JPS626677B2 - - Google Patents
Info
- Publication number
- JPS626677B2 JPS626677B2 JP17118779A JP17118779A JPS626677B2 JP S626677 B2 JPS626677 B2 JP S626677B2 JP 17118779 A JP17118779 A JP 17118779A JP 17118779 A JP17118779 A JP 17118779A JP S626677 B2 JPS626677 B2 JP S626677B2
- Authority
- JP
- Japan
- Prior art keywords
- cladding layer
- substrate
- view
- active layer
- main part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
- Led Devices (AREA)
Description
【発明の詳細な説明】
本発明は、光通信用光源などに用いられるスト
ライプ型半導体発光装置の改良に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to improvements in striped semiconductor light emitting devices used as light sources for optical communications and the like.
従来、ストライプ型半導体レーザとして、スト
ライプを形成する為のZn拡散領域を有する所謂
プレーナ・ストライプ構造のものが知られている
が、このレーザでは電流励起に依る利得領域にレ
ーザ光がガイドされる構成になつている為、電流
の不均一、温度分布などに依つて光出力・電流特
性にキンクを生じ横方向モードが不安定である欠
点を持つている。 Conventionally, a so-called planar stripe structure having a Zn diffusion region to form a stripe is known as a stripe type semiconductor laser, but this laser has a structure in which laser light is guided to a gain region by current excitation. Because of this, it has the disadvantage that kinks occur in the optical output and current characteristics due to non-uniform current flow, temperature distribution, etc., and the transverse mode becomes unstable.
そこで、横方向モードを安定化させる為の光ガ
イド機構を付設したチヤネルド・サブストレイ
ト・プレーナ(CSP)構造を有するレーザが提案
されている。このレーザは、第1図に見られる構
成を備えている。即ち、図に於いて、1は基板、
1′は基板1に形成された溝、2は第1クラツド
層、2′は突出部、3は活性層、4は第2クラツ
ド層、5はコンタクト層、6,7は電極である。
このレーザでは、主として突出部2′直上の活性
層部分を光が導波されるので横方向モードは安定
になるとされている。しかし、これは理想的に作
製できた場合のことであつて、実際には、第1ク
ラツド層2を液相エピタキシヤル成長させるとき
に折角シヤープに形成した溝1′の肩部(矢印参
照)が融液中にメルト・バツクして所謂ダレを発
生するので、期待通りの光ガイド機能を持たせる
ことができない。 Therefore, a laser having a channeled substrate planar (CSP) structure has been proposed, which is equipped with a light guide mechanism to stabilize the transverse mode. This laser has the configuration seen in FIG. That is, in the figure, 1 is the substrate,
1' is a groove formed in the substrate 1, 2 is a first cladding layer, 2' is a protrusion, 3 is an active layer, 4 is a second cladding layer, 5 is a contact layer, and 6 and 7 are electrodes.
In this laser, the light is mainly guided through the active layer directly above the protrusion 2', so that the transverse mode is said to be stable. However, this is an ideal case, and in reality, the shoulders of the grooves 1' (see arrows), which were formed in a sharp manner when the first cladding layer 2 was grown by liquid phase epitaxial growth, were formed in an ideal manner. Since it melts back into the melt and causes so-called sagging, it is not possible to provide the expected light guide function.
本発明は、前記の如き半導体発光装置に極めて
簡単な構造上の改変を加えることに依つて横方向
モードを確実に安定しようとするものであり、以
下これを詳細に説明する。 The present invention attempts to reliably stabilize the transverse mode by adding an extremely simple structural modification to the semiconductor light emitting device as described above, and this will be explained in detail below.
第2図は本発明一実施例の要部正面説明図、第
3図は第2図の線A―A′で切断し矢印方向に見
た要部側断面説明図、第4図は第2図の線B―
B′で切断し矢印方向に見た要部側断面説明図であ
り、第1図について説明した部分と同部分は同記
号で指示してある。尚、本実施例はGaAs系レー
ザに関するものである。 2 is a front explanatory view of the main part of an embodiment of the present invention, FIG. 3 is a side sectional view of the main part taken along line A-A' in FIG. 2 and seen in the direction of the arrow, and FIG. Line B in the diagram
It is an explanatory side cross-sectional view of the main part taken along B' and viewed in the direction of the arrow, and the same parts as those described in FIG. 1 are indicated by the same symbols. Note that this embodiment relates to a GaAs-based laser.
本実施例が第1図従来例と相違する点は基板1
に於けるストライプ領域外に溝1″を形成し、そ
の上にクラツド層2、活性層3、クラツド層4、
コンタクト層5の四つの層を連続エピタキシヤル
成長させたことである。 The difference between this embodiment and the conventional example shown in FIG.
A groove 1'' is formed outside the stripe area, and a cladding layer 2, an active layer 3, a cladding layer 4,
The four layers of the contact layer 5 are epitaxially grown in succession.
このような構成に依れば、活性層3からクラツ
ド層4に滲み出した光が基板1(従つてクラツド
層4)に設定されたストライプ領域を除く部分で
散乱されて損失となるので、横方向モードは安定
化されるものである。 According to such a configuration, the light leaking from the active layer 3 to the cladding layer 4 is scattered in a portion other than the stripe area set on the substrate 1 (therefore, the cladding layer 4), resulting in a loss. The directional mode is what is stabilized.
本実施例の場合も第1クラツド層2を成長させ
る際、メルト・バツクに依る溝1′の肩ダレが起
るけれども、それは散乱損失には無関係であるか
ら、そのような肩ダレを生じたものも正常に動作
させることができる。 In the case of this example as well, when growing the first cladding layer 2, shoulder sagging of the groove 1' occurs due to melt back, but since it is unrelated to scattering loss, such shoulder sagging occurs. You can also make things work properly.
第5図は他の実施例の要部正面説明図、第6図
は第5図の線A―A′で切断し失印方向に見た要
部側断面説明図であり、第2図乃至第4図に関し
て説明した部分と同部分を同記号で指示してあ
る。 FIG. 5 is a front explanatory view of the main part of another embodiment, and FIG. 6 is a side cross-sectional view of the main part taken along line A-A' in FIG. The same parts as those explained in connection with FIG. 4 are indicated by the same symbols.
本実施例はInP系レーザに関するものであり、
この場合、基板1がクラツド層の役割を果してい
るので第2図乃至第4図に見られる第1クラツド
層2は存在しない。従つて、基板1に形成した溝
1′の影響は活性層3に直接及ぶことになり、こ
の方が効果的である。 This example relates to an InP-based laser,
In this case, since the substrate 1 plays the role of a cladding layer, the first cladding layer 2 shown in FIGS. 2 to 4 does not exist. Therefore, the influence of the groove 1' formed in the substrate 1 directly affects the active layer 3, which is more effective.
以上の説明で判るように、本発明に依れば、適
宜に設定したストライプ領域を除く表面に活性層
で発生した光を散乱して損失とするのに充分な凹
凸を形成した基板を備えてなる半導体発光装置が
得られ、これに依れば、第1層クラツド層或いは
活性層を成長させる際にメルト・バツクに依る溝
の肩ダレを生じたとしても、横方向モードを確実
に安定化することができる。 As can be seen from the above description, according to the present invention, the substrate is provided with a substrate having enough irregularities formed on the surface excluding appropriately set stripe areas to scatter light generated in the active layer and cause a loss. According to this semiconductor light emitting device, even if shoulder sagging of the groove occurs due to melt back when growing the first cladding layer or active layer, the lateral mode can be reliably stabilized. can do.
第1図は従来例の要部正面説明図、第2図は本
発明一実施例の要部正面図、第3図は第2図の線
A―A′に於ける要部側断面説明図、第4図は第
2図の線B―B′に於ける要部側断面説明図、第5
図は他の実施例の要部正面説明図、第6図は第5
図の線A―A′に於ける要部側断面説明図であ
る。
図に於いて、1は基板、2はクラツド層、3は
活性層、4はクラツド層、5はコンタクト層、
1′及び1″は溝である。
Fig. 1 is an explanatory front view of main parts of a conventional example, Fig. 2 is a front view of main parts of an embodiment of the present invention, and Fig. 3 is a side sectional view of main parts taken along line A-A' in Fig. 2. , FIG. 4 is an explanatory side cross-sectional view of the main part taken along line B-B' in FIG. 2, and FIG.
The figure is a front explanatory view of the main part of another embodiment, and FIG.
It is an explanatory side sectional view of a main part in line AA' of a figure. In the figure, 1 is a substrate, 2 is a cladding layer, 3 is an active layer, 4 is a cladding layer, 5 is a contact layer,
1' and 1'' are grooves.
Claims (1)
活性層で発生した光を散乱して損失とするのに充
分な凹凸を形成した基板を備えてなることを特徴
とする半導体発光装置。1. A semiconductor light-emitting device comprising a substrate having enough irregularities formed on its surface, excluding appropriately set stripe regions, to scatter light generated in an active layer and result in loss.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17118779A JPS5696887A (en) | 1979-12-29 | 1979-12-29 | Semiconductor light emitting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17118779A JPS5696887A (en) | 1979-12-29 | 1979-12-29 | Semiconductor light emitting device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5696887A JPS5696887A (en) | 1981-08-05 |
| JPS626677B2 true JPS626677B2 (en) | 1987-02-12 |
Family
ID=15918608
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17118779A Granted JPS5696887A (en) | 1979-12-29 | 1979-12-29 | Semiconductor light emitting device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5696887A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006267324A (en) * | 2005-03-23 | 2006-10-05 | Matsushita Electric Ind Co Ltd | Optical element and coherent light source |
-
1979
- 1979-12-29 JP JP17118779A patent/JPS5696887A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5696887A (en) | 1981-08-05 |
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