JPS6292864A - Manufacture of thick-film type thermal head - Google Patents
Manufacture of thick-film type thermal headInfo
- Publication number
- JPS6292864A JPS6292864A JP60232542A JP23254285A JPS6292864A JP S6292864 A JPS6292864 A JP S6292864A JP 60232542 A JP60232542 A JP 60232542A JP 23254285 A JP23254285 A JP 23254285A JP S6292864 A JPS6292864 A JP S6292864A
- Authority
- JP
- Japan
- Prior art keywords
- thick
- printing
- resistor
- thermal head
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/345—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads characterised by the arrangement of resistors or conductors
Landscapes
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Electronic Switches (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、厚膜型サーマルヘッドの製造方法に係り、特
に、発熱抵抗素子の抵抗値の安定化をはかるための方法
に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method for manufacturing a thick film thermal head, and particularly to a method for stabilizing the resistance value of a heat generating resistor element.
プリンタあるいはブアクシミリ装置等の記録部において
用いられる感熱記録ヘッド(サーマルヘッド)において
は、高度な記録精度への成木が烏まるにつれて、各発熱
抵抗体の抵抗値の均一化と共に、長+11]にわたる抵
抗値の安定化が中太な問題となってきている。In the heat-sensitive recording head (thermal head) used in the recording section of a printer or a printing device, as the recording accuracy becomes more mature, the resistance value of each heating resistor becomes uniform, and the resistance value increases over a length of +11]. Stabilizing the resistance value has become a serious problem.
殊に、厚膜ベース1〜をスクリーン印刷することによっ
て作製したパターンを焼成することによって、抵抗体層
をはじめとした周辺回路を形成してなる厚膜型のサーマ
ルヘッドは、製造が容易でコストも低く機械的強度が高
いことから、サーマルヘッドの主流となってはいるが、
反面、7a膜型のものに比べてパターン精度が悪く、抵
抗値にバラツキが生じ易い上、早期に抵抗値の劣化が生
じ易いという不都合があった。In particular, a thick film type thermal head in which peripheral circuits including a resistor layer are formed by baking a pattern created by screen printing the thick film base 1 is easy to manufacture and inexpensive. Although it has become the mainstream of thermal heads because of its low heat and high mechanical strength,
On the other hand, compared to the 7a film type, the pattern accuracy is poor, the resistance value tends to fluctuate, and the resistance value easily deteriorates at an early stage.
ところでこの厚膜型のナーマルヘッドは、一般に、第4
図に示すようなフローチャートに従って製造される。By the way, this thick-film type nursing head generally has a fourth
It is manufactured according to the flowchart shown in the figure.
すなわち、まず、グレーズ加工のなされたセラミック基
板笠0絶縁基板を出発材料(F1)とし、スクリーン印
刷法によって導体を印刷した後、焼成し(F2)、フォ
トリソエッチング法により導体をパターニングすること
により電極を形成する(F3)。That is, first, a glazed ceramic substrate insulating substrate is used as a starting material (F1), a conductor is printed by a screen printing method, and then fired (F2), and an electrode is formed by patterning the conductor by a photolithographic etching method. (F3).
この後、発熱抵抗素子を構成するための抵抗体層パター
ンを、スクリーン印刷および焼成によって形成する(F
4)。Thereafter, a resistor layer pattern for configuring the heating resistor element is formed by screen printing and baking (F
4).
そして最後に、耐摩耗層を印刷、焼成し(F5)、完成
となる。Finally, a wear-resistant layer is printed and fired (F5) to complete the process.
完成後のサーマルヘッドの各発熱抵抗素子の抵抗値は、
使用する抵抗ペーストのシート抵抗値、抵抗体パターン
のパターン寸法、焼成温度によって決定される。The resistance value of each heating resistor element of the thermal head after completion is
It is determined by the sheet resistance value of the resistor paste used, the pattern dimensions of the resistor pattern, and the firing temperature.
しかし、このようにして形成された厚膜型サーマルヘッ
ドは、厚膜抵抗体からなる発熱抵抗累子に画情報に応じ
て選択的に一定の大きさ(電力値)の電気パルスを印加
し、所望の温度に発熱させるようにしたものである。こ
の厚膜抵抗体は、一般に印加電力に応じて抵抗値が変化
する性質を持っている。従って、使用している間に抵抗
値が変化してしまい、発熱量が変わることにより印字濃
度が変化する等の不都合が生じていた。このため、従来
は抵抗値の変化が少なくてすむように比較的小さな電力
でしか使用できず、また、大ぎな電力で使用した場合は
、抵抗値変化が大きく極めて寿命が短いという不都合が
あった。However, the thick-film thermal head formed in this way selectively applies electric pulses of a certain magnitude (power value) to the heating resistor made of thick-film resistors according to image information. It is designed to generate heat to a desired temperature. This thick film resistor generally has a property that its resistance value changes depending on the applied power. Therefore, the resistance value changes during use, and the amount of heat generated changes, causing problems such as changes in print density. For this reason, in the past, it was possible to use only a relatively small amount of power so that the change in resistance value was small, and when used with a large amount of power, there was a disadvantage that the change in resistance value was large and the lifespan was extremely short.
また、定電圧で駆動することも多いがこの場合、初期抵
抗値に合せ電圧を固定してしまうため、電力印加を続け
ていくと抵抗値が下がる。このため、実質の印加電力が
増加していき、抵抗値の変化を加速することになり、場
合によっては破壊に至ってしまうことがあった。Further, although it is often driven with a constant voltage, in this case, the voltage is fixed to match the initial resistance value, so the resistance value decreases as power continues to be applied. For this reason, the actual applied power increases, accelerating the change in resistance value, and in some cases leading to destruction.
本発明は、前記実情に鑑みてなされたちので、大電力で
使用する場合にも長期にわたって安定な印字特性を維持
することのできる厚膜型サーマルヘッドを提供すること
を目的とする。The present invention has been made in view of the above-mentioned circumstances, and an object of the present invention is to provide a thick-film thermal head that can maintain stable printing characteristics over a long period of time even when used with high power.
(問題点を解決するための手段)
そこで本発明では、印刷、焼成によって厚膜抵抗体を形
成し、発熱抵抗素子を形成した後、使用に先立ち、印字
電力よりも大きい電力を印加し、厚膜抵抗体を安定化す
る工程を導入するようにしている。(Means for Solving the Problems) Therefore, in the present invention, after forming a thick film resistor by printing and firing and forming a heating resistor element, before use, a power higher than the printing power is applied to the thick film resistor. We are introducing a process to stabilize the membrane resistor.
(作用)
ところで通常、厚膜抵抗体は第3図の曲線1に示す如く
印加電圧を大きくしていくとき、所定の電圧以上となる
と、該厚膜抵抗体自体のもつ抵抗値は変化してしまい、
更に、電圧を上げていくと破壊してしまうことが知られ
ている。(Function) Normally, when the applied voltage to a thick film resistor is increased as shown in curve 1 in Fig. 3, the resistance value of the thick film resistor itself changes when the voltage exceeds a predetermined value. Sisters,
Furthermore, it is known that increasing the voltage causes destruction.
本発明者らは、更に種々の実験を重ねた結果、一厚膜抵
抗体に対し所定の電圧以上の電圧を印加すると、抵抗値
は変化するが、その後、該電圧以下の電圧を印加しても
抵抗値の変化はほとんどない一ということを見いだした
。As a result of further various experiments, the present inventors found that when a voltage higher than a predetermined voltage is applied to a thick film resistor, the resistance value changes, but after that, when a voltage lower than the voltage is applied. It was also found that there was almost no change in resistance value.
本発明は、このことに着目してなされたもので、使用に
先立ち、あらかじめ、使用電圧よりも大きな電力を印加
することにより、抵抗値変化を生ぜしめておき、使用時
の電力印加では、抵抗値の変化を生じることのないよう
にしようとするものである。The present invention has been made with this in mind. Prior to use, a resistance value is caused to change by applying power greater than the working voltage in advance, and when power is applied during use, the resistance value The aim is to ensure that no changes occur.
すなわち、第3図の曲線1の極小点Aにあたる電力Δ′
以下の電力値、例えば電力B′をあらかじめ厚膜抵抗体
に印加した後、再度、電力を印加し、再度特性を測定し
ていくと、曲線2に示す如く、電力B′以下の印加電力
に対して抵抗値の変化はほとんど無視できる程度の小さ
な値となっている。That is, the power Δ' corresponding to the minimum point A of curve 1 in FIG.
After applying the following power value, for example, power B', to the thick film resistor in advance, applying power again and measuring the characteristics again, as shown in curve 2, the applied power below power B' On the other hand, the change in resistance value is so small that it can be almost ignored.
以下、本発明の実施例について図面を参照しつつ詳細に
説明する。Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
第1図および第2図(a).(b)は、夫々本発明実施
例の6ドット/InInの厚模型サーマルヘッドの製造
工程を示すフローチセート図、および同厚膜型サーマル
ヘッドの部分概要図である。(第2図(b)は第2図(
a)のA−A’ 断面図である。)
この厚膜型サーマルヘッドは、ガラス基板1上に、幅W
1=25μmの金厚膜パターンからなり互いに間隔d=
167μmで千鳥状に配列せしめられたリード電極A1
・・・八〇と、この上層に配設された幅W2=200μ
7W(7)M化ルテニウムトカラスとを主成分とする線
状の厚膜抵抗体Rとが形成されてなるもので、画情報に
応じて各リード電極に電流が供給され、該厚膜抵抗体R
の所定の素子領域が選択的に発熱せしめられるようにし
たものである。Figures 1 and 2 (a). (b) is a flow diagram showing the manufacturing process of a 6-dot/InIn thick model thermal head according to an embodiment of the present invention, and a partial schematic diagram of the same thick film type thermal head. (Figure 2 (b) is shown in Figure 2 (
It is an AA' sectional view of a). ) This thick film type thermal head has a width W on a glass substrate 1.
1 = 25 μm thick gold film pattern with mutual spacing d =
Lead electrodes A1 arranged in a staggered manner at 167 μm
...80, and the width W2 provided on this upper layer = 200μ
A linear thick film resistor R whose main component is 7W (7) M-ruthenium chloride is formed, and current is supplied to each lead electrode according to image information, and the thick film resistor Body R
A predetermined element region of the device is selectively made to generate heat.
次に、この厚膜型1ナーマルヘツドの作製方法について
説明する。Next, a method for manufacturing this thick film type one-terminal head will be explained.
まず、ガラス葛根1を準備しくN1)この表面上にスク
リーン印刷および焼成(900℃)によって金厚膜層を
形成した後(N2)、フォトリンエツチング法によりリ
ード電極へ1・・・A、のバターニングを行なう(N3
)。First, a glass root 1 is prepared.N1) A thick gold film layer is formed on this surface by screen printing and baking (900°C) (N2), and then lead electrodes 1... Perform buttering (N3)
).
この後、酸化ルテニウムおよびガラスを主成分とする抵
抗ペーストを用いてスクリーン印刷および焼成(870
℃)を行ない、線状の厚膜抵抗体Rを形成する(N4)
。This is followed by screen printing and firing (870
°C) to form a linear thick film resistor R (N4)
.
このようにして形成された厚膜抵抗体の電力印加に対す
る抵抗変化率の関係曲線は第3図の曲線1に示す如くで
あった。この抵抗変化率が極小点Aをとるときの印加電
力A′よりも小さい電力であって印字電力よりも大きい
電力B′を、この厚膜抵抗体Rに対して印加する(N5
)。(このときパルス幅は印字パルス幅の100〜10
00分の1程度とする。)
電力印加後の厚膜抵抗体Rの電力印加に対する抵抗変化
率の関係曲線は、第3図の曲線2に示す如くであり、電
力B′以下の電力では、抵抗値変化はほとんど無視でき
る程度であった。The relationship curve of the rate of change in resistance with respect to the application of electric power to the thick film resistor thus formed was as shown in curve 1 in FIG. 3. A power B' which is smaller than the applied power A' when the resistance change rate takes the minimum point A and which is larger than the printing power is applied to the thick film resistor R (N5
). (At this time, the pulse width is 100 to 10 of the printing pulse width.
It is assumed to be about 1/00. ) The relationship curve of the resistance change rate with respect to the power application of the thick film resistor R after power is applied is as shown in curve 2 in Figure 3, and at a power below the power B', the change in resistance value is almost negligible. Met.
このように、この厚膜型サーマルヘッドは、長時間にわ
たる印字操作に対してし抵抗値が極めて安定に維持され
ており、信頼性の高いものとなっている。In this way, this thick-film thermal head maintains an extremely stable resistance value even during long printing operations, making it highly reliable.
なお、実施例においては、リード電極に金厚膜を使用し
、また抵抗体層としては酸化ルテニウムとガラスとを主
成分とするものを用いたが、必ずしもこれらに限定され
るものではなく、他の厚膜材料を用いた場合にも有効で
あることはいうまでもない。In the example, a thick gold film was used for the lead electrode, and a material mainly composed of ruthenium oxide and glass was used as the resistor layer, but this is not necessarily limited to these, and other materials may be used. Needless to say, this method is also effective when using a thick film material.
また、厚膜抵抗体の上位に耐摩耗層等の保護層を形成す
る場合にも本発明の方法は適用可能であり、この場合は
すべての層の形成後に電力印加による安定化を行なうよ
うにしてもよいし、保1fflの形成に先立って行なう
ようにしてもよい。The method of the present invention can also be applied to the case where a protective layer such as a wear-resistant layer is formed on top of a thick film resistor, and in this case, stabilization by applying power is performed after forming all layers. Alternatively, it may be carried out prior to the formation of the 1ffl.
以上説明してきたように、本発明によれば、多数のリー
ド電極と、厚膜抵抗体とから形成され、複数の発熱抵抗
素子領域を構成してなる厚膜型サーマルヘッドを作製す
るに際し、印刷および焼成によって発熱抵抗素子領域を
形成した後、各素子領域の厚膜抵抗体パターンに対し、
印字電力よりも大きい電力を印加することにより、抵抗
値を安定化するようにしているため、各素子領域の抵抗
値は長期にわたって安定であり、極めて容易に長寿命で
あってかつ信頼性の高い厚膜型サーマルヘッドを形成す
ることが可能となる。As described above, according to the present invention, when producing a thick-film thermal head that is formed from a large number of lead electrodes and thick-film resistors and constitutes a plurality of heat-generating resistor element regions, printing is possible. After forming heat generating resistor element regions by firing and baking, for the thick film resistor pattern in each element region,
Since the resistance value is stabilized by applying a power larger than the printing power, the resistance value of each element area is stable over a long period of time, and it is extremely easy to achieve long life and high reliability. It becomes possible to form a thick film type thermal head.
第1図J5よび第2図<a)、(b)は、夫々、本発明
実施例の厚膜型サーマルヘッドの製造工程1 を示すフ
ローヂV〜ト図、および同厚膜型サーマルヘッドの部分
概要図、第3図は、発熱抵抗体に対して電気パルスを印
加したときの印加電力と抵抗変化率との関係における、
本発明実施例の方法によって形成したものと従来のちの
との比較図、第4図は、従来の厚膜型サーマルヘッドの
製造工程を示すフローチャート図である。
<A )−A 、 A 、 Am+2 ・(A
、 ) ・・・1 m m÷1
リード電極、R・・・厚膜抵抗体、
1・・・通常の方法によっτ形成されl〔発熱抵抗体に
電力を印加したときの電力と抵抗変化率との関係を示す
曲線、
2・・・本発明の方法によって形成された発熱抵抗体に
電力を印加したときの電力と抵抗変化率との関係を示す
曲線。
第1図
第2図(σ)
第2図(b)
第4図Figure 1 J5 and Figures 2 (a) and (b) are flow diagrams showing the manufacturing process 1 of the thick film type thermal head according to the embodiment of the present invention, and parts of the same thick film type thermal head, respectively. The schematic diagram, Figure 3, shows the relationship between the applied power and the rate of change in resistance when an electric pulse is applied to the heating resistor.
FIG. 4, which is a comparison diagram of the one formed by the method of the embodiment of the present invention and the conventional one, is a flowchart showing the manufacturing process of a conventional thick film type thermal head. <A)-A, A, Am+2 ・(A
, )...1 m m÷1 Lead electrode, R... Thick film resistor, 1... τ formed by the usual method l [Power and resistance change when power is applied to the heating resistor 2. Curve showing the relationship between electric power and resistance change rate when electric power is applied to the heating resistor formed by the method of the present invention. Figure 1 Figure 2 (σ) Figure 2 (b) Figure 4
Claims (2)
なる発熱抵抗素子を配設した厚膜型サーマルヘッドの製
造方法において、 印刷および焼成によって発熱抵抗素子を構成する厚膜抵
抗体のパターンを形成した後、 使用時の印字電力よりも大きい電力を印加する抵抗安定
化工程を含むことを特徴とする厚膜型サーマルヘッドの
製造方法。(1) In a method for manufacturing a thick-film thermal head in which a heat-generating resistor element consisting of one or more thick-film resistors is arranged on an insulating substrate, the thick-film resistor constitutes the heat-generating resistor element by printing and firing. A method for manufacturing a thick-film thermal head, comprising: after forming a pattern, a resistance stabilization step of applying power greater than printing power during use.
字パルスの100乃至1000分の1程度のパルス幅を
もつ電気パルスの形態をとるようにしたことを特徴とす
る特許請求の範囲第(1)項記載の厚膜型サーマルヘッ
ドの製造方法。(2) The electric power applied in the resistance stabilization step is in the form of an electric pulse having a pulse width of about 1/100 to 1/1000 of the printing pulse. ) The method for manufacturing a thick-film thermal head described in item 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60232542A JPH0725174B2 (en) | 1985-10-18 | 1985-10-18 | Method for manufacturing thick film type thermal head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60232542A JPH0725174B2 (en) | 1985-10-18 | 1985-10-18 | Method for manufacturing thick film type thermal head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6292864A true JPS6292864A (en) | 1987-04-28 |
| JPH0725174B2 JPH0725174B2 (en) | 1995-03-22 |
Family
ID=16940954
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60232542A Expired - Fee Related JPH0725174B2 (en) | 1985-10-18 | 1985-10-18 | Method for manufacturing thick film type thermal head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0725174B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6399230B1 (en) | 1997-03-06 | 2002-06-04 | Sarnoff Corporation | Multilayer ceramic circuit boards with embedded resistors |
| EP1016106A4 (en) * | 1997-03-06 | 2007-12-12 | Lamina Ceramics Inc | MULTI-LAYER CERAMIC PRINTED CIRCUIT BOARDS WITH PASSIVE RECESSED COMPONENTS |
| US10839992B1 (en) | 2019-05-17 | 2020-11-17 | Raytheon Company | Thick film resistors having customizable resistances and methods of manufacture |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5836474A (en) * | 1981-08-26 | 1983-03-03 | Yokogawa Hokushin Electric Corp | Thermal head |
-
1985
- 1985-10-18 JP JP60232542A patent/JPH0725174B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5836474A (en) * | 1981-08-26 | 1983-03-03 | Yokogawa Hokushin Electric Corp | Thermal head |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6399230B1 (en) | 1997-03-06 | 2002-06-04 | Sarnoff Corporation | Multilayer ceramic circuit boards with embedded resistors |
| EP1016106A4 (en) * | 1997-03-06 | 2007-12-12 | Lamina Ceramics Inc | MULTI-LAYER CERAMIC PRINTED CIRCUIT BOARDS WITH PASSIVE RECESSED COMPONENTS |
| US10839992B1 (en) | 2019-05-17 | 2020-11-17 | Raytheon Company | Thick film resistors having customizable resistances and methods of manufacture |
| WO2020236324A1 (en) * | 2019-05-17 | 2020-11-26 | Raytheon Company | Thick film resistors having customizable resistances and methods of manufacture |
| US11107610B2 (en) | 2019-05-17 | 2021-08-31 | Raytheon Company | Thick film resistors having customizable resistances and methods of manufacture |
| JP2022533642A (en) * | 2019-05-17 | 2022-07-25 | レイセオン カンパニー | Thick film resistors with custom resistors and manufacturing methods |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0725174B2 (en) | 1995-03-22 |
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| LAPS | Cancellation because of no payment of annual fees |