JPS63112193A - Manufacturing method of aluminum substrate for lithographic printing - Google Patents

Manufacturing method of aluminum substrate for lithographic printing

Info

Publication number
JPS63112193A
JPS63112193A JP25816186A JP25816186A JPS63112193A JP S63112193 A JPS63112193 A JP S63112193A JP 25816186 A JP25816186 A JP 25816186A JP 25816186 A JP25816186 A JP 25816186A JP S63112193 A JPS63112193 A JP S63112193A
Authority
JP
Japan
Prior art keywords
aluminum
aqueous solution
resin film
resin
lithographic printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25816186A
Other languages
Japanese (ja)
Inventor
Hideaki Kaneko
金子 秀昭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Parkerizing Co Ltd
Original Assignee
Nihon Parkerizing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Parkerizing Co Ltd filed Critical Nihon Parkerizing Co Ltd
Priority to JP25816186A priority Critical patent/JPS63112193A/en
Publication of JPS63112193A publication Critical patent/JPS63112193A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00Preparing for use and conserving printing surfaces
    • B41N3/03Chemical or electrical pretreatment
    • B41N3/036Chemical or electrical pretreatment characterised by the presence of a polymeric hydrophilic coating

Landscapes

  • Printing Plates And Materials Therefor (AREA)

Abstract

PURPOSE:To provide a durable hydrophilic surface in non-printing areas and enhance adhesion of a photosensitive layer to an aluminum plate, by providing a resin film on the surface of an aluminum plate or aluminum alloy plate by applying an aqueous solution containing as a main constituent an organic high- molecular weight material which shows a cationic property in aqueous solutions. CONSTITUTION:A resin film is provided on the surface of an aluminum plate by applying an aqueous solution containing as a main constituent an organic high molecular weight material showing a cationic property in aqueous solutions, thereby producing an aluminum base for planography. The aluminum preferably has a surface previously subjected to mechanical graining, anodizing or a chemical conversion treatment to enhance adhesion of the resin film thereto. A organic high-molecular weight resin to be used as the organic high-molecular weight material comprises, as a main constituent, a high molecular weight resin having a multiplicity of amino groups (-NR2, wherein R is H, Oh or an alkyl) in the molecule thereof. Among the resins, those which give a particularly favorable result include a water-soluble polyamide resin and a cationic acrylic resin.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は平版印刷用アルミニウム基板の製造方法に関す
るものである。更に詳しくは平版印刷用プレートに用い
るアルミニウムまたはアルミニウム合金板(本発明でア
ルミニウム、アルミニウム合金板を以下アルミニウム板
と総称する)表面に親水性を付与し、印刷性を向上せし
めた平版印刷用アルミニウム板の製造方法に関するもの
である[従来の技術] 平版印刷板を製造するためのベース材料として使用され
るアルミニウム板は0.1〜0 、4 mm厚のものが
多く用いられ、表面は油類が付着しているので脱脂し、
使用する。アルミニウム板はとくに砂目立てなどしない
で滑面のまま感光液を塗布する場合もあるが、耐刷持続
性が悪いため軽印刷用など以外は、研磨砂を用いたブラ
シ研磨、電解による表面粗化または陽極酸化などの事前
処理を行った後、水洗、乾燥してアルミニウム基板とす
る。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method of manufacturing an aluminum substrate for planographic printing. More specifically, an aluminum or aluminum alloy plate used for a lithographic printing plate (in the present invention, aluminum and aluminum alloy plates are collectively referred to as aluminum plates hereinafter) has a hydrophilic surface and has improved printability. [Prior art] Aluminum plates used as base materials for producing lithographic printing plates are often 0.1 to 0.4 mm thick, and the surface is coated with oil. Since it is attached, degrease it,
use. In some cases, aluminum plates are coated with a photosensitive liquid on a smooth surface without any particular graining, but since printing durability is poor, for purposes other than light printing, brush polishing with abrasive sand or surface roughening by electrolysis is used. Alternatively, after pre-treatment such as anodization, washing with water and drying is performed to obtain an aluminum substrate.

その後感光液を塗布し表面にマット化剤を塗布する工程
で平版印刷板とする。
Thereafter, a photosensitive liquid is applied and a matting agent is applied to the surface to form a lithographic printing plate.

アルミニウム板の上に塗布される感光層との密着性を向
上させ且つ、それを用いて作製される平版印刷板の非画
像部分の保水性を改善することを目的とし、アルミニウ
ム板には粗面化や陽極酸化が行われているが、この処理
だけではこれらの表面は経時によって親水性面から疎水
面に変化する。
The aluminum plate has a rough surface for the purpose of improving the adhesion with the photosensitive layer coated on the aluminum plate and improving the water retention of the non-image area of the lithographic printing plate produced using it. However, with this treatment alone, these surfaces change from hydrophilic to hydrophobic over time.

従って極めて高い印刷版数を得るための平版印刷板には
望ましくない。すなわち疎水面に変化するに従って非印
刷部分に油性のインキが除々に蓄積する傾向を示し、い
わゆるトーニング(toning)あるいはスカミング
(scumming)なる現象が現われて印刷性が劣っ
てくる。このトーニングまたはスカミングをなくするた
めにはアルミニウム基板の表面は不活性で、持続性のあ
る親水性面を有するものでなくてはならない。
Therefore, it is not desirable for lithographic printing plates for obtaining extremely high printing plate numbers. That is, as the surface changes to a hydrophobic surface, oil-based ink tends to gradually accumulate in non-printing areas, and a phenomenon called so-called toning or scumming appears, resulting in poor printability. To eliminate this toning or scumming, the surface of the aluminum substrate must be inert and have a persistent hydrophilic surface.

親水性面を与える方法として、アルミニウム板をケイ酸
アルカリ塩水溶液で処理する方法がある。
One method for imparting a hydrophilic surface is to treat an aluminum plate with an aqueous alkali silicate solution.

このように処理したアルミニウム基板の上に感光性水溶
性ジアゾ樹脂などの感光層で被覆し平版印刷用プレート
とするが、原紙又はネガを通して光線をこの上に感光す
ると感光層の露光部分は反応し、疎水性を有する樹脂の
画像を形成する。露光されなかった部分はアルカリ液な
どからなる現像液により洗浄除去せしめ、非画像部分に
親水性面を付与したケイ酸塩層部分をアルミニウム表面
に残留せしめることが特徴である。
The thus treated aluminum substrate is coated with a photosensitive layer such as a photosensitive water-soluble diazo resin to form a lithographic printing plate, but when a light beam is exposed onto the plate through a base paper or a negative, the exposed portions of the photosensitive layer react. , forming an image of a hydrophobic resin. It is characterized in that the unexposed areas are washed away with a developer such as an alkaline solution, leaving the silicate layer portions with a hydrophilic surface imparted to the non-image areas on the aluminum surface.

[発明が解決しようとする問題点] このケイ酸アルカリ塩水溶液による処理はアルミニウム
表面の親水性付与には役立つが、しかし親水性の持続性
が十分でなく、且つその上に塗布される感光層との密着
性が損われて、感光層の寿命が短いなどの欠点を有して
いた。
[Problems to be Solved by the Invention] Treatment with an aqueous alkali silicate solution is useful for imparting hydrophilicity to the aluminum surface, but the hydrophilicity does not last long enough, and the photosensitive layer coated thereon is This has disadvantages such as poor adhesion with the photosensitive layer and short life of the photosensitive layer.

本発明は上記の問題点に鑑みてなされたものであす、非
印刷部分に持続性のある親水性面を形成し、あわせて感
光層のアルミニウム板への密着性を向上せしめ、堅牢な
印刷面を形成する平版印刷用アルミニウム基板の製造方
法を提供することを目的とする。
The present invention has been made in view of the above problems.It forms a long-lasting hydrophilic surface in the non-printing area, improves the adhesion of the photosensitive layer to the aluminum plate, and provides a robust printed surface. An object of the present invention is to provide a method for manufacturing an aluminum substrate for lithographic printing.

[問題点を解決するための手段] 本発明は上記目的を達成するための方法で、その要旨は
下記のごとくである。即ち(1)アルミニウム板の表面
に水溶液中で陽イオン性を呈する有機高分子材料を主と
する水溶液を塗着せしめてなる樹脂皮膜を僅えることを
特徴とする平版印刷用アルミニウム基板の製造方法であ
り、(2)樹脂皮膜が水溶液中で陽イオン性を呈する水
溶液ポリアミド樹脂の水溶液を塗着せしめてなる樹脂皮
膜である前記(1)の方法であり、又(3)樹脂皮膜が
水溶液中で陽イオン性を呈するカチオン系アクリル樹脂
の水溶液を塗着せしめてなる樹脂皮膜である前記(1)
の方法であり、又(4)樹脂皮膜が水溶液中で陽イオン
性を呈する有機高分子材料に四価金属元素化合物を添加
した水溶液を塗着せしめてなる樹脂皮膜である前記(1
)の方法であり、又(5)樹脂皮膜が水溶液中で陽イオ
ン性を呈する有機高分子材料にコロイダルシリカを添加
した水溶液を塗着せしめてなる前記(1)の方法であり
、又(6)アルミニウム板がその表面をあらかじめ機械
的に粗面化したアルミニウム板である前記(1)〜(5
)に記載の方法であり、又(7)アルミニウム板がその
表面にあるいは前記(6)で示す機械的に粗面化した゛
アルミニウム板の表面にあらかじめ陽極酸化皮膜を形成
せしめたアルミニウム板である前記(1)〜(6)に記
載の方法であり、又(8)アルミニウム板がその表面に
あるいは前記(6)で示す機械的に粗面化したアルミニ
ウム板の表面に、あるいは前記(7)で示す陽極酸化皮
膜を形成せしめた表面にあらかじめクロメート化成皮膜
を形成せしめたアルミニウム板である前記(1)〜(7
)に記載の方法である。
[Means for Solving the Problems] The present invention is a method for achieving the above object, and the gist thereof is as follows. Namely, (1) a method for producing an aluminum substrate for lithographic printing, which comprises coating the surface of an aluminum plate with an aqueous solution mainly composed of an organic polymeric material exhibiting cationic properties in an aqueous solution to form a resin film; and (2) the resin film is a resin film formed by applying an aqueous solution of an aqueous polyamide resin exhibiting cationic properties in an aqueous solution, and (3) the resin film is a resin film formed in an aqueous solution. (1) above, which is a resin film formed by coating an aqueous solution of a cationic acrylic resin exhibiting cationic properties.
(4) The resin film is a resin film formed by applying an aqueous solution containing a compound of a tetravalent metal element to an organic polymeric material exhibiting cationic properties in an aqueous solution.
), and (5) the method of (1) above, in which the resin film is coated with an aqueous solution containing colloidal silica on an organic polymeric material exhibiting cationic properties in an aqueous solution; ) The aluminum plate is an aluminum plate whose surface has been mechanically roughened in advance (1) to (5).
), and (7) the aluminum plate is an aluminum plate on which an anodic oxide film has been previously formed on its surface or on the surface of the mechanically roughened aluminum plate shown in (6) above. (1) to (6), and (8) an aluminum plate is applied to the surface of the aluminum plate or the mechanically roughened surface of the aluminum plate shown in (6) above, or in the method (7) above. (1) to (7) above, which are aluminum plates on which a chromate conversion film has been previously formed on the surface on which the anodic oxide film has been formed as shown.
).

[作用] 本発明で用いるアルミニウム板は樹脂皮膜との密着性を
高めるために、その表面をあらかじめ機械的に粗面化し
たものや、陽極酸化処理を施したものや化成処理したも
のが望ましい。
[Function] In order to improve the adhesion with the resin film, the aluminum plate used in the present invention preferably has its surface mechanically roughened, anodized, or chemically treated in advance.

陽極酸化は硫酸、シュウ酸、リン酸、クロム酸などの電
解液によって行われ、一般的には電解液が1〜80重量
%5浴温5〜70℃、電流密度0゜5〜60アンペア/
dra”、電圧1〜100v、電解時間30秒〜50分
の範囲が適当である。又不発明に用いることのできる化
成処理方法としては、アルカリ−クロム酸塩法、クロム
酸塩法、リン酸クロム酸塩法、クロム酸を含有する樹脂
皮膜処理法があり、又クロムを含有しない皮膜化成法と
してリン酸亜鉛法並びにチタン、ジルコンのリン酸皮膜
化成処理法があるが、クロム酸クロメートやリン酸クロ
メート等のクロメート化成皮膜は簡易で一般的である。
Anodic oxidation is carried out using an electrolyte such as sulfuric acid, oxalic acid, phosphoric acid, or chromic acid. Generally, the electrolyte is 1 to 80% by weight5, the bath temperature is 5 to 70℃, the current density is 0.5 to 60 ampere/
dra'', a voltage of 1 to 100 V, and an electrolysis time of 30 seconds to 50 minutes. Chemical conversion treatment methods that can be used inventively include alkali-chromate method, chromate method, phosphoric acid method, etc. There are the chromate method and the resin film treatment method containing chromic acid, and the zinc phosphate method and the phosphate film chemical conversion treatment method for titanium and zircon, which do not contain chromium. Chromate conversion coatings such as acid chromate are simple and common.

本発明に用いる水溶液中で陽イオン性を呈する有機高分
子樹脂は、分子中に多数のアミノ基(−NR2:RはH
,OHもしくはアルキル基)を有する高分子樹脂を主体
としたものである。
The organic polymer resin that exhibits cationic properties in the aqueous solution used in the present invention has many amino groups (-NR2:R is H
, OH or alkyl group).

樹脂骨格中の−NR,を有する樹脂は水溶液中では無機
酸もしくは有機酸によって、−NHR−として陽イオン
性を呈し、水溶液中に溶解もしくは分散する。
A resin having -NR in its resin skeleton exhibits cationic properties as -NHR- by an inorganic or organic acid in an aqueous solution, and is dissolved or dispersed in an aqueous solution.

陽イオン性を呈し水溶液中に溶解もしくは分散した樹脂
はアルカリ溶液中もしくは陰イオン性化合物によってそ
の荷電を失い沈降もしくは不溶化し析出する性質を有す
る。又、多価金属イオンによって、樹脂が会合し、不溶
化し析出する性質も有する。
A resin that exhibits cationic properties and is dissolved or dispersed in an aqueous solution has the property of losing its charge in an alkaline solution or with an anionic compound, and precipitating or becoming insolubilized to precipitate. It also has the property that the resin associates with polyvalent metal ions, becomes insolubilized, and precipitates.

従って、亜鉛、クロム、アルミニウムなどの多価金属イ
オンやリン酸イオン、クロム酸イオンなどの陰イオンか
らなる化成皮膜上に、これらの多価金属や陰イオンが樹
脂と結合して有機高分子樹脂皮膜を形成する。上記樹脂
皮膜は水濡れ性を呈し親水性に優れるが、親水性を更に
向上させるためには樹脂骨格中に、カルボキシル基、水
酸基、およびアミノ基などを導入することもできる。
Therefore, on a chemical conversion coating consisting of polyvalent metal ions such as zinc, chromium, and aluminum, and anions such as phosphate ions and chromate ions, these polyvalent metals and anions combine with the resin to form an organic polymer resin. Forms a film. The resin film exhibits water wettability and is excellent in hydrophilicity, but in order to further improve hydrophilicity, carboxyl groups, hydroxyl groups, amino groups, etc. can be introduced into the resin skeleton.

これらの樹脂の代表的なものとして、水溶性ポリアミド
樹脂、ポリエチレンイミン、陽イオン性高分子界面活性
剤およびカチオン電着塗料に用いられている樹脂を用い
ることができるが、特に良好な結果を示すものとして水
溶性ポリアミド樹脂やカチオン系アクリル樹脂をあげる
ことができる。
Typical examples of these resins include water-soluble polyamide resins, polyethyleneimine, cationic polymeric surfactants, and resins used in cationic electrodeposition paints, which show particularly good results. Examples include water-soluble polyamide resins and cationic acrylic resins.

又本発明による、水溶液中で陽イオン性を呈する有機高
分子樹脂溶液中に、ケイ素、ジルコニウム、チタニウム
またはスズなどの四価の原子価を有する金属の塩を添加
し、無機酸もしくは有機酸でPHを2〜7の範囲に調整
した処理液を用意し、この処理液を塗布することにより
形成した高分子樹脂皮膜は、樹脂単独皮膜より密着性や
親水性能の向上を図ることができる。
In addition, according to the present invention, a salt of a tetravalent metal such as silicon, zirconium, titanium, or tin is added to an organic polymer resin solution that exhibits cationic properties in an aqueous solution, and then an inorganic or organic acid is added. A polymer resin film formed by preparing a treatment liquid with a pH adjusted to a range of 2 to 7 and applying this treatment liquid can have improved adhesion and hydrophilic performance compared to a resin-only coating.

また、本発明による水溶液中で陽イオン性を呈する有機
高分子樹脂溶液中に、均一に分散することのできる陽イ
オン性荷電を有するコロイダルシリカを含有する液を用
いた樹脂皮膜は、樹脂単独皮膜より耐食性並びに親水性
能を向上せしめることができる。
In addition, the resin coating according to the present invention using a liquid containing colloidal silica having a cationic charge that can be uniformly dispersed in an organic polymer resin solution exhibiting cationic properties in an aqueous solution is a resin-only coating. Corrosion resistance and hydrophilic performance can be further improved.

本発明に用いることのできる無機酸で最も効果的なもの
はリン酸である。また、有機酸は、種々の一塩基酸、二
塩基酸および多塩基酸を用いることができる。
The most effective inorganic acid that can be used in the present invention is phosphoric acid. Moreover, various monobasic acids, dibasic acids, and polybasic acids can be used as the organic acids.

本発明における上記処理液の処理温度は、常温〜80℃
であり、通常は常温(10〜40℃)に定めるが、作業
性向上などの目的で浴温を加温して実施することも可能
である。80℃以上では、水の蒸発が早く、処理液濃度
の変化が起り易く、不利である。
The processing temperature of the above-mentioned processing liquid in the present invention is room temperature to 80°C.
This is usually set at room temperature (10 to 40°C), but it is also possible to increase the bath temperature for the purpose of improving workability. A temperature of 80° C. or higher is disadvantageous because water evaporates quickly and the concentration of the treatment liquid tends to change.

このようにして得られたアルミニウム基板の表面上に更
に感光性物質を塗布することによって感光性平版を得る
ことが出来る。
A photosensitive planographic plate can be obtained by further coating a photosensitive material on the surface of the aluminum substrate thus obtained.

感光性物質は現在市販されているものを適用することが
出来る。一般的な基本組成は、(1)主体ポリマー、(
2)ビニル系ポリマー、(3)光重合開始剤、(4)熱
重合禁止剤、(5)その他の添加物、であり、使用目的
により化合物や配合割合の組合せが変る。
As the photosensitive material, currently available commercially available materials can be used. The general basic composition is (1) main polymer, (
2) a vinyl polymer, (3) a photopolymerization initiator, (4) a thermal polymerization inhibitor, and (5) other additives, and the combination of compounds and blending ratios varies depending on the purpose of use.

(1)主体ポリマーとしてはポリアミド系、水可溶性ポ
リマー系、セルローズ系、不飽和ポリエステル系、合成
ゴム系などが挙られる。
(1) Examples of the main polymer include polyamide, water-soluble polymer, cellulose, unsaturated polyester, and synthetic rubber.

(2)ビニル系ポリマーとしては、アクリル酸エステル
、アクリル酸アミド、メタクリル酸エステル。
(2) Vinyl polymers include acrylic ester, acrylic amide, and methacrylic ester.

およびメタクリル酸アミドなどが用いられる。and methacrylic acid amide.

(3)光重合開始剤としては、ベンゾフェノン系、ベン
ゾイン系、ケタール系、チオキサントン系、アントラキ
ノン系などのラジカル重合開始剤が用いられる。
(3) As the photopolymerization initiator, radical polymerization initiators such as benzophenone, benzoin, ketal, thioxanthone, and anthraquinone are used.

(4)熱重合禁止剤としては、保存時の安定性や感光層
形成時の加熱による重合禁止剤としてヒドロキノン、メ
トキシフェノール、N−ニトロソヒドロキシルアミン類
が用いられる。
(4) As the thermal polymerization inhibitor, hydroquinone, methoxyphenol, and N-nitrosohydroxylamine are used as an inhibitor for stability during storage and polymerization due to heating during formation of the photosensitive layer.

(5)その他の添加物としては、着色のための染料、顔
料、感光層の皮膜物性を変えるための可塑剤並びに塗布
作業性向上のための溶剤が添加される。
(5) Other additives include dyes and pigments for coloring, plasticizers for changing the physical properties of the photosensitive layer, and solvents for improving coating workability.

[実施例] 以下に実施例を挙げて本発明を説明する。[Example] The present invention will be explained below with reference to Examples.

実施例1 アルミニウム用クロム酸クロメート皮膜化成
処理剤(登録商標ボンデライト7132日本パー力ライ
ジング(株)製)を’72gIQの割合で水に希釈し、
この水溶液を50℃に維持し、その水溶液中に、あらか
じめ清浄にしたアルミニウム板(A 1050)を約2
分間浸漬して、クロム付着量として約100 mg/m
”のクロム酸クロメート化成皮膜を形成し、次いでアル
ミニウム板を水洗洗浄した。しかる後、水溶液中で陽イ
オン性を呈する水溶性ポリアミド樹脂(商品名AQナイ
ロン、東しく株))を20gIQの割合で溶解し、更に
リン酸でPH3,0に調整した浴温30’Cの処理液に
該アルミニウム板を浸漬塗布した後、熱風乾燥炉で12
0℃の温度で3分間の乾燥焼付工程を行なうことによっ
て上記クロメート化成皮膜上に水濡れ性を呈するポリア
ミド樹脂皮膜を約0 、5 g/m”の付着量でもって
形成させた。
Example 1 A chromate chromate film conversion treatment agent for aluminum (registered trademark Bonderite 7132 manufactured by Nippon Parriki Rising Co., Ltd.) was diluted with water at a ratio of 72 gIQ,
This aqueous solution was maintained at 50°C, and a pre-cleaned aluminum plate (A 1050) was placed in the aqueous solution for about 2 hours.
After soaking for 1 minute, the amount of chromium deposited is approximately 100 mg/m
A chromic acid chromate conversion film was formed, and then the aluminum plate was washed with water. After that, a water-soluble polyamide resin (trade name: AQ Nylon, Toshishiku Co., Ltd.) that exhibits cationic properties in an aqueous solution was applied at a rate of 20 gIQ. After dissolving the aluminum plate and coating it by dipping in a treatment solution with a bath temperature of 30'C adjusted to pH 3.0 with phosphoric acid, it was dried in a hot air drying oven for 12 hours.
By carrying out a dry baking process at a temperature of 0° C. for 3 minutes, a water-wettable polyamide resin film was formed on the chromate conversion film with a coating weight of about 0.5 g/m''.

このようにして得られたアルミニウム基板の上にジアゾ
化合物とアクリル系共重合体から成る感光層を約2.5
μ形成させた。
On the aluminum substrate obtained in this way, a photosensitive layer consisting of a diazo compound and an acrylic copolymer is deposited for approximately
μ was formed.

このようにして得られたアルミニウム板を露光し。The aluminum plate thus obtained was exposed to light.

弱アルカリ性の現像液で現像を行った。Development was performed using a weakly alkaline developer.

現像後のアルミニウム板面を水で払拭した後、油性印刷
用インキでロール塗布すると感光層の樹脂表面はインキ
とよくなじむが感光層が除去された非印刷部分は油性の
印刷インキをよくはじいた。
After wiping the surface of the aluminum plate after development with water, when it was roll-coated with oil-based printing ink, the resin surface of the photosensitive layer blended well with the ink, but the non-printing areas where the photosensitive layer had been removed repelled the oil-based printing ink well. .

この非印刷部分の親水性を確認するため、ゴニオ式接触
角測定器を用いて測定した結果、水の接触角は約10度
で良好な結果を示し、又室内に約1ケ月放置後も水の接
触角の上昇はなかった。
In order to confirm the hydrophilicity of this non-printed part, we measured it using a gonio-type contact angle measuring device, and found that the water contact angle was approximately 10 degrees, a good result. There was no increase in the contact angle.

一方、流水中に本発明品を約1ケ月浸漬した後も水の接
触角の上昇はほとんどなく、従って本発明品の水濡れ性
は長期間にわたって劣化することなく良好に維持できる
ことがわかった。
On the other hand, even after the product of the present invention was immersed in running water for about one month, there was almost no increase in the contact angle of water, indicating that the water wettability of the product of the present invention could be maintained well over a long period of time without deterioration.

又感光層の素地との密着性の評価として、1mm平方角
のゴバン目の素地に達する傷を感光層に入れた後、セロ
ファンテープを貼着し、次いで強くひき剥がす試験を行
ったが、その結果は感光層の剥離はなく、良好な密着性
を示した。
To evaluate the adhesion of the photosensitive layer to the substrate, a test was conducted in which a 1 mm square scratch reaching the substrate was made in the photosensitive layer, a cellophane tape was attached, and then it was strongly peeled off. The results showed that there was no peeling of the photosensitive layer and good adhesion was observed.

本実施例1の試験結果は後掲の表1にまとめて示した。The test results of Example 1 are summarized in Table 1 below.

比較例1 この比較例では実施例1と同様の方法でクロ
メート化成皮膜を形成したが樹脂皮膜形成処理を行わな
かった。この比較例1を実施例1と同様に処理し試験を
行ったが表1に示すごとく、初期の水濡れ性は実施例1
とはゾ同等で良好であるが、経時によって水の接触角が
増加し、水濡れ性が著しく低下した。
Comparative Example 1 In this comparative example, a chromate conversion coating was formed in the same manner as in Example 1, but no resin coating treatment was performed. Comparative Example 1 was treated and tested in the same manner as Example 1, but as shown in Table 1, the initial water wettability was lower than that of Example 1.
However, as time passed, the contact angle of water increased and the water wettability significantly decreased.

実施例2 アルミニウム用リン酸クロメート皮膜化成処
理液(登録商標ボンデライト701のAB剤48g/ 
Qと、同じくボンデライト701のAC剤27g/Qと
の混合溶液、日本パー力ライジング(株)製)で液温度
50℃に、あらかじめ清浄にしたアルミニウム板を1分
間浸漬してクロム付着量として約150mg/m2のリ
ン酸クロメート皮膜を形成させ、次いで水洗した。しか
る後、ビニルピロリドンとジメチルアミノエチルメタク
リレート共重合体の四級塩化合物(カチオン系アクリル
樹脂、商品名コポリマー937、GAFコーポレーショ
ン)20g/u、PH6,5,浴温35℃の水溶液に該
アルミニウム板を浸漬した後、熱風乾燥炉で120℃の
温度で30分間乾燥し焼付けた。
Example 2 Phosphate chromate film chemical conversion treatment solution for aluminum (AB agent 48g of registered trademark Bonderite 701/
A pre-cleaned aluminum plate was immersed for 1 minute in a mixed solution of Q and 27 g/Q of AC agent also Bonderite 701 (manufactured by Nippon Parriki Rising Co., Ltd.) at a temperature of 50°C to determine the amount of chromium deposited. A phosphoric acid chromate film of 150 mg/m2 was formed and then washed with water. After that, the aluminum plate was placed in an aqueous solution of 20 g/u of a quaternary salt compound of vinylpyrrolidone and dimethylaminoethyl methacrylate copolymer (cationic acrylic resin, trade name Copolymer 937, GAF Corporation), pH 6.5, bath temperature 35°C. After immersing it, it was dried and baked in a hot air drying oven at a temperature of 120°C for 30 minutes.

これによってリン酸クロメート化成皮膜上に上記樹脂皮
膜を約0 、5 g/m2の付着量で形成した。
As a result, the resin film was formed on the phosphoric acid chromate conversion film with a coating weight of about 0.5 g/m 2 .

本処理を施したアルミニウム基板を実施例1と同様の試
験を行った結果を表1に示したが、水濡れ性は、長期間
にわたって劣化することなく良好に維持でき、又感光層
の密着性もよかった。
The aluminum substrate subjected to this treatment was subjected to the same test as in Example 1, and the results are shown in Table 1. The water wettability was maintained well over a long period of time without deterioration, and the adhesion of the photosensitive layer was It was also good.

比較例2 実施例2と同様の方法で処理し、樹脂皮膜を
形成しなかったリン酸クロメート化成皮膜単独のもので
は、表1に示すごとく、経時によって水の接触角が増大
し、水濡れ性が低下した。
Comparative Example 2 As shown in Table 1, when the phosphoric acid chromate chemical conversion coating alone was treated in the same manner as in Example 2 and did not form a resin coating, the contact angle of water increased over time and the water wettability decreased. decreased.

実施例3 実施例1と同じ方法でアルミニウム板の表面
にクロム酸クロメート化成皮膜を形成させ、次いで洗浄
した。ひき続き、実施例1で使用した水溶性ポリアミド
樹脂20gIQの水溶液にジルコンフッ化水素錯塩6g
/Qを添加溶解し、更にリン酸でPH3に調整した浴温
30℃の水溶液に該アルミニウム板を浸漬塗布した後、
熱風乾燥炉で120℃、30分の乾燥焼付を行い、約0
.3g/m2の付着量を有する樹脂皮膜を形成させた。
Example 3 A chromate chromate conversion film was formed on the surface of an aluminum plate in the same manner as in Example 1, and then washed. Subsequently, 6 g of zirconate hydrogen fluoride complex salt was added to the aqueous solution of 20 g IQ of the water-soluble polyamide resin used in Example 1.
/Q was added and dissolved, and the aluminum plate was dip-coated in an aqueous solution with a bath temperature of 30°C adjusted to pH 3 with phosphoric acid,
Dry and bake for 30 minutes at 120℃ in a hot air drying oven, resulting in approximately 0.
.. A resin film with a coating weight of 3 g/m2 was formed.

本処理を施したアルミニウム基板の性能確認を実施例1
と同様の方法で行った結果を表1に示したが、水濡れ性
は長期間にわたって劣化することなく良好に維持でき又
感光層の密着性もよかった。
Example 1 Confirming the performance of aluminum substrates subjected to this treatment
The results obtained using the same method as above are shown in Table 1, and the water wettability was maintained well over a long period of time without deterioration, and the adhesion of the photosensitive layer was also good.

実施例4〜6 実施例1と同じ方法でアルミニウム板の
表面にクロム酸クロメート化成皮膜を形成させ、次いで
洗浄した。ひき続き実施例1で使用した水溶性ポリアミ
ド樹脂20gIQの水溶液に、カチオン荷電分散性コロ
イダルシリカ(登録商標スノーテックスAK、日産化学
)を2gIQ、 5gIQおよびLog、lの割合で添
加した3種類の混合液を用意し、この各混合液にそれぞ
れ該アルミニウム板を常温で浸漬塗布した後、熱風乾燥
炉で120℃、30分の乾燥焼付工程を行い、それぞれ
約0.3,0.4.および0 、5 g/m”の付着量
で、かつコロイダルシリカを含有する高分子樹脂皮膜を
形成させた。
Examples 4 to 6 A chromate conversion film was formed on the surface of an aluminum plate in the same manner as in Example 1, and then washed. Subsequently, three kinds of mixtures were prepared by adding cationically charged dispersive colloidal silica (registered trademark Snowtex AK, Nissan Chemical) to an aqueous solution of 20 g IQ of the water-soluble polyamide resin used in Example 1 at a ratio of 2 g IQ, 5 g IQ, and Log, l. The aluminum plates were immersed in each of the mixed solutions at room temperature, and then subjected to a drying and baking process at 120°C for 30 minutes in a hot air drying oven. A polymer resin film containing colloidal silica was formed with a coating weight of 0.5 g/m''.

本処理を施したアルミニウム基板の性能確認を実施例1
と同様の方法で行った結果を表1に示したが、水濡れ性
は長期間にわたって劣化することなく良好に維持でき感
光層の密着性もよい。
Example 1 Confirming the performance of aluminum substrates subjected to this treatment
The results obtained using the same method as above are shown in Table 1, and the water wettability was maintained well over a long period of time without deterioration, and the adhesion of the photosensitive layer was also good.

比較例3〜5 実施例1と同じ方法でクロム酸クロメー
ト化成皮膜を形成させ、ひき続き、アニオン分散性アク
リル樹脂エマルジョン(登録商標トークツルN−142
,東洋インキ製造)樹脂固形分濃度20gIQの水溶液
にアニオン荷電分散性コロイダルシリカ(登録商標スノ
ーテックスO2日産化学)を5g/Q、Log/Ωおよ
び20g/Qの割合で添加した3種類の混合液を用意し
、この各混合液に該アルミニウム板を常温で浸漬塗布し
た後、熱風乾燥炉で120℃、30分の乾燥焼付を行い
Comparative Examples 3 to 5 A chromate chromate conversion film was formed in the same manner as in Example 1, and then an anion-dispersible acrylic resin emulsion (registered trademark Tokutsuru N-142) was formed.
, Toyo Ink Manufacturing) Three types of mixed liquids in which anionic charge dispersive colloidal silica (registered trademark Snowtex O2 Nissan Chemical) was added to an aqueous solution with a resin solid content concentration of 20 g IQ at a ratio of 5 g/Q, Log/Ω, and 20 g/Q. The aluminum plates were dip-coated in each of the mixed solutions at room temperature, and then dried and baked in a hot air drying oven at 120°C for 30 minutes.

それぞれ約0.4,0.5および0 、6 g/m2の
付着量で、かつコロイダルシリカを含有する高分子樹脂
皮膜を形成させた。本処理を施したアルミニウム基板の
性能確認を実施例1と同様の方法で行った結果を表1に
示した。表1に示すように比較例3.4.5では良好な
水濡れ性を呈するためにはコロイダルシリカの樹脂に占
める割合を多くする必要があるが、その反面コロイダル
シリカの添加割合を増加せしめると、感光層の密着性が
低下する傾向を示した。
Polymer resin films containing colloidal silica were formed with adhesion amounts of approximately 0.4, 0.5 and 0.6 g/m2, respectively. The performance of the aluminum substrate subjected to this treatment was confirmed in the same manner as in Example 1, and the results are shown in Table 1. As shown in Table 1, in Comparative Example 3.4.5, it is necessary to increase the proportion of colloidal silica in the resin in order to exhibit good water wettability, but on the other hand, increasing the proportion of colloidal silica added , the adhesion of the photosensitive layer tended to decrease.

実施例7 厚さ0.2mmのアルミニウム板(A105
0)を2%苛性ソーダを主体とするアルカリ性エツチン
グ洗浄液60℃で1分間浸漬した後、水洗した。次いで
15%硫酸水溶液中で直流電圧20■で1分間陽極酸化
処理を行い水洗した。しかる後、実施例1で用いた水溶
性ポリアミドを含む処理液で同じ条件で、約1μの陽極
酸化皮膜の上に水濡れ性を有するポリアミド樹脂皮膜を
約0.4g/+a”の付着量をもって形成させた。
Example 7 Aluminum plate (A105) with a thickness of 0.2 mm
0) was immersed in an alkaline etching cleaning solution mainly containing 2% caustic soda at 60° C. for 1 minute, and then washed with water. Next, an anodic oxidation treatment was performed in a 15% sulfuric acid aqueous solution at a DC voltage of 20 μm for 1 minute, followed by washing with water. Thereafter, a water-wettable polyamide resin film was coated on the approximately 1μ anodic oxide film with a coating weight of approximately 0.4 g/+a'' under the same conditions using the treatment solution containing water-soluble polyamide used in Example 1. formed.

本処理を施したアルミニウム基板を実施例1と同様の試
験を行った結果を表1に示したが、水濡れ性は経時劣化
もなく良好で、又感光層の密着性もよかった。
The aluminum substrate subjected to this treatment was subjected to the same test as in Example 1, and the results are shown in Table 1. The water wettability was good with no deterioration over time, and the adhesion of the photosensitive layer was also good.

実施例8 実施例7と同じアルミニウム板を研暦砂によ
って表面を粗面化した後、実施例1で用いた水溶性ポリ
アミドを含む処理液で水濡れ性を有するポリアミド樹脂
皮膜を0 、4 g/m2の付着量で形成した。本処理
のアルミニウム基板に実施例1と同様の試験を行った結
果を表1に示したが、水濡れ性も良好に維持でき、感光
層の密着性もよい。
Example 8 After roughening the surface of the same aluminum plate as in Example 7 with Kenreki sand, 0.4 g of a water-wettable polyamide resin film was applied with the treatment solution containing the water-soluble polyamide used in Example 1. It was formed with an adhesion amount of /m2. Table 1 shows the results of the same tests as in Example 1 performed on the aluminum substrate treated with this treatment, and the water wettability was maintained well, and the adhesion of the photosensitive layer was also good.

[発明の効果] 本発明の平版印刷用アルミニウム板は、画像形成後の非
画像部分に、持続性のある親水性面が形成され、又感光
層の密着性もよいために、多量の枚数の平版印刷に適し
ており、産業上の効果が大きい。
[Effects of the Invention] The aluminum plate for lithographic printing of the present invention has a long-lasting hydrophilic surface formed in the non-image area after image formation, and also has good adhesion of the photosensitive layer, so it can be used in a large number of sheets. It is suitable for lithographic printing and has great industrial effects.

Claims (1)

【特許請求の範囲】 (1)アルミニウムまたはアルミニウム合金板の表面に
水溶液中で陽イオン性を呈する有機高分子材料を主とす
る水溶液を塗着せしめてなる樹脂皮膜を備えることを特
徴とする平版印刷用アルミニウム基板の製造方法 (2)樹脂皮膜が水溶液中で陽イオン性を呈する水溶性
ポリアミド樹脂の水溶液を塗着せしめてなる樹脂皮膜で
ある特許請求の範囲第1項に記載の平版印刷用アルミニ
ウム基板の製造方法 (3)樹脂皮膜が水溶液中で陽イオン性を呈するカチオ
ン系アクリル樹脂の水溶液を塗着せしめてなる樹脂皮膜
である特許請求の範囲第1項に記載のアルミニウム基板
の製造方法(4)樹脂皮膜が水溶液中で陽イオン性を呈
する有機高分子材料に四価金属元素化合物を添加したP
Hが2〜7の水溶液を塗着せしめてなる樹脂皮膜である
特許請求の範囲第1項に記載の平版印刷用アルミニウム
基板の製造方法 (5)樹脂皮膜が水溶液中で陽イオン性を呈する有機高
分子材料にコロイダルシリカを添加した水溶液を塗着せ
しめてなる樹脂皮膜である特許請求の範囲第1項に記載
の平版印刷用アルミニウム基板の製造方法 (6)アルミニウムまたはアルミニウム合金板が、その
表面をあらかじめ機械的に粗面化したアルミニウムまた
はアルミニウム合金板である特許請求の範囲第1項また
は第2項または第3項または第4項または第5項に記載
の平版印刷用アルミニウム基板の製造方法 (7)アルミニウムまたはアルミニウム合金板が、その
表面にあらかじめ陽極酸化皮膜を形成せしめたアルミニ
ウムまたはアルミニウム合金板である特許請求の範囲第
1項または第2項または第3項または第4項または第5
項または第6項に記載の平版印刷用アルミニウム基板の
製造方法 (8)アルミニウムまたはアルミニウム合金板が、その
表面にあらかじめクロメート化成皮膜を形成せしめたア
ルミニウムまたはアルミニウム合金板である特許請求の
範囲第1項または第2項または第3項または第4項また
は第5項または第6項または第7項に記載の平版印刷用
アルミニウム基板の製造方法
[Scope of Claims] (1) A lithographic plate comprising a resin film formed by coating the surface of an aluminum or aluminum alloy plate with an aqueous solution mainly containing an organic polymeric material exhibiting cationic properties in an aqueous solution. Method for producing an aluminum substrate for printing (2) The method for lithographic printing according to claim 1, wherein the resin film is a resin film formed by applying an aqueous solution of a water-soluble polyamide resin that exhibits cationic properties in an aqueous solution. Method for manufacturing an aluminum substrate (3) The method for manufacturing an aluminum substrate according to claim 1, wherein the resin film is a resin film formed by applying an aqueous solution of a cationic acrylic resin that exhibits cationic properties in an aqueous solution. (4) P in which a tetravalent metal element compound is added to an organic polymer material whose resin film exhibits cationic properties in an aqueous solution.
A method for producing an aluminum substrate for lithographic printing according to claim 1, wherein the resin film is formed by applying an aqueous solution in which H is 2 to 7. (6) The method for producing an aluminum substrate for lithographic printing according to claim 1, which is a resin film formed by coating a polymeric material with an aqueous solution containing colloidal silica. The method for producing an aluminum substrate for lithographic printing according to claim 1 or 2 or 3 or 4 or 5, which is an aluminum or aluminum alloy plate whose surface has been mechanically roughened in advance. (7) Claim 1 or 2 or 3 or 4 or 5, wherein the aluminum or aluminum alloy plate is an aluminum or aluminum alloy plate on which an anodized film has been previously formed.
The method for manufacturing an aluminum substrate for lithographic printing according to item 1 or 6, wherein the aluminum or aluminum alloy plate is an aluminum or aluminum alloy plate on which a chromate conversion film has been previously formed on the surface of the aluminum or aluminum alloy plate. The method for producing an aluminum substrate for lithographic printing according to item 1 or 2 or 3 or 4 or 5 or 6 or 7.
JP25816186A 1986-10-31 1986-10-31 Manufacturing method of aluminum substrate for lithographic printing Pending JPS63112193A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25816186A JPS63112193A (en) 1986-10-31 1986-10-31 Manufacturing method of aluminum substrate for lithographic printing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25816186A JPS63112193A (en) 1986-10-31 1986-10-31 Manufacturing method of aluminum substrate for lithographic printing

Publications (1)

Publication Number Publication Date
JPS63112193A true JPS63112193A (en) 1988-05-17

Family

ID=17316382

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25816186A Pending JPS63112193A (en) 1986-10-31 1986-10-31 Manufacturing method of aluminum substrate for lithographic printing

Country Status (1)

Country Link
JP (1) JPS63112193A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5302460A (en) * 1990-07-21 1994-04-12 Hoechst Aktiengesellschaft Support material for offset-printing plates in the form of a sheet, a foil or a web process for its production and offset-printing plate comprising said material
US5403975A (en) * 1990-08-17 1995-04-04 Olin Corporation Anodized aluminum electronic package components

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5302460A (en) * 1990-07-21 1994-04-12 Hoechst Aktiengesellschaft Support material for offset-printing plates in the form of a sheet, a foil or a web process for its production and offset-printing plate comprising said material
US5403975A (en) * 1990-08-17 1995-04-04 Olin Corporation Anodized aluminum electronic package components

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