JPS625677A - Frequency stabilized semiconductor laser device - Google Patents

Frequency stabilized semiconductor laser device

Info

Publication number
JPS625677A
JPS625677A JP60145582A JP14558285A JPS625677A JP S625677 A JPS625677 A JP S625677A JP 60145582 A JP60145582 A JP 60145582A JP 14558285 A JP14558285 A JP 14558285A JP S625677 A JPS625677 A JP S625677A
Authority
JP
Japan
Prior art keywords
semiconductor laser
diffraction grating
light
order diffracted
frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60145582A
Other languages
Japanese (ja)
Other versions
JPH067613B2 (en
Inventor
Hiroyuki Asakura
宏之 朝倉
Yoshito Miyatake
義人 宮武
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP14558285A priority Critical patent/JPH067613B2/en
Publication of JPS625677A publication Critical patent/JPS625677A/en
Publication of JPH067613B2 publication Critical patent/JPH067613B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/068Stabilisation of laser output parameters
    • H01S5/0683Stabilisation of laser output parameters by monitoring the optical output parameters
    • H01S5/0687Stabilising the frequency of the laser
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/14External cavity lasers
    • H01S5/141External cavity lasers using a wavelength selective device, e.g. a grating or etalon

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 産業上の利用分野 この発明は光通信及び光学計測に用いる周波数安定化半
導体レーザー素子に関する。
DETAILED DESCRIPTION OF THE INVENTION FIELD OF INDUSTRIAL APPLICATION This invention relates to frequency stabilized semiconductor laser devices used in optical communication and optical measurement.

従来の技術 近年、半導体レーザーはそのコヒーレンスの良さが利用
されて、光通信や光計測の分野において信号源や光源と
して利用されはじめている。しかし半導体レーザーの発
振周波数はその発振周波数のバラツキや温度や戻り光の
影響を受は易く変動しやすい。そこで半導体レーザー(
以下LDとする)の外部に鏡や回折格子を配置しLDの
片端面からの出力光をその発光点へ帰還させることによ
って、複合共振器を形成させ、単−波長発振及び発振周
波数選択を行う。過去の実施例を第3図に従って説明す
る。第3図(a)は鏡?用いた複合共振器レーザーでL
D23の出力光全レンズ22で平行光とし鏡に入射し、
その反射光をもとの光路を通して再びLD23の発光点
へ帰還する。この結果共振器のQ値が高まり単−波長で
発振し、また共振器長Li変えることによって発振条件
を変えて周波数を変えることができる。第3図(b)に
おいては前記の鏡の代りに回折格子を用いるもの、であ
り、LD26からの入射光は回折格子24によって各波
長に対しであるグレーティング方程式を満すように回折
される。IJ )ロー配置をとった場合入射角二回折角
二〇、格子定数d、波長λとすると 2 d sinθ=mλ−(1) の条件をみたすθ方向へ波長λの光は回折される。
BACKGROUND OF THE INVENTION In recent years, semiconductor lasers have begun to be used as signal sources and light sources in the fields of optical communication and optical measurement, taking advantage of their good coherence. However, the oscillation frequency of a semiconductor laser is easily influenced by variations in the oscillation frequency, temperature, and returned light, and thus tends to fluctuate. Therefore, semiconductor laser (
By placing a mirror or a diffraction grating outside the LD (hereinafter referred to as LD) and returning the output light from one end face of the LD to its light emitting point, a composite resonator is formed, and single-wavelength oscillation and oscillation frequency selection are performed. . Past embodiments will be described with reference to FIG. Is Figure 3(a) a mirror? L with the composite resonator laser used
The output light of D23 is converted into parallel light by all lenses 22 and is incident on the mirror.
The reflected light returns to the light emitting point of the LD 23 through the original optical path. As a result, the Q value of the resonator increases and the resonator oscillates at a single wavelength, and by changing the resonator length Li, the oscillation conditions can be changed and the frequency can be changed. In FIG. 3(b), a diffraction grating is used instead of the mirror, and the incident light from the LD 26 is diffracted by the diffraction grating 24 so as to satisfy a grating equation for each wavelength. IJ) In the case of a low configuration, where the incident angle is 2, the diffraction angle is 20, the lattice constant is d, and the wavelength is λ, light with a wavelength of λ is diffracted in the θ direction that satisfies the following conditions: 2 d sin θ=mλ−(1).

(1)式を満す角度θに回折格子を傾けるとLD26の
発振波長はλになる。また角度θを変ることでLD26
の発振波長を(1)式に基づいて変化きせることが可能
である。
When the diffraction grating is tilted to an angle θ that satisfies equation (1), the oscillation wavelength of the LD 26 becomes λ. Also, by changing the angle θ, the LD26
It is possible to change the oscillation wavelength based on equation (1).

発明が解決しようとする問題点 前記のような外部共振器金偏えたLDでは、LDの周囲
の温度変化やLD自身が駆動中に発生する熱によってそ
のLDの屈折率やエネルギーバンドギャップが変化し単
一波長で発振していてもその波長が温度やその他の影響
を受けてモードホップをおこしたり、変動(−たりする
0このため周波数の不安定さに加えて、出力強度も変化
し、通信システムにおいては雑音の原因となったり、計
測においては測定誤差の大きな要因となる。
Problems to be Solved by the Invention In the above-mentioned LD in which the external resonator is biased toward gold, the refractive index and energy bandgap of the LD change due to temperature changes around the LD and heat generated while the LD itself is driven. Even when oscillating with a single wavelength, that wavelength may cause mode hops or fluctuations due to temperature and other influences.As a result, in addition to frequency instability, the output intensity also changes, making communication difficult. In systems, it causes noise, and in measurements, it becomes a major cause of measurement errors.

本発明は、上記問題点に鑑み、LDの発振周波数を安定
化しかつその出力バーワーも一定に保つ周波数安定化半
導体レーザーを提供するものである0 問題点を解決するための手段 上記問題点を解決するために本発明の周波数安定化半導
体レーザーは半導体レーザー素子とレンズ及び回折格子
2位置検出素子と光検出素子ヲ廟し、回折格子で生ずる
1次の回折光を半導体レーザーへ帰還させ単一波長発振
きせると共に0次の回折光の強度変化を光検出器で検出
し半導体レーザーの駆動電流を調整し、2次の回折光を
集光レンズで焦点面上で結像させ結f象点の位置変化を
位置検出素子で検出し、一定の位置に結像するように半
導体レーザーの温度を制御するものである0作用 本発明は、上記した構成によシ、半導体レーザーの出力
光の周波数と強度を安定化し、上記に説明した問題点を
解決しようとするものである0実施例 以下本発明の一笑流側の周波数安定化半導体レーザーに
ついて図面を参照しながら説明する。
In view of the above-mentioned problems, the present invention provides a frequency-stabilized semiconductor laser that stabilizes the oscillation frequency of the LD and keeps its output power constant.Means for Solving the ProblemsSolving the above-mentioned problems In order to achieve this, the frequency-stabilized semiconductor laser of the present invention includes a semiconductor laser element, a lens, a diffraction grating two-position detection element, and a photodetection element, and returns the first-order diffracted light generated by the diffraction grating to the semiconductor laser to generate a single wavelength. Along with the oscillation, a photodetector detects the change in the intensity of the 0th-order diffracted light, adjusts the drive current of the semiconductor laser, and focuses the 2nd-order diffracted light on the focal plane with a condensing lens to determine the position of the f-quadrant. The temperature of the semiconductor laser is controlled so that the change is detected by a position detection element and the image is formed at a fixed position. Embodiment 0 A frequency-stabilized semiconductor laser on the one-shot side of the present invention will be described below with reference to the drawings.

第1図は本発明の第1の実施例における周波数安定化半
導体レーザーの構成図である。第1因において5は半導
体レーザーでこの半導体レーザー(以下LD)5の片側
の端面からの出力光はコリメーターレンズ6によって平
行光とされ回折格子1に入射される。今LD5の発振周
波数がλ0とすると入射光の回折格子の法線となす角α
と回折角βの間には d (Sin α+ Sinβ)=mλo  −−−−
−・(2)の関係がある。dは格子定数1mは整数であ
る。
FIG. 1 is a block diagram of a frequency-stabilized semiconductor laser according to a first embodiment of the present invention. In the first factor, 5 is a semiconductor laser, and the output light from one end face of this semiconductor laser (hereinafter referred to as LD) 5 is made into parallel light by a collimator lens 6 and is incident on the diffraction grating 1 . Now, if the oscillation frequency of LD5 is λ0, the angle α between the incident light and the normal to the diffraction grating is
and the diffraction angle β is d (Sin α+ Sinβ) = mλo -----
-・(2) is the relationship. d is a lattice constant 1m is an integer.

m二1についてIJ )ロー配置に回折格子を傾けると
α=β=θより 2a sinθ= λo   −=−−−(3)となり
、1次の回折光16がLD5の発光点へ帰還されること
になり、LDsの発振周波数はλ0付近に限定される。
IJ for m21) When the diffraction grating is tilted to the low configuration, α = β = θ, 2a sin θ = λo -=---- (3), and the first-order diffracted light 16 is returned to the light emitting point of LD5. Therefore, the oscillation frequency of the LDs is limited to around λ0.

回折格子からの1次の回折光16とLDsとの結合にお
いて、帰還光の発光面上のスポット家がコリメーターレ
ンズの回折限界で約発振波長程町の広がリヲ持ち、一般
に0.8〜1.6a程度のぼけとなるため発振波長λ0
もある。
In the combination of the first-order diffracted light 16 from the diffraction grating and the LDs, the spot on the light emitting surface of the returned light has a width approximately equal to the oscillation wavelength at the diffraction limit of the collimator lens, and is generally 0.8~ Since the blur is about 1.6a, the oscillation wavelength λ0
There is also.

Δλの範囲で変化しうる。そこで(1)式においてm 
= 2 fみたす2次の回折光を利用しその波長変動を
検出する。(1)式においてLD5の発振波長λ0がλ
0+Δλに変化したとすると 2d CO3θΔθ=2・Δλ ・・・・・ (4)Δ
θ=Δλ/dcosθ ・・・・・・(5)Δθの回折
角変化が生ずる。そこでこの2次回折光18を集光レン
ズ7で結像してやるとレンズ7の焦点面上において ΔX= f・Δθ=f・Δλ/ c o sθ・・・・
・・(6)の位置変化を生ずる。但しfはレンズ7の焦
点距離である。レンズ7の焦点面上にPSDや2分割フ
ォトダイオードの様な位置検出素子2を置いておけば回
折光の波長変化によ−って生ずる位置を検出することが
でき、3の誤差検出部から出される誤差信号を用いてL
D5の温度をペルチェ素子などを用いて電気的に制御し
、元の位置にもどるようにLDsの温度を制御してやる
。従って位置の誤差信号を温度制御4ヘフイードバノク
することで常にLDsの発振周波数が一定に保たれる0
また回折格子の分解能δは δ=Δλ/λ= mW  ・・・・・・(7)で表され
る。mは次数、Nは格子の総本数である。
It can vary within the range of Δλ. Therefore, in equation (1), m
= 2f Second-order diffracted light is used to detect the wavelength fluctuation. In equation (1), the oscillation wavelength λ0 of LD5 is λ
If it changes to 0 + Δλ, then 2d CO3θΔθ = 2・Δλ ... (4) Δ
θ=Δλ/dcosθ (5) A diffraction angle change of Δθ occurs. Therefore, when this second-order diffracted light 18 is imaged by the condensing lens 7, on the focal plane of the lens 7, ΔX= f・Δθ=f・Δλ/ co sθ...
...(6) causes the position change. However, f is the focal length of the lens 7. If a position detection element 2 such as a PSD or a two-split photodiode is placed on the focal plane of the lens 7, the position caused by the wavelength change of the diffracted light can be detected, and the error detection section 3 Using the output error signal, L
The temperature of D5 is electrically controlled using a Peltier element or the like, and the temperature of the LDs is controlled so as to return to the original position. Therefore, by applying the position error signal to the temperature control system, the oscillation frequency of the LDs can be kept constant.
Further, the resolution δ of the diffraction grating is expressed as δ=Δλ/λ=mW (7). m is the order, and N is the total number of lattices.

2次の回折光18を用いることによって1次の回折光よ
り、より感度良く波長変化Δλを検出することができる
。一般にmが大きくなるにつれて回折光強度が低下する
ため口=2で用いるのが望ましいOm=2以上の高次の
回折光ではより分解能δは大きくなるが強度低下によっ
て位置検出素子2でのS / Nが低下してしまい、素
子での雑音の影響全党は易くなってしまう0 回折格子1で生ずる0次回折光は回折格子の鏡面反射に
よって生ずる光であるため、波長依存性は無い。このO
次光17′に用いその光強度の変化を光検出器で検知し
駆動回路9ヘフイードバツクし出力光強度を一疋に保た
せる。
By using the second-order diffracted light 18, the wavelength change Δλ can be detected with higher sensitivity than the first-order diffracted light. In general, as m increases, the intensity of the diffracted light decreases, so it is preferable to use it with aperture = 2. For higher-order diffracted light of Om = 2 or more, the resolution δ increases, but due to the decrease in intensity, the S / N decreases, and the overall effect of noise on the element becomes easier.0 The 0th-order diffracted light generated by the diffraction grating 1 is generated by specular reflection of the diffraction grating, and therefore has no wavelength dependence. This O
A photodetector detects changes in the light intensity of the secondary light 17' and feeds back to the drive circuit 9 to keep the output light intensity constant.

第2図は第1図におけるレンズと回折格子全一体と成し
た構成図である。第1図におけるレンズ6、 7. 8
の代りにガラスブロックを用い、半導体レーザー6の希
望する発振周波数λに対して(1)式を満する角度θに
対してきまる0次、1次、2次の回折方向に直交する三
面をレンズ状に加工する。本光学系において画角は非常
に狭いものが許されるため、レンズ面も非球面である放
物面が使え収差の無い光学系が可能である。回折格子部
分15はガラス材に直接格子全形成するか、または市販
の平面格子をシリコンオイルか、紫外線硬化樹脂でガラ
スブロック14にはり付けでや扛ば良い。このように全
体をガラスブロック化することによって小型でかつ機械
的振動にも比較的安定したシステムを実現することがで
きる。
FIG. 2 is a structural diagram of the lens and diffraction grating shown in FIG. 1, which are all integrated. Lenses 6, 7 in FIG. 8
Instead, a glass block is used, and the three surfaces perpendicular to the 0th, 1st, and 2nd order diffraction directions determined by the angle θ that satisfies equation (1) for the desired oscillation frequency λ of the semiconductor laser 6 are used as lenses. Process into shapes. Since this optical system allows a very narrow angle of view, the lens surface can also be an aspherical paraboloid, making it possible to create an optical system free of aberrations. The diffraction grating portion 15 may be formed by directly forming the entire grating on the glass material, or by gluing a commercially available planar grating onto the glass block 14 using silicone oil or ultraviolet curing resin. By making the entire system into a glass block in this way, it is possible to realize a system that is compact and relatively stable against mechanical vibrations.

発明の効果 以上のように本発明は半導体レーザー素子の外部に3枚
のレンズと回折格子と、2次回折光のレンズ焦点面上の
位置変化を検出する位置検出素子と○次回折光の強度変
化を検知する光検出器を具備し、前記の位置検出素子か
らの信号を用いて前記の半導体レーザー素子の動作温度
を制御する温度制御回路と前記の光検出器からの出力信
号音用いて前記の半導体レーザー素子の発光電流を制御
する駆動回路を設けることにより、発振周波数及び発光
パワーの安定した半導体レーザー素子を提供することが
できる。
Effects of the Invention As described above, the present invention includes three lenses and a diffraction grating outside a semiconductor laser element, a position detection element that detects a change in the position of the second-order diffracted light on the lens focal plane, and a position detection element that detects the change in the intensity of the ○th-order diffracted light. A temperature control circuit includes a photodetector for detecting the semiconductor laser element, and uses a signal from the position detection element to control the operating temperature of the semiconductor laser element; By providing a drive circuit that controls the emission current of the laser element, it is possible to provide a semiconductor laser element with stable oscillation frequency and emission power.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の第1の実施例における周波数安定化半
導体レーザーの構成図、第2図は本発明の第2の実施例
における周波数安定化半導体レーザー素子の光学系ブロ
ック図、第3図は従来の半導体レーザー素子の構成図で
ある。 1.15・−・・・・回折格子、6・・・・・・半導体
レーザー素子、2・・・・・・位置検出素子、11・・
・・・・光検出器、9・・・・・・駆動回路、4・・・
・・・温度制御部、6. 7.8・・・・・・レンズ、
14・・・・・・ガラスブロック。
FIG. 1 is a block diagram of a frequency-stabilized semiconductor laser according to a first embodiment of the present invention, FIG. 2 is a block diagram of an optical system of a frequency-stabilized semiconductor laser element according to a second embodiment of the present invention, and FIG. 1 is a configuration diagram of a conventional semiconductor laser device. 1.15... Diffraction grating, 6... Semiconductor laser element, 2... Position detection element, 11...
...Photodetector, 9...Drive circuit, 4...
...Temperature control section, 6. 7.8...Lens,
14...Glass block.

Claims (2)

【特許請求の範囲】[Claims] (1)半導体レーザー素子とコリメート及び2つのレン
ズと回折格子とからなる光学系と位置検出素子と光検出
器とを具備し、前記半導体レーザー素子の1端面からの
出力光を前記コリメーターレンズによって平行光とし、
前記回折格子に入射せしめ、前記回折格子によって生ず
る1次回折光を前記半導体レーザー素子の発光点へ帰還
し2次回折光を前記集光レンズで前記の位置検出素子上
に結像し、前記位置検出素子からの出力信号に応じて前
記の半導体レーザー素子の温度を制御する温度制御部と
、0次回折光を前記光検出器に入射し、光検出素子から
の出力信号を用いて前記半導体レーザ素子の駆動電流を
制御する駆動回路を有することを特徴とした周波数安定
化半導体レーザー素子。
(1) An optical system including a semiconductor laser element, a collimator, two lenses, and a diffraction grating, a position detection element, and a photodetector, the output light from one end surface of the semiconductor laser element is transmitted by the collimator lens. Parallel light,
The first-order diffracted light generated by the diffraction grating is made to enter the diffraction grating, and the first-order diffracted light is returned to the light emitting point of the semiconductor laser element, and the second-order diffracted light is imaged on the position detection element by the condensing lens. a temperature control section that controls the temperature of the semiconductor laser element according to an output signal from the semiconductor laser element; A frequency-stabilized semiconductor laser device characterized by having a drive circuit that controls current.
(2)回折格子及び3枚のレンズをガラスブロックで一
体となした特許請求の範囲第(1)項記載の周波数安定
化半導体レーザー素子。
(2) A frequency-stabilized semiconductor laser device according to claim (1), in which the diffraction grating and three lenses are integrated with a glass block.
JP14558285A 1985-07-02 1985-07-02 Frequency stabilized semiconductor laser device Expired - Lifetime JPH067613B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14558285A JPH067613B2 (en) 1985-07-02 1985-07-02 Frequency stabilized semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14558285A JPH067613B2 (en) 1985-07-02 1985-07-02 Frequency stabilized semiconductor laser device

Publications (2)

Publication Number Publication Date
JPS625677A true JPS625677A (en) 1987-01-12
JPH067613B2 JPH067613B2 (en) 1994-01-26

Family

ID=15388421

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14558285A Expired - Lifetime JPH067613B2 (en) 1985-07-02 1985-07-02 Frequency stabilized semiconductor laser device

Country Status (1)

Country Link
JP (1) JPH067613B2 (en)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04109561U (en) * 1991-03-06 1992-09-22 株式会社アドバンテスト semiconductor laser equipment
WO1995008206A1 (en) * 1993-09-14 1995-03-23 Accuwave Corporation Wavelength stabilized laser sources using feedback from volume holograms
US5440669A (en) * 1991-07-26 1995-08-08 Accuwave Corporation Photorefractive systems and methods
US5491570A (en) * 1991-07-26 1996-02-13 Accuwave Corporation Methods and devices for using photorefractive materials at infrared wavelengths
US5684611A (en) * 1991-07-26 1997-11-04 Accuwave Corporation Photorefractive systems and methods
US5715219A (en) * 1991-11-29 1998-02-03 Nippon Steel Corporation Displacement detecting device for optical head
EP0556016B1 (en) * 1992-02-10 1998-04-15 Hamamatsu Photonics K.K. Wavelength variable laser device
US5796096A (en) * 1991-07-26 1998-08-18 Accuwave Corporation Fabrication and applications of long-lifetime, holographic gratings in photorefractive materials
JP2003060299A (en) * 2001-06-07 2003-02-28 Ricoh Opt Ind Co Ltd Optical output element / optical output element array and lens element / lens element array
JP2006032397A (en) * 2004-07-12 2006-02-02 Sony Corp Laser system, laser control method, and system and method for recording/reproducing hologram
JP2006324371A (en) * 2005-05-18 2006-11-30 Sony Corp LASER DEVICE, LASER WAVELENGTH DETECTING METHOD, AND HOLOGRAM DEVICE
JP2006324561A (en) * 2005-05-20 2006-11-30 Sony Corp Laser apparatus and diffraction grating driving method
WO2009083164A1 (en) * 2007-12-21 2009-07-09 Trumpf Laser- Und Systemtechnik Gmbh Grating mirror for the online monitoring of a laser beam, and monitoring device comprising the same
US7630426B2 (en) 2007-03-16 2009-12-08 Panasonic Corporation Wavelength detector, wavelength stabilization laser device, and image display device
JP2019212654A (en) * 2018-05-31 2019-12-12 日亜化学工業株式会社 Light source device

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04109561U (en) * 1991-03-06 1992-09-22 株式会社アドバンテスト semiconductor laser equipment
US5796096A (en) * 1991-07-26 1998-08-18 Accuwave Corporation Fabrication and applications of long-lifetime, holographic gratings in photorefractive materials
US5491570A (en) * 1991-07-26 1996-02-13 Accuwave Corporation Methods and devices for using photorefractive materials at infrared wavelengths
US5684611A (en) * 1991-07-26 1997-11-04 Accuwave Corporation Photorefractive systems and methods
US5691989A (en) * 1991-07-26 1997-11-25 Accuwave Corporation Wavelength stabilized laser sources using feedback from volume holograms
US5440669A (en) * 1991-07-26 1995-08-08 Accuwave Corporation Photorefractive systems and methods
US5715219A (en) * 1991-11-29 1998-02-03 Nippon Steel Corporation Displacement detecting device for optical head
EP0556016B1 (en) * 1992-02-10 1998-04-15 Hamamatsu Photonics K.K. Wavelength variable laser device
WO1995008206A1 (en) * 1993-09-14 1995-03-23 Accuwave Corporation Wavelength stabilized laser sources using feedback from volume holograms
JP2003060299A (en) * 2001-06-07 2003-02-28 Ricoh Opt Ind Co Ltd Optical output element / optical output element array and lens element / lens element array
JP2006032397A (en) * 2004-07-12 2006-02-02 Sony Corp Laser system, laser control method, and system and method for recording/reproducing hologram
JP2006324371A (en) * 2005-05-18 2006-11-30 Sony Corp LASER DEVICE, LASER WAVELENGTH DETECTING METHOD, AND HOLOGRAM DEVICE
JP2006324561A (en) * 2005-05-20 2006-11-30 Sony Corp Laser apparatus and diffraction grating driving method
US7630426B2 (en) 2007-03-16 2009-12-08 Panasonic Corporation Wavelength detector, wavelength stabilization laser device, and image display device
WO2009083164A1 (en) * 2007-12-21 2009-07-09 Trumpf Laser- Und Systemtechnik Gmbh Grating mirror for the online monitoring of a laser beam, and monitoring device comprising the same
JP2019212654A (en) * 2018-05-31 2019-12-12 日亜化学工業株式会社 Light source device

Also Published As

Publication number Publication date
JPH067613B2 (en) 1994-01-26

Similar Documents

Publication Publication Date Title
US5177750A (en) Misalignment-tolerant, grating-tuned external-cavity laser with enhanced longitudinal mode selectivity
JPS625677A (en) Frequency stabilized semiconductor laser device
EP0867989A1 (en) Wavelength tunable semiconductor laser light source
EP1509980B1 (en) Resonator
EP0267036B1 (en) Waveguide type optical head
JPH08273186A (en) Optical head
JPH0755940A (en) Laser doppler speedometer
US5113071A (en) Encoder in which single light source projects dual beams onto grating
EP0462757B1 (en) Polarization diffraction element and polarization detector employing the same
US6340448B1 (en) Surface plasmon sensor
US5272512A (en) Displacement information detection apparatus
JPH04146681A (en) Semiconductor laser device
KR100343310B1 (en) Wavelength-stabilized Laser Diode
EP0592075B1 (en) A polarization detector
JP4984537B2 (en) External resonator type tunable light source
JP3044865B2 (en) Displacement information detection device and speedometer
KR20010073962A (en) Monitoring method and light source module for wavelength locking
JPH07202256A (en) Optical integrated sensor
JPH0663866B2 (en) Wavelength detector
JP2990891B2 (en) Displacement information detection device and speedometer
JPH03116992A (en) Semiconductor laser device
JPH04127488A (en) Laser
JP2007121232A (en) Wavelength monitor
JPH04106990A (en) Optical integrated circuit
JPS6341093A (en) Control device for light source for semiconductor laser