JPS6267458U - - Google Patents
Info
- Publication number
- JPS6267458U JPS6267458U JP15779385U JP15779385U JPS6267458U JP S6267458 U JPS6267458 U JP S6267458U JP 15779385 U JP15779385 U JP 15779385U JP 15779385 U JP15779385 U JP 15779385U JP S6267458 U JPS6267458 U JP S6267458U
- Authority
- JP
- Japan
- Prior art keywords
- rotating disk
- mounting portion
- wafer mounting
- disk
- diameter periphery
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005468 ion implantation Methods 0.000 claims 1
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は従来のイオン注入装置用回転デイスク
の截断側面図、第２図は本考案の実施例の一部省
略した正面図、第３図は第２図の―線截断側
面図である。 １……回転軸、２……回転デイスク、３……ウ
エハ装着部、６……取付部。
の截断側面図、第２図は本考案の実施例の一部省
略した正面図、第３図は第２図の―線截断側
面図である。 １……回転軸、２……回転デイスク、３……ウ
エハ装着部、６……取付部。
Claims (1)
- イオン注入装置の回転軸に取付けられて回転さ
れると共にウエハ装着部を備えた回転デイスクに
於いて、該回転デイスクを中空コーン状に薄肉部
材で形成し、その大径周縁にウエハ装着部を設け
、その小径周縁に回転軸への取付部を設けて成る
イオン注入装置用回転デイスク。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15779385U JPS6267458U (ja) | 1985-10-17 | 1985-10-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15779385U JPS6267458U (ja) | 1985-10-17 | 1985-10-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6267458U true JPS6267458U (ja) | 1987-04-27 |
Family
ID=31080675
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15779385U Pending JPS6267458U (ja) | 1985-10-17 | 1985-10-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6267458U (ja) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5796452A (en) * | 1980-12-08 | 1982-06-15 | Nisshin Haiboruteeji Kk | Wafer mounting device for ion implanting device |
| JPS57101327A (en) * | 1980-12-16 | 1982-06-23 | Nisshin Haiboruteeji Kk | Wafer carrier in ion implanting device |
| JPS57151263A (en) * | 1981-03-13 | 1982-09-18 | Mitsubishi Electric Corp | Eddy current generating rotary disc |
-
1985
- 1985-10-17 JP JP15779385U patent/JPS6267458U/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5796452A (en) * | 1980-12-08 | 1982-06-15 | Nisshin Haiboruteeji Kk | Wafer mounting device for ion implanting device |
| JPS57101327A (en) * | 1980-12-16 | 1982-06-23 | Nisshin Haiboruteeji Kk | Wafer carrier in ion implanting device |
| JPS57151263A (en) * | 1981-03-13 | 1982-09-18 | Mitsubishi Electric Corp | Eddy current generating rotary disc |