JPS6281603A - Color filter manufacturing method - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Detailed description of the invention] Invention! [Industrial Application Field] The present invention relates to a method for manufacturing a color filter.

[Summary of the invention]

The present invention provides a color filter in which dyed material 1j is
Differences in film thickness due to differences in film thickness before dyeing, before dyeing or after dyeing,
Layer to be dyed ■ Thin film thickness dyed area, acid is also dyed;
It is shaped by photo-etching to eliminate the difference in film thickness between each dyed area.

[Conventional technology]

Conventional color filters have differences in film thickness in each dyed area due to differences in # tension due to dye intrusion into the dyed layer during dyeing, and differences in film thickness of the dyed layer before dyeing.

[Problem to be solved by the invention]

However, when this is used in a liquid crystal display book, if the film thickness differs depending on the focal color area, there will be a difference in the alignment processing state VC, or the cell thickness will differ, resulting in non-uniform alignment of the liquid crystal. There are problems. ``Furthermore, when a T-pattern pattern is created on a color filter that has a different film thickness for each dyeing area, disconnections tend to occur at stepped portions.The present invention solves this problem. The purpose is to
The purpose of this method is to provide a color filter in which each dyed area has an equal film thickness.

[Means to solve the problem]

In the color filter according to the present invention, before taking the J-shaped pattern to be dyed or after dyeing the layer to be dyed, mosquitoes can be etched into dyed areas with a small thickness of the layer to be dyed by photo-etching. The special ridge is to form the photosensitive transparent resin 14 by the difference in film thickness from the Vh dyed area.

[For implementation]

FIG. 1 shows a first example of the method for manufacturing a color filter according to the present invention. This color filter has three types of dyed areas A, B, and C.
Let the expansion of A, B, and C be larger than Ill. First, on the transparent substrate 1, in the dyed area B, the
A photosensitive transparent resin film layer 2B is formed by photo-etching by the difference in film thickness between the dyed area 1tJijA and the dyed area B after dyeing 1.--.

Similarly, regarding the dyeing area C, the primary layer forming the photosensitive transparent resin film r42c is the first layer to be dyed.
v#3 to glass substrate l and photosensitive transparent resin 142B
, 2C,J:. Before dyeing, the film thickness in each dyeing area of the layer to be dyed is equal.The dyeing of dyeing target I- is done using a photoresist r*7ft with stain resistance and color property.
: The dyed area is removed by photoetching, dyed, and then the photoresist is removed by repeating a series of steps.
Form A, 3B, and 3G.

In the dyed ribbon, the film thickness of each dyed area is equal due to the correction by the transparent resin layer 2.

FIG. 2 shows the method for manufacturing a color filter according to the present invention. In the second row, a photosensitive transparent F94 resin film is formed on the dyed film 3 formed in the same manner as in the first row. Then, the film thickness was corrected to make the film thickness of each stained area the same.

FIG. 3 shows the third row of the method for manufacturing a color filter according to the present invention. In the first and second examples, the layer to be dyed is Q
However, in the third example, dyeing target 1-wo is patterned by photo-etching, so that dyeing target tvj is independent for each dyeing area. Since the degree of dyeing is correlated with the thickness of the layer to be dyed, in order to obtain a predetermined dyeing result, the thickness of the layer to be dyed is not necessarily equal even before dyeing.

Depending on the dye applied, the expansion of the dyed area 1- in each dyed area also differs. First, a photosensitive transparent resin film 2B is formed on the dyed area 14B on the transparent substrate l by photo-etching, by the difference in film thickness between the dyed area A and the dyed area B after dyeing of the layer to be dyed, which has been examined in advance.

Similarly, for the dyed area C, the dyed area A on the transparent substrate 1 is applied to the primary layer forming the photosensitive transparent resin layer 2C.
On top, the entire shape of the dyed layer 3A was changed by photoetching,
After dyeing, the first step is to perform a resist dyeing treatment using a resisting agent or a resisting film, and also for the dyed area B on the photosensitive transparent resin 1-2B and the dyed area C on the photosensitive transparent resin layer 2C. 3B to the dyed object 1 which was dyed by repeating the same process.
3 (: Fully formed, a color filter with equal film thickness in each dyed area is created.

FIG. 4 shows a fourth example of a revised method for producing a color filter according to the present invention. Correction was performed to make the film thickness of each stained area the same.

〔effect〕

Since the color filter according to the present invention has the same film thickness in each dyed area, When 'L is used in a liquid crystal display,
This has the effect that the alignment treatment is performed uniformly and the alignment state of the liquid crystal within the cell is improved. Furthermore, when a transparent electrical conductor is formed on a color filter according to the present invention, there is an effect that there are fewer disconnections at one stage compared to a color filter in which each dyed region has a different film thickness.

[Brief explanation of drawings]

1 to 4 are structural diagrams of the color filter according to the present invention. 1...Transparent substrate 2B, - Photosensitive transparent resin layer 2C on dyed area B...Sensitive transparent resin layer 3A on dyed area C...Dyeed dyed layer 3B on dyed area A... The dyed layer 3C on the dyed area B...The dyed layer on the dyed area C and above

Claims (1)

[Claims] In a color filter manufactured by selectively dyeing a layer to be dyed formed on a transparent substrate using a predetermined dye, the dyed film is removed by photo-etching before forming the layer to be dyed or after dyeing the layer to be dyed. A method for manufacturing a color filter, characterized in that a main line of a photosensitive transparent resin is formed in a thin dyed area by the thickness difference between the dyed area and the thickest dyed area after dyeing.