工程数が著しく減少
し、また、上記加工法自身容易であることによ
り、薄膜磁気ヘツドをきわめて量産的に、かつ、
低廉価に製造でき、その効果は大である。 According to the thin film magnetic head and the manufacturing method thereof of the present invention described above, a narrow gap length, a narrow track width,
In addition, it has the feature that a magnetic thin film head having a magnetic flux constriction shape can be manufactured extremely easily and in mass production. In other words, while maintaining the basic features of the bondingless magnetic head, such as high-precision gap length and high-precision track width, we have optimized the magnetic path structure to obtain a magnetic flux constriction shape, which requires only two magnetic thin film deposition steps. A high-performance thin-film magnetic head can be realized by employing two groove forming steps, specifically, by using a high-hardness cutting tool. As a result, the number of manufacturing steps is significantly reduced compared to conventional methods, and since the processing method itself is easy, thin-film magnetic heads can be extremely mass-produced.
It can be manufactured at low cost and has great effects.
第１図は従来の薄膜磁気ヘツドを示す斜視図、
第２図及び第３図は従来の磁束絞り形状を有する
薄膜磁気ヘツドを示す斜視図、第４図〜第１３図
は本発明による薄膜磁気ヘツドの一実施例の製造
方法を説明するための各工程における形状を示す
斜視図である。
１０：基板、１１：第１の磁性薄膜、１２：第
１の溝部、１３：非磁性薄膜、１４：第２の磁性
薄膜、１５：第２の溝部。
FIG. 1 is a perspective view showing a conventional thin film magnetic head.
2 and 3 are perspective views showing a thin film magnetic head having a conventional magnetic flux constriction shape, and FIGS. 4 to 13 are perspective views showing a manufacturing method of an embodiment of the thin film magnetic head according to the present invention. It is a perspective view showing the shape in a process. 10: Substrate, 11: First magnetic thin film, 12: First groove, 13: Nonmagnetic thin film, 14: Second magnetic thin film, 15: Second groove.
Claims (1)
され、最終的に得られる磁気ヘツドコアのギヤツ
プ位置に於てその一方の面がギヤツプ面となりそ
の深さが少なくとも前記基板の表面に達する断面
がＶ字状の第１の溝部が設けられ、該第１の溝部
を挟んで一方が最終的に得られる磁気ヘツドコア
の一半部の主磁路となり、他方が他半部の補助磁
路となる第１の磁性薄膜と、該第１の磁性薄膜の
表面上及び前記第１の溝部内面上に連続して被着
形成された非磁性薄膜と、該非磁性薄膜の表面上
に於て前記第１の磁性薄膜の形状に対応して被着
され、最終的に得られる磁気ヘツドコアのギヤツ
プ位置に於てその深さが少なくとも前記第１の磁
性薄膜の主磁路側の表面に達する断面がＵ字状の
第２の溝部を挟んで、一方が最終的に得られる磁
気ヘツドコアの一半部の補助磁路となり、他方が
他半部の主磁路となる第２の磁性薄膜とよりな
り、前記第１及び第２の磁性薄膜の各主磁路の前
記非磁性薄膜を挟む互いに対向する端面間に於て
磁気作動ギヤツプを形成したことを特徴とする薄
膜磁気ヘツド。 ２ 非磁性材料からなる基板の上面に、トラツク
幅にほぼ等しい厚さの第１の磁性薄膜を被着させ
る工程と、この第１の磁性薄膜に一方の側面が作
動ギヤツプ面となり、底部が上記基板に達するＶ
字状の溝部を設ける工程と、上記第１の磁性薄膜
の表面上および上記Ｖ字状溝部の内面上に連続し
た非磁性薄膜を被着形成する工程と、この非磁性
薄膜の上に第２の磁性薄膜を被着形成する工程
と、最終的に得られる磁気ヘツドコアの作動ギヤ
ツプ部において、その深さが少なくとも上記第１
の磁性薄膜の上記Ｖ字状溝部のギヤツプ面となる
側面を持つ側の上面に達する断面Ｕ字状の溝部を
設ける工程とを有することを特徴とする薄膜磁気
ヘツドの製造方法。[Scope of Claims] 1. A substrate made of a non-magnetic material, which is adhered to the surface of the substrate, and at the gap position of the finally obtained magnetic head core, one surface thereof becomes a gap surface and its depth is at least as large as that of the substrate. A first groove with a V-shaped cross section reaching the surface of the head is provided, and one side of the first groove forms the main magnetic path of one half of the magnetic head core to be finally obtained, and the other forms the main magnetic path of the other half. a first magnetic thin film serving as an auxiliary magnetic path; a nonmagnetic thin film continuously deposited on the surface of the first magnetic thin film and the inner surface of the first groove; It is deposited in a manner corresponding to the shape of the first magnetic thin film, and its depth reaches at least the surface of the first magnetic thin film on the main magnetic path side at the gap position of the finally obtained magnetic head core. A second magnetic thin film is sandwiched between the second groove portion having a U-shaped cross section, one of which becomes an auxiliary magnetic path for one half of the finally obtained magnetic head core, and the other of which becomes a main magnetic path of the other half. A thin film magnetic head characterized in that a magnetically actuated gap is formed between mutually opposing end surfaces sandwiching the non-magnetic thin film of each main magnetic path of the first and second magnetic thin films. 2. A step of depositing a first magnetic thin film having a thickness approximately equal to the track width on the upper surface of a substrate made of a non-magnetic material; V reaching the board
forming a continuous non-magnetic thin film on the surface of the first magnetic thin film and on the inner surface of the V-shaped groove; and forming a second non-magnetic thin film on the non-magnetic thin film. In the step of depositing and forming a magnetic thin film, and in the working gap portion of the magnetic head core finally obtained, the depth is at least as large as the first magnetic thin film described above.
A method for manufacturing a thin film magnetic head, comprising the step of providing a groove portion having a U-shaped cross section reaching the upper surface of the V-shaped groove portion of the magnetic thin film on the side having the side surface serving as the gap surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2431381A JPS57141011A (en) | 1981-02-23 | 1981-02-23 | Thin film magnetic head and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2431381A JPS57141011A (en) | 1981-02-23 | 1981-02-23 | Thin film magnetic head and its production |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57141011A JPS57141011A (en) | 1982-09-01 |
| JPS6249652B2 true JPS6249652B2 (en) | 1987-10-20 |
Family
ID=12134686
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2431381A Granted JPS57141011A (en) | 1981-02-23 | 1981-02-23 | Thin film magnetic head and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57141011A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61283018A (en) * | 1985-06-07 | 1986-12-13 | Hitachi Ltd | Thin film magnetic head |
| JPS6433709A (en) * | 1987-07-29 | 1989-02-03 | Sharp Kk | Magnetic head |
-
1981
- 1981-02-23 JP JP2431381A patent/JPS57141011A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57141011A (en) | 1982-09-01 |
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