JPS627541B2 - - Google Patents

Info

Publication number: JPS627541B2
Authority: JP; Japan
Prior art keywords: photomask; opaque; pinhole; electroless plating; metal film
Prior art date: 1981-12-25
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

JP20904381A

Other languages

English (en)

Japanese (ja)

Other versions

JPS58111317A (ja

Inventor

Hideo Sawai

Kohei Sogo

Takashi Kanamori

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Oki Electric Industry Co Ltd

Original Assignee

Oki Electric Industry Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1981-12-25

Filing date

1981-12-25

Publication date

1987-02-18

1981-12-25 Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd

1981-12-25 Priority to JP56209043A priority Critical patent/JPS58111317A/ja

1983-07-02 Publication of JPS58111317A publication Critical patent/JPS58111317A/ja

1987-02-18 Publication of JPS627541B2 publication Critical patent/JPS627541B2/ja

Status Granted legal-status Critical Current

Links

229910052751 metal Inorganic materials 0.000 claims description 10
239000002184 metal Substances 0.000 claims description 10
238000007772 electroless plating Methods 0.000 claims description 9
238000000034 method Methods 0.000 claims description 6
230000002950 deficient Effects 0.000 claims description 5
239000007788 liquid Substances 0.000 description 10
230000007547 defect Effects 0.000 description 8
239000000758 substrate Substances 0.000 description 7
238000007747 plating Methods 0.000 description 6
238000004519 manufacturing process Methods 0.000 description 5
238000006243 chemical reaction Methods 0.000 description 4
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
229910052802 copper Inorganic materials 0.000 description 3
239000010949 copper Substances 0.000 description 3
238000010894 electron beam technology Methods 0.000 description 3
238000002203 pretreatment Methods 0.000 description 3
230000005855 radiation Effects 0.000 description 3
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
229910052804 chromium Inorganic materials 0.000 description 2
239000011651 chromium Substances 0.000 description 2
239000003984 copper intrauterine device Substances 0.000 description 2
239000011521 glass Substances 0.000 description 2
239000000203 mixture Substances 0.000 description 2
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
239000005751 Copper oxide Substances 0.000 description 1
FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
QDWJUBJKEHXSMT-UHFFFAOYSA-N boranylidynenickel Chemical compound [Ni]#B QDWJUBJKEHXSMT-UHFFFAOYSA-N 0.000 description 1
229910052796 boron Inorganic materials 0.000 description 1
RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 1
ODWXUNBKCRECNW-UHFFFAOYSA-M bromocopper(1+) Chemical compound Br[Cu+] ODWXUNBKCRECNW-UHFFFAOYSA-M 0.000 description 1
239000003054 catalyst Substances 0.000 description 1
230000003197 catalytic effect Effects 0.000 description 1
239000003638 chemical reducing agent Substances 0.000 description 1
239000011248 coating agent Substances 0.000 description 1
238000000576 coating method Methods 0.000 description 1
229910000431 copper oxide Inorganic materials 0.000 description 1
NOEHFKOMKDWDFM-UHFFFAOYSA-L disodium;2,6-dioxoanthracene-1,3-disulfonate Chemical compound [Na+].[Na+].O=C1C=CC2=CC3=C(S([O-])(=O)=O)C(=O)C(S(=O)(=O)[O-])=CC3=CC2=C1 NOEHFKOMKDWDFM-UHFFFAOYSA-L 0.000 description 1
230000000694 effects Effects 0.000 description 1
239000000839 emulsion Substances 0.000 description 1
NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
238000007654 immersion Methods 0.000 description 1
230000001678 irradiating effect Effects 0.000 description 1
230000004048 modification Effects 0.000 description 1
238000012986 modification Methods 0.000 description 1
238000002715 modification method Methods 0.000 description 1
229920002120 photoresistant polymer Polymers 0.000 description 1
238000006722 reduction reaction Methods 0.000 description 1
239000004065 semiconductor Substances 0.000 description 1
239000000600 sorbitol Substances 0.000 description 1
238000004544 sputter deposition Methods 0.000 description 1
239000004094 surface-active agent Substances 0.000 description 1
238000007740 vapor deposition Methods 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Preparing Plates And Mask In Photomechanical Process (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

JP56209043A 1981-12-25 1981-12-25 フオトマスクの修正方法 Granted JPS58111317A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP56209043A JPS58111317A (ja)	1981-12-25	1981-12-25	フオトマスクの修正方法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP56209043A JPS58111317A (ja)	1981-12-25	1981-12-25	フオトマスクの修正方法

Publications (2)

Publication Number	Publication Date
JPS58111317A JPS58111317A (ja)	1983-07-02
JPS627541B2 true JPS627541B2 (fr)	1987-02-18

Family

ID=16566308

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP56209043A Granted JPS58111317A (ja)	1981-12-25	1981-12-25	フオトマスクの修正方法

Country Status (1)

Country	Link
JP (1)	JPS58111317A (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3329662A1 (de) *	1983-08-17	1985-03-07	Philips Patentverwaltung Gmbh, 2000 Hamburg	Verfahren zum nachbessern von optischen belichtungsmasken
JPS63210845A (ja) *	1987-02-27	1988-09-01	Hitachi Ltd	欠陥修正方法

1981
- 1981-12-25 JP JP56209043A patent/JPS58111317A/ja active Granted

Also Published As

Publication number	Publication date
JPS58111317A (ja)	1983-07-02

Publication	Publication Date	Title
JPH03135568A (ja)	1991-06-10	電子成分等を製造するためにレーザ走査を使用するリトグラフィ技術
JP2003107723A (ja)	2003-04-09	メタルマスクの製造方法およびメタルマスク
KR101216797B1 (ko)	2012-12-28	기판 처리 방법, ｅｕｖ 마스크의 제조 방법 및 ｅｕｖ 마스크
JPS627541B2 (fr)	1987-02-18
JPS602956A (ja)	1985-01-09	フオトマスクの製造方法
US6415431B1 (en)	2002-07-02	Repair of phase shift materials to enhance adhesion
JPH03203390A (ja)	1991-09-05	プリント基板の製造方法
GB2291216A (en)	1996-01-17	Method of manufacturing a printed circuit board
JP3655029B2 (ja)	2005-06-02	電着レジスト皮膜の露光方法
JPS6154212B2 (fr)	1986-11-21
JPH0744147B2 (ja)	1995-05-15	アスペクト比の高い吸収体パターンを含む解像力の高いｘ線マスク
JPH07207464A (ja)	1995-08-08	水溶性フォトレジスト膜の硬膜方法
JP3453365B2 (ja)	2003-10-06	写真製版によるパターン形成方法
JPH02115842A (ja)	1990-04-27	ホトマスク欠陥の修正方法
JPS60152027A (ja)	1985-08-10	パタ−ン欠陥修正方法
JP2506912B2 (ja)	1996-06-12	レジストパタ―ン形成方法
JPS617839A (ja)	1986-01-14	ハ−ドマスク修正法
JPS59172646A (ja)	1984-09-29	フオト・マスク及びその製造方法
JPS6161378B2 (fr)	1986-12-25
JPS63218959A (ja)	1988-09-12	ホトマスクパタ−ンの修正方法
JPH04217245A (ja)	1992-08-07	リソグラフィマスクの欠陥修復方法
JPS6163029A (ja)	1986-04-01	クロムマスクの修正方法
JPS6366556A (ja)	1988-03-25	フオトマスクの修正方法
KR950030231A (ko)	1995-11-24	포토마스크 패턴 형성 방법
JPS58138028A (ja)	1983-08-16	フオトマスクの欠陥修正方法