JPS6257712B2 - - Google Patents
Info
- Publication number
- JPS6257712B2 JPS6257712B2 JP54082093A JP8209379A JPS6257712B2 JP S6257712 B2 JPS6257712 B2 JP S6257712B2 JP 54082093 A JP54082093 A JP 54082093A JP 8209379 A JP8209379 A JP 8209379A JP S6257712 B2 JPS6257712 B2 JP S6257712B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- gas
- electrode
- film forming
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
- Light Receiving Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8209379A JPS565974A (en) | 1979-06-27 | 1979-06-27 | Film forming method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8209379A JPS565974A (en) | 1979-06-27 | 1979-06-27 | Film forming method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS565974A JPS565974A (en) | 1981-01-22 |
| JPS6257712B2 true JPS6257712B2 (sr) | 1987-12-02 |
Family
ID=13764810
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8209379A Granted JPS565974A (en) | 1979-06-27 | 1979-06-27 | Film forming method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS565974A (sr) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2520589B2 (ja) * | 1985-06-17 | 1996-07-31 | キヤノン株式会社 | Cvd法による堆積膜形成方法 |
| KR100197649B1 (ko) * | 1995-09-29 | 1999-06-15 | 김영환 | 박막 증착장치 |
| CN107250429B (zh) * | 2015-02-18 | 2020-08-14 | 株式会社尼康 | 薄膜制造装置和薄膜制造方法 |
| JP6869123B2 (ja) * | 2017-06-23 | 2021-05-12 | 東京エレクトロン株式会社 | プローブ装置及び針跡転写方法 |
-
1979
- 1979-06-27 JP JP8209379A patent/JPS565974A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS565974A (en) | 1981-01-22 |
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