JPS6287905A - Production of waveguide lens - Google Patents
Production of waveguide lensInfo
- Publication number
- JPS6287905A JPS6287905A JP22819685A JP22819685A JPS6287905A JP S6287905 A JPS6287905 A JP S6287905A JP 22819685 A JP22819685 A JP 22819685A JP 22819685 A JP22819685 A JP 22819685A JP S6287905 A JPS6287905 A JP S6287905A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- crystallized glass
- waveguide
- curved face
- waveguide layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 239000011521 glass Substances 0.000 claims abstract description 27
- 230000003287 optical effect Effects 0.000 claims abstract description 7
- 239000010445 mica Substances 0.000 claims abstract description 6
- 229910052618 mica group Inorganic materials 0.000 claims abstract description 6
- 238000003754 machining Methods 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 16
- 239000013081 microcrystal Substances 0.000 claims description 5
- 238000005520 cutting process Methods 0.000 abstract description 12
- 229910000997 High-speed steel Inorganic materials 0.000 abstract description 2
- 229910000420 cerium oxide Inorganic materials 0.000 abstract description 2
- 239000003989 dielectric material Substances 0.000 abstract description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 abstract description 2
- 239000013078 crystal Substances 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 32
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- 229910003327 LiNbO3 Inorganic materials 0.000 description 4
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RJDOZRNNYVAULJ-UHFFFAOYSA-L [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] Chemical compound [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] RJDOZRNNYVAULJ-UHFFFAOYSA-L 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000004410 intraocular pressure Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/124—Geodesic lenses or integrated gratings
- G02B6/1245—Geodesic lenses
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は光導波路デバイスに用いられる導波路レンズの
製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing a waveguide lens used in an optical waveguide device.
導波路レンズは導波路中に組み込まれて、導波路内を伝
搬する拡散光束を導波路に平行な面内で平行光束に変換
したり、平行光束を上記面内で集束する機能をもち、光
集積スペクトラムアナライザ、光波長分割合波・分波回
路等の先導波路デバイスに広く使用されている。この導
波路レンズには種々の構成があるが、マルチモード光に
対して有効なものに導波路層の一部を特定形状の凹曲面
としたジオデシックレンズがある。そしてジオデシック
レンズの製造方法としては、LiNbO3基板に対して
はダイヤモンドバイトによる超精密切削、ガラス基板に
対して高温条件゛;での眼圧もしくは加圧加工が知られ
ている。A waveguide lens is incorporated into a waveguide and has the function of converting a diffused light beam propagating within the waveguide into a parallel light beam within a plane parallel to the waveguide, or converging a parallel light beam within the above plane. It is widely used in guided waveguide devices such as integrated spectrum analyzers and optical wavelength fractionating/demultiplexing circuits. This waveguide lens has various configurations, but one that is effective for multimode light is a geodesic lens in which a part of the waveguide layer has a concave curved surface of a specific shape. Known methods for manufacturing geodesic lenses include ultra-precision cutting using a diamond cutting tool for LiNbO3 substrates, and intraocular pressure or pressurization processing for glass substrates under high temperature conditions.
前者はLiNbO3基板を回転させダイヤモンドバイト
の位置を精密に数値制御して切削する方法であり、後者
はガラスの変形温度付近まで温度を上昇させグラファイ
ト等のモールドに不活性ガスで押しあてたり真空で吸引
したりすることにより、薄いガラス基板にジオデシック
レンズ凹曲面部を形成する方法である。The former is a method of cutting by rotating the LiNbO3 substrate and precisely numerically controlling the position of the diamond bite, while the latter is a method of raising the temperature to near the deformation temperature of glass and pressing it against a mold of graphite or the like with an inert gas or using a vacuum. This is a method of forming a concave curved surface portion of a geodesic lens on a thin glass substrate by applying suction.
上記のようにして凹曲面部を設けた基板に光導波路層を
形成するに当っては、LiNbO3基板の場合はTiを
拡散させ、またガラス基板の場合はガラスの屈折率を高
めるイオンをガラス内に拡散させることによって高屈折
率の光導波路層を形成している。When forming an optical waveguide layer on a substrate provided with a concave curved surface as described above, in the case of a LiNbO3 substrate, Ti is diffused, and in the case of a glass substrate, ions that increase the refractive index of the glass are introduced into the glass. An optical waveguide layer with a high refractive index is formed by diffusing the light into a high refractive index.
従来の製造方法のうちLiNbO3基板を用いたものは
基板の硬度が高いため、切削に時間がかかりまたコスト
が高くつくとしζう欠点があり、このためLiNb○3
独自の圧電効果や音響光学効果を特に利用する場合以外
は実用的でない。Among the conventional manufacturing methods, those using LiNbO3 substrates have the disadvantage that cutting takes time and costs are high due to the high hardness of the substrate.
It is not practical unless the unique piezoelectric effect or acousto-optic effect is specifically used.
またガラス基板の熱変形を用いる方法は簡便であるもの
の所望のジオデシックレンズ曲面の形状に精度良く加工
することが難しいという欠点がある。Furthermore, although the method using thermal deformation of a glass substrate is simple, it has the disadvantage that it is difficult to accurately process the shape of the desired geodesic lens curved surface.
上記の問題点を解決する本発明は、基板として内部に雲
母の微結晶を含む結晶化ガラスを使用し、この結晶化ガ
ラスの基板面の一部に機械加工によって所定形状の四部
を形成し、しがる後この四部を含む基板面にプラズマ化
学気相成長法(プラズマCVD法)等により高屈折率の
導波路層を積層形成する。The present invention, which solves the above problems, uses crystallized glass containing microcrystals of mica inside as a substrate, forms four parts of a predetermined shape on a part of the substrate surface of this crystallized glass by machining, After that, a high refractive index waveguide layer is laminated on the substrate surface including these four parts by plasma chemical vapor deposition (plasma CVD) or the like.
〔作用効果〕
内部に雲母の微結晶を含む結晶化ガラスは切削性が極め
て良好であり、ジオデシックレンズを構成する凹曲面部
を基板面に高い形状精度で容易に機械加工することがで
きる。[Operation and Effect] Crystallized glass containing microcrystals of mica inside has extremely good machinability, and the concave curved portion constituting the geodesic lens can be easily machined onto the substrate surface with high shape accuracy.
また上記結晶化ガラスは黄銅やアルミニウムよりも機械
加工性が良く、このため通常のガラスに対しては適用が
困難なダイヤモンドバイトによる超精密切削も適用する
ことができる。Furthermore, the above-mentioned crystallized glass has better machinability than brass or aluminum, and therefore, ultra-precision cutting using a diamond cutting tool, which is difficult to apply to ordinary glass, can be applied.
また上記結晶化ガラスは導波路層をプラズマCVD法で
形成する場合の基板温度上昇(約300″C)にも充分
耐えることができる。Further, the above-mentioned crystallized glass can sufficiently withstand the rise in substrate temperature (approximately 300''C) when the waveguide layer is formed by plasma CVD.
このように本発明方法によれば形状精度の良好なジオデ
シックレンズを含む先導波路を安価なコストで簡単な工
程によって製造することができ実用性が高い。As described above, according to the method of the present invention, a guiding waveguide including a geodesic lens with good shape accuracy can be manufactured at low cost and through a simple process, and is highly practical.
以下本発明を図面に示した一実施例について詳細に説明
する。第1図においてlは、内部に雲母の微結晶を含む
結晶化ガラスから成る快削性結晶化ガラス基板である。EMBODIMENT OF THE INVENTION Below, one embodiment of the present invention shown in the drawings will be described in detail. In FIG. 1, 1 is a free-cutting crystallized glass substrate made of crystallized glass containing mica microcrystals therein.
一例トL、 T 5i02.Al2O3,MgO,に2
0.F、B2O3を成分とする結晶化ガラスで、熱処理
により合成雲母の微結晶がランダムに成長しているもの
(市販品として米国コーニンググラスワークス社の商品
名「マコール」)を使用する。An example is L, T 5i02. Al2O3, MgO, Ni2
0. A crystallized glass containing F and B2O3 in which synthetic mica microcrystals are randomly grown by heat treatment (commercially available product, trade name "Macol", manufactured by Corning Glass Works, USA) is used.
上記の快削性結晶化ガラス基板lの面に、高速度鋼等か
ら成る研削工具2を用いてジオデシックレンズを成す凹
曲面3を加工形成する。A concave curved surface 3 constituting a geodesic lens is formed on the surface of the above-mentioned free-cutting crystallized glass substrate 1 using a grinding tool 2 made of high-speed steel or the like.
研削工具コの先端面uAは予めジオデシックレンズの曲
面′に形成されており、この研削工具の先端面2Aに例
えば酸化セリウムの水溶液を塗布し、約J OOrpm
の回転速度で基板lの表面/Aに押し当てて切削してジ
オデシック曲面3をつくる。The tip surface uA of the grinding tool is formed in advance into the curved surface of the geodesic lens, and the tip surface 2A of the grinding tool is coated with, for example, an aqueous solution of cerium oxide, and is heated to approximately JOOrpm.
A geodesic curved surface 3 is created by pressing the surface /A of the substrate 1 at a rotational speed of .
快削性結晶化ガラスは乳白色の不透明体であり、このガ
ラスだけでは導波路層を構成できないので、次の工程と
してプラズマCVD法によりジオデシック曲面3の領域
を含む基板表面上に透明誘電体を生成積層させて三層か
ら成る導波路層lを形成する。Free-cutting crystallized glass is a milky white opaque material, and since this glass alone cannot constitute a waveguide layer, the next step is to create a transparent dielectric material on the substrate surface including the geodesic curved surface 3 region by plasma CVD method. A waveguide layer l consisting of three layers is formed by laminating them.
第1の導波路層II/は例えば厚み10μmの8102
薄膜から成り、プラズマ発生領域に基板/を配置し、キ
ャリアの02ガスにより導入された5iC14を反応さ
せて形成される。The first waveguide layer II/ is, for example, 8102 with a thickness of 10 μm.
It is made of a thin film and is formed by placing a substrate in a plasma generation region and reacting 5iC14 introduced by carrier O2 gas.
第2の導波路層12は一例として厚み30μmの5i0
2 + Si3N4の薄膜から成り、この薄膜は第1の
導波路層4Z/の作製に続きプラズマ発生領域に結晶化
ガラス基板/を配置した状態でキャリアの02ガスによ
り導入された5iCJ4及びNH3を反応させ、第1の
導波路層IIlの上に生成積層させる。The second waveguide layer 12 is, for example, a 5i0 layer with a thickness of 30 μm.
2 + Si3N4 thin film, which reacts with 5iCJ4 and NH3 introduced by the carrier 02 gas with the crystallized glass substrate/ placed in the plasma generation region following the fabrication of the first waveguide layer 4Z/. Then, a generated layer is formed on the first waveguide layer IIl.
第3の導波路層13は一例として110μm厚みの81
02膜から成り、第2の導波路層II2の作製に続き、
プラズマ発生領域に基板/を配置した状態でキャリアの
02ガスにより導入された5i(J4を反応させ、第2
の導波路層グ2の上に生成積層させたものである。そし
て屈折率は中間の第一導波路層12が最も高く一例とし
て八5−であり、上下の第1、第2導波路層111.1
1.3がこれよりも低く一例として八IIrであり、第
2導波路層lI2が両側にクラッド層を有するマルチモ
ード光導波路として機能する。As an example, the third waveguide layer 13 has a thickness of 81 μm.
02 film, and following the fabrication of the second waveguide layer II2,
With the substrate / placed in the plasma generation area, 5i (J4) introduced by the carrier 02 gas is reacted, and the second
The waveguide layer 2 is produced and laminated on top of the waveguide layer 2. The refractive index of the intermediate first waveguide layer 12 is the highest, for example, 85-, and the upper and lower first and second waveguide layers 111.1
1.3 is lower than this, for example, 8IIr, and the second waveguide layer II2 functions as a multimode optical waveguide having cladding layers on both sides.
上記構成の導波路レンズにおいて、第2導波路層/I2
の端部に端面結合等により結合された光は上下の第11
第3導波路層111.’ljの間に閉じ込められ、基板
/の表面方向を伝搬する。そして基板のジオデシック曲
面四部3に沿った第2導波路層II2がジオデシックレ
ンズよとして作用し、この領域を通る光が平面内でレン
ズ作用を受け、例えば拡散光が平面内で平行光に変換さ
れた後、上記レンズjに続く平面導波路部をそのまま伝
搬する0
上述した実施例では各導波路層’l/、tI2゜’13
の膜材質としてSi及び5i02+Si3N4を用いた
が、使用波長の光に対して透明で所定の屈折率差がとれ
るものであれば材質に特に制限はない。In the waveguide lens having the above configuration, the second waveguide layer/I2
The light coupled to the ends of the
Third waveguide layer 111. 'lj and propagates in the direction of the surface of the substrate. The second waveguide layer II2 along the four geodesic curved surfaces 3 of the substrate acts as a geodesic lens, and the light passing through this region is subjected to a lens action within the plane, for example, diffused light is converted into parallel light within the plane. After that, the waveguide layer propagates as it is through the planar waveguide section following the lens j.
Although Si and 5i02+Si3N4 were used as the material of the film, there is no particular restriction on the material as long as it is transparent to light of the used wavelength and can provide a predetermined difference in refractive index.
また導波路層は、屈折率の異なる複数層を積層して断面
内で深さ方向にステップ状の屈折率分布を付与する以外
に、連続的に積層生成膜の組成を変化させる等の方法で
、深さ方向にパラポリツクな屈折率分布をもつ実質的に
単一層の導波路で構成することもできる。In addition to stacking multiple layers with different refractive indexes to give a step-like refractive index distribution in the depth direction within the cross section, the waveguide layer can be constructed by continuously changing the composition of the layered film. , it is also possible to construct a substantially single-layer waveguide having a refractive index distribution that is paraporic in the depth direction.
ただし基板lは不透明であるから導波路層中を伝搬する
光の電界分布が基板に達しないように第1の導波路層I
l/の厚み等を定めることが必要である。However, since the substrate I is opaque, the first waveguide layer I
It is necessary to determine the thickness of l/.
また光ファイバー等からの光を効率良く結合するために
、各導波路層’l/、l12.’13の各パラメータを
最適化することが望ましい。また基板/の加工方法とし
ては超高速皮屑工具による研削の代りにダイヤモンドバ
イトによる超精密切削法など種々の機械加工方法を用い
ることができる。In addition, in order to efficiently couple light from optical fibers, etc., each waveguide layer 'l/, l12. It is desirable to optimize each of the '13 parameters. In addition, as a processing method for the substrate, various machining methods such as an ultra-precision cutting method using a diamond cutting tool can be used instead of grinding using an ultra-high speed scraping tool.
さらに、導波路層の形成はプラズマCVD法以外にも周
知の種々の被膜形成方法を用いることができるが、プラ
ズマCVD法は透明な誘電体膜を厚く形成するのに適し
ており、ひび割れの発生等の品質劣化を容易に防止する
ことができるので、本発明方法では導波路層をプラズマ
CVD法で形成するのが望ましい。Furthermore, the waveguide layer can be formed using various well-known film forming methods other than the plasma CVD method, but the plasma CVD method is suitable for forming a thick transparent dielectric film and is less likely to cause cracks. In the method of the present invention, it is preferable to form the waveguide layer by the plasma CVD method because quality deterioration such as the above can be easily prevented.
図面は本発明の一実施例を示し、第7図は結晶化ガラス
基板に機械加工でジオデシック凹曲面部を形成する工程
を示す断面図、第一図は本発明方法で得られる導波路レ
ンズの断面図である。
/・・・・結晶化ガラス基板 2・・・・・・研削工具
3・・・・ジオデシック曲面 グ・・・・・・導波路層
!・・・・ジオデシックレンズ
第1図
第2図The drawings show an embodiment of the present invention, FIG. 7 is a sectional view showing the process of forming a geodesic concave curved surface part by machining on a crystallized glass substrate, and FIG. 1 is a diagram showing a waveguide lens obtained by the method of the present invention. FIG. /... Crystallized glass substrate 2... Grinding tool 3... Geodesic curved surface Gu... Waveguide layer! ...Geodesic lens Figure 1 Figure 2
Claims (1)
シックレンズ形状の凹曲面部を機械加工で形成する工程
と、前記凹曲面部を含む基板面に光導波路層を形成する
工程とを備えた導波路レンズの製造方法。The method comprises the steps of: forming a concave curved surface portion in the shape of a geodesic lens by machining on a substrate of crystallized glass containing mica microcrystals therein; and forming an optical waveguide layer on the substrate surface including the concave curved surface section. A method of manufacturing a waveguide lens.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22819685A JPS6287905A (en) | 1985-10-14 | 1985-10-14 | Production of waveguide lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22819685A JPS6287905A (en) | 1985-10-14 | 1985-10-14 | Production of waveguide lens |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6287905A true JPS6287905A (en) | 1987-04-22 |
Family
ID=16872706
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22819685A Pending JPS6287905A (en) | 1985-10-14 | 1985-10-14 | Production of waveguide lens |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6287905A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0591287U (en) * | 1992-05-19 | 1993-12-14 | 積水化成品工業株式会社 | Nursery frame |
-
1985
- 1985-10-14 JP JP22819685A patent/JPS6287905A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0591287U (en) * | 1992-05-19 | 1993-12-14 | 積水化成品工業株式会社 | Nursery frame |
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